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1. 发明授权

US08895934B2 Microstructure manufacturing method 有权
标题翻译：微结构制造方法
公开(公告)号：US08895934B2
公开(公告)日：2014-11-25
申请号：US12986015
申请日：2011-01-06
申请人： Shinan Wang , Takashi Nakamura , Takayuki Teshima , Yutaka Setomoto , Shinichiro Watanabe
发明人： Shinan Wang , Takashi Nakamura , Takayuki Teshima , Yutaka Setomoto , Shinichiro Watanabe
IPC分类号： B81C1/00 , G01T1/29
CPC分类号： G21K1/06 , B81C1/00619 , G01N23/20075 , G01T1/295 , H01L21/31111 , H01L21/32051
摘要： A microstructure manufacturing method includes forming a first insulating film on an Si substrate, exposing an Si surface by removing a part of the first insulating film, forming a recessed portion by etching the Si substrate from the exposed Si surface, forming a second insulating film on a sidewall and a bottom of the recessed portion, forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed portion, and filling the recessed portion with a metal from the Si exposed surface by electrolytic plating.
摘要翻译：微结构制造方法包括在Si衬底上形成第一绝缘膜，通过去除第一绝缘膜的一部分暴露出Si表面，通过从暴露的Si表面蚀刻Si衬底形成凹陷部分，形成第二绝缘膜所述凹部的侧壁和底部通过去除形成在所述凹部的底部上的所述第二绝缘膜的至少一部分而形成Si暴露表面，并且通过电解从所述Si暴露表面向所述凹部填充所述凹部电镀。

2. 发明申请

US20110168908A1 MICROSTRUCTURE MANUFACTURING METHOD 有权
标题翻译：微结构制造方法
公开(公告)号：US20110168908A1
公开(公告)日：2011-07-14
申请号：US12986015
申请日：2011-01-06
申请人： Shinan Wang , Takashi Nakamura , Takayuki Teshima , Yutaka Setomoto , Shinichiro Watanabe
发明人： Shinan Wang , Takashi Nakamura , Takayuki Teshima , Yutaka Setomoto , Shinichiro Watanabe
IPC分类号： G01T1/24 , H01L21/3205 , H01L29/06
CPC分类号： G21K1/06 , B81C1/00619 , G01N23/20075 , G01T1/295 , H01L21/31111 , H01L21/32051
摘要： A microstructure manufacturing method includes forming a first insulating film on an Si substrate, exposing an Si surface by removing a part of the first insulating film, forming a recessed portion by etching the Si substrate from the exposed Si surface, forming a second insulating film on a sidewall and a bottom of the recessed portion, forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed portion, and filling the recessed portion with a metal from the Si exposed surface by electrolytic plating.
摘要翻译：微结构制造方法包括在Si衬底上形成第一绝缘膜，通过去除第一绝缘膜的一部分暴露出Si表面，通过从暴露的Si表面蚀刻Si衬底形成凹陷部分，形成第二绝缘膜所述凹部的侧壁和底部通过去除形成在所述凹部的底部上的所述第二绝缘膜的至少一部分而形成Si暴露表面，并且通过电解从所述Si暴露表面向所述凹部填充所述凹部电镀。

3. 发明申请

US20110194673A1 MICROSTRUCTURE MANUFACTURING METHOD AND MICROSTRUCTURE 有权
标题翻译：微结构制造方法和微结构
公开(公告)号：US20110194673A1
公开(公告)日：2011-08-11
申请号：US13023454
申请日：2011-02-08
申请人： Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
发明人： Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
IPC分类号： G01N23/04 , B05D5/06 , B29D11/00 , B32B3/10 , B32B15/01
CPC分类号： G21K1/06 , C23C18/1612 , C23C18/1651 , C23C18/1653 , C23C18/1692 , C23C18/1851 , C23C18/1868 , C25D5/02 , C25D5/022 , C25D5/10 , C25D5/12 , C25D5/50 , C25D7/123 , G02B5/1838 , G02B5/1857 , G02B5/1866 , G21K2207/005 , Y10T428/12396
摘要： A microstructure manufacturing method includes: preparing a mold having on a front side thereof a plurality of fine structures, with conductivity being imparted to a bottom portion between the plurality of fine structures; forming a first plating layer between the plurality of fine structures by plating the bottom portion; and forming a second plating layer of larger stress than the first plating layer on the first plating layer between the plurality of fine structures, wherein the stress of the second plating layer is used to curve a back side surface of the mold.
摘要翻译：微结构制造方法包括：制备在其前侧具有多个精细结构的模具，其导电性被施加到所述多个精细结构之间的底部; 通过电镀底部在多个精细结构之间形成第一镀层; 并且形成比所述多个微细结构之间的所述第一镀层上的第一镀层大的应力的第二镀层，其中所述第二镀层的应力用于弯曲所述模具的背面。

