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1. 发明公开

EP1215717A4 MAGNETRON PLASMA PROCESSING APPARATUS 有权
标题翻译： BELLY TRON等离子体BEHANDLUNGSAPPARAT
公开(公告)号：EP1215717A4
公开(公告)日：2002-11-27
申请号：EP00955070
申请日：2000-08-28
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： YAMASAKI TOMOMI , KIMURA HIDETOSHI , ARAMI JUNICHI , ONO HIROO , KOSHIISHI AKIRA , MIYATA KOJI
IPC分类号： H01L21/302 , C23F4/00 , H01J37/34 , H01L21/3065 , H05H1/46 , H01J23/02 , H01J37/32 , H01L21/203 , H01L21/205
CPC分类号： H01J37/3266 , H01J37/3408
摘要： For magnetron plasma processing of a wafer (30), a dipole ring magnet (21) constituted of a large number of anisotropic segment magnets (22) arranged in a ring around the peripheral wall of a chamber (1), a gradient magnetic field where the strength of the magnetic field decreases from the E electrode side toward the W electrode side in the direction perpendicular to the direction B of the magnetic field in a plane perpendicular to the direction of the electric field between a pair of parallel electrodes spaced from each other is produced, the anisotropic segment magnets are divided into parts including a first part (a) that includes anisotropic segment magnets the N poles of which are directed to a region (A) outside the edge on the E electrode side of a wafer to be processed and a second part (b) that includes anisotropic segment magnets the S poles of which are directed to the region (A), and the strength of the magnetic field in the first and second regions is locally increased by the first and second parts.

2. 发明专利

AU8020001A Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator 未知
公开(公告)号：AU8020001A
公开(公告)日：2002-03-22
申请号：AU8020001
申请日：2001-08-28
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , HIROSE JUN , KODASHIMA AKIRA , TOZAWA SHIGEKI , KUBOTA KAZUHIRO , CHIBA YUKI
IPC分类号： H01J37/34 , H01L21/3065 , H05H1/46
摘要： In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

3. 发明专利

AU2003257652A8 Magnetron plasma-use magnetic field generation device 未知
公开(公告)号：AU2003257652A8
公开(公告)日：2004-03-11
申请号：AU2003257652
申请日：2003-08-21
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , TEZUKA KAZUYUKI , TATESHITA KOICHI , ONO HIROO , NAGASEKI KAZUYA , HIMORI SHINJI
IPC分类号： C23F1/00 , H01J37/32 , H01L21/00 , H01L21/3065 , H01L21/311 , H01L21/3213
摘要： Disclosed is a magnetic field generator for magnetron plasma. The magnetic field generator is provided with a plurality of magnetic segments, and generates a predetermined multi-pole magnetic field around the periphery of a workpiece substrate within a process chamber. The strength of the multi-pole magnetic field is controlled so that the state of the multi-pole magnetic field is matched different plasma processes. Further, the pattern of the multi-pole magnetic field can be changed so as to match different sizes of the substrate.

4. 发明专利

DE69629885D1 未知
公开(公告)号：DE69629885D1
公开(公告)日：2003-10-16
申请号：DE69629885
申请日：1996-07-01
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： MIYATA KOJI
IPC分类号： C23C14/35 , H01J37/32 , H01J37/34 , C23C14/34 , H01H1/46
摘要： The improvement proposed relates to the dipole ring magnet in a magnetic field generator for magnetron plasma in an apparatus for plasma sputtering or plasma etching. Different from the conventional dipole ring magnet, which is an assembly of anisotropic columnar segment magnets in a circular arrangement each in an integral columnar form, each of the segment magnets according to the first aspect of the invention is divided into upper and lower halves and the gap space held between the upper and lower halves is varied from position to position so that the uniformity of the magnetic field formed inside of the dipole ring magnet is increased in the horizontal direction with consequently increased uniformity of the plasma density generated thereby. Instead of dividing each of the segment magnets into the upper and lower halves, according to the second aspect of the invention, the circular arrangement of the segment magnets is not regular and symmetrical but assymmetrical relative to the direction of the magnetic field so that similar improvements to those in the first aspect of the invention can be accomplished in the uniformity of the magnetic field and in the density of the plasma.

5. 发明专利

DE69403768T2 未知
公开(公告)号：DE69403768T2
公开(公告)日：1997-11-13
申请号：DE69403768
申请日：1994-12-27
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： MIYATA KOJI
IPC分类号： H01J37/34
摘要： The invention relates to a dipole ring magnet for use in magnetron sputtering apparatus or magnetron etching apparatus to produce a uniform magnetic field. Essentially the dipole ring magnet is an assembly of a plurality of pillar-like, anisotropic magnet segments in a circumferential arrangement. Each of the pillar-like magnet segments is magnetized in a direction normal to its longitudinal axis, and in assembling the ring magnet the magnet segments are differently oriented such that a magnetic field in the direction of a diameter of the ring is produced inside the ring magnet. To improve the uniformity of the magnetic field, particularly in respect of a component normal to the longitudinal axis of the ring magnet, each pillar-like segment is devoid of a lengthwise middle part to provide a vacant space in place of the millde part, and the length of the vacant space is regulated according to the position of the segment in the ring magnet.

