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1. 发明授权

US07994450B2 Debris minimization and improved spatial resolution in pulsed laser ablation of materials 有权
标题翻译：碎片最小化和改善材料脉冲激光烧蚀中的空间分辨率
公开(公告)号：US07994450B2
公开(公告)日：2011-08-09
申请号：US10041328
申请日：2002-01-07
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B23K26/00
CPC分类号： B23K26/0635 , B23K26/032 , B23K26/0624 , B23K26/066 , B23K26/0732 , B23K26/142 , B23K26/146 , B23K26/147 , B23K26/1476 , B23K26/16 , B23K26/361 , B23K26/40 , B23K2101/42 , B23K2103/50 , B41M5/24 , G03F1/82
摘要： A method and an apparatus of minimizing the deposition of debris onto a sample being ablated. The method comprising the steps of: 1) reducing a laser pulse energy to approximately a threshold level for ablation; and 2) ablating a region of the sample using a multitude of laser pulses, each pulse being sufficiently separated in time to reduce a concentration of ablation products in a gas phase. An apparatus for ablating a region of a sample with a laser beam. The apparatus comprises: 1) a source providing a pulsed laser beam of a certain energy, the source focusing the laser beam on the sample to ablate a region of the sample; and 2) a device for providing a flowing fluid over the region being ablated to remove the ablation products.
摘要翻译：一种使碎片沉积到被烧蚀的样品上的方法和装置。该方法包括以下步骤：1）将激光脉冲能量降低到近似于消融的阈值水平; 和2）使用多个激光脉冲消融样品的区域，每个脉冲在时间上充分分离以降低气相中的消融产物的浓度。一种用激光束烧蚀样品区域的装置。该装置包括：1）提供具有一定能量的脉冲激光束的源，所述源将激光束聚焦在样品上以烧蚀样品的区域; 以及2）用于在被烧蚀的区域上提供流动的流体以移除消融产物的装置。

2. 发明授权

US07211300B2 Method and apparatus for performing laser CVD 有权
标题翻译：用于执行激光CVD的方法和装置
公开(公告)号：US07211300B2
公开(公告)日：2007-05-01
申请号：US10698884
申请日：2003-10-31
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B05D3/06 , C23C18/14 , C23C14/14 , C23C14/58 , C23C16/56 , C23C16/48 , C23C14/04
CPC分类号： C23C16/483 , C23C16/047
摘要： An element is deposited by flowing a gas through a solid donor compound that includes the element, and over a substrate. The flow of gas deposits a film of a few monolayers of donor compound on the substrate. An optical radiation source (e.g., a femtosecond laser) which produces optical radiation at an instantaneous intensity sufficient to cause non linear or otherwise enhanced interaction between optical radiation photons and the donor compound is used to decompose the donor compound and deposit the metal on the substrate. After an initial deposit of the donor compound is produced, optical radiation can be absorbed and heat the substrate in the localized area of the deposit in order to accelerate the deposition process by thermally decomposing the donor compound.
摘要翻译：通过使气体流过包括元件的固体给体化合物并在基底上沉积元素。气体的流动将一些单层供体化合物的膜沉积在基材上。使用产生光辐射的光辐射源（例如，飞秒激光），其瞬时强度足以引起光辐射光子和供体化合物之间的非线性或其它增强的相互作用，以分解供体化合物并将金属沉积在基底上。在产生供体化合物的初始沉积之后，可以吸收光辐射并加热沉积物的局部区域中的基底，以通过热分解供体化合物来加速沉积过程。

3. 发明授权

US06656539B1 Method and apparatus for performing laser CVD 失效
标题翻译：用于执行激光CVD的方法和装置
公开(公告)号：US06656539B1
公开(公告)日：2003-12-02
申请号：US09711269
申请日：2000-11-13
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B05D306
CPC分类号： C23C16/483 , C23C16/047
摘要： An element is deposited by flowing a gas through a solid donor compound that includes the element, and over a substrate. The flow of gas deposits a film of a few monolayers of donor compound on the substrate. An optical radiation source (e.g., a femtosecond laser) which produces optical radiation at an instantaneous intensity sufficient to cause non linear or otherwise enhanced interaction between optical radiation photons and the donor compound is used to decompose the donor compound and deposit the metal on the substrate. After an initial deposit of the donor compound is produced, optical radiation can be absorbed and heat the substrate in the localized area of the deposit in order to accelerate the deposition process by thermally decomposing the donor compound.
摘要翻译：通过使气体流过包括元件的固体给体化合物并在基底上沉积元素。气体的流动将一些单层供体化合物的膜沉积在基材上。使用产生光辐射的光辐射源（例如，飞秒激光），其瞬时强度足以引起光辐射光子和供体化合物之间的非线性或其它增强的相互作用，以分解供体化合物并将金属沉积在基底上。在产生供体化合物的初始沉积之后，可以吸收光辐射并加热沉积物的局部区域中的基底，以通过热分解供体化合物来加速沉积过程。

