专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06403744B1 Fluorine-containing copolymer and composition for preparing low reflectance film 有权
标题翻译：含氟共聚物和制备低反射膜的组合物
公开(公告)号：US06403744B1
公开(公告)日：2002-06-11
申请号：US09640536
申请日：2000-08-17
申请人： Shuyo Akama , Hiromi Sugimoto , Kentaro Tsutsumi
发明人： Shuyo Akama , Hiromi Sugimoto , Kentaro Tsutsumi
IPC分类号： C08F21418
CPC分类号： C08F214/182 , C08F214/188
摘要： The invention relates to a fluorine-containing copolymer. This copolymer contains 1-99 mol % of a special first repeating unit of a cyclic perfluoro group; and 99-1 mol % of a second repeating unit of a bivalent organic group. The copolymer has a number average molecular weight of from 1,000 to 1,000,000 determined in a gel permeation chromatography using polystyrene as a standard material thereof. The invention further relates to a composition for forming a low reflectance film. This composition contains as a film-forming component a fluorine-containing polymer containing the first repeating unit. This polymer can be the above copolymer. A film formed by applying the composition to a substrate provides low reflectance and is improved in hardness.
摘要翻译：本发明涉及一种含氟共聚物。该共聚物含有1-99mol％的环状全氟基团的特殊的第一重复单元; 和99-1摩尔％的二价有机基团的第二重复单元。该共聚物的数均分子量为1,000〜1,000,000，在使用聚苯乙烯作为标准材料的凝胶渗透色谱中测定。本发明还涉及用于形成低反射率膜的组合物。该组合物含有含有第一重复单元的含氟聚合物作为成膜组分。该聚合物可以是上述共聚物。通过将组合物施加到基材上形成的膜提供低反射率并且硬度提高。

2. 发明授权

US5880234A Curable fluorine-containing copolymer and coating liquid composition containing same 失效
标题翻译：可固化的含氟共聚物和含有它的涂布液组合物
公开(公告)号：US5880234A
公开(公告)日：1999-03-09
申请号：US831305
申请日：1997-04-01
申请人： Kazuhiko Maeda , Yukio Ikeda , Kentaro Tsutsumi , Yutaka Maruyama , Shuyo Akama , Michitaka Ohtani
发明人： Kazuhiko Maeda , Yukio Ikeda , Kentaro Tsutsumi , Yutaka Maruyama , Shuyo Akama , Michitaka Ohtani
IPC分类号： C08F214/18 , C08F218/10 , C08F12/22
CPC分类号： C08F218/10 , C08F214/184 , C08F214/186
摘要： The invention relates to a curable fluorine-containing copolymer prepared by copolymerizing a monomer mixture. This monomer mixture is in an amount of 100 mol % in total and includes (a) 10-60 mol % of a first polymerizable monomer that is one of hexafluoroisobutene and hexafluoroacetone, each of which has one hexafluoroisopropylidene group; (b) 10-70 mol % of a fatty acid vinyl ester that is represented by a general formula of CH.sub.2 .dbd.CH--OC (.dbd.O) --R.sup.1 where R.sup.1 is one of an alkyl group and --(CH.sub.2).sub.m --R.sup.2 --(CH.sub.2).sub.n --H where R.sup.2 is one of a cycloalkylene group and a divalent aromatic group, and m and n are respectively integers each ranging from 0 to 12, the alkyl group having a carbon atom number of from 1 to 22 and an optional branched chain, each of the cycloalkylene group and the divalent aromatic group having an optional substituent; (c) 1-60 mol % of a second polymerizable monomer that has a cross-linkable functional group and a polymerizable double bond, the cross-linkable functional group being one selected from the group consisting of hydroxyl group, carboxyl group, hydrolyzable organosilyl groups, epoxy groups, .beta.-ketoester groups; and (d) 0-20 mol %, of a third polymerizable monomer that is different from the first and second monomers and the fatty acid vinyl ester and is free of a cross-linkable functional group. A coated film prepared by the application of a varnish containing the fluorine-containing copolymer is superior in water repellency and stain resistance.
摘要翻译：本发明涉及通过共聚单体混合物制备的可固化含氟共聚物。该单体混合物的总量为100摩尔％，包括（a）10-60摩尔％的作为六氟异丁烯和六氟丙酮之一的第一可聚合单体，每个具有一个六氟异丙烯基; （b）10-70mol％由通式CH 2 = CH-OC（= O）-R1表示的脂肪酸乙烯基酯，其中R1是烷基和 - （CH2）m -R2- （CH2）nH，其中R2是亚环烷基和二价芳族基团之一，m和n分别为0-12的整数，碳原子数为1至22的烷基和任选的支链，各环亚烷基和具有任选取代基的二价芳基; （c）1-60摩尔％具有可交联官能团和可聚合双键的第二可聚合单体，所述可交联官能团选自羟基，羧基，可水解的有机甲硅烷基，环氧基团，β-酮酯基团; 和（d）0-20摩尔％的不同于第一和第二单体和脂肪酸乙烯基酯并且不含可交联官能团的第三可聚合单体。通过使用含有含氟共聚物的清漆制备的涂膜具有优异的防水性和耐污染性。