6. 发明专利

DE69403768D1 未知
公开(公告)号：DE69403768D1
公开(公告)日：1997-07-17
申请号：DE69403768
申请日：1994-12-27
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： MIYATA KOJI
IPC分类号： H01J37/34
摘要： The invention relates to a dipole ring magnet for use in magnetron sputtering apparatus or magnetron etching apparatus to produce a uniform magnetic field. Essentially the dipole ring magnet is an assembly of a plurality of pillar-like, anisotropic magnet segments in a circumferential arrangement. Each of the pillar-like magnet segments is magnetized in a direction normal to its longitudinal axis, and in assembling the ring magnet the magnet segments are differently oriented such that a magnetic field in the direction of a diameter of the ring is produced inside the ring magnet. To improve the uniformity of the magnetic field, particularly in respect of a component normal to the longitudinal axis of the ring magnet, each pillar-like segment is devoid of a lengthwise middle part to provide a vacant space in place of the millde part, and the length of the vacant space is regulated according to the position of the segment in the ring magnet.

7. 发明公开

EP1329947A4 MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA, AND PLASMA ETCHING APPARATUS AND METHOD COMPRISING THE MAGNETIC FIELD GENERATOR 有权
标题翻译： FOR PLASMA MAGNETON磁场发生器和等离子体蚀刻AND METHOD WITH磁场发生器
公开(公告)号：EP1329947A4
公开(公告)日：2008-08-20
申请号：EP01958549
申请日：2001-08-28
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , HIROSE JUN , KODASHIMA AKIRA , TOZAWA SHIGEKI , KUBOTA KAZUHIRO , CHIBA YUKI
IPC分类号： H01J37/34 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/3266 , H01J37/3408
摘要： In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

8. 发明专利

DE69629885T2 未知
公开(公告)号：DE69629885T2
公开(公告)日：2005-03-10
申请号：DE69629885
申请日：1996-07-01
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： MIYATA KOJI
IPC分类号： C23C14/35 , H01J37/32 , H01J37/34 , C23C14/34 , H01H1/46
摘要： The improvement proposed relates to the dipole ring magnet in a magnetic field generator for magnetron plasma in an apparatus for plasma sputtering or plasma etching. Different from the conventional dipole ring magnet, which is an assembly of anisotropic columnar segment magnets in a circular arrangement each in an integral columnar form, each of the segment magnets according to the first aspect of the invention is divided into upper and lower halves and the gap space held between the upper and lower halves is varied from position to position so that the uniformity of the magnetic field formed inside of the dipole ring magnet is increased in the horizontal direction with consequently increased uniformity of the plasma density generated thereby. Instead of dividing each of the segment magnets into the upper and lower halves, according to the second aspect of the invention, the circular arrangement of the segment magnets is not regular and symmetrical but assymmetrical relative to the direction of the magnetic field so that similar improvements to those in the first aspect of the invention can be accomplished in the uniformity of the magnetic field and in the density of the plasma.

9. 发明专利

JPH1041284A PLASMA TREATING APPARATUS 失效
公开(公告)号：JPH1041284A
公开(公告)日：1998-02-13
申请号：JP21517296
申请日：1996-07-26
申请人： TOKYO ELECTRON LTD , SHINETSU CHEMICAL CO
发明人： ARAMI JIYUNICHI , KONDO TOMOMI , ONO HIROO , MIYATA KOJI
IPC分类号： H05H1/46 , C23C16/50 , C23C16/505 , C23F4/00 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To prevent the magnetic field leakage from an apparatus having a dipole ring magnet composed of a plurality of anisotorpic segment magnets at near and far sides. SOLUTION: A shield ring 45 composed of a magnet is disposed round a dipole ring magnet 41 disposed round a treating vessel 3. A counter magnet 61 is disposed round the shield ring 45 which blocks the magnetic field from leaking to a near place while the far leaking magnetic field is canceled by a magnetic field generated by the counter magnet 61.

10. 发明专利

JPH11176341A MAGNETIC FIELD GENERATION DEVICE FOR MAGNETRON PLASMA 失效
公开(公告)号：JPH11176341A
公开(公告)日：1999-07-02
申请号：JP33688997
申请日：1997-12-08
申请人： SHINETSU CHEMICAL CO , TOKYO ELECTRON LTD
发明人： MIYATA KOJI , ONO HIROO , ARAMI JIYUNICHI
IPC分类号： H01J23/10
摘要： PROBLEM TO BE SOLVED: To provide a magnetic field generation device equipped with a dipole ring magnet used for sputtering or an etching device utilizing magnetron plasma, and capable of providing plasma of highly uniform in a wide range. SOLUTION: Plural columnar first anisotropic segment magnets 10 are ring- like disposed on a dipole ring magnet 1. Gaps 4 are provided in the central portions of the lengthwise direction of the first anisotropic magnets 10, and other second anisotropic segment magnets 3 having the reverse magnetizing direction of the magnetizing direction of the first respective anisotropic segment magnets 10 in the gaps 4. The gaps formed between the first and second anisotropic magnets 10, 3 have such constitutions as changing the lengths thereof so as to promote the uniformization of a magnetic field intensity distribution. Thereby, the magnetic field intensity of a plasma space 9 is further equalized.

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