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1. 发明授权

US07985061B2 Imprint apparatus having attitude control 有权
标题翻译：压印装置具有姿态控制
公开(公告)号：US07985061B2
公开(公告)日：2011-07-26
申请号：US12726375
申请日：2010-03-18
申请人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
发明人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C33/424 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.
摘要翻译：一种压印装置，其中具有形成有预定印记的处理表面的模具，并且将放置在基板上的未固化树脂材料填充并固化在模具和基板之间的空间中，并且经受预定的形成在模具的加工表面上的印痕。压印装置包括用于控制模具和基板的态度的姿态控制机构，使得模具的第一端和基板之间的第一间隙和模具的第二端与基板之间的第二间隙各自不同以及用于测量模具和基板的姿态和位置的测量机构。还提供了一种用于在基材和模具之间进行相对运动的机构，使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基材之间的空间的至少一部分。

2. 发明授权

US07981304B2 Process for producing a chip using a mold 有权
标题翻译：使用模具制造芯片的工艺
公开(公告)号：US07981304B2
公开(公告)日：2011-07-19
申请号：US12388179
申请日：2009-02-18
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： C03C15/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

3. 发明授权

US07510388B2 Mold, imprint method, and process for producing chip 有权
标题翻译：模具，压印方法和生产芯片的工艺
公开(公告)号：US07510388B2
公开(公告)日：2009-03-31
申请号：US11468876
申请日：2006-08-31
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： B29C59/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of effecting alignment of the mold and the member to be processed with high accuracy even in such a state that a photocurable resin material is disposed between the mold and the member to be processed is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmittivities to light in a part of an ultraviolet wavelength range of the ultraviolet light. The second material has a refractive index of not less than 1.7.
摘要翻译：即使在光固化树脂材料配置在模具和待加工构件之间的状态下，能够高精度地进行模具和被处理部件的对准的模具由基板2010构成，基板2010由第一材料以及由不同于第一材料的第二材料形成的对准标记2102。第一材料和第二材料在紫外线的紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

4. 发明授权

US08668484B2 Mold, imprint method, and process for producing a chip 有权
标题翻译：模具，压印方法和制造芯片的工艺
公开(公告)号：US08668484B2
公开(公告)日：2014-03-11
申请号：US12388194
申请日：2009-02-18
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： B29C59/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

5. 发明申请

US20100173032A1 IMPRINT METHOD AND IMPRINT APPARATUS 有权
标题翻译： IMPRINT方法和印刷装置
公开(公告)号：US20100173032A1
公开(公告)日：2010-07-08
申请号：US12726375
申请日：2010-03-18
申请人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
发明人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
IPC分类号： B29C59/02
CPC分类号： B29C43/021 , B29C33/424 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.
摘要翻译：一种压印装置，其中具有形成有预定印记的处理表面的模具，并且将放置在基板上的未固化树脂材料填充并固化在模具和基板之间的空间中，并且经受预定的形成在模具的加工表面上的印痕。压印装置包括用于控制模具和基板的态度的姿态控制机构，使得模具的第一端和基板之间的第一间隙和模具的第二端与基板之间的第二间隙各自不同以及用于测量模具和基板的姿态和位置的测量机构。还提供了一种用于在基材和模具之间进行相对运动的机构，使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基材之间的空间的至少一部分。

6. 发明申请

US20090152753A1 MOLD, IMPRINT METHOD, AND PROCESS FOR PRODUCING A CHIP 有权
标题翻译：模具，印刷方法和制造芯片的方法
公开(公告)号：US20090152753A1
公开(公告)日：2009-06-18
申请号：US12388194
申请日：2009-02-18
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： B29C43/58
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

