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1. 发明授权

US06515736B1 Reticle capturing and handling system 失效
标题翻译：光栅捕获和处理系统
公开(公告)号：US06515736B1
公开(公告)日：2003-02-04
申请号：US09564189
申请日：2000-05-04
申请人： Dennis M. Hayden , Timothy E. Neary
发明人： Dennis M. Hayden , Timothy E. Neary
IPC分类号： G03B2762
CPC分类号： G03F7/70741
摘要： A reticle capturing system includes a reticle that defines a first recess extending into the reticle from a first edge of the reticle and a second recess extending into the reticle from a second edge of the reticle. The reticle capturing system also includes a first finger selectively extending into the first recess and a second finger selectively extending into the second recess. The first and second fingers may be tapered so that the reticle capturing system will be self centering. The reticle capturing system may also include a third recess defined by the reticle and a third finger selectively extending into a recess. A method for capturing a reticle includes providing a reticle that defines a recess at an edge of the reticle and inserting the finger into the recess. The method may further include inserting a second finger into a second recess.
摘要翻译：掩模版捕获系统包括掩模版，所述掩模版限定从所述掩模版的第一边缘延伸到所述掩模版中的第一凹部和从所述掩模版的第二边缘延伸到所述掩模版中的第二凹部。掩模版捕获系统还包括选择性地延伸到第一凹部中的第一手指和选择性地延伸到第二凹部中的第二手指。第一和第二手指可以是锥形的，使得掩模版捕获系统将是自对中的。掩模版捕获系统还可以包括由掩模版限定的第三凹部和选择性地延伸到凹部中的第三手指。一种用于捕获掩模版的方法包括提供在所述掩模版的边缘处限定凹部并将所述手指插入所述凹部中的掩模版。该方法还可以包括将第二手指插入第二凹槽中。

2. 发明授权

US06582857B1 Repair of masks to promote adhesion of patches 有权
标题翻译：修复口罩以促进贴片的粘附
公开(公告)号：US06582857B1
公开(公告)日：2003-06-24
申请号：US09526858
申请日：2000-03-16
申请人： Philip S. Flanigan , Dennis M. Hayden , Michael S. Hibbs , Timothy E. Neary
发明人： Philip S. Flanigan , Dennis M. Hayden , Michael S. Hibbs , Timothy E. Neary
IPC分类号： G03F900
CPC分类号： G03F1/72 , G03F1/26 , G03F1/74
摘要： The current invention performs short pulse laser ablation of clear defect regions on a mask prior to patching the clear defect regions. The short-pulse laser ablation removes any residue that absorbs light. Thus, the ablation completely cleans the surface of the clear defect regions, meaning that any patches of the surface will better adhere to the surface of the mask. This is particularly important during those situations where a later etch of a conductive surface added to the mask creates a solvent because the etchant interacts with residue on the mask, and wherein the solvent attacks the patch material at the patch material's interface.
摘要翻译：本发明在修补清晰的缺陷区域之前对掩模上的清晰缺陷区进行短脉冲激光烧蚀。短脉冲激光烧蚀消除了吸收光的残留物。因此，消融完全清洁透明缺陷区域的表面，意味着表面的任何贴片将更好地粘附到掩模的表面。这在这些情况下特别重要，在这些情况下，添加到掩模中的导电表面的后续蚀刻产生溶剂，因为蚀刻剂与掩模上的残余物相互作用，并且其中溶剂在补片材料的界面处攻击补片材料。

3. 发明授权

US6156461A Method for repair of photomasks 有权
标题翻译：光掩模修复方法
公开(公告)号：US6156461A
公开(公告)日：2000-12-05
申请号：US504031
申请日：2000-02-14
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03S9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模上的缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的清晰区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

4. 发明授权

US06534225B2 Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features 失效
标题翻译：锥形离子注入与飞秒激光烧蚀消除可打印交替相移特征
公开(公告)号：US06534225B2
公开(公告)日：2003-03-18
申请号：US09892957
申请日：2001-06-27
申请人： Steven D. Flanders , Dennis M. Hayden , Timothy E. Neary
发明人： Steven D. Flanders , Dennis M. Hayden , Timothy E. Neary
IPC分类号： G03F900
CPC分类号： G03F1/30 , G03F1/72
摘要： The present invention provides various methods for eliminating printable alternating phase shift defects from an alternating phase shift mask without the need of using a trim mask. Specifically, unwanted printable defects are removed by employing methods which provide a gradual sloped region in the transparent or semi-transparent substrate which is formed in an area of the substrate opposite to that of the opaque image which is formed thereon.
摘要翻译：本发明提供了用于从交替的相移掩模中消除可印刷交替相移缺陷的各种方法，而不需要使用修剪掩模。具体而言，通过采用在与形成在其上的不透明图像相反的基板的区域中形成的透明或半透明基板中提供逐渐倾斜的区域的方法来去除不需要的可印刷缺陷。

5. 发明授权

US6165649A Methods for repair of photomasks 失效
公开(公告)号：US6165649A
公开(公告)日：2000-12-26
申请号：US786061
申请日：1997-01-21
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.

6. 发明授权

US6090507A Methods for repair of photomasks 有权
标题翻译：修复光掩模的方法
公开(公告)号：US6090507A
公开(公告)日：2000-07-18
申请号：US261638
申请日：1999-03-03
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03F9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的透明区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

7. 发明授权

US06346352B1 Quartz defect removal utilizing gallium staining and femtosecond ablation 有权
标题翻译：使用镓染色和飞秒消融的石英缺陷去除
公开(公告)号：US06346352B1
公开(公告)日：2002-02-12
申请号：US09512951
申请日：2000-02-25
申请人： Dennis M. Hayden , Timothy E. Neary , John N. Ross
发明人： Dennis M. Hayden , Timothy E. Neary , John N. Ross
IPC分类号： G03F900
CPC分类号： G03F1/74 , G03F1/26
摘要： The present invention discloses a method of controlling the precise removal of unwanted material from a light transmittable substrate for isolating and removing defects from a surface of the light transmittable substrate and for direct writing of a reticle or photomask, and the resultant reticle or photomask. The depth of ion implantation of a light absorbing material such as gallium, arsenic, boron, phosphorus, antimony or combinations thereof into the defect and/or the areas surrounding the defect on the light transmittable substrate controls the depth of material removed from the substrate. Unexpectedly, the use of laser ablation at pulses not greater than 10−5 seconds to remove the unwanted material provides precision removal while preventing heat damage to the substrate.
摘要翻译：本发明公开了一种控制从透光性基板精确去除不想要的材料的方法，用于从透光性基板的表面隔离和去除缺陷，并直接写入掩模版或光掩模，以及所得的掩模版或光掩模。诸如镓，砷，硼，磷，锑或其组合的光吸收材料的离子注入深度可以在缺陷和/或透光性基材上的缺陷周围的区域上控制从衬底去除的材料的深度。出乎意料的是，在不大于10-5秒的脉冲下使用激光烧蚀以去除不需要的材料提供精确的去除，同时防止对基底的热损伤。

8. 发明授权

US06190836B1 Methods for repair of photomasks 失效
标题翻译：修复光掩模的方法
公开(公告)号：US06190836B1
公开(公告)日：2001-02-20
申请号：US09561560
申请日：2000-04-28
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： G03C500
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模上的缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的清晰区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

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