3. 发明授权

US06861197B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06861197B2
公开(公告)日：2005-03-01
申请号：US10084828
申请日：2002-02-28
申请人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： C08F220/22 , G03F7/004 , G03F7/039
CPC分类号： C08F220/22 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/126 , Y10S430/168
摘要： A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2 laser and is ideal as a micropatterning material in VLSI fabrication.
摘要翻译：提供了具有含有氟化脂环族单元的酯基的基础聚合物。包含聚合物的抗蚀剂组合物对高能量辐射敏感，并且在小于200nm的波长下具有优异的灵敏度，由于所掺入的氟化脂环族单元以及令人满意的等离子体耐蚀刻性而显着提高了透明度。抗蚀剂组合物在F2激光的曝光波长处具有低吸收，并且在VLSI制造中是理想的微图案材料。

4. 发明授权

US06680389B2 Ester compounds 有权
标题翻译：酯化合物
公开(公告)号：US06680389B2
公开(公告)日：2004-01-20
申请号：US10178482
申请日：2002-06-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： C07D30756
CPC分类号： C07D307/00 , C07D307/33 , C07D309/30
摘要： Acrylic esters containing fluorine at &agr;-position and having a lactone ring introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters have a high transparency to VUV and good adhesion to substrates and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
摘要翻译：在α-位上含有氟并具有引入其酯侧链的内酯环的丙烯酸酯是新颖的。从丙烯酸酯获得的聚合物对VUV具有高透明度和对基材的良好粘附性，并且用于制备用于光刻微细加工的化学放大抗蚀剂组合物。

5. 发明授权

US06582880B2 Polymers, resist compositions and patterning process 有权
公开(公告)号：US06582880B2
公开(公告)日：2003-06-24
申请号：US09947765
申请日：2001-09-07
申请人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , C08F220/22 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.

6. 发明授权

US06384182B2 Fluorine-containing polybenzoxazole 有权
标题翻译：含氟聚苯并恶唑
公开(公告)号：US06384182B2
公开(公告)日：2002-05-07
申请号：US09904529
申请日：2001-07-16
申请人： Kazuhiko Maeda , Yoshihiro Moroi , Michio Ishida , Kentaro Tsutsumi
发明人： Kazuhiko Maeda , Yoshihiro Moroi , Michio Ishida , Kentaro Tsutsumi
IPC分类号： C08G6926
CPC分类号： C08G73/22
摘要： The invention relates to a fluorine-containing polybenzoxazole including a structural unit represented by the general formula (1): where X is a tetravalent organic group containing an aromatic ring, and two sets of N and O are each bonded to the ortho positions of the aromatic ring of X such that two five-membered rings are formed next to the aromatic ring of X. This polybenzoxazole demonstrates low dielectric constant and low coefficient of thermal expansion while maintaining the properties of polybenzoxazole including mechanical strength and thermal stability.
摘要翻译：本发明涉及包含由通式（1）表示的结构单元的含氟聚苯并恶唑：其中X是含有芳香环的四价有机基团，并且两组N和O各自键合到 X的芳环，使得在X的芳香环上形成两个五元环。该聚苯并恶唑表现出低的介电常数和低的热膨胀系数，同时保持聚苯并恶唑的性质，包括机械强度和热稳定性。

7. 发明授权

US07005228B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07005228B2
公开(公告)日：2006-02-28
申请号：US10178638
申请日：2002-06-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7/038 , G03F7/40
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A ternary copolymer comprising units of α-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of α-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
摘要翻译：包含其上取代有酸不稳定基团的α-三氟甲基丙烯酸羧酸酯单元的三元共聚物，其上取代有粘合剂基团的α-三氟甲基丙烯酸羧酸酯单元和具有六氟醇垂饰的苯乙烯单元对VUV辐射是高度透明的并且耐等离子体蚀刻。使用聚合物作为基础树脂的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，并且适用于光刻微处理。

8. 发明授权

US06933095B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06933095B2
公开(公告)日：2005-08-23
申请号：US10178475
申请日：2002-06-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7/032 , C08F212/14 , C08F220/04 , C08F220/22 , G03F7/004 , G03F7/039 , G03F7/38 , H01L21/027
CPC分类号： G03F7/0046 , C08F212/14 , G03F7/0392 , Y10S430/108 , Y10S430/146 , Y10S430/167
摘要： A copolymer of an acrylate monomer containing fluorine at α-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译：在α-位含氟的丙烯酸酯单体与氟化羟基苯乙烯衍生物的共聚物对VUV辐射是高度透明的并且耐等离子体蚀刻。使用聚合物作为基础树脂的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，分辨率，透明度，基底粘附性和等离子体耐蚀刻性，并且适用于光刻微处理。

