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1. 发明专利

AU8020001A Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator 未知
公开(公告)号：AU8020001A
公开(公告)日：2002-03-22
申请号：AU8020001
申请日：2001-08-28
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , HIROSE JUN , KODASHIMA AKIRA , TOZAWA SHIGEKI , KUBOTA KAZUHIRO , CHIBA YUKI
IPC分类号： H01J37/34 , H01L21/3065 , H05H1/46
摘要： In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

2. 发明公开

EP1329947A4 MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA, AND PLASMA ETCHING APPARATUS AND METHOD COMPRISING THE MAGNETIC FIELD GENERATOR 有权
标题翻译： FOR PLASMA MAGNETON磁场发生器和等离子体蚀刻AND METHOD WITH磁场发生器
公开(公告)号：EP1329947A4
公开(公告)日：2008-08-20
申请号：EP01958549
申请日：2001-08-28
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , HIROSE JUN , KODASHIMA AKIRA , TOZAWA SHIGEKI , KUBOTA KAZUHIRO , CHIBA YUKI
IPC分类号： H01J37/34 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/3266 , H01J37/3408
摘要： In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

3. 发明公开

KR20180025832A 플라즈마 처리 장치 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：KR20180025832A
公开(公告)日：2018-03-09
申请号：KR20170112052
申请日：2017-09-01
申请人： TOKYO ELECTRON LTD
发明人： MATSUURA SHIN , HIROSE JUN
IPC分类号： H01J37/32
CPC分类号： H01J37/32807 , H01J37/18 , H01J37/32009 , H01J37/32513 , H01J37/32743 , H01L21/67126 , H01L21/6719
摘要： 본발명은플라즈마처리장치를소형화하는것을과제로한다. 플라즈마처리장치(10)는, 챔버(1)와, 셔터(20)와, 접촉부를구비한다. 챔버(1)는, 측벽에웨이퍼(W)를반입하기위한개구부(74)를가지며, 내부에공급된처리가스의플라즈마에의해웨이퍼(W)에미리정해진처리를실시한다. 셔터(20)는, 챔버(1)의측벽을따라이동함으로써, 개구부(74)를개폐한다. 접촉부는, 도전성의재료로구성되어있으며, 셔터(20)가이동중인경우에셔터와접촉하지않고, 셔터(20)가개구부(74)를폐쇄하는위치에있는경우에, 셔터(20)의이동방향과는상이한방향으로변위하여셔터(20)와접촉한다.
摘要翻译：本公开的等离子体处理设备包括腔室，快门和接触部分。腔室在其侧壁上具有开口以便通过开口将晶片W运送到腔室中，并且通过供应到其中的处理气体的等离子体对晶片W进行预定的处理。快门通过沿着腔室的侧壁移动来打开或关闭开口。接触部分由导电材料形成，并且在快门移动时不与快门接触。当开闭器处于关闭开口的位置时，接触部分沿不同于开闭器的移动方向的方向移动以与开闭器接触。

4. 发明公开

KR20200131745A 기판 지지체 및 플라즈마 처리 장치 审中-公开
公开(公告)号：KR20200131745A
公开(公告)日：2020-11-24
申请号：KR20200054086
申请日：2020-05-06
申请人： TOKYO ELECTRON LTD
发明人： UEDA TAKEHIRO , HIROSE JUN
IPC分类号： H01L21/687 , B23Q3/15 , H01J37/32 , H01L21/67 , H01L21/683 , H02N13/00
摘要： 본발명은플라즈마를이용하여피처리체가처리될때에발생하는이상방전을억제하는기술을제공한다. 기판지지체는플라즈마를이용하여처리되는피처리체가탑재되는기판지지체본체와, 기판지지체본체에형성되는핀용관통구멍에삽입되는리프터핀과, 리프터핀을기판지지체본체에대해서승강시키는것에의해피처리체를승강시키는승강기구를구비하고있다. 리프터핀 중핀용관통구멍의내벽에대향하는부분에는, 수나사가형성되어있다. 내벽에는, 수나사에끼워맞춰지는암나사가형성되어있다.

