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1. 发明申请

US20100072664A1 IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：US20100072664A1
公开(公告)日：2010-03-25
申请号：US12566572
申请日：2009-09-24
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.
摘要翻译：在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离方向或与其相反的第二方向。

2. 发明授权

US09039402B2 Imprinting apparatus and method therefor 有权
标题翻译：压印装置及其方法
公开(公告)号：US09039402B2
公开(公告)日：2015-05-26
申请号：US12566513
申请日：2009-09-24
申请人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
发明人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
IPC分类号： B29C43/02 , B29C43/00 , B29C43/14 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C59/02 , B29C43/58
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
摘要翻译：提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

3. 发明授权

US08404169B2 Imprint apparatus and method of manufacturing article 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：US08404169B2
公开(公告)日：2013-03-26
申请号：US12566572
申请日：2009-09-24
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29B11/08 , B29C45/76
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.
摘要翻译：在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离方向或与其相反的第二方向。

4. 发明申请

US20100078840A1 IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE 审中-公开
标题翻译：印刷装置及其制造方法
公开(公告)号：US20100078840A1
公开(公告)日：2010-04-01
申请号：US12565664
申请日：2009-09-23
申请人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
发明人： Eigo Kawakami , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima , Motoki Okinaka
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7015 , G03F9/7042
摘要： An apparatus for pressing resin on a shot region of a substrate and a mold to each other to form a resin pattern on the shot region, including: a mold chuck; an X-Y stage including a substrate chuck, the resin held by the substrate chuck and mold held by the mold chuck being pressed to each other in a Z-axis direction; a dispenser for dispensing the resin on the shot region; a scope for measuring, in an X-Y plane, a position of a substrate mark formed in each of a plurality of shot regions of the substrate held by the substrate chuck; and a reference mark formed on the X-Y stage. The X-Y stage has a moving range allowing the dispenser to dispense the resin on all shot regions of the substrate, and the position of the reference mark can be measured within the moving range of the X-Y stage.
摘要翻译：一种用于将基板和模具的注射区域上的树脂彼此挤压以在射出区域上形成树脂图案的装置，包括：模具卡盘; 包括基板卡盘的X-Y平台，由基板卡盘保持的树脂和由卡盘夹持的模具在Z轴方向上彼此挤压; 用于在喷射区域上分配树脂的分配器; 用于在X-Y平面中测量形成在由基板卡盘保持的基板的多个注射区域中的每一个中的基板标记的位置的范围; 和在X-Y平台上形成的参考标记。 X-Y平台具有移动范围，允许分配器在基板的所有喷射区域上分配树脂，并且可以在X-Y平台的移动范围内测量参考标记的位置。

5. 发明申请

US20100072667A1 IMPRINTING METHOD 审中-公开
标题翻译：印刷方法
公开(公告)号：US20100072667A1
公开(公告)日：2010-03-25
申请号：US12564187
申请日：2009-09-22
申请人： Eigo Kawakami , Motoki Okinaka , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Eigo Kawakami , Motoki Okinaka , Hideki Ina , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C39/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method for depositing resins to a substrate, bringing a mold into contact with the resins, and transferring a pattern formed on the mold to the resins includes a first imprinting process for transferring the pattern to a first resin and a second imprinting process for forming the pattern on a second resin in an area adjacent to an area formed during the first imprinting process. The amount of the second resin to be deposited during the second imprinting process is different from that of the first resin used during the first imprinting process so that a gap between the area formed during the first imprinting process and an area to be formed during the second imprinting process is filled.
摘要翻译：用于将树脂沉积到基底上，使模具与树脂接触并将形成在模具上的图案转印到树脂上的印记方法包括用于将图案转印到第一树脂的第一印记方法和用于形成的第二印记工艺在与第一次压印过程中形成的区域相邻的区域中的第二树脂上的图案。在第二次压印处理期间，要沉积的第二树脂的量不同于在第一次压印过程中使用的第一树脂的量，使得在第一次压印过程中形成的区域与在第二次压印过程中形成的区域之间的间隙印记过程充满。

6. 发明申请

US20100072653A1 IMPRINTING APPARATUS AND METHOD THEREFOR 有权
标题翻译：印刷设备及其方法
公开(公告)号：US20100072653A1
公开(公告)日：2010-03-25
申请号：US12566513
申请日：2009-09-24
申请人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
发明人： Eigo Kawakami , Shingo Okushima , Hideki Ina , Junichi Seki , Atsunori Terasaki , Motoki Okinaka
IPC分类号： B29C43/58 , B29C43/32
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
摘要翻译：提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

