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1. 发明授权

US09013134B2 Method for determing a commutation offset and for determining a compensation map for a stage 有权
标题翻译：用于确定换向偏移和用于确定载物台的补偿图的方法
公开(公告)号：US09013134B2
公开(公告)日：2015-04-21
申请号：US13110760
申请日：2011-05-18
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： H02P1/26 , G03F7/20 , H02P6/00
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

2. 发明申请

US20120127447A1 METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE 有权
标题翻译：用于确定报告偏移和用于确定阶段的补偿地图的方法
公开(公告)号：US20120127447A1
公开(公告)日：2012-05-24
申请号：US13110760
申请日：2011-05-18
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

3. 发明申请

US20120113405A1 METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE 有权
标题翻译：用于确定报告偏移量和确定阶段补偿地图的方法
公开(公告)号：US20120113405A1
公开(公告)日：2012-05-10
申请号：US13101264
申请日：2011-05-05
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： G03B27/58 , G05B1/06
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

4. 发明授权

US07989756B2 Active-isolation mounts for optical elements 有权
标题翻译：用于光学元件的主动隔离支架
公开(公告)号：US07989756B2
公开(公告)日：2011-08-02
申请号：US12262115
申请日：2008-10-30
申请人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
发明人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
IPC分类号： G02B7/00
CPC分类号： G02B27/646 , G03F7/70825 , G03F7/709
摘要： Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.
摘要翻译：特别地，公开了包括光学元件（例如，反射镜）和将光学元件安装到框架（例如，光学镜筒或光学框架）的至少三个主动隔离安装件的光学部件。主动隔离安装件具有将光学元件上的相应位置连接到框架的非接触致动器，并且在至少一个方向上提供相对于框架的相应位置的可移动性。至少一个位移传感器与光学元件上的每个相应位置相关联。位移传感器对至少一个相应方向上各个位置的位移敏感，并将位移引用为绝对参考。执行器和传感器连接到伺服控制回路以提供反馈控制。

5. 发明申请

US20100188647A1 Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like 有权
标题翻译：控制系统和方法应用迭代反馈调谐用于微光刻阶段的前馈和同步控制等
公开(公告)号：US20100188647A1
公开(公告)日：2010-07-29
申请号：US12657805
申请日：2010-01-27
申请人： Pai-Hsueh Yang , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Shiang-Lung Koo
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70725
摘要： Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers perform iterative feedback tuning IFT, including minimization of a cost-function of the parameter vectors from the first and second controllers. The second controller receives data including first-stage trajectory, and the first controller receives data including first-stage following-error. A suitable application of the assembly is in a microlithography system or other high-precision system.
摘要翻译：公开了舞台组件和控制方法。示例性组件包括第一级和第一和第二控制器。第一控制器反馈根据相应的参数向量来控制第一级。第二控制器根据相应的参数向量通过前馈控制来控制第一级。控制器执行迭代反馈调谐IFT，包括使来自第一和第二控制器的参数矢量的成本函数最小化。第二控制器接收包括第一级轨迹的数据，第一控制器接收包括第一级跟随误差的数据。该组件的合适应用是在微光刻系统或其它高精度系统中。

6. 发明授权

US09465305B2 Method for determining a commutation offset and for determining a compensation map for a stage 有权
标题翻译：用于确定换向偏移和用于确定载物台的补偿图的方法
公开(公告)号：US09465305B2
公开(公告)日：2016-10-11
申请号：US13101264
申请日：2011-05-05
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： H02K41/00 , G03F7/20 , H02P6/00
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

7. 发明授权

US08451431B2 Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like 有权
标题翻译：控制系统和方法应用迭代反馈调谐用于微光刻阶段的前馈和同步控制等
公开(公告)号：US08451431B2
公开(公告)日：2013-05-28
申请号：US12657805
申请日：2010-01-27
申请人： Pai-Hsueh Yang , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Shiang-Lung Koo
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03B27/58 , G03F7/70725
摘要： Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers perform iterative feedback tuning IFT, including minimization of a cost-function of the parameter vectors from the first and second controllers. The second controller receives data including first-stage trajectory, and the first controller receives data including first-stage following-error. A suitable application of the assembly is in a microlithography system or other high-precision system.
摘要翻译：公开了舞台组件和控制方法。示例性组件包括第一级和第一和第二控制器。第一控制器反馈根据相应的参数向量来控制第一级。第二控制器根据相应的参数向量通过前馈控制来控制第一级。控制器执行迭代反馈调谐IFT，包括最小化来自第一和第二控制器的参数矢量的成本函数。第二控制器接收包括第一级轨迹的数据，第一控制器接收包括第一级跟随误差的数据。该组件的合适应用是在微光刻系统或其它高精度系统中。

