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1. 发明申请

US20140198321A1 SURFACE SHAPE MEASURING APPARATUS 有权
标题翻译：表面形状测量装置
公开(公告)号：US20140198321A1
公开(公告)日：2014-07-17
申请号：US14240669
申请日：2012-07-27
申请人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
发明人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
IPC分类号： G01B11/24 , G01N21/55
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01N21/4738 , G01N21/55 , G01N21/9501 , G01N2201/12
摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
摘要翻译：在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

2. 发明申请

US20120268742A1 APPARATUS AND METHOD FOR INSPECTING PATTERN DEFECT 有权
标题翻译：检查图形缺陷的装置和方法
公开(公告)号：US20120268742A1
公开(公告)日：2012-10-25
申请号：US13386243
申请日：2010-06-21
申请人： Hisashi Hatano , Hiroyuki Yamashita , Hidetoshi Nishiyama
发明人： Hisashi Hatano , Hiroyuki Yamashita , Hidetoshi Nishiyama
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/956 , G01N21/9501 , G01R31/2656 , H01L21/681
摘要： Provided is a pattern defect inspecting apparatus wherein inspection performance is stabilized. The defect inspecting apparatus, which has a plurality of configuration units and inspects defects on the surface of a sample, is provided with a means for monitoring time-dependent changes and failures of some of or all of the configuration units, and a means for notifying the user of the results of the monitoring. Furthermore, a unit which can perform correction is provided with a correcting means, and also a means for replacing a failure component with a spare component which has been prepared in the device.
摘要翻译：提供了一种图案缺陷检查装置，其中检查性能稳定。具有多个配置单元并且检查样品表面上的缺陷的缺陷检查装置设置有用于监视部分或全部配置单元的时间依赖性变化和故障的装置，以及用于通知用户的监控结果。此外，可以进行校正的单元设置有校正装置，并且还具有用于在设备中准备的备用部件替换故障部件的装置。

3. 发明申请

US20110032515A1 METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
公开(公告)号：US20110032515A1
公开(公告)日：2011-02-10
申请号：US12907895
申请日：2010-10-19
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

4. 发明申请

US20130271754A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20130271754A1
公开(公告)日：2013-10-17
申请号：US13993814
申请日：2011-11-09
申请人： Nobuaki Hirose , Takahiro Jingu , Hidetoshi Nishiyama , Kazuo Takahashi , Hisashi Hatano
发明人： Nobuaki Hirose , Takahiro Jingu , Hidetoshi Nishiyama , Kazuo Takahashi , Hisashi Hatano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/95623
摘要： This invention implements reduction in the amount of background-scattered light from a semiconductor wafer surface and highly sensitive inspection, without increasing the number of detectors. A surface inspection apparatus that detects defects on the surface of an object (semiconductor wafer surface) to be inspected, by irradiating the surface of the object with a beam of light such as laser light and detecting the light reflected or scattered from the surface; wherein a widely apertured lens with an optical Fourier transform function is disposed between the object to be inspected and a detector, a filter variable in position as well in aperture diameter is provided on a Fourier transform plane, and background-scattered light from the semiconductor wafer surface is effectively blocked, whereby only a signal from a defect such as a foreign substance is detected.
摘要翻译：本发明实现了半导体晶片表面的背景散射光的量的减少和高灵敏度的检查，而不增加检测器的数量。一种表面检查装置，其通过用诸如激光的光束照射物体的表面来检测从表面反射或散射的光来检测待检查的物体（半导体晶片表面）的表面上的缺陷; 其中具有光学傅里叶变换功能的广泛有孔的透镜设置在待检查对象与检测器之间，在傅里叶变换平面上设置了孔径直径可变的滤光器以及来自半导体晶片的背景散射光表面被有效地阻挡，从而仅检测到诸如异物的缺陷的信号。

5. 发明授权

US08289507B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US08289507B2
公开(公告)日：2012-10-16
申请号：US13118004
申请日：2011-05-27
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