7. 发明申请

US20090039550A1 IMPRINT METHOD AND IMPRINT APPARATUS 有权
标题翻译： IMPRINT方法和印刷装置
公开(公告)号：US20090039550A1
公开(公告)日：2009-02-12
申请号：US12184372
申请日：2008-08-01
申请人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
发明人： Nobuhito Suehira , Junichi Seki , Shingo Okushima
IPC分类号： B29C43/18 , B29C33/00
CPC分类号： B29C43/021 , B29C33/424 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method, includes the steps of: preparing a substrate; placing an uncured resin material on the substrate; preparing a mold having a first end and a second end; placing the mold to oppose the substrate at a position not sandwiching the resin material, wherein a first gap between the first end and the substrate and a second gap between the second end and the substrate are different from each other; imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of a space between the mold and the substrate; and changing at least one of the first and second gaps in the state that the resin material is present between the mold and the substrate.
摘要翻译：压印方法包括以下步骤：准备衬底; 将未固化的树脂材料放置在基材上; 制备具有第一端和第二端的模具; 将模具放置在不夹持树脂材料的位置处的基板上，其中第一端和基板之间的第一间隙和第二端与基板之间的第二间隙彼此不同; 在基板和模具之间施加相对运动，使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基板之间的空间的至少一部分; 并且在树脂材料存在于模具和基板之间的状态下改变第一和第二间隙中的至少一个。

8. 发明授权

US08562846B2 Process for producing a chip using a mold 有权
标题翻译：使用模具制造芯片的工艺
公开(公告)号：US08562846B2
公开(公告)日：2013-10-22
申请号：US13175071
申请日：2011-07-01
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： C03C15/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

9. 发明授权

US09573319B2 Imprinting method and process for producing a member in which a mold contacts a pattern forming layer 有权
标题翻译：用于制造其中模具与图案形成层接触的构件的印刷方法和方法
公开(公告)号：US09573319B2
公开(公告)日：2017-02-21
申请号：US12088340
申请日：2008-02-05
申请人： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
发明人： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
IPC分类号： B29C59/02 , B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F9/00
CPC分类号： G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
摘要： An imprinting method in which alignment control of a mold and a substrate is effected and a pattern formed on the mold is transferred onto a pattern forming layer provided on the substrate. The imprinting method includes a step in which the mold and the substrate are brought near to each other while effecting the alignment control, after the alignment control is started, to bring the mold and the pattern forming layer into contact with each other, and then, the pattern forming layer is cured, and a step in which the gap between the mold and the substrate is increased, after the pattern forming layer is cured. Further, the alignment control is stopped after the alignment control is started, and at least one of before and after the mold contacts the pattern forming layer.
摘要翻译：实现了模具和基板的对准控制并且在模具上形成的图案转印到设置在基板上的图案形成层上的压印方法。压印方法包括在进行取向控制的同时使模具和基板彼此靠近的步骤，在对准控制开始之后，使模具和图案形成层彼此接触，然后，图案形成层被固化，并且在图案形成层固化之后，模具和基板之间的间隙增加的步骤被增加。此外，在开始对准控制之后停止对准控制，并且在模具接触图案形成层之前和之后的至少一个。

10. 发明申请

US20100270705A1 IMPRINT METHOD AND IMPRINT APPARATUS 有权
标题翻译： IMPRINT方法和印刷装置
公开(公告)号：US20100270705A1
公开(公告)日：2010-10-28
申请号：US12088340
申请日：2008-02-05
申请人： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
发明人： Shingo Okushima , Nobuhito Suehira , Junichi Seki , Kazuyuki Kasumi
IPC分类号： B28B11/08 , B29C59/02
CPC分类号： G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
摘要： An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.
摘要翻译：用于将提供给模具的印模图案压印到形成在基板上的图案形成层上的印记方法由通过反馈控制来实现基板和模具之间的对准的第一步骤构成; 使模具和图案形成层彼此接触的第二步骤; 固化图案形成层的第三步骤; 以及增加基板和模具之间的间隙的第四步骤。压印方法还包括停止第一步骤和第二步骤之间和/或在第二步骤和第三步骤之间的反馈控制的步骤。

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