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1. 发明授权

US4605860A Apparatus for focusing a charged particle beam onto a specimen 失效
标题翻译：用于将带电粒子束聚焦到样本上的装置
公开(公告)号：US4605860A
公开(公告)日：1986-08-12
申请号：US654457
申请日：1984-09-26
申请人： Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
发明人： Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
IPC分类号： H01J37/21 , H01J37/28 , H01J37/304 , G01K1/08 , H01J3/14
CPC分类号： H01J37/304 , H01J37/21
摘要： Disclosed is an apparatus for focusing a charged particle beam onto a speciman, which comprises a scanner for scanning a pre-formed standard pattern with a charged particle beam, a converging unit capable of converging the charged particle beam onto a specimen, a detector for detecting secondary charged particles emitted as a result of scanning the standard pattern by the scanner, a circuit for deriving a standard frequency component determined by the period of scanning with the charged particle beam and the shape of the portion of the standard pattern in the region being scanned with the charged particle beam, and a circuit cooperating with the converging unit for finding the maximum value of the amplitude of the standard frequency component thereby identifying attainment of focusing of the charged particle beam with high accuracy.
摘要翻译：公开了一种用于将带电粒子束聚焦到标本上的装置，其包括用于利用带电粒子束扫描预形成的标准图案的扫描器，能够将带电粒子束收敛到样本上的会聚单元，用于检测的检测器作为由扫描仪扫描标准图案的结果而发射的二次带电粒子，用于导出由带电粒子束扫描的周期确定的标准频率分量的电路和被扫描的区域中的标准图案的部分的形状带电粒子束，以及与会聚单元配合的电路，用于找到标准频率分量的振幅的最大值，从而以高精度识别带电粒子束的聚焦。

2. 发明授权

US4600839A Small-dimension measurement system by scanning electron beam 失效
标题翻译：通过扫描电子束的小尺寸测量系统
公开(公告)号：US4600839A
公开(公告)日：1986-07-15
申请号：US576324
申请日：1984-02-02
申请人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
发明人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
IPC分类号： G01B15/00 , G01R31/305 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00 , G01R31/305
摘要： A small-dimension measurement system by scanning electron beam comprises an electron optical column including an electron source for emitting an electron beam to scan a sample, at least one pair of detectors disposed symmetrically with respect to an optical axis of the electron optical column for detecting position information from the sample by scanning of the electron beam, and a signal selecting circuit for subjecting the outputs of the paired detectors to a predetermined signal selection. The signal selecting circuit selectively and alternately provides maximum or peak portions of the outputs of the paired detectors which portions correspond to opposite edge portions of the sample. The output of the signal selecting circuit is applied to a signal processing circuit for conversion into a dimension of a predetermined pattern on the sample.
摘要翻译：通过扫描电子束的小尺寸测量系统包括电子光学柱，其包括用于发射电子束以扫描样品的电子源，至少一对相对于电子光学柱的光轴对称设置的检测器，用于检测通过扫描电子束从样品的位置信息，以及信号选择电路，用于对成对的检测器的输出进行预定的信号选择。信号选择电路选择性地并且交替地提供成对检测器的输出的最大值或峰值部分，这些部分对应于样品的相对边缘部分。信号选择电路的输出被施加到信号处理电路，以转换成样本上的预定图案的尺寸。

3. 发明授权

US5134289A Field emission electron device which produces a constant beam current 失效
标题翻译：产生恒流束电流的场发射电子器件
公开(公告)号：US5134289A
公开(公告)日：1992-07-28
申请号：US627976
申请日：1990-12-17
申请人： Hisaya Murakoshi , Mikio Ichihashi , Shigeto Isakozawa , Yuji Sato
发明人： Hisaya Murakoshi , Mikio Ichihashi , Shigeto Isakozawa , Yuji Sato
IPC分类号： H01J37/285 , H01J37/073 , H01J37/24
CPC分类号： H01J37/243 , H01J37/073
摘要： A field emission electron microscope in which a controller is provided to make an electron beam current fixed due to variations in an accelerating voltage or an extracting voltage to thereby make fixed the brightness of an electron beam with which a specimen is illuminated.