6. 发明申请

US20110228258A1 METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
标题翻译：检测样品中颗粒物的方法
公开(公告)号：US20110228258A1
公开(公告)日：2011-09-22
申请号：US13118004
申请日：2011-05-27
申请人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
发明人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
IPC分类号： G01N21/88
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

7. 发明授权

US09182359B2 Apparatus and method for inspecting pattern defect 有权
标题翻译：检测图案缺陷的装置和方法
公开(公告)号：US09182359B2
公开(公告)日：2015-11-10
申请号：US13386243
申请日：2010-06-21
申请人： Hisashi Hatano , Hiroyuki Yamashita , Hidetoshi Nishiyama
发明人： Hisashi Hatano , Hiroyuki Yamashita , Hidetoshi Nishiyama
IPC分类号： G01N21/95 , G01N21/956 , G01R31/265 , H01L21/68
CPC分类号： G01N21/956 , G01N21/9501 , G01R31/2656 , H01L21/681
摘要： Provided is a pattern defect inspecting apparatus wherein inspection performance is stabilized. The defect inspecting apparatus, which has a plurality of configuration units and inspects defects on the surface of a sample, is provided with a means for monitoring time-dependent changes and failures of some of or all of the configuration units, and a means for notifying the user of the results of the monitoring. Furthermore, a unit which can perform correction is provided with a correcting means, and also a means for replacing a failure component with a spare component which has been prepared in the device.
摘要翻译：提供了一种图案缺陷检查装置，其中检查性能稳定。具有多个配置单元并且检查样品表面上的缺陷的缺陷检查装置设置有用于监视部分或全部配置单元的时间依赖性变化和故障的装置，以及用于通知用户的监控结果。此外，可以进行校正的单元设置有校正装置，并且还具有用于在设备中准备的备用部件替换故障部件的装置。

8. 发明授权

US08902417B2 Inspection apparatus 有权
标题翻译：检验仪器
公开(公告)号：US08902417B2
公开(公告)日：2014-12-02
申请号：US13993814
申请日：2011-11-09
申请人： Nobuaki Hirose , Takahiro Jingu , Hidetoshi Nishiyama , Kazuo Takahashi , Hisashi Hatano
发明人： Nobuaki Hirose , Takahiro Jingu , Hidetoshi Nishiyama , Kazuo Takahashi , Hisashi Hatano
IPC分类号： G01N21/00 , G01N21/956 , G01N21/95
CPC分类号： G01N21/9501 , G01N21/95623
摘要： This invention implements reduction in the amount of background-scattered light from a semiconductor wafer surface and highly sensitive inspection, without increasing the number of detectors. A surface inspection apparatus that detects defects on the surface of an object (semiconductor wafer surface) to be inspected, by irradiating the surface of the object with a beam of light such as laser light and detecting the light reflected or scattered from the surface; wherein a widely apertured lens with an optical Fourier transform function is disposed between the object to be inspected and a detector, a filter variable in position as well in aperture diameter is provided on a Fourier transform plane, and background-scattered light from the semiconductor wafer surface is effectively blocked, whereby only a signal from a defect such as a foreign substance is detected.
摘要翻译：本发明实现了半导体晶片表面的背景散射光的量的减少和高灵敏度的检查，而不增加检测器的数量。一种表面检查装置，其通过用诸如激光的光束照射物体的表面来检测从表面反射或散射的光来检测待检查的物体（半导体晶片表面）的表面上的缺陷; 其中具有光学傅里叶变换功能的广泛有孔的透镜设置在待检查对象与检测器之间，在傅里叶变换平面上设置了孔径直径可变的滤光器以及来自半导体晶片的背景散射光表面被有效地阻挡，从而仅检测到诸如异物的缺陷的信号。

9. 发明授权

US07952700B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07952700B2
公开(公告)日：2011-05-31
申请号：US12907895
申请日：2010-10-19
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

10. 发明授权

US07817261B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07817261B2
公开(公告)日：2010-10-19
申请号：US12114139
申请日：2008-05-02
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

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