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1. 发明授权

US06628392B2 Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof 失效
标题翻译：光调制装置和光开关，移动检测装置和距离测量装置，对准装置和半导体对准器及其处理
公开(公告)号：US06628392B2
公开(公告)日：2003-09-30
申请号：US09931720
申请日：2001-08-20
申请人： Ryo Kuroda , Yasuhiro Shimada , Junichi Seki , Takako Yamaguchi , Yasuhisa Inao
发明人： Ryo Kuroda , Yasuhiro Shimada , Junichi Seki , Takako Yamaguchi , Yasuhisa Inao
IPC分类号： G01B1100
CPC分类号： G03F9/703 , G03F9/7038 , G03F9/7049 , G03F9/7088
摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.
摘要翻译：这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个通过移动装置的周期性结构。

2. 发明授权

US09507256B2 Imprint method, imprint apparatus, and process for producing chip 有权
标题翻译：压印方法，压印装置和制造芯片的工艺
公开(公告)号：US09507256B2
公开(公告)日：2016-11-29
申请号：US12894450
申请日：2010-09-30
申请人： Junichi Seki , Nobuhito Suehira
发明人： Junichi Seki , Nobuhito Suehira
IPC分类号： C23C16/00 , G03F7/00 , B29C43/56 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B29C43/56 , B82Y10/00 , B82Y40/00
摘要： An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.
摘要翻译：用于将模具的印模图案压印到基板上的图案形成材料上以便实现高生产量的压印方法包括使压印图案和图案形成材料彼此接触的步骤; 在模具和基板之间施加第一压力以增加压印图案和图案形成材料之间的接触面积; 以及在低于所述第一压力的第二压力下调节所述模具和所述基板之间的位置关系。

3. 发明授权

US09039402B2 Imprinting apparatus and method therefor 有权
标题翻译：压印装置及其方法
公开(公告)号：US09039402B2
公开(公告)日：2015-05-26
申请号：US12566513
申请日：2009-09-24
申请人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
发明人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
IPC分类号： B29C43/02 , B29C43/00 , B29C43/14 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C59/02 , B29C43/58
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
摘要翻译：提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

4. 发明授权

US08404169B2 Imprint apparatus and method of manufacturing article 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：US08404169B2
公开(公告)日：2013-03-26
申请号：US12566572
申请日：2009-09-24
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29B11/08 , B29C45/76
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.
摘要翻译：在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离方向或与其相反的第二方向。

5. 发明授权

US08308471B2 Mold, mold production process, processing apparatus, and processing method 有权
标题翻译：模具，模具生产工艺，加工设备及加工方法
公开(公告)号：US08308471B2
公开(公告)日：2012-11-13
申请号：US12091845
申请日：2008-03-14
申请人： Atsunori Terasaki , Junichi Seki
发明人： Atsunori Terasaki , Junichi Seki
IPC分类号： A01J21/00
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F7/0002 , G03F9/7084 , Y10T428/24479
摘要： A mold for imprinting a pattern onto a member to be processed. The mold includes a mold body having a front surface, at which an imprint pattern is formed, and a rear surface opposite from the front surface. A coating layer covers the front surface of the mold body, and a coating layer covers the rear surface of the mold body. An alignment mark as an object to be subjected to optical observation is provided at the front surface of the mold body. The coating layer for covering the rear surface includes (i) a hole for observation of the alignment mark and (ii) a stress adjusting pattern corresponding to a density of the imprint pattern. The hole for observation is formed at the rear surface of the mold body opposite from the alignment mark, and the stress adjusting pattern is formed at the rear surface of the mold body opposite from the imprint pattern.
摘要翻译：用于将图案压印到要处理的构件上的模具。模具包括具有形成有压印图案的前表面和与前表面相对的后表面的模具体。涂层覆盖模体的前表面，涂层覆盖模体的后表面。在模具体的前表面设置有作为光学观察对象的对准标记。用于覆盖后表面的涂层包括（i）用于观察对准标记的孔和（ii）与压印图案的密度相对应的应力调整图案。用于观察的孔形成在与对准标记相对的模具体的后表面处，并且应力调整图案形成在与压印图案相对的模具体的后表面处。