4. 发明授权

US07170030B2 Method and apparatus for repair of reflective photomasks 有权
标题翻译：用于修复反光光掩模的方法和装置
公开(公告)号：US07170030B2
公开(公告)日：2007-01-30
申请号：US10660477
申请日：2003-09-12
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B23K26/38
CPC分类号： B82Y40/00 , B23K26/0624 , B23K26/361 , B23K26/40 , B23K2101/35 , B23K2103/50 , B82Y10/00 , G03F1/24 , G03F1/72
摘要： A method of selectively ablating an undesired material from a substrate includes providing a substrate with two regions; providing laser pulses; tuning a wavelength of the laser pulses to match a desired wavelength characteristic of a material and directing the tuned laser pulses onto the substrate; and controlling a pulse duration, wavelength, or both, of the laser pulses to ablate the undesired material without damaging the substrate or any adjacent material. In another embodiment, an apparatus for repairing a defect on a reflective photomask includes a femtosecond pulse width laser; a harmonic conversion cell; a filter for passing a selected EUV harmonic of the laser light; a lens arrangement configured to direct the selected EUV harmonic of the laser light onto the photomask; and a control unit connected to the laser to control an ablation of the defect on the reflective photomask.
摘要翻译：从衬底中选择性地烧蚀不需要的材料的方法包括提供具有两个区域的衬底; 提供激光脉冲; 调整激光脉冲的波长以匹配材料的期望波长特性并将调谐的激光脉冲引导到衬底上; 并且控制激光脉冲的脉冲持续时间，波长或两者，以消除不需要的材料，而不会损坏衬底或任何相邻的材料。在另一个实施例中，用于修复反射光掩模上的缺陷的装置包括飞秒脉冲宽度激光器; 谐波转换电池; 用于通过激光的所选EUV谐波的滤波器; 透镜装置，被配置为将所选择的激光的EUV谐波引导到光掩模上; 以及连接到激光器以控制反射光掩模上的缺陷的消融的控制单元。

5. 发明授权

US06591154B2 System and method for modifying enclosed areas for ion beam and laser beam bias effects 失效
标题翻译：用于修改离子束封闭区域和激光束偏置效应的系统和方法
公开(公告)号：US06591154B2
公开(公告)日：2003-07-08
申请号：US09737398
申请日：2000-12-15
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： H04N121
CPC分类号： H01L21/67288
摘要： A system and method for repairing defects in semiconductor wafers utilizing a repair tool including a device for applying energy to obliterate defects at locations on the wafer, the method being a graphical approach implementing a graphical user interface (GUI) comprising a pixel screen display and comprising the steps of: via the interface, identifying a wafer defect to repair and enclosing the defect within a polygonal repair outline drawn using a default line thickness; graphically adjusting the line thickness to modify the enclosed polygonal repair outline area; automatically detecting one or more areas within an interior region of the modified polygonal repair outline area; and, scanning the modified polygonal repair outline, and for each pixel location inside the one or more detected areas, applying energy to the wafer coordinated to the pixel location for repairing the defect, whereby the identification of said pixel location is accomplished using standard graphical tools with minimal operator intervention.
摘要翻译：一种利用修复工具修复半导体晶片缺陷的系统和方法，所述修复工具包括用于施加能量以消除晶片上位置处的缺陷的装置，所述方法是实现包括像素屏幕显示并且包括以下步骤：通过接口，识别晶片缺陷以修复并将缺陷包围在使用默认线厚度绘制的多边形修复轮廓内; 以图形方式调整线条厚度以修改封闭的多边形修复轮廓区域; 自动检测修改的多边形修复轮廓区域的内部区域内的一个或多个区域; 以及扫描所述修改的多边形修复轮廓，以及对于所述一个或多个检测区域内的每个像素位置，向与所述像素位置协调的晶片施加能量以修复所述缺陷，由此使用标准图形工具来实现所述像素位置的识别以最小的操作员干预。

6. 发明授权

US09102008B2 Debris minimization and improved spatial resolution in pulsed laser ablation of materials 有权
标题翻译：碎片最小化和改善材料脉冲激光烧蚀中的空间分辨率
公开(公告)号：US09102008B2
公开(公告)日：2015-08-11
申请号：US12241274
申请日：2008-09-30
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B23K26/00 , B23K26/06 , B23K26/03 , B23K26/073 , B23K26/14 , B23K26/16 , B23K26/36 , B23K26/40 , G03F1/82 , B41M5/24
CPC分类号： B23K26/0635 , B23K26/032 , B23K26/0624 , B23K26/066 , B23K26/0732 , B23K26/142 , B23K26/146 , B23K26/147 , B23K26/1476 , B23K26/16 , B23K26/361 , B23K26/40 , B23K2101/42 , B23K2103/50 , B41M5/24 , G03F1/82
摘要： A method of minimizing the deposition of debris onto a sample being ablated. The method comprises: 1) reducing a laser pulse energy to approximately a threshold level for ablation; 2) focusing the energy using an immersion object lens having a final element and 3) ablating a region of the sample using a multitude of laser pulses, each pulse being sufficiently separated in time to reduce a concentration of ablation products in a gas phase.
摘要翻译：将碎屑沉积最小化到被烧蚀的样品上的方法。该方法包括：1）将激光脉冲能量降低到近似于消融的阈值水平; 2）使用具有最终元件的浸没物镜聚焦能量; 3）使用多个激光脉冲消融样品的区域，每个脉冲在时间上充分分离，以降低气相中消融产物的浓度。

