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1. 发明申请

US20060234135A1 Method for repairing mask-blank defects using repair-zone compensation 审中-公开
标题翻译：使用修补区补偿修复掩模 - 空白缺陷的方法
公开(公告)号：US20060234135A1
公开(公告)日：2006-10-19
申请号：US11109026
申请日：2005-04-18
申请人： Stefan Hau-Riege , Donald Sweeney , Anton Barty , Paul Mirkarimi , Daniel Stearns
发明人： Stefan Hau-Riege , Donald Sweeney , Anton Barty , Paul Mirkarimi , Daniel Stearns
IPC分类号： G03C5/00 , G21K5/00 , G03F1/00
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/72 , G21K2201/067
摘要： A method for repairing mask-blank defects uses repair-zone compensation. Local disturbances are compensated over the post-defect-repair repair-zone by altering a portion of the absorber pattern on the surface of the mask blank. This enables the fabrication of defect-free (since repaired) X-ray Mo—Si multilayer mirrors. Repairing Mo—Si multilayer-film defects on mask blanks is a key for the commercial success of EUVL. It is known that particles are added to the Mo—Si multilayer film during the fabrication process. There is a large effort to reduce this contamination, but results are not sufficient, and defects continue to be a major mask yield limiter.
摘要翻译：修复掩模 - 空白缺陷的方法使用修补区补偿。通过改变掩模毛坯表面上的部分吸收体图案来补偿在缺陷后修复区域上的局部扰动。这使得能够制造无缺陷（自修复的）X射线Mo-Si多层反射镜。在掩模板上修复Mo-Si多层膜缺陷是EUVL商业成功的关键。已知在制造过程中将颗粒加入到Mo-Si多层膜中。减少这种污染有很大的努力，但结果是不够的，缺陷仍然是主要的面膜产量限制。

2. 发明申请

US20050118533A1 Planarization of substrate pits and scratches 审中-公开
标题翻译：基底凹坑和划痕的平面化
公开(公告)号：US20050118533A1
公开(公告)日：2005-06-02
申请号：US10964048
申请日：2004-10-12
申请人： Paul Mirkarimi , Sherry Baker , Daniel Stearns , Eberhard Spiller
发明人： Paul Mirkarimi , Sherry Baker , Daniel Stearns , Eberhard Spiller
IPC分类号： C23C14/14 , C23C14/22 , C23C14/34 , C23C14/46 , C23C14/58 , G02B1/12 , G03F1/08 , G03F1/14 , G21K1/06 , G03F7/36
CPC分类号： C23C14/14 , B82Y10/00 , B82Y40/00 , C23C14/223 , C23C14/3442 , C23C14/46 , C23C14/5833 , G02B1/12 , G03F1/24 , G21K1/062 , G21K2201/067
摘要： Ion-beam based deposition technique are provided for the planarization of pit and scratch defects in conjunction with particle defects. One application of this planarization technique is to mitigate the effects of pits and scratches and particles on reticles for extreme ultraviolet (EUV) lithography. In the planarization process, thin Si layers are successively deposited and etched away where the etching is directed at angles well away from normal incidence to the substrate to planarize pits and scratches without causing the particle defects to get too large; this is followed by a normal incidence etching process sequence designed primarily to planarize the particles but which will also planarize the pits and scratches to completion. The process also shows significant promise for planarizing substrate roughness.
摘要翻译：提供了基于离子束的沉积技术，用于平坦化凹坑和划痕缺陷以及颗粒缺陷。这种平面化技术的一个应用是减轻凹坑和划痕和颗粒对极紫外（EUV）光刻的掩模版的影响。在平坦化过程中，薄Si层被依次沉积并蚀刻掉，其中蚀刻以远离正常入射到衬底的角度定向，以平坦化凹坑和划痕而不会使颗粒缺陷变得太大; 这之后是主要设计为使颗粒平坦化但也将凹坑和划痕平坦化以完成的正常入射蚀刻工艺序列。该工艺还显示出使基板粗糙度平坦化的显着前景。

3. 发明授权

US08731139B2 Evaporative thermal management of grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放射收集器的蒸发热管理
公开(公告)号：US08731139B2
公开(公告)日：2014-05-20
申请号：US13136784
申请日：2011-08-10
申请人： Boris Grek , Daniel Stearns , Natale M. Ceglio
发明人： Boris Grek , Daniel Stearns , Natale M. Ceglio
IPC分类号： G02B7/195 , G21K1/06 , H01J35/16 , H05G1/02 , G02B5/08
CPC分类号： G03F7/70891 , F28D15/0208 , F28D15/04 , F28D15/046 , G02B7/1815 , G03F7/70166 , G21K1/067 , H05G2/001
摘要： Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.
摘要翻译：蒸发热管理系统和用于极紫外（EUV）光刻的掠入射收集器（GIC）的方法包括与外壳相接合的GIC壳，以形成具有前端并且限定腔室的结构。腔室可操作地支撑至少一个芯吸层。导管将芯吸层连接到支撑储存器中的冷却流体的冷凝器系统。当向前端施加热量时，冷却流体通过芯吸层中的毛细管作用和可选的重力辅助从冷凝器单元吸入室中，同时蒸气沿着从室到冷凝器单元的相反方向被抽吸。在冷凝器单元处从冷凝的蒸汽中除去热量，从而冷却GIC镜壳。