4. 发明授权

US4767926A Electron beam metrology system 失效
标题翻译：电子束计量系统
公开(公告)号：US4767926A
公开(公告)日：1988-08-30
申请号：US911791
申请日：1986-09-26
申请人： Hisaya Murakoshi , Mikio Ichihashi , Kenichi Yamamoto
发明人： Hisaya Murakoshi , Mikio Ichihashi , Kenichi Yamamoto
IPC分类号： G01B15/00 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , G01B15/00
摘要： Disclosed is an electron beam metrology system for measuring the width of a pattern on a specimen by scanning the specimen with a deflected electron beam, detecting a pattern image signal provided by secondary electrons emitted from the specimen, and measuring the pattern width on the specimen on the basis of the pattern detection signal. The system comprises a signal detecting device including at least one set of two detectors disposed toward the scanning direction of the electron beam in a relation symmetrical with respect to the optical axis of the electron beam for detecting pattern image signals independently of each other, a device for recognizing surface topography of the pattern using an output signal of the signal detecting device, and a device for measuring the pattern width while discriminating as to whether the pattern is a raised-profile pattern or a hollow-profile pattern.
摘要翻译：公开了一种电子束测量系统，用于通过用偏转的电子束扫描样本来测量样本上的图案的宽度，检测由样本发射的二次电子提供的图案图像信号，并测量样本上的图案宽度模式检测信号的基础。该系统包括信号检测装置，该信号检测装置包括至少一组两个检测器，其以相对于电子束的光轴对称关系的电子束的扫描方向设置，用于彼此独立地检测图案图像信号;装置用于使用信号检测装置的输出信号来识别图案的表面形貌，以及用于测量图案宽度的装置，同时鉴别图案是凸起轮廓图案还是中空轮廓图案。

5. 发明授权

US4751384A Electron beam metrology system 失效
标题翻译：电子束计量系统
公开(公告)号：US4751384A
公开(公告)日：1988-06-14
申请号：US13534
申请日：1987-02-11
申请人： Hisaya Murakoshi , Mikio Ichihashi , Hideo Todokoro
发明人： Hisaya Murakoshi , Mikio Ichihashi , Hideo Todokoro
IPC分类号： G01B15/00 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00
摘要： An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.
摘要翻译：一种用于以样品表面用电子束扫描的方式测量样品表面上的图案的宽度的电子束计量系统，检测从表面发射的二次电子以获得检测信号，以及通过使用检测信号测量图案的宽度，公开了一对检测器相对于电子束的光轴在其扫描方向上对称设置，其中一个检测器的输出信号形成与其他输出信号的检测器和其他输出信号与一个输出信号的比率，并且产生指示两个比率之和的和信号，以用于正确且精确地测量图案的宽度，而不受图案材料变化的影响。

6. 发明授权

US5373158A Field-emission transmission electron microscope and operation method thereof 失效
标题翻译：场发射透射电子显微镜及其操作方法
公开(公告)号：US5373158A
公开(公告)日：1994-12-13
申请号：US69838
申请日：1993-06-01
申请人： Hisaya Murakoshi , Mikio Ichihashi
发明人： Hisaya Murakoshi , Mikio Ichihashi
IPC分类号： H01J37/073 , H01J37/141 , H01J37/26
CPC分类号： H01J37/26 , H01J2237/0492 , H01J2237/06341 , H01J2237/25
摘要： An object of the present invention is to realize a field-emission transmission electron microscope which is able to cope with both observation of an electron-microscopic image of a high brightness and microanalysis. A low aberration condenser lens 4 is disposed at the farthest position from a specimen 7, and a short focal length lens 5 is disposed at the midpoint between the specimen 7 and the condenser lens 4. In the case of an observation of an electron-microscopic image, the condenser lens unit is operated for enlargement in which the condenser lens 4 and the condenser lens 5 are driven in an interlocking motion. When the size of a beam spot on a specimen is to be reduced, a condenser lens 6 disposed close to the specimen between the condenser lens 5 and the specimen 7 is driven to make the condenser lens unit be operated for reduction. The coexistence of a small illuminating angle and the illumination of a specimen with a fine beam spot is realized, which makes it possible for a field-emission transmission electron microscope to have both functions, being able to observe a bright electron microscopic image and to perform an element analysis.
摘要翻译：本发明的目的是实现能够应对高亮度和微量分析的电子显微图像的观察的场致发射透射电子显微镜。低像差聚光透镜4设置在距样本7最远的位置，并且短焦距透镜5设置在样本7和聚光透镜4之间的中点。在观察电子显微镜的情况下图像中，聚光透镜单元被操作以使聚光透镜4和聚光透镜5以互锁的方式驱动。当要减小试样上的束斑的尺寸时，驱动设置在聚光透镜5和样品7之间的样本附近的聚光透镜6，以使聚光透镜单元被操作以进行还原。实现了小的照明角度和具有精细光束点的样本的照射的共存，这使得场致发射透射电子显微镜具有两个功能，能够观察明亮的电子显微镜图像并执行元素分析。