8. 发明申请

US20090237793A1 ACTIVE-ISOLATION MOUNTS FOR OPTICAL ELEMENTS 有权
标题翻译：光学元件的主动隔离装置
公开(公告)号：US20090237793A1
公开(公告)日：2009-09-24
申请号：US12262115
申请日：2008-10-30
申请人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
发明人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
IPC分类号： G02B27/64
CPC分类号： G02B27/646 , G03F7/70825 , G03F7/709
摘要： Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.
摘要翻译：特别地，公开了包括光学元件（例如，反射镜）和将光学元件安装到框架（例如，光学镜筒或光学框架）的至少三个主动隔离安装件的光学部件。主动隔离安装件具有将光学元件上的相应位置连接到框架的非接触式致动器，并且在至少一个方向上提供相对于框架的相应位置的可移动性。至少一个位移传感器与光学元件上的每个相应位置相关联。位移传感器对至少一个相应方向上各个位置的位移敏感，并将位移引用为绝对参考。执行器和传感器连接到伺服控制回路以提供反馈控制。

9. 发明申请

US20080275661A1 On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage 有权
标题翻译：用于识别和补偿由多个执行器在多轴平台上产生的力 - 波动和侧力的机上方法
公开(公告)号：US20080275661A1
公开(公告)日：2008-11-06
申请号：US11986314
申请日：2007-11-19
申请人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
发明人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
IPC分类号： G01L25/00
CPC分类号： G03F7/70758 , G03F7/70725
摘要： Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.
摘要翻译：公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法，装置和系统。可以对所识别的力 - 纹波和/或侧向力进行映射，并且获得用于校正相应的位置相关的补偿比的映射。这些方法对于使用多个（冗余）致动器在至少一个自由度中提供运动的阶段特别有用。在示例性方法中，使用至少一个所选择的致动器，在主体致动器的运动范围内的设定距离上移动台架构件多次。每个位移具有预定的轨迹和该范围内的相应起始点。对于每个位移，提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。组合多段补偿比作为该范围内的位移的函数，以提供在整个范围内的致动器的补偿比的图。

10. 发明授权

US09030057B2 Method and apparatus to allow a plurality of stages to operate in close proximity 有权
标题翻译：允许多个台阶靠近操作的方法和装置
公开(公告)号：US09030057B2
公开(公告)日：2015-05-12
申请号：US13526994
申请日：2012-06-19
申请人： Michael B. Binnad , Pai-Hsueh Yang
发明人： Michael B. Binnad , Pai-Hsueh Yang
IPC分类号： H02K41/02 , G03F7/20 , H02K41/03 , H02K3/47
CPC分类号： G03F7/70758 , H02K3/47 , H02K41/031 , H02K2201/18 , Y10T428/24479
摘要： According to one aspect of the present invention, a stage apparatus includes a first stage, a first magnet arrangement, and a stator arrangement that includes a first coil having a first width. The first magnet arrangement is associated with the first stage, and includes a first quadrant and a second quadrant or, more generally, a first sub-array and a second sub-array. The first quadrant has at least one first magnet arranged parallel to a first axis, and the second quadrant has at least one second magnet arranged parallel to a second axis. The first quadrant is adjacent to the second quadrant relative to the first axis, and is spaced apart from the second quadrant by a distance relative to the second axis. The stator arrangement is configured to cooperate with the first magnet arrangement to drive the first stage.
摘要翻译：根据本发明的一个方面，一种舞台装置包括第一舞台，第一磁铁装置以及包括具有第一宽度的第一线圈的定子装置。第一磁体布置与第一阶段相关联，并且包括第一象限和第二象限，或更一般地，第一子阵列和第二子阵列。第一象限具有平行于第一轴布置的至少一个第一磁体，而第二象限具有平行于第二轴布置的至少一个第二磁体。第一象限相对于第一轴相邻于第二象限，并且与第二象限相隔相对于第二轴的距离。定子装置构造成与第一磁体装置配合以驱动第一级。

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