4. 发明申请

US20110078944A1 Bee Smoker 有权
标题翻译：蜜蜂吸烟者
公开(公告)号：US20110078944A1
公开(公告)日：2011-04-07
申请号：US12573214
申请日：2009-10-05
申请人： Daniel Stearns
发明人： Daniel Stearns
IPC分类号： A01K55/00
CPC分类号： A01K55/00
摘要： An improved bee smoker is provided for producing smoke on demand for use in controlling bees that includes a housing, a power source, a heating element, a fan, and switches.
摘要翻译：提供了一种改进的蜂吸烟器，用于根据需要生产用于控制包括壳体，电源，加热元件，风扇和开关的蜜蜂的烟雾。

5. 发明授权

US08746975B2 Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放电收集器的热管理系统，组件和方法
公开(公告)号：US08746975B2
公开(公告)日：2014-06-10
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
IPC分类号： H01J35/02 , H01J35/16 , G21K1/06
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

6. 发明申请

US20120281189A1 Evaporative thermal management of grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放射收集器的蒸发热管理
公开(公告)号：US20120281189A1
公开(公告)日：2012-11-08
申请号：US13136784
申请日：2011-08-10
申请人： Boris Grek , Daniel Stearns , Natale M. Ceglio
发明人： Boris Grek , Daniel Stearns , Natale M. Ceglio
IPC分类号： G03B27/52 , F28D15/04
CPC分类号： G03F7/70891 , F28D15/0208 , F28D15/04 , F28D15/046 , G02B7/1815 , G03F7/70166 , G21K1/067 , H05G2/001
摘要： Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.
摘要翻译：蒸发热管理系统和用于极紫外（EUV）光刻的掠入射收集器（GIC）的方法包括与外壳相接合的GIC壳，以形成具有前端并且限定腔室的结构。腔室可操作地支撑至少一个芯吸层。导管将芯吸层连接到支撑储存器中的冷却流体的冷凝器系统。当向前端施加热量时，冷却流体通过芯吸层中的毛细管作用和可选的重力辅助从冷凝器单元吸入室中，同时蒸气沿着从室到冷凝器单元的相反方向被抽吸。在冷凝器单元处从冷凝的蒸汽中除去热量，从而冷却GIC镜壳。

7. 发明授权

US08353126B2 Bee smoker 有权
标题翻译：蜜蜂吸烟者
公开(公告)号：US08353126B2
公开(公告)日：2013-01-15
申请号：US12573214
申请日：2009-10-05
申请人： Daniel Stearns
发明人： Daniel Stearns
IPC分类号： A01K55/00
CPC分类号： A01K55/00
摘要： An improved bee smoker is provided for producing smoke on demand for use in controlling bees that includes a housing, a power source, a heating element, a fan, and switches.
摘要翻译：提供了一种改进的蜂吸烟器，用于根据需要生产用于控制包括壳体，电源，加热元件，风扇和开关的蜜蜂的烟雾。

8. 发明申请

US20060227113A1 INFRARED KEYPAD ACTUATOR HAVING IMPROVED FALSE TRIGGERING RESISTANCE 审中-公开
标题翻译：红色键盘执行器具有改进的假冒触发电阻
公开(公告)号：US20060227113A1
公开(公告)日：2006-10-12
申请号：US10907581
申请日：2005-04-06
申请人： David Joyce , Daniel Stearns
发明人： David Joyce , Daniel Stearns
IPC分类号： G09G5/00
CPC分类号： G06F3/0202 , G06F3/0421
摘要： An actuator configured for use with an infrared (IR) touch screen device includes a flexible body having a cutout portion formed therein for viewing a display region of the touch screen device. One or more input buttons are formed in the flexible body, the one or more input buttons configured for alignment with corresponding keypad locations on the touch screen device. The one or more input buttons further include a reflective surface on a back side thereof for directly contacting the corresponding keypad areas on the touch screen device when the one or more buttons are fully depressed.
摘要翻译：配置为与红外（IR）触摸屏设备一起使用的致动器包括柔性体，其具有形成在其中的切口部分，用于观察触摸屏设备的显示区域。在柔性主体中形成一个或多个输入按钮，所述一个或多个输入按钮被配置为与触摸屏设备上的对应键盘位置对准。所述一个或多个输入按钮还包括在其背侧上的反射表面，用于当所述一个或多个按钮被完全按压时，直接接触触摸屏设备上的对应键盘区域。

9. 发明申请

US20070270697A1 METHOD AND APPARATUS FOR DETERMINING TARGET DEPTH, BRIGHTNESS AND SIZE WITHIN A BODY REGION 有权
标题翻译：用于确定目标区域的目标深度，亮度和大小的方法和装置
公开(公告)号：US20070270697A1
公开(公告)日：2007-11-22
申请号：US11829930
申请日：2007-07-29
申请人： Bradley Rice , Daniel Stearns , Tamara Troy
发明人： Bradley Rice , Daniel Stearns , Tamara Troy
IPC分类号： A61B6/00
CPC分类号： G01N21/6456 , G01N21/4795 , G01N21/6428
摘要： A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.
摘要翻译：公开了一种调查受试者中发光源的位置和尺寸的方法。在实施该方法时，首先通过用光电检测器件从第一个角度测量光源（i）来源于发光源，（ii）穿过受试者的混浊生物组织，以及（iii）从对象的感兴趣的第一表面区域发射。光强度曲线与基于参数的生物光子函数匹配，以估计诸如深度和大小的函数参数。使用除第一测量光强度分布之外的数据来精确地确定如此确定的参数，以获得对象中源的近似深度和大小。还公开了一种用于执行该方法的装置。

10. 发明申请

US20120212719A1 THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY 有权
标题翻译：热管理系统，组装和方法，用于对EUV LITHOGRAPHY进行收集
公开(公告)号：US20120212719A1
公开(公告)日：2012-08-23
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

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