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    • 9. 发明申请
    • Defect Inspection Method and System
    • 缺陷检查方法和系统
    • US20110075134A1
    • 2011-03-31
    • US12964176
    • 2010-12-09
    • Sachio UTOHiroyuki NakanoYukihiro ShibataAkira HamamatsuYuta Urano
    • Sachio UTOHiroyuki NakanoYukihiro ShibataAkira HamamatsuYuta Urano
    • G01N21/88
    • G01N21/9501G01N21/21G01N21/4788G01N21/94G01N21/956
    • An apparatus for inspecting a specimen includes a first illumination unit having a laser light source and a first optical component for illuminating a specimen on which patterns are formed with a laser from a first elevation angle direction, a second illuminating unit having a light source and a second optical component for illuminating the specimen from a second elevation angle direction which is greater than the first elevation angle, a first detection optical unit which detects light from the specimen illuminated by the first illumination unit, a second detection optical unit which detects light from the specimen illuminated by the second illumination unit, and a signal processing unit which processes signals output from the first detector to detect defects in a first area on the specimen and processes signals output from the second detector to detect defects in a second area on the specimen.
    • 一种用于检查试样的装置包括具有激光光源的第一照明单元和用于照射具有来自第一仰角方向的激光形成图案的样本的第一光学部件,具有光源的第二照明单元和 第二光学部件,用于从大于所述第一仰角的第二仰角方向照射所述试样;第一检测光学单元,其检测来自所述第一照明单元照射的样本的光;第二检测光学单元, 由第二照明单元照射的样本,以及信号处理单元,处理从第一检测器输出的信号,以检测样本上的第一区域中的缺陷,并处理从第二检测器输出的信号,以检测样本上的第二区域中的缺陷。
    • 10. 发明申请
    • Defect Inspection Method And System
    • 缺陷检查方法和系统
    • US20090141269A1
    • 2009-06-04
    • US12366956
    • 2009-02-06
    • Sachio UTOHiroyuki NAKANOYukihiro SHIBATAAkira HAMAMATSUYuta URANO
    • Sachio UTOHiroyuki NAKANOYukihiro SHIBATAAkira HAMAMATSUYuta URANO
    • G01N21/88
    • G01N21/9501G01N21/21G01N21/4788G01N21/94G01N21/956
    • An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
    • 检查系统包括:使用具有不同波长的宽带照明光和单波长光的设备,在具有透明膜的表面上的多个照明中对被检查对象进行暗场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此,能够稳定地检测出更微细的缺陷。