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    • 1. 发明申请
    • (AMIDE AMINO ALKANE) METAL COMPOUND, METHOD OF MANUFACTURING METAL-CONTAINING THIN FILM USING SAID METAL COMPOUND
    • (AMIDE AMINO ALKANE)金属化合物,使用含金属化合物制造含金属薄膜的方法
    • US20130273250A1
    • 2013-10-17
    • US13882824
    • 2011-11-02
    • Osamu FujimuraHiroki KanatoMasashi ShiraiHiroshi Nihei
    • Osamu FujimuraHiroki KanatoMasashi ShiraiHiroshi Nihei
    • H01L51/00C07F15/06C07F5/00C07F3/06C07F15/02C07F15/04C07F3/02C07F13/00
    • H01L51/0083C07C211/65C07F3/02C07F3/06C07F5/003C07F13/005C07F15/025C07F15/045C07F15/065C23C16/18C23C16/403C23C16/407H01L51/0077H01L51/0084H01L51/0089H01L51/0092
    • The present invention relates to an (amide amino alkane) metal compound represented by the formula (1): wherein M represents a metal atom; R1 represents a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; R2 and R3 may be the same as, or different from each other, and each independently represents a linear or branched alkyl group having 1 to 3 carbon atoms, or R2 and R3 may form a substituted or unsubstituted 5- or 6-membered ring together with the nitrogen atom to which they are bound; Z represents a linear or branched alkylene group having 1 to 10 carbon atoms (a part of which may optionally form a ring); and n represents a number of the ligands, which is equal to the valence of the metal (M), and represents an integer of from 1 to 3; with the proviso that the metal compounds in which M is Li (Lithium), Be (Beryllium), Ge (Germanium) or Nd (Neodymium) are excluded; the metal compounds in which M is Mg (Magnesium) and R1 is methyl group are excluded; the metal compounds in which M is Zn (Zinc) and R1 is methyl group are excluded; the metal compounds in which M is Bi (Bismuth) and R1 is t-butyl group are excluded; and in cases where n is two or greater, two or more ligands may be the same as, or different from each other; and a method of producing a metal-containing thin film using the metal compound.
    • 本发明涉及由式(1)表示的(酰胺氨基烷烃)金属化合物:其中M表示金属原子; R1表示碳原子数为1〜6的直链状,支链状或环状的烷基。 R 2和R 3可以彼此相同或不同,并且各自独立地表示具有1至3个碳原子的直链或支链烷基,或者R 2和R 3可以一起形成取代或未取代的5-或6-元环 与它们所结合的氮原子一起; Z表示碳原子数1〜10的直链状或支链状的亚烷基(其一部分可以形成环)。 n表示与金属(M)的化合价相同的配体数,表示1〜3的整数。 条件是不包括其中M为Li(锂),Be(铍),Ge(锗)或Nd(钕)的金属化合物; 其中M为Mg(镁)和R1为甲基的金属化合物被排除; 其中M为Zn(锌)和R1为甲基的金属化合物被排除; 其中M为Bi(铋)和R 1为叔丁基的金属化合物被排除; 并且在n为2或更大的情况下,两个或多个配体可以彼此相同或不同; 以及使用该金属化合物制造含金属薄膜的方法。
    • 2. 发明授权
    • (Amide amino alkane) metal compound, method of manufacturing metal-containing thin film using said metal compound
    • (酰胺氨基烷烃)金属化合物,使用所述金属化合物制造含金属薄膜的方法
    • US08871304B2
    • 2014-10-28
    • US13882824
    • 2011-11-02
    • Osamu FujimuraHiroki KanatoMasashi ShiraiHiroshi Nihei
    • Osamu FujimuraHiroki KanatoMasashi ShiraiHiroshi Nihei
    • H01L51/00C07F15/00C07F13/00C07F5/00C07F3/00C07F15/06C07F15/04C07F15/02C07F3/02C07F3/06
    • H01L51/0083C07C211/65C07F3/02C07F3/06C07F5/003C07F13/005C07F15/025C07F15/045C07F15/065C23C16/18C23C16/403C23C16/407H01L51/0077H01L51/0084H01L51/0089H01L51/0092
    • The present invention relates to an (amide amino alkane) metal compound represented by the formula (1): wherein M represents a metal atom; R1 represents a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; R2 and R3 may be the same as, or different from each other, and each independently represents a linear or branched alkyl group having 1 to 3 carbon atoms, or R2 and R3 may form a substituted or unsubstituted 5- or 6-membered ring together with the nitrogen atom to which they are bound; Z represents a linear or branched alkylene group having 1 to 10 carbon atoms (a part of which may optionally form a ring); and n represents a number of the ligands, which is equal to the valence of the metal (M), and represents an integer of from 1 to 3; with the proviso that the metal compounds in which M is Li (Lithium), Be (Beryllium), Ge (Germanium) or Nd (Neodymium) are excluded; the metal compounds in which M is Mg (Magnesium) and R1 is methyl group are excluded; the metal compounds in which M is Zn (Zinc) and R1 is methyl group are excluded; the metal compounds in which M is Bi (Bismuth) and R1 is t-butyl group are excluded; and in cases where n is two or greater, two or more ligands may be the same as, or different from each other; and a method of producing a metal-containing thin film using the metal compound.
