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1. 发明申请

US20100259751A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20100259751A1
公开(公告)日：2010-10-14
申请号：US12823510
申请日：2010-06-25
申请人： Sachio UTO , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Akira HAMAMATSU , Takahiro JINGU , Toshihiko NAKATA , Masahiro WATANABE
发明人： Sachio UTO , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Akira HAMAMATSU , Takahiro JINGU , Toshihiko NAKATA , Masahiro WATANABE
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

2. 发明申请

US20120133929A1 INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：检验方法和检验装置
公开(公告)号：US20120133929A1
公开(公告)日：2012-05-31
申请号：US13347245
申请日：2012-01-10
申请人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
发明人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
IPC分类号： G01N21/55
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

3. 发明申请

US20110228258A1 METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
标题翻译：检测样品中颗粒物的方法
公开(公告)号：US20110228258A1
公开(公告)日：2011-09-22
申请号：US13118004
申请日：2011-05-27
申请人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
发明人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
IPC分类号： G01N21/88
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

4. 发明申请

US20100002227A1 INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：检验方法和检验装置
公开(公告)号：US20100002227A1
公开(公告)日：2010-01-07
申请号：US12555610
申请日：2009-09-08
申请人： Akira HAMAMATSU , Minori NOGUCHI , Hedetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
发明人： Akira HAMAMATSU , Minori NOGUCHI , Hedetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
IPC分类号： G01N21/88 , G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

5. 发明申请

US20100088042A1 Apparatus And Method For Testing Defects 失效
标题翻译：用于测试缺陷的设备和方法
公开(公告)号：US20100088042A1
公开(公告)日：2010-04-08
申请号：US12630307
申请日：2009-12-03
申请人： Minori NOGUCHI , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori NOGUCHI , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/88 , G06F19/00
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the specimen, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks diffraction light resulting from patterns formed on the specimen, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the specimen, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
摘要翻译：用于检测试样缺陷的装置和方法包括：照射光学单元，其将聚焦在激光束上的激光倾斜投射在试样的表面上;照射单元，其安装试样并可移动的检测光学单元，图像传感器，由从样本反射的光形成的光的图像，并且通过滤光器，该滤光器阻挡由形成在样本上的图案产生的衍射光;处理从检测光学单元的图像传感器输出的信号提取的信号处理器样本的缺陷以及显示由信号处理器提取的缺陷的信息的显示单元。过滤器可调。

6. 发明申请

US20120268734A1 PATTERN DEFECT INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20120268734A1
公开(公告)日：2012-10-25
申请号：US13535955
申请日：2012-06-28
申请人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Minori NOGUCHI
发明人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Minori NOGUCHI
IPC分类号： G01N21/01
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

7. 发明申请

US20100214561A1 DEFECT INSPECTING APPARATUS 有权
标题翻译：缺陷检查装置
公开(公告)号：US20100214561A1
公开(公告)日：2010-08-26
申请号：US12774379
申请日：2010-05-05
申请人： Shuichi CHIKAMATSU , Minori NOGUCHI , Kenji AIKO
发明人： Shuichi CHIKAMATSU , Minori NOGUCHI , Kenji AIKO
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

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