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1. 发明授权

US6165649A Methods for repair of photomasks 失效
公开(公告)号：US6165649A
公开(公告)日：2000-12-26
申请号：US786061
申请日：1997-01-21
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.

2. 发明授权

US6090507A Methods for repair of photomasks 有权
标题翻译：修复光掩模的方法
公开(公告)号：US6090507A
公开(公告)日：2000-07-18
申请号：US261638
申请日：1999-03-03
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的透明区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

3. 发明授权

US6156461A Method for repair of photomasks 有权
标题翻译：光掩模修复方法
公开(公告)号：US6156461A
公开(公告)日：2000-12-05
申请号：US504031
申请日：2000-02-14
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03S9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模上的缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的清晰区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

4. 发明授权

US06190836B1 Methods for repair of photomasks 失效
标题翻译：修复光掩模的方法
公开(公告)号：US06190836B1
公开(公告)日：2001-02-20
申请号：US09561560
申请日：2000-04-28
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： G03C500
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模上的缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的清晰区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

5. 发明授权

US5665968A Inspecting optical masks with electron beam microscopy 失效
标题翻译：用电子束显微镜检查光学掩模
公开(公告)号：US5665968A
公开(公告)日：1997-09-09
申请号：US607191
申请日：1996-02-26
申请人： Dan Meisburger , Alan D. Brodie , Zhong-Wei Chen , Jack Y. Jau , Brian J. Grenon
发明人： Dan Meisburger , Alan D. Brodie , Zhong-Wei Chen , Jack Y. Jau , Brian J. Grenon
IPC分类号： H01J37/28 , H01J37/30 , H01J37/26
CPC分类号： H01J37/28 , H01J37/3005 , H01J2237/2817
摘要： There is disclosed an apparatus to scan an electron beam across an optical phase shift mask and automatically inspect the mask to determine the features of the phase shift mask and classification of defects. An electron beam is directed at the surface of a mask for scanning that mask and detectors are provided to measure the secondary and backscattered charged particles from the surface of the mask. The mask is mounted on an x-y stage to provide it with at least one degree of freedom while the mask is being scanned by the electron beam. By analysis of various waveform features in each of the secondary and backscatter electron waveforms obtained from a phase shift mask, various physical features of the mask can be detected, as well as their size and position determined. The thickness of chromium layers can also be determined. In the inspection configuration, there is also a comparison technique for comparing the pattern on the substrate with a second pattern for error detection.
摘要翻译：公开了一种通过光学相移掩模扫描电子束并自动检查掩模以确定相移掩模的特征和缺陷分类的装置。电子束指向掩模的表面以扫描该掩模，并且提供检测器以从掩模的表面测量次级和背散射带电粒子。掩模安装在x-y平台上，以在掩模被电子束扫描时提供至少一个自由度。通过分析从相移掩模获得的每个次要和反向散射电子波形中的各种波形特征，可以检测掩模的各种物理特征以及它们的尺寸和位置。也可以确定铬层的厚度。在检查配置中，还存在用于比较衬底上的图案与用于错误检测的第二图案的比较技术。

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