    • 本发明涉及由式(1)表示的(酰胺氨基烷烃)金属化合物:其中M表示金属原子; R1表示碳原子数为1〜6的直链状,支链状或环状的烷基。 R 2和R 3可以彼此相同或不同,并且各自独立地表示具有1至3个碳原子的直链或支链烷基,或者R 2和R 3可以一起形成取代或未取代的5-或6-元环 与它们所结合的氮原子一起; Z表示碳原子数1〜10的直链状或支链状的亚烷基(其一部分可以形成环)。 n表示与金属(M)的化合价相同的配体数,表示1〜3的整数。 条件是不包括其中M为Li(锂),Be(铍),Ge(锗)或Nd(钕)的金属化合物; 其中M为Mg(镁)和R1为甲基的金属化合物被排除; 其中M为Zn(锌)和R1为甲基的金属化合物被排除; 其中M为Bi(铋)和R 1为叔丁基的金属化合物被排除; 并且在n为2或更大的情况下,两个或多个配体可以彼此相同或不同; 以及使用该金属化合物制造含金属薄膜的方法。
    • 9. 发明授权
    • Method of producing straight-chain acrylonitrile dimers
    • 制备直链丙烯腈二聚体的方法
    • US5466858A
    • 1995-11-14
    • US298113
    • 1994-08-30
    • Ryoji SugiseKouichi KashiwagiMasashi ShiraiToshihiro Shimakawa
    • Ryoji SugiseKouichi KashiwagiMasashi ShiraiToshihiro Shimakawa
    • C07C63/70C07C65/32C07C65/34C07C253/30
    • C07C65/32C07C253/30C07C65/34Y02P20/52
    • Straight-chain acrylonitrile dimers including 1,4-dicyanobutene, 1,4-dicyanobutadiene and adiponitrile are produced at a high selectivity by dimerizing acrylonitrile in the presence of a ruthenium catalyst, and in the presence of a straight-chain dimer selectivity-enhancing agent comprising at least one member selected from(A) substituted benzoic acids, except for monoalkylbenzoic acids, having at least one substituent and preferably exhibiting a pKa of 1.50 to 6.0 determined in water at an ionic strength of 0 to 0.1 mole/liter at 25.degree. C.;(B) hetero atom-containing acyclic carboxylic acids having at least one substituent having a sulfur or nitrogen atom attached to a carbon atom located in an .alpha.- on .beta.-position with respect to a carboxyl group in a main hydrocarbon structure; and(C) 5 to 12 membered heterocyclic carboxylic acids having an oxygen, sulfur or nitrogen atom included in a 5 to 12 membered heterocyclic structure and a carboxyl or carboxymethyl group attached to a carbon atom located in an .alpha.-position with respect to the hetero atom.
    • 通过在钌催化剂的存在下使丙烯腈二聚,并且在直链二聚体选择性增强剂的存在下,以高选择性制备包括1,4-二氰基,1,4-二氰基丁二烯和己二腈的直链丙烯腈二聚体 包括至少一种选自(A)取代的苯甲酸,除了单烷基苯甲酸,具有至少一个取代基,并且优选表现出在25℃下在离子强度为0至0.1摩尔/升的水中测定的pKa为1.50至6.0。 C。; (B)具有至少一个具有硫原子或氮原子的取代基的含杂原子的非环状羧酸与位于主烃结构中的羧基上位于β-位上的α-位上的碳原子连接; 和(C)5至12元杂环结构中包含的具有氧,硫或氮原子的5至12元杂环羧酸和连接于位于相对于杂原子的α位的碳原子上的羧基或羧甲基 原子。