6. 发明授权

US08011916B2 Mold, imprint apparatus, and process for producing structure 有权
标题翻译：模具，压印设备和生产结构的过程
公开(公告)号：US08011916B2
公开(公告)日：2011-09-06
申请号：US11468870
申请日：2006-08-31
申请人： Nobuhito Suehira , Junichi Seki
发明人： Nobuhito Suehira , Junichi Seki
IPC分类号： B29C59/00 , B29C35/08
CPC分类号： B29C35/0894 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24802
摘要： In order to alleviate or suppress curing of a photocurable resin material in an area in which the curing of the photocurable resin material is not intended, exposure of the photocurable resin material to light is suppressed through a non-pattern portion at which a light-blocking member is provided by means of a mold having an imprint pattern portion and the non-pattern portion or is suppressed by disposing a light-blocking member so as not to irradiate the photocurable resin material with light not via the mold.
摘要翻译：为了减轻或抑制光固化树脂材料在不需要光固化树脂材料的固化的区域中的固化，可光固化树脂材料对光的曝光通过遮光的非图案部分被抑制构件通过具有压印图案部分和非图案部分的模具提供，或者通过设置遮光构件来抑制，以便不通过模具照射光可光固化树脂材料。

7. 发明授权

US07985061B2 Imprint apparatus having attitude control 有权
标题翻译：压印装置具有姿态控制
公开(公告)号：US07985061B2
公开(公告)日：2011-07-26
申请号：US12726375
申请日：2010-03-18
申请人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
发明人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C33/424 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.
摘要翻译：一种压印装置，其中具有形成有预定印记的处理表面的模具，并且将放置在基板上的未固化树脂材料填充并固化在模具和基板之间的空间中，并且经受预定的形成在模具的加工表面上的印痕。压印装置包括用于控制模具和基板的态度的姿态控制机构，使得模具的第一端和基板之间的第一间隙和模具的第二端与基板之间的第二间隙各自不同以及用于测量模具和基板的姿态和位置的测量机构。还提供了一种用于在基材和模具之间进行相对运动的机构，使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基材之间的空间的至少一部分。

8. 发明申请

US20100200544A1 PRODUCTION PROCESS OF STRUCTURE 审中-公开
标题翻译：生产过程结构
公开(公告)号：US20100200544A1
公开(公告)日：2010-08-12
申请号：US12767881
申请日：2010-04-27
申请人： Atsunori Terasaki , Junichi Seki , Toshiki Ito
发明人： Atsunori Terasaki , Junichi Seki , Toshiki Ito
IPC分类号： C03C15/00
CPC分类号： H01L21/02126 , C03C17/42 , C03C2218/33 , H01L21/02164 , H01L21/022 , H01L21/02282 , H01L21/02356 , H01L21/31144 , H01L21/3121 , H01L21/316
摘要： A process for producing a structure containing silicon oxide includes a step of forming a first layer of organic spin-on glass on a substrate and a step of forming a second layer of inorganic spin-on glass on the first layer. Thereafter, the first layer is etched by using a pattern formed on the second layer as a mask and then the first layer and the second layer are calcined to prepare the structure containing silicon oxide.
摘要翻译：制造含有氧化硅的结构的方法包括在基材上形成第一层有机旋涂玻璃的步骤和在第一层上形成第二层无机旋涂玻璃的步骤。此后，通过使用形成在第二层上的图案作为掩模来蚀刻第一层，然后将第一层和第二层煅烧以制备含有氧化硅的结构。

9. 发明申请

US20090273124A1 NANOIMPRINTING METHOD AND MOLD FOR USE IN NANOIMPRINTING 有权
标题翻译：用于纳米压印的纳米压印方法和模具
公开(公告)号：US20090273124A1
公开(公告)日：2009-11-05
申请号：US12405847
申请日：2009-03-17
申请人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
摘要翻译：纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成区域和第二图案形成区域彼此。

10. 发明授权

US07531821B2 Imprint apparatus and imprint method including dual movable image pick-up device 有权
标题翻译：印刷装置和压印方法，包括双移动图像拾取装置
公开(公告)号：US07531821B2
公开(公告)日：2009-05-12
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01N21/86
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

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