7. 发明授权

US07759606B2 Method and apparatus for repair of reflective photomasks 有权
标题翻译：用于修复反光光掩模的方法和装置
公开(公告)号：US07759606B2
公开(公告)日：2010-07-20
申请号：US11458161
申请日：2006-07-18
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B23K26/38 , B23K26/06 , G02F2/02
CPC分类号： B82Y40/00 , B23K26/0624 , B23K26/361 , B23K26/40 , B23K2101/35 , B23K2103/50 , B82Y10/00 , G03F1/24 , G03F1/72
摘要： A method of selectively ablating an undesired material from a substrate includes providing a substrate with two regions; providing laser pulses; tuning a wavelength of the laser pulses to match a desired wavelength characteristic of a material and directing the tuned laser pulses onto the substrate; and controlling a pulse duration, wavelength, or both, of the laser pulses to ablate the undesired material without damaging the substrate or any adjacent material. In another embodiment, an apparatus for repairing a defect on a reflective photomask includes a femtosecond pulse width laser; a harmonic conversion cell; a filter for passing a selected EUV harmonic of the laser light; a lens arrangement configured to direct the selected EUV harmonic of the laser light onto the photomask; and a control unit connected to the laser to control an ablation of the defect on the reflective photomask.
摘要翻译：从衬底选择性地烧蚀不需要的材料的方法包括：提供具有两个区域的衬底; 提供激光脉冲; 调整激光脉冲的波长以匹配材料的期望波长特性并将调谐的激光脉冲引导到衬底上; 并且控制激光脉冲的脉冲持续时间，波长或两者，以消除不需要的材料，而不会损坏衬底或任何相邻的材料。在另一个实施例中，用于修复反射光掩模上的缺陷的装置包括飞秒脉冲宽度激光器; 谐波转换电池; 用于通过激光的所选EUV谐波的滤波器; 透镜装置，被配置为将所选择的激光的EUV谐波引导到光掩模上; 以及连接到激光器以控制反射光掩模上的缺陷的消融的控制单元。

8. 发明申请

US20090107964A1 DEBRIS MINIMIZATION AND IMPROVED SPATIAL RESOLUTION IN PULSED LASER ABLATION OF MATERIALS 有权
标题翻译：脉冲激光消除材料的破碎最小化和改进的空间分辨率
公开(公告)号：US20090107964A1
公开(公告)日：2009-04-30
申请号：US12241274
申请日：2008-09-30
申请人： Richard A. Haight , Peter P. Longo , Alfred Wagner
发明人： Richard A. Haight , Peter P. Longo , Alfred Wagner
IPC分类号： B23K26/00
CPC分类号： B23K26/0635 , B23K26/032 , B23K26/0624 , B23K26/066 , B23K26/0732 , B23K26/142 , B23K26/146 , B23K26/147 , B23K26/1476 , B23K26/16 , B23K26/361 , B23K26/40 , B23K2101/42 , B23K2103/50 , B41M5/24 , G03F1/82
摘要： A method of minimizing the deposition of debris onto a sample being ablated. The method comprises: 1) reducing a laser pulse energy to approximately a threshold level for ablation; 2) focusing the energy using an immersion object lens having a final element and 3) ablating a region of the sample using a multitude of laser pulses, each pulse being sufficiently separated in time to reduce a concentration of ablation products in a gas phase.
摘要翻译：将碎屑沉积最小化到被烧蚀的样品上的方法。该方法包括：1）将激光脉冲能量降低到近似于消融的阈值水平; 2）使用具有最终元件的浸没物镜聚焦能量; 3）使用多个激光脉冲消融样品的区域，每个脉冲在时间上充分分离，以降低气相中消融产物的浓度。

9. 发明授权

US6165649A Methods for repair of photomasks 失效
公开(公告)号：US6165649A
公开(公告)日：2000-12-26
申请号：US786061
申请日：1997-01-21
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.

10. 发明授权

US6090507A Methods for repair of photomasks 有权
标题翻译：修复光掩模的方法
公开(公告)号：US6090507A
公开(公告)日：2000-07-18
申请号：US261638
申请日：1999-03-03
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的透明区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

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