7. 发明授权

US08178026B2 Nanoimprinting method and mold for use in nanoimprinting 有权
标题翻译：用于纳米压印的纳米印刷方法和模具
公开(公告)号：US08178026B2
公开(公告)日：2012-05-15
申请号：US12405847
申请日：2009-03-17
申请人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
摘要翻译：纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成区域和第二图案形成区域彼此。

8. 发明申请

US20090273124A1 NANOIMPRINTING METHOD AND MOLD FOR USE IN NANOIMPRINTING 有权
标题翻译：用于纳米压印的纳米压印方法和模具
公开(公告)号：US20090273124A1
公开(公告)日：2009-11-05
申请号：US12405847
申请日：2009-03-17
申请人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
发明人： Motoki Okinaka , Junichi Seki , Atsunori Terasaki , Shingo Okushima
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
摘要翻译：纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成区域和第二图案形成区域彼此。

9. 发明申请

US20090039563A1 METHOD OF FORMING FINE PATTERN 审中-公开
标题翻译：形成精细图案的方法
公开(公告)号：US20090039563A1
公开(公告)日：2009-02-12
申请号：US12065246
申请日：2006-08-25
申请人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
发明人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
IPC分类号： B29C59/16
CPC分类号： G03F7/0002 , B81C1/00031 , B81C1/00111 , B81C2201/0152 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , H01L21/31 , H01L21/3121 , H01L21/316 , H01L21/76817
摘要： A method of fine-pattern formation in which in forming a pattern, a fine pattern formed in a mold can be transferred to a pattering material in a short time at a low temperature and low pressure and, after the transfer of the fine pattern to the patterning material, the fine pattern formed in the patterning material does not readily deform. The method for fine-pattern formation comprises: a first step in which a mold having a fine structure with recesses/protrusions is pressed against a pattering material comprising a polysilane; a second step in which the patterning material is irradiated with ultraviolet to photooxidize the patterning material; a third in which the pressing of the mold against the patterning material is relieved and the mold is drawn from the pattering material; and a fourth step in which that surface of the patterning material to which the fine pattern has been transferred is irradiated with an oxygen plasma to oxidize the surface.
摘要翻译：精细图案形成方法在形成图案时，在模具中形成的精细图案可以在低温低压下在短时间内转印到图案材料，并且在精细图案转印到图案形成材料中形成的微细图案不容易变形。精细图案形成方法包括：第一步骤，其中具有凹陷/突起的精细结构的模具被压在包含聚硅烷的图案材料上; 第二步骤，其中图案形成材料被紫外线照射以对图案材料进行光氧化; 第三，其中将模具压靠在图案形成材料上被释放并且模具从图案材料中拉出; 以及第四步骤，其中已经转印有精细图案的图案形成材料的表面用氧等离子体照射以氧化该表面。

10. 发明申请

US20080203620A1 METHOD OF FORMING MINUTE PATTERN 审中-公开
标题翻译：形成分钟图案的方法
公开(公告)号：US20080203620A1
公开(公告)日：2008-08-28
申请号：US11845618
申请日：2007-08-27
申请人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
发明人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
IPC分类号： B29C35/08
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827
摘要： There is provided a method for forming minute patterns ranging from nanometer scale to micrometer scale with high aspect ratio at one time under a single condition of low temperature, low pressure, and a short period of time. A method of forming a minute pattern according to the present invention includes: applying, onto a substrate, a patterning material containing a polysilane and a silicone compound; pressing a mold on which a predetermined minute pattern has been formed to the patterning material which has been applied onto the substrate; irradiating energy rays from a side of the substrate while the mold is contacted by press with the patterning material; releasing the mold; and irradiating the patterning material with energy rays from a side to which the mold has been pressed.
摘要翻译：提供一种在低温，低压和短时间的单一条件下一次形成从纳米尺度到微米级的高纵横比的微小图案的方法。根据本发明的形成微细图案的方法包括：在基材上涂布含有聚硅烷和硅氧烷化合物的图案形成材料; 将已经形成有预定的微小图案的模具按压到已经施加到基板上的图案形成材料上; 在模具与图案形成材料接触的同时，从基板侧照射能量射线; 释放模具; 并用能量射线照射图案形成材料，该能量射线从模具被按压的一侧。

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