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1. 发明申请

US20100072664A1 IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：US20100072664A1
公开(公告)日：2010-03-25
申请号：US12566572
申请日：2009-09-24
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.
摘要翻译：在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离方向或与其相反的第二方向。

2. 发明授权

US09039402B2 Imprinting apparatus and method therefor 有权
标题翻译：压印装置及其方法
公开(公告)号：US09039402B2
公开(公告)日：2015-05-26
申请号：US12566513
申请日：2009-09-24
申请人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
发明人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
IPC分类号： B29C43/02 , B29C43/00 , B29C43/14 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C59/02 , B29C43/58
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
摘要翻译：提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

3. 发明授权

US08404169B2 Imprint apparatus and method of manufacturing article 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：US08404169B2
公开(公告)日：2013-03-26
申请号：US12566572
申请日：2009-09-24
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29B11/08 , B29C45/76
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.
摘要翻译：在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离方向或与其相反的第二方向。

4. 发明申请

US20100078840A1 IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE 审中-公开
标题翻译：印刷装置及其制造方法
公开(公告)号：US20100078840A1
公开(公告)日：2010-04-01
申请号：US12565664
申请日：2009-09-23
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7015 , G03F9/7042
摘要： An apparatus for pressing resin on a shot region of a substrate and a mold to each other to form a resin pattern on the shot region, including: a mold chuck; an X-Y stage including a substrate chuck, the resin held by the substrate chuck and mold held by the mold chuck being pressed to each other in a Z-axis direction; a dispenser for dispensing the resin on the shot region; a scope for measuring, in an X-Y plane, a position of a substrate mark formed in each of a plurality of shot regions of the substrate held by the substrate chuck; and a reference mark formed on the X-Y stage. The X-Y stage has a moving range allowing the dispenser to dispense the resin on all shot regions of the substrate, and the position of the reference mark can be measured within the moving range of the X-Y stage.
摘要翻译：一种用于将基板和模具的注射区域上的树脂彼此挤压以在射出区域上形成树脂图案的装置，包括：模具卡盘; 包括基板卡盘的X-Y平台，由基板卡盘保持的树脂和由卡盘夹持的模具在Z轴方向上彼此挤压; 用于在喷射区域上分配树脂的分配器; 用于在X-Y平面中测量形成在由基板卡盘保持的基板的多个注射区域中的每一个中的基板标记的位置的范围; 和在X-Y平台上形成的参考标记。 X-Y平台具有移动范围，允许分配器在基板的所有喷射区域上分配树脂，并且可以在X-Y平台的移动范围内测量参考标记的位置。

5. 发明申请

US20100072667A1 IMPRINTING METHOD 审中-公开
标题翻译：印刷方法
公开(公告)号：US20100072667A1
公开(公告)日：2010-03-25
申请号：US12564187
申请日：2009-09-22
申请人： Eigo Kawakami , Motoki Okinaka , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Eigo Kawakami , Motoki Okinaka , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C39/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method for depositing resins to a substrate, bringing a mold into contact with the resins, and transferring a pattern formed on the mold to the resins includes a first imprinting process for transferring the pattern to a first resin and a second imprinting process for forming the pattern on a second resin in an area adjacent to an area formed during the first imprinting process. The amount of the second resin to be deposited during the second imprinting process is different from that of the first resin used during the first imprinting process so that a gap between the area formed during the first imprinting process and an area to be formed during the second imprinting process is filled.
摘要翻译：用于将树脂沉积到基底上，使模具与树脂接触并将形成在模具上的图案转印到树脂上的印记方法包括用于将图案转印到第一树脂的第一印记方法和用于形成的第二印记工艺在与第一次压印过程中形成的区域相邻的区域中的第二树脂上的图案。在第二次压印处理期间，要沉积的第二树脂的量不同于在第一次压印过程中使用的第一树脂的量，使得在第一次压印过程中形成的区域与在第二次压印过程中形成的区域之间的间隙印记过程充满。

6. 发明申请

US20100072653A1 IMPRINTING APPARATUS AND METHOD THEREFOR 有权
标题翻译：印刷设备及其方法
公开(公告)号：US20100072653A1
公开(公告)日：2010-03-25
申请号：US12566513
申请日：2009-09-24
申请人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
发明人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
IPC分类号： B29C43/58 , B29C43/32
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
摘要翻译：提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

7. 发明授权

US08178026B2 Nanoimprinting method and mold for use in nanoimprinting 有权
标题翻译：用于纳米压印的纳米印刷方法和模具
公开(公告)号：US08178026B2
公开(公告)日：2012-05-15
申请号：US12405847
申请日：2009-03-17
申请人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
摘要翻译：纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成区域和第二图案形成区域彼此。

8. 发明申请

US20090273124A1 NANOIMPRINTING METHOD AND MOLD FOR USE IN NANOIMPRINTING 有权
标题翻译：用于纳米压印的纳米压印方法和模具
公开(公告)号：US20090273124A1
公开(公告)日：2009-11-05
申请号：US12405847
申请日：2009-03-17
申请人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
摘要翻译：纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成区域和第二图案形成区域彼此。

9. 发明授权

US07981304B2 Process for producing a chip using a mold 有权
标题翻译：使用模具制造芯片的工艺
公开(公告)号：US07981304B2
公开(公告)日：2011-07-19
申请号：US12388179
申请日：2009-02-18
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： C03C15/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

10. 发明授权

US07510388B2 Mold, imprint method, and process for producing chip 有权
标题翻译：模具，压印方法和生产芯片的工艺
公开(公告)号：US07510388B2
公开(公告)日：2009-03-31
申请号：US11468876
申请日：2006-08-31
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： B29C59/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of effecting alignment of the mold and the member to be processed with high accuracy even in such a state that a photocurable resin material is disposed between the mold and the member to be processed is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmittivities to light in a part of an ultraviolet wavelength range of the ultraviolet light. The second material has a refractive index of not less than 1.7.
摘要翻译：即使在光固化树脂材料配置在模具和待加工构件之间的状态下，能够高精度地进行模具和被处理部件的对准的模具由基板2010构成，基板2010由第一材料以及由不同于第一材料的第二材料形成的对准标记2102。第一材料和第二材料在紫外线的紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

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