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1. 发明申请

US20100259751A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20100259751A1
公开(公告)日：2010-10-14
申请号：US12823510
申请日：2010-06-25
申请人： Sachio UTO , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Akira HAMAMATSU , Takahiro JINGU , Toshihiko NAKATA , Masahiro WATANABE
发明人： Sachio UTO , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Akira HAMAMATSU , Takahiro JINGU , Toshihiko NAKATA , Masahiro WATANABE
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

2. 发明申请

US20120133929A1 INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：检验方法和检验装置
公开(公告)号：US20120133929A1
公开(公告)日：2012-05-31
申请号：US13347245
申请日：2012-01-10
申请人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
发明人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
IPC分类号： G01N21/55
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

3. 发明申请

US20090103079A1 APPARATUS AND METHOD FOR INSPECTING DEFECT IN OBJECT SURFACE 有权
标题翻译：用于检查物体表面缺陷的装置和方法
公开(公告)号：US20090103079A1
公开(公告)日：2009-04-23
申请号：US12244958
申请日：2008-10-03
申请人： Sachio UTO , Hidetoshi Nishiyama , Minori Noguchi
发明人： Sachio UTO , Hidetoshi Nishiyama , Minori Noguchi
IPC分类号： G01N21/88
CPC分类号： H01L21/02334 , B08B6/00 , G01B11/0625 , G01B11/303 , G01N3/04 , G01N21/15 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/9563 , H01L21/02057 , H01L21/02082
摘要： An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed.In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.
摘要翻译：本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。在异物防粘装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181由可固定在基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

4. 发明申请

US20120268734A1 PATTERN DEFECT INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20120268734A1
公开(公告)日：2012-10-25
申请号：US13535955
申请日：2012-06-28
申请人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Minori NOGUCHI
发明人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Minori NOGUCHI
IPC分类号： G01N21/01
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

5. 发明申请

US20110310382A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20110310382A1
公开(公告)日：2011-12-22
申请号：US13221935
申请日：2011-08-31
申请人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

6. 发明申请

US20110228258A1 METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
标题翻译：检测样品中颗粒物的方法
公开(公告)号：US20110228258A1
公开(公告)日：2011-09-22
申请号：US13118004
申请日：2011-05-27
申请人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
发明人： Akira HAMAMATSU , Minori NOGUCHI , Yoshimasa OHSHIMA , Sachio UTO , Taketo UENO , Hiroyuki NAKANO , Takahiro JINGU , Hisashi HATANO , Yukihisa MOHARA , Seiji OTANI , Takahiro TOGASHI
IPC分类号： G01N21/88
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

7. 发明申请

US20100002227A1 INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：检验方法和检验装置
公开(公告)号：US20100002227A1
公开(公告)日：2010-01-07
申请号：US12555610
申请日：2009-09-08
申请人： Akira HAMAMATSU , Minori NOGUCHI , Hedetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
发明人： Akira HAMAMATSU , Minori NOGUCHI , Hedetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
IPC分类号： G01N21/88 , G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

8. 发明申请

US20120074319A1 METHOD AND APPARATUS FOR REVIEWING DEFECTS 有权
标题翻译：评估缺陷的方法和装置
公开(公告)号：US20120074319A1
公开(公告)日：2012-03-29
申请号：US13311734
申请日：2011-12-06
申请人： Hidetoshi NISHIYAMA , Toshifumi HONDA , Sachio UTO
发明人： Hidetoshi NISHIYAMA , Toshifumi HONDA , Sachio UTO
IPC分类号： H01J37/26
CPC分类号： G01N23/225 , G02B15/14 , G02B21/0016 , H01J37/226 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2817 , H01K3/02
摘要： A method of inspecting defects of a sample on a movable table includes a first step for, on a basis of position information of the defects which is previously detected by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of the re-detected defects, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. At the second step, re-detecting is performed using reflection light or scattered light from the sample which passes an optical filter which includes a light shielding portion and a light transmitting portion.
摘要翻译：一种在可移动台上检查样本的缺陷的方法包括：第一步骤，用于基于先前由另一检查系统检测到的缺陷的位置信息来驱动该表，使得缺陷进入到具有调整焦点的光学显微镜，用于重新检测缺陷以获得第一检测结果的第二步骤，基于重新检测到的缺陷的位置信息来校正缺陷的位置信息的第三步骤，以及检查位置信息被校正以获得第二检测结果的缺陷的第四步骤。在第二步骤中，使用来自通过包括遮光部分和透光部分的滤光器的样品的反射光或散射光进行再检测。

9. 发明申请

US20080273193A1 PATTERN DEFECT INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20080273193A1
公开(公告)日：2008-11-06
申请号：US12113781
申请日：2008-05-01
申请人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Monori NOGUCHI
发明人： Hidetoshi NISHIYAMA , Kei SHIMURA , Sachio UTO , Monori NOGUCHI
IPC分类号： G01N21/00 , G01N21/55
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

10. 发明申请

US20120176602A1 APPARATUS AND METHOD FOR INSPECTING PATTERN 有权
标题翻译：用于检查图案的装置和方法
公开(公告)号：US20120176602A1
公开(公告)日：2012-07-12
申请号：US13423862
申请日：2012-03-19
申请人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

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