7. 发明授权

US07232996B2 Method and an apparatus of an inspection system using an electron beam 失效
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US07232996B2
公开(公告)日：2007-06-19
申请号：US11319279
申请日：2005-12-29
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

8. 发明授权

US08604430B2 Method and an apparatus of an inspection system using an electron beam 有权
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US08604430B2
公开(公告)日：2013-12-10
申请号：US13366874
申请日：2012-02-06
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.
摘要翻译：所公开的检查装置产生电子束，加速电极加速电子束，会聚透镜会聚电子束，电子束偏转器扫描样品上的光束，物镜会将电子束会聚在样品上，检测器位于在样品和物镜之间检测从样品发射的带电粒子，电源向样品施加延迟电压以将电子束减速到样品，电极设置在物镜和样品之间，电压为通过所述电极在样品和电极之间产生，电压根据样品确定。该装置解决了常规检测系统遇到的问题。

9. 发明授权

US07012252B2 Method and an apparatus of an inspection system using an electron beam 失效
公开(公告)号：US07012252B2
公开(公告)日：2006-03-14
申请号：US11108877
申请日：2005-04-19
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

10. 发明授权

US4670652A Charged particle beam microprobe apparatus 失效
标题翻译：带电粒子束微探针装置
公开(公告)号：US4670652A
公开(公告)日：1987-06-02
申请号：US737478
申请日：1985-05-24
申请人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
发明人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
IPC分类号： H01J37/22 , G01B15/00 , G01B15/04 , G01B15/08 , G01N23/225 , H01J37/28
CPC分类号： H01J37/28
摘要： A charged particle beam microprobe apparatus capable of accurately determining the three-dimensional structure of a surface is disclosed in which a detection system including at least a pair of detectors disposed symmetrically with respect to the optical axis of an charged particle beam generating instrument is used for obtaining an image signal from a surface scanned with a charged particle beam, the image signal obtained by difference detection in the detection system is compared with a pair of variable reference levels opposite in polarity to each other, to be converted into positive and negative rectangular wave signals, and information on whether the scanned surface slopes upward or downward when viewed from the detection system and information on the gradient of the scanned surface are obtained from the polarity and pulse width of each of the positive and negative rectangular wave signals, respectively, to determine the three-dimensional structure of the scanned surface. That is, the charged particle beam apparatus does not utilize a phenomenon that the coefficient of backscattered electrons is proportional to the angle of slope of a primary beam impinging surface, and hence can use secondary electron suitable for forming a high resolution scanned image.
摘要翻译：公开了一种能够精确地确定表面的三维结构的带电粒子束微探针装置，其中使用包括至少一对相对于带电粒子束产生装置的光轴对称设置的检测器的检测系统从用带电粒子束扫描的表面获得图像信号，将通过检测系统中的差分检测获得的图像信号与彼此极性相反的一对可变参考电平进行比较，以被转换为正和负矩形波信号，以及关于从检测系统观察扫描表面是向上还是向下倾斜的信息以及关于扫描表面的梯度的信息的信息分别从正和负矩形波信号的极性和脉冲宽度获得到确定扫描表面的三维结构。也就是说，带电粒子束装置没有利用背散射电子的系数与主光束入射表面的倾斜角成比例的现象，因此可以使用适于形成高分辨率扫描图像的二次电子。

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