4. 发明授权

US08908274B2 Microstructure manufacturing method and microstructure 有权
标题翻译：微结构制造方法和微观结构
公开(公告)号：US08908274B2
公开(公告)日：2014-12-09
申请号：US13023454
申请日：2011-02-08
申请人： Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
发明人： Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
IPC分类号： G02B5/18 , C23C18/16 , C23C18/18 , C25D5/10 , C25D5/12 , C25D5/50 , G21K1/06 , C25D7/12 , C25D5/02
CPC分类号： G21K1/06 , C23C18/1612 , C23C18/1651 , C23C18/1653 , C23C18/1692 , C23C18/1851 , C23C18/1868 , C25D5/02 , C25D5/022 , C25D5/10 , C25D5/12 , C25D5/50 , C25D7/123 , G02B5/1838 , G02B5/1857 , G02B5/1866 , G21K2207/005 , Y10T428/12396
摘要： A microstructure manufacturing method includes: preparing a mold having on a front side thereof a plurality of fine structures, with conductivity being imparted to a bottom portion between the plurality of fine structures; forming a first plating layer between the plurality of fine structures by plating the bottom portion; and forming a second plating layer of larger stress than the first plating layer on the first plating layer between the plurality of fine structures, wherein the stress of the second plating layer is used to curve a back side surface of the mold.
摘要翻译：微结构制造方法包括：制备在其前侧具有多个精细结构的模具，其导电性被施加到所述多个精细结构之间的底部; 通过电镀底部在多个精细结构之间形成第一镀层; 并且形成比所述多个微细结构之间的所述第一镀层上的第一镀层大的应力的第二镀层，其中所述第二镀层的应力用于弯曲所述模具的背面。

5. 发明授权

US4409613A SEPP-Based deflection control circuit 失效
标题翻译：基于SEPP的偏转控制电路
公开(公告)号：US4409613A
公开(公告)日：1983-10-11
申请号：US354307
申请日：1982-03-03
申请人： Takashi Nakamura , Yoshihiro Morioka , Kazunori Yamaji , Takashi Nakamura , Yoshihiro Morioka , Kazunori Yamaji
发明人： Takashi Nakamura , Yoshihiro Morioka , Kazunori Yamaji , Takashi Nakamura , Yoshihiro Morioka , Kazunori Yamaji
IPC分类号： H04N3/16 , H04N3/22 , H04N9/09 , H04N9/093
CPC分类号： H04N9/09
摘要： Deflection control apparatus for registering the electron beam, rasters of electrostatic-deflection pick-up tubes of a three-tube color television camera includes a compensating voltage generator with inputs connected to receive horizontal and vertical sawtooth deflection signals provided from a deflection signal generator, and outputs providing compensating voltages to adjust for size, skew, and rotation. A combining circuit is provided to add the deflecting signals to the respective compensating voltages to generate adjusted compensating voltages for application to respective electrostatic deflection plates of certain ones of the tubes. For each adjusted deflecting signal, the combining circuit includes a transistor circuit having an input electrode coupled to receive the associated compensating voltage and an output electrode connected through a load resistor to an output of the deflecting signal generator. A pair of SEPP-arranged transistors are provided with their bases connected to the output electrode of the transistor circuit and with their emitters coupled together, through like-value emitter resistors, to a respective deflection plate of one of the tubes. The SEPP-configured transistors permit a high impedance to be presented to the deflection signal generator to minimize the power consumption thereof, and a low resistance to be presented to the deflection plates, to keep the latter from undesirably integrating the deflection sawtooth voltages.
摘要翻译：用于对电子束进行配准的偏转控制装置，三管彩色电视摄像机的静电偏转拾取管的光栅包括：补偿电压发生器，具有连接的输入端，用于接收从偏转信号发生器提供的水平和垂直锯齿波偏转信号;以及输出提供补偿电压以调整大小，偏斜和旋转。提供组合电路以将偏转信号添加到相应的补偿电压以产生用于施加到某些管的各个静电偏转板的调整的补偿电压。对于每个经调整的偏转信号，组合电路包括晶体管电路，其具有耦合以接收相关联的补偿电压的输入电极和通过负载电阻器连接到偏转信号发生器的输出的输出电极。一对SEPP布置的晶体管被设置有它们的基极连接到晶体管电路的输出电极，并且它们的发射极通过同值发射极电阻耦合到一个管的相应的偏转板上。 SEPP配置的晶体管允许将高阻抗呈现给偏转信号发生器以最小化其功率消耗，以及将低电阻提供给偏转板，以防止偏转锯齿波电压的不期望的积分。

6. 发明授权

US08834144B2 Imprinting machine and device manufacturing method 有权
标题翻译：压印机和器件制造方法
公开(公告)号：US08834144B2
公开(公告)日：2014-09-16
申请号：US12710685
申请日：2010-02-23
申请人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： B29C59/02 , G03F9/00 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F9/703 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7049
摘要： An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.
摘要翻译：使具有图案的模具与物体接触并将图案转印到物体上的压印机包括测量单元，其在模具接触物体时测量模具的位置。

7. 发明授权

US08830539B2 Image processing apparatus and determination method 有权
公开(公告)号：US08830539B2
公开(公告)日：2014-09-09
申请号：US13609730
申请日：2012-09-11
申请人： Tetsuya Suwa , Minako Kato , Yugo Mochizuki , Takashi Nakamura , Masao Kato
发明人： Tetsuya Suwa , Minako Kato , Yugo Mochizuki , Takashi Nakamura , Masao Kato
IPC分类号： H04N1/04 , G06K15/00 , G06K9/46 , G06K9/50 , G06K9/48 , H04N1/387 , G06K9/20 , H04N1/00 , H04N1/38 , H04N1/46
摘要： A signal value representing at least one of a plurality of types of optical characteristics are calculated for each pixel from the read signal obtained and output by reading light reflected by a document placed on a document table and a document table cover while the document is covered with the cover. It is determined, based on the signal value calculated, whether or not a target pixel is a pixel in a document region. A document region is detected from the determination result.

