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1. 发明授权

US6422264B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US6422264B2
公开(公告)日：2002-07-23
申请号：US73464000
申请日：2000-12-13
申请人： FUJIKIN KK , OHMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time DELTAt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点的特定延迟时间DELTAt中达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

2. 发明专利

DE69832956T2 未知
公开(公告)号：DE69832956T2
公开(公告)日：2006-08-17
申请号：DE69832956
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F15D1/08 , B23P15/16 , G01F1/40 , G01F1/42 , G05D7/01
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

3. 发明专利

AT310985T 未知
公开(公告)号：AT310985T
公开(公告)日：2005-12-15
申请号：AT98937819
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , G05D16/20 , F16K7/16 , F16K7/14
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

4. 发明专利

DE69912239D1 未知
公开(公告)号：DE69912239D1
公开(公告)日：2003-11-27
申请号：DE69912239
申请日：1999-08-09
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , NISHINO KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO , DOHI RYOUSUKE , YOSHIKAWA KAZUHIRO , KOYOMOGI MUTSUNORI , UNO TOMIO , IDETA EIJI , HIROSE TAKASHI
IPC分类号： G05D7/06 , F16K37/00
摘要： A method and apparatus for detection of the clogging of the orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow control unit and enhance its safety. To be specific, the apparatus of detecting the clogging of the orifice in a pressure-type rate flow controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween and a flow rate setting circuit (32) wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated from the equation QC = KP1 (K: constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS, the apparatus comprising: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL, with the orifice (2) not clogged a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSR to the low set flow rate QSL, with the orifice (2) in the actual conditions a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t) and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.

5. 发明专利

DE69832956D1 未知
公开(公告)号：DE69832956D1
公开(公告)日：2006-02-02
申请号：DE69832956
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： B23P15/16 , F15D1/08 , G01F1/40 , G01F1/42 , G05D7/01
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

6. 发明专利

DE69926971D1 未知
公开(公告)号：DE69926971D1
公开(公告)日：2005-10-06
申请号：DE69926971
申请日：1999-05-27
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , IKEDA NOBUKAZU , NISHINO KOUJI , YOSHIKAWA KAZUHIRO , IDETA EIJI , DOHI RYOUSUKE , UNO TOMIO , YAMAJI MICHIO
IPC分类号： F17D1/00 , G05D7/06 , G05D16/20

7. 发明专利

AT252741T 未知
公开(公告)号：AT252741T
公开(公告)日：2003-11-15
申请号：AT99935120
申请日：1999-08-09
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , FUJIICHO NIRASAKI-SHI , HIROSE JUN , NISHINO KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO , DOHI RYOUSUKE , YOSHIKAWA KAZUHIRO , NISHI-KU , KOYOMOGI MUTSUNORI , UNO TOMIO , IDETA EIJI , HIROSE TAKASHI
IPC分类号： G05D7/06 , F16K37/00
摘要： A method and apparatus for detection of the clogging of the orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow control unit and enhance its safety. To be specific, the apparatus of detecting the clogging of the orifice in a pressure-type rate flow controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween and a flow rate setting circuit (32) wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated from the equation QC = KP1 (K: constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS, the apparatus comprising: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL, with the orifice (2) not clogged a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSR to the low set flow rate QSL, with the orifice (2) in the actual conditions a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t) and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.

8. 发明专利

DE69832467T2 未知
公开(公告)号：DE69832467T2
公开(公告)日：2006-08-17
申请号：DE69832467
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , F16K7/14 , F16K7/16 , G05D16/20
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

9. 发明专利

DE69928047T2 未知
公开(公告)号：DE69928047T2
公开(公告)日：2006-07-13
申请号：DE69928047
申请日：1999-01-11
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , MINAMI YUKIO , NISHINO KOUJI , KAWATA KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K31/06 , C01B5/00 , G05D7/06 , G05D11/13 , G05D21/00
摘要： A fluid feeding apparatus for use in a gas supply system as in semiconductor manufacturing facilities which permits high-precision control of the flow of fluid without causing transient overshooting phenomena of fluid at the start of fluid feeding or fluid changeover. The fluid feeding apparatus of the present invention comprises a pressure flow controller to regulate the flow of fluid, a fluid changeover valve to open and close the fluid passage on the secondary side of the pressure flow controller and a fluid feeding control unit to control the actuation of the pressure flow controller and the fluid changeover valve, said pressure flow controller including: an orifice 5, a control valve 1 provided on the upstream side of the orifice 5, a pressure detector 3 provided between the control valve 1 and the orifice 5 and a calculation control unit 6 which inputs in a drive 2 for said control valve 1 a difference between a flow rate signal Qc and a flow rate specifying signal Qs as control signal Qy, said flow rate signal Qc calculated with flow rate Qc = KP1 (K = constant) on the basis of a pressure P1 detected by the pressure detector 3, wherein the flow rate on the downstream side of the orifice 5 is controlled by regulating the pressure P1 on the upstream side of the orifice 5 through the opening and closing of said control valve 1.

10. 发明专利

DE69926971T2 未知
公开(公告)号：DE69926971T2
公开(公告)日：2006-06-08
申请号：DE69926971
申请日：1999-05-27
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , IKEDA NOBUKAZU , NISHINO KOUJI , YOSHIKAWA KAZUHIRO , IDETA EIJI , DOHI RYOUSUKE , UNO TOMIO , YAMAJI MICHIO
IPC分类号： F17D1/00 , G05D7/06 , G05D16/20

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