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1. 发明授权

US06084938A X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06084938A
公开(公告)日：2000-07-04
申请号：US813349
申请日：1997-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K5/02 , G03F7/20 , G21K5/10 , H01L21/027 , H01L21/683 , G21K5/00
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

2. 发明授权

US07072438B2 Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US07072438B2
公开(公告)日：2006-07-04
申请号：US10736693
申请日：2003-12-17
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K3/00
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
摘要翻译：反射型掩模包括其上设置有用于反射X射线的多层膜的基板，形成在用于吸收X射线的多层膜上的掩模图案，以及用于保护掩模图案的盖。盖可拆卸地附接到基板。

3. 发明授权

US06836531B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06836531B2
公开(公告)日：2004-12-28
申请号：US10679278
申请日：2003-10-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.
摘要翻译：曝光装置包括用于保持物体的卡盘和用于将来自光源的光引导到由卡盘保持的物体的光学系统。该光学系统包括具有凹面反射面的多层膜反射镜，其中卡盘的接触部分的面积被设定为使得卡盘的接触部分面积达到由卡盘保持的物体的面积的至多10％。

4. 发明授权

US06668037B2 X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06668037B2
公开(公告)日：2003-12-23
申请号：US09948041
申请日：2001-09-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

5. 发明授权

US06317479B1 X-ray mask, and exposure method and apparatus using the same 失效
标题翻译： X射线掩模和使用其的曝光方法和装置
公开(公告)号：US06317479B1
公开(公告)日：2001-11-13
申请号：US08857466
申请日：1997-05-16
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： H01L2700
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.
摘要翻译： X射线掩模包括形成在表面上的掩模图案，安装在表面上用于形成用于保护掩模图案的防尘空间的可拆卸保护盖，当掩模图案用X射线暴露时，保护盖被分离，以及用于在防尘空间和外部空气之间通风的孔。

6. 发明授权

US06584168B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06584168B2
公开(公告)日：2003-06-24
申请号：US10092280
申请日：2002-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray exposure apparatus operating in a vacuum or a reduced-pressure environment includes a mask, arranged in the vacuum or in the reduced-pressure environment, for holding a reflection X-ray mask having a mask pattern thereon, an X-ray illuminating system arranged so as to illuminate the reflection X-ray mask having the mask pattern thereon, relatively scanningly with X-rays, wherein the mask pattern being illuminated is transferred onto an object, and a cooling structure for cooling the X-ray mask held by the mask chuck.
摘要翻译：在真空或减压环境中工作的X射线曝光装置包括在真空中或在减压环境中布置的用于保持其上具有掩模图案的反射X射线掩模的掩模，X射线照明系统，其被布置成以X射线相对扫描地照射其上具有掩模图案的反射X射线掩模，其中照射的掩模图案被转印到物体上，并且用于冷却所述X射线掩模的冷却结构通过面罩卡盘。

7. 发明授权

US06310934B1 X-ray projection exposure apparatus and a device manufacturing method 有权
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06310934B1
公开(公告)日：2001-10-30
申请号：US09342897
申请日：1999-06-29
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
摘要翻译： X射线投影曝光装置包括：掩模卡盘，用于保持其上具有掩模图案的反射X射线掩模，在掩模和掩模卡盘之间形成空隙;晶片卡盘，用于保持掩模图案是转移了用于照射由掩模卡盘保持的反射X射线掩模的X射线照射系统的X射线，用于将反射X射线掩模的掩模图案投影到晶片上的X射线投影光学系统由晶片卡盘以预定的放大率保持，以及用于将形成在掩模和掩模卡盘之间的空隙供给用于冷却掩模的冷却气体的供给。

8. 发明授权

US06728332B2 X-ray mask, and exposure method and apparatus using the same 失效
标题翻译： X射线掩模和使用其的曝光方法和装置
公开(公告)号：US06728332B2
公开(公告)日：2004-04-27
申请号：US09970826
申请日：2001-10-05
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K300
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.
摘要翻译：一种用于将掩模图案转印到要曝光的构件上的曝光方法。该方法包括以下步骤：当保护盖附着到掩模上时，进行曝光准备，在保护盖与掩模分离的同时执行被曝光元件与掩模之间的对准，并且执行X射线曝光防护罩与面罩分离。

9. 发明授权

US06504896B2 X-ray illumination optical system and x-ray reduction exposure apparatus 失效
标题翻译： X射线照射光学系统和X射线减少曝光装置
公开(公告)号：US06504896B2
公开(公告)日：2003-01-07
申请号：US08917373
申请日：1997-08-26
申请人： Akira Miyake , Masami Tsukamoto
发明人： Akira Miyake , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70058 , G21K1/06
摘要： An X-ray illumination optical system includes a reflection type integrator, having cylindrical surfaces, for reflecting an X-ray beam, and a concave mirror, including a rotational parabolic surface mirror, for reflecting the X-ray beam reflected by the integrator and for illuminating an object with the X-ray beam.
摘要翻译： X射线照明光学系统包括具有用于反射X射线束的圆柱面的反射型积分器和包括旋转抛物面镜的凹面镜，用于反射由积分器反射的X射线束，并且用X射线束照射物体。

10. 发明授权

US5995582A X-ray reduction exposure apparatus and device manufacturing method using the same 失效
标题翻译： X射线减少曝光装置及其制造方法
公开(公告)号：US5995582A
公开(公告)日：1999-11-30
申请号：US835721
申请日：1997-04-10
申请人： Shigeru Terashima , Masami Tsukamoto
发明人： Shigeru Terashima , Masami Tsukamoto
IPC分类号： G21K5/02 , G03F7/20 , G21K1/06 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70891 , G21K1/06
摘要： A deflection mirror is disposed before an X-ray mask so as to reflect an X-ray beam and to project it to the X-ray mask. The X-ray mask is disposed opposed to a wafer with a distance D therebetween, and the X-ray beam reflected by the X-ray mask is projected onto the wafer through a reduction projection optical system. The deflecting mirror is disposed, in an example, at a position satisfying a relation D>L>d/(tan .delta.1+tan .delta.2) where L is the distance from the X-ray mask to an edge of the deflection mirror closer to the path of the X-ray beam reflected by the X-ray mask, d is the width of irradiation of the X-ray beam upon the X-ray mask, and .delta.1 and .delta.2 are incidence angles of the X-ray beam at upper and lower edges of the irradiation width d, respectively, upon the X-ray mask. This assures a compact structure wherein, even when a wafer of a large diameter is used, illumination light to the mask is not intercepted.
摘要翻译：偏转镜设置在X射线掩模之前，以便反射X射线束并将其投影到X射线掩模。 X射线掩模与其间具有距离D的晶片相对设置，并且由X射线掩模反射的X射线束通过还原投影光学系统投影到晶片上。偏转镜例如设置在满足关系D> L> d /（tanδ1 +tanδ2）的位置处，其中L是从X射线掩模到偏转镜的边缘的距离更近到由X射线掩模反射的X射线束的路径，d是X射线掩模上的X射线束的照射宽度，δ1和δ2是X射线的入射角在X射线掩模上分别照射宽度d的上边缘和下边缘。这确保了紧凑的结构，其中即使当使用大直径的晶片时，不遮挡对掩模的照明光。

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