5. 发明授权

US6422264B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US6422264B2
公开(公告)日：2002-07-23
申请号：US73464000
申请日：2000-12-13
申请人： FUJIKIN KK , OHMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time DELTAt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点的特定延迟时间DELTAt中达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

6. 发明专利

DE69938368T2 未知
公开(公告)号：DE69938368T2
公开(公告)日：2009-03-05
申请号：DE69938368
申请日：1999-08-09
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , HIROSE JUN , NISHINO KOUJI
IPC分类号： F16K7/14 , G05D7/06 , C01B5/00 , F15D1/04 , F16K31/06 , G05B11/36
摘要： A fluid-switchable flow rate control system that permits free changing of the full scale flow rate and which can control a plurality of kinds of fluids with high precision. The fluid-switchable flow rate control system controls the flow rate of fluid with the pressure P1 on the upstream side of the orifice member held about twice or more higher than the downstream pressure P2, the fluid-switchable flow rate control system comprising an orifice member 8 replaceable with another to provide a suitable orifice diameter according to the kind of fluid and the flow rate range, a control valve 2 provided on the upstream side thereof, a pressure detector 6 provided between the control valve 2 and the orifice member 8, and a flow rate calculation circuit 14 where, from the pressure P1 detected by the pressure detector, the flow rate Qc is calculated by the equation Qc = KP1 (K: constant), a flow rate-setting circuit 16 for outputting flow rate setting signal Qe, a flow rate conversion circuit 18 for multiplying the calculated flow rate signal Qc by the flow rate conversion rate k into switch-over calculated flow rate signal Qf (Qf = kQc) to change the full scale flow rate, and a calculation control circuit 20 to output the difference between the switch-over calculation flow rate signal Qf and the flow rate setting signal Qe as control signal Qy to the drive 4 of the control valve 2, thereby opening or closing the control valve to bring the control signal Qy to zero, thus controlling the flow rate on the downstream side of the orifice member.

7. 发明专利

DE60036362T2 未知
公开(公告)号：DE60036362T2
公开(公告)日：2008-06-12
申请号：DE60036362
申请日：2000-07-27
申请人： TOKYO ELECTRON LTD , FUJIKIN KK , OHMI TADAHIRO , IIDA SEIICHI
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , FUKASAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , UNO TOMIO , NISHINO KOUJI , IKEDA NOBUKAZU , DOHI RYOUSUKE , IDETA EIJI
IPC分类号： G01F1/36 , G05B23/02 , F16K17/22 , F16K37/00 , G01D21/00 , G05D7/06
摘要： A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice - the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC = KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS. The method comprises, outputting a testing signal DELTA Qs having a testing amplitude Vo from a testing circuit provided separately or a flow rate setting circuit to the control valve CV, measuring the pressure amplitude V of the variable pressure DELTA P1 of the pressure P1 on the upstream side of the orifice that arises in response to actuation of the control valve CV and setting off an alarm for the clogging of the orifice when the pressure amplitude V is smaller than a limit amplitude Vt. If the testing signal DELTA Qs is superimposed on a steady-state set flow rate signal Qso and outputted to control the valve CV from the testing circuit or the flow rate setting circuit, the flow rate can be checked for abnormalities while controlling the flow rate by the steady-state set flow rate signal Qso.

