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1. 发明授权

US06358124B1 Pad conditioner cleaning apparatus 有权
标题翻译：垫调节剂清洗装置
公开(公告)号：US06358124B1
公开(公告)日：2002-03-19
申请号：US09222180
申请日：1998-12-29
申请人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker , Bruce Lu , Rex Lu , K. Y. Wang , Roland Shu
发明人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker , Bruce Lu , Rex Lu , K. Y. Wang , Roland Shu
IPC分类号： B24B100
CPC分类号： B08B1/007 , B24B53/005 , B24B53/017 , H01L21/67051
摘要： A chemical mechanical polishing apparatus includes a pad conditioner having a conditioner head, a cleaning cup for receiving and cleaning the conditioner head of the pad conditioner, and a fluid dispenser for dispensing a cleaning fluid onto the conditioner head.
摘要翻译：化学机械抛光装置包括具有调节头的垫调节器，用于接收和清洁垫调节器的调节头的清洁杯，以及用于将清洁流体分配到调节头上的流体分配器。

2. 发明授权

US06217430B1 Pad conditioner cleaning apparatus 有权
标题翻译：垫调节剂清洗装置
公开(公告)号：US06217430B1
公开(公告)日：2001-04-17
申请号：US09184786
申请日：1998-11-02
申请人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker
发明人： Raijiro Koga , Hiromi Tsuruta , Takashi Kumagai , Gee Hoey , Brian J. Brown , Boris Fishkin , Fred C. Redeker
IPC分类号： B24B2118
CPC分类号： H01L21/67051 , B08B1/007 , B24B53/005 , B24B53/017
摘要： A cleaning cup for holding and cleaning a pad conditioner having a conditioner head, the cleaning cup includes a spray nozzle for spraying a cleaning solution on a top side of the conditioner head. The cleaning cup further includes a plurality of support pins extending upwards from a base of the cleaning cup to receive the conditioner head thereon.
摘要翻译：一种用于保持和清洁具有调节头的垫调节器的清洁杯，所述清洁杯包括用于在所述调理头的顶侧上喷射清洁溶液的喷嘴。清洁杯还包括从清洁杯的底部向上延伸的多个支撑销，以在其上接收调节头。

3. 发明授权

US06386963B1 Conditioning disk for conditioning a polishing pad 失效
标题翻译：用于调理抛光垫的调节盘
公开(公告)号：US06386963B1
公开(公告)日：2002-05-14
申请号：US09698520
申请日：2000-10-27
申请人： Suzuki Kenji , Raijiro Koga
发明人： Suzuki Kenji , Raijiro Koga
IPC分类号： B24B2118
CPC分类号： B24B53/017 , B24B53/12
摘要： The present invention generally provides an apparatus and a method for conditioning a polishing pad in a polishing system. In one embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk. In another embodiment, the apparatus includes a base plate and a ring-shaped plate in which the conditioning elements are disposed on the ring-shaped plate. In still another embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk and having brush bristles disposed on the center portion of the disk.
摘要翻译：本发明总体上提供了一种在抛光系统中调节抛光垫的装置和方法。在一个实施例中，该装置包括调节盘，其具有设置在底表面上并远离盘的中心部分的调节元件。在另一个实施例中，该装置包括基板和环形板，其中调节元件设置在环形板上。在另一个实施例中，该装置包括调节盘，其具有设置在底表面上并且远离盘的中心部分的调节元件，并且具有设置在盘的中心部分上的刷毛。

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