9. 发明授权

US06176891B1 Coated granular fertilizer and method for producing same 失效
公开(公告)号：US06176891B1
公开(公告)日：2001-01-23
申请号：US09048111
申请日：1998-03-26
申请人： Haruhiko Komoriya , Kazuhiko Maeda , Masayuki Shiota , Yoshi Hirashima , Kentaro Tsutsumi , Mikio Ootani , Yukio Ikeda
发明人： Haruhiko Komoriya , Kazuhiko Maeda , Masayuki Shiota , Yoshi Hirashima , Kentaro Tsutsumi , Mikio Ootani , Yukio Ikeda
IPC分类号： C05G500
CPC分类号： C08G18/36 , C05G3/0029 , C08G18/5021 , C08G18/8051
摘要： The invention relates to a coated granular fertilizer having a film covering fertilizer granules. This film comprises a polyurethane resin prepared by a method comprising the steps of (a) reacting an aromatic polyisocyanate with a first polyol component (i.e., castor oil or a castor oil derivative), thereby to obtain a prepolymer having terminal isocyanate groups in the molecule; and (b) reacting the prepolymer with a second polyol component (i.e., castor oil or a castor oil derivative) and a third polyol component which is an amine having at least two hydroxyl groups in the molecule, thereby to cure the prepolymer and thus to prepare the polyurethane resin. The invention relates to another coated granular fertilizer having a film covering fertilizer granules. This film comprises a urethane resin and aqueous-fluid-absorbing particles having a particle diameter of from 1 to 200 &mgr;m. This urethane resin may be the above polyurethane resin. This coated granular fertilizer can be produced by a method comprising the steps of (a) applying an aromatic polyisocyanate, a polyol component (i.e., castor oil or a castor oil derivative), an amine, and the aqueous-fluid-absorbing particles, at the same time or separately in no special order, while the fertilizer granules are kept fluidized or rolled, thereby to form a precursory film on the fertilizer granules; and (b) curing the precursory film into the film. Each coated granular fertilizer is substantially superior in regulation of the release of plant nutrient elements therefrom.

10. 发明授权

US4954589A Soluble and curable fluorine-containing copolymer suitable as paint vehicle 失效
标题翻译：可溶性和可固化含氟共聚物适合作为涂料载体
公开(公告)号：US4954589A
公开(公告)日：1990-09-04
申请号：US353032
申请日：1989-05-17
申请人： Kiyomi Sugawara , Kentaro Tsutsumi , Mikio Otani
发明人： Kiyomi Sugawara , Kentaro Tsutsumi , Mikio Otani
IPC分类号： C08F14/18 , C08F16/14 , C08F18/02 , C08F214/18 , C08F214/24 , C08F216/14 , C08F218/02 , C08F218/04 , C09D127/12 , C09D129/00 , C09D129/10 , C09D131/02 , C09D131/04 , C09D133/04 , C09D133/06
CPC分类号： C08F214/247 , C08F214/186 , C08F218/04
摘要： The invention provides a novel copolymer comprising 25-75 mol % of a fluoroolefin such as CTFE, 10-70 mol % of a vinyl or isopropenyl ester of fatty acid, such as finyl acetate or isopropenyl acetate, 3-40 mol % of a hydroxyl-containing allyl ether such as ethylene glycol monoallyl ether, and 0.1-20 mol % of a carboxyl-containing monomer such as finylacetic acid. This copolymer possesses favorable properties characteristic of fluoroesins, is soluble in various organic solvents and is curable at normal temperature by a polyisocyanate. Since the copolymer has carboxyl group, not only inorganic pigments but also organic pigments exhibit very good dispersibility in a solution of this copolymer in an organic solvent. The copolymer can be prepared by a single-stage reaction using a radical polymerization initiator.
摘要翻译：本发明提供一种包含25-75mol％的氟烯烃如CTFE，10-70mol％乙烯基或脂肪酸异丙烯酯的新型共聚物，例如乙酸芬脂酯或乙酸异丙烯酯，3-40mol％的羟基含有烯丙基醚如乙二醇单烯丙基醚和0.1-20摩尔％的含羧基的单体如甲基乙酸。该共聚物具有氟类蛋白的有利特性，可溶于各种有机溶剂，在常温下可通过多异氰酸酯固化。由于共聚物具有羧基，不仅无机颜料而且有机颜料在该共聚物在有机溶剂中的溶液中表现出非常好的分散性。共聚物可以通过使用自由基聚合引发剂的单阶段反应来制备。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式