8. 发明申请

US20130223025A1 ELECTRONIC DEVICE 审中-公开
标题翻译：电子设备
公开(公告)号：US20130223025A1
公开(公告)日：2013-08-29
申请号：US13588100
申请日：2012-08-17
申请人： Tadaomi Fujieda , Takashi Nakamura
发明人： Tadaomi Fujieda , Takashi Nakamura
IPC分类号： H05K7/02
CPC分类号： H05K7/02 , G06F1/1656
摘要： Provided is an electronic device including a housing, at least a part of which has conductive properties; a substrate on which a heating element is mounted and which has a ground pattern; and a spacer which is located between the housing and the ground pattern and which includes a main body portion having heat insulating properties and a conductive portion which is in contact with the ground pattern and the housing and which conducts current between the ground pattern and the housing.
摘要翻译：提供一种电子设备，其包括壳体，其至少一部分具有导电性能; 其上安装有加热元件并具有接地图案的基板; 以及间隔件，其位于壳体和接地图案之间，并且包括具有绝热性能的主体部分和与接地图案和壳体接触的导电部分并且在接地图案和壳体之间传导电流的间隔件。

9. 发明授权

US08402651B2 Method of manufacturing vane 有权
标题翻译：制造叶片的方法
公开(公告)号：US08402651B2
公开(公告)日：2013-03-26
申请号：US12369803
申请日：2009-02-12
申请人： Tomonari Tanaka , Mitsuru Yahagi , Kouji Shibayama , Takashi Nakamura , Yuuji Fukaura
发明人： Tomonari Tanaka , Mitsuru Yahagi , Kouji Shibayama , Takashi Nakamura , Yuuji Fukaura
IPC分类号： B21K3/04 , B05D3/00
CPC分类号： B29C71/0009 , B29C71/02 , B29C2035/043 , B29C2071/0018 , B29C2791/006 , B29K2101/10 , B29K2105/24 , B29L2031/08 , F04C18/3441 , F04C2230/90 , F05C2225/00 , Y10T29/49245 , Y10T29/49336
摘要： A method is provided which manufactures a vane used for an oil-sealed rotary vacuum pump and having at least a part formed of a resin material, the method including: an oil impregnating process of immersing the vane into oil used for the oil-sealed rotary vacuum pump under a depressurized condition, the oil impregnating process being carried out before a finishing process of finishing the vane into a final shape.
摘要翻译：提供一种制造用于油封旋转真空泵的叶片的方法，至少具有由树脂材料形成的部分，该方法包括：将叶片浸入用于油封旋转体的油中的油浸渍方法真空泵在减压条件下，油浸渍过程在将叶片整理成最终形状的精加工过程之前进行。

10. 发明申请

US20130063761A1 IMAGE PROCESSING APPARATUS AND INFORMATION SETTING SYSTEM 有权
标题翻译：图像处理设备和信息设置系统
公开(公告)号：US20130063761A1
公开(公告)日：2013-03-14
申请号：US13602572
申请日：2012-09-04
申请人： Hiroki Uchibori , Kei Nakabayashi , Takashi Nakamura , Osamu Kizaki , Sachiko Takeuchi
发明人： Hiroki Uchibori , Kei Nakabayashi , Takashi Nakamura , Osamu Kizaki , Sachiko Takeuchi
IPC分类号： G06K15/02
CPC分类号： G06F3/1285 , G06F3/1203 , G06F3/1231 , G06F9/445 , H04N1/00127 , H04N1/00973
摘要： An image processing apparatus includes a storing unit that stores setting information for operating the image processing apparatus; and an updating control unit that sends a request for obtaining predetermined differentiated setting information, which is a part of a set of setting information stored in a data processing apparatus in a differentiated manner in accordance with a predetermined differentiating criterion, to the data processing apparatus via a network, obtains the predetermined differentiated setting information from the data processing apparatus via the network and controls to update the setting information stored in the storing unit by the obtained predetermined differentiated setting information.
摘要翻译：图像处理装置包括：存储单元，存储用于操作图像处理装置的设置信息; 以及更新控制单元，其根据预定的微分准则向数据处理设备发送作为数据处理设备中存储的一组设置信息的一部分的预定差分设置信息的请求，经过网络，经由网络从数据处理装置获得预定的差异化设置信息，并且控制通过获得的预定差分设置信息来更新存储在存储单元中的设置信息。

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