8. 发明专利

AT373257T 未知
公开(公告)号：AT373257T
公开(公告)日：2007-09-15
申请号：AT00948265
申请日：2000-07-27
申请人： TOKYO ELECTRON LTD , FUJIKIN KK , OHMI TADAHIRO , IIDA SEIICHI
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , FUKASAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , UNO TOMIO , NISHINO KOUJI , IKEDA NOBUKAZU , DOHI RYOUSUKE , IDETA EIJI
IPC分类号： G01F1/36 , G05B23/02 , F16K17/22 , F16K37/00 , G01D21/00 , G05D7/06
摘要： A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice - the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC = KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS. The method comprises, outputting a testing signal DELTA Qs having a testing amplitude Vo from a testing circuit provided separately or a flow rate setting circuit to the control valve CV, measuring the pressure amplitude V of the variable pressure DELTA P1 of the pressure P1 on the upstream side of the orifice that arises in response to actuation of the control valve CV and setting off an alarm for the clogging of the orifice when the pressure amplitude V is smaller than a limit amplitude Vt. If the testing signal DELTA Qs is superimposed on a steady-state set flow rate signal Qso and outputted to control the valve CV from the testing circuit or the flow rate setting circuit, the flow rate can be checked for abnormalities while controlling the flow rate by the steady-state set flow rate signal Qso.

9. 发明专利

DE69927932D1 未知
公开(公告)号：DE69927932D1
公开(公告)日：2005-12-01
申请号：DE69927932
申请日：1999-08-09
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , HIROSE JUN , NISHINO KOUJI
IPC分类号： F16K7/14 , C01B5/00 , F15D1/04 , F16K31/06 , G05B11/36 , G05D7/06
摘要： A fluid-switchable flow rate control system that permits free changing of the full scale flow rate and which can control a plurality of kinds of fluids with high precision. The fluid-switchable flow rate control system controls the flow rate of fluid with the pressure P1 on the upstream side of the orifice member held about twice or more higher than the downstream pressure P2, the fluid-switchable flow rate control system comprising an orifice member 8 replaceable with another to provide a suitable orifice diameter according to the kind of fluid and the flow rate range, a control valve 2 provided on the upstream side thereof, a pressure detector 6 provided between the control valve 2 and the orifice member 8, and a flow rate calculation circuit 14 where, from the pressure P1 detected by the pressure detector, the flow rate Qc is calculated by the equation Qc = KP1 (K: constant), a flow rate-setting circuit 16 for outputting flow rate setting signal Qe, a flow rate conversion circuit 18 for multiplying the calculated flow rate signal Qc by the flow rate conversion rate k into switch-over calculated flow rate signal Qf (Qf = kQc) to change the full scale flow rate, and a calculation control circuit 20 to output the difference between the switch-over calculation flow rate signal Qf and the flow rate setting signal Qe as control signal Qy to the drive 4 of the control valve 2, thereby opening or closing the control valve to bring the control signal Qy to zero, thus controlling the flow rate on the downstream side of the orifice member.

10. 发明专利

CA2346202A1 STRUCTURE OR CONSTRUCTION FOR MOUNTING A PRESSURE DETECTOR 未知
公开(公告)号：CA2346202A1
公开(公告)日：2001-02-15
申请号：CA2346202
申请日：2000-08-03
申请人： OHMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： FUKASAWA KAZUO , DOHI RYOUSUKE , KOIZUMI HIROSHI , HIROSE JUN , IKEDA NOBUKAZU , OHMI TADAHIRO , HIROSE TAKASHI , KAGATSUME SATOSHI , YOSHIKAWA KAZUHIRO , IDETA EIJI , NISHINO KOUJI , NAGAOKA HIDEKI
IPC分类号： G01L9/04 , G01L9/00 , G01L19/00 , G01L19/04 , G01L19/06 , G01L19/14 , G01L7/08
摘要： A pressure detector mounting structure capable of preventing a diaphragm fro m being deformed by a stress acting on a diaphragm type pressure detector and output characteristics and temperature characteristics from being varied whe n the pressure detector is incorporated in a fixture provided in a piping or equipment, wherein the pressure detector formed by fixedly combining a diaphragm base having a diaphragm with a sensor base incorporating a sensor element operating according to the displacement of the diaphragm is inserted into an inserting hole through a gasket and pressed air-tight fixedly from t he upper side using a pressing member, the pressing member and the gasket are brought into contact with the upper and lower surfaces of a main body of the diaphragm base, respectively, and a shallow groove is formed in ring-shape i n the lower surface of the main body on the inner side of a part in contact wi th the gasket so as to off set a deformation produced by a pressing force from the pressing member through the shallow groove.

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