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    • 9. 发明授权
    • Thin film transistor structure, method of manufacturing the same, and electronic device
    • 薄膜晶体管结构,制造方法及电子器件
    • US08445912B2
    • 2013-05-21
    • US13028604
    • 2011-02-16
    • Iwao YagiHideki OnoMari Sasaki
    • Iwao YagiHideki OnoMari Sasaki
    • H01L29/10
    • H01L29/66742G02F1/1368H01L27/1225H01L27/1285H01L27/1292H01L27/283H01L29/7869
    • A high-performance thin film transistor structure which is easily manufactured is provided. The thin film transistor structure includes: a first electrode; second and third electrodes apart from each other in a hierarchical level different from that of the first electrode; first, second, and third wirings connected to the first, second, and third electrodes, respectively; a main stack body disposed so as to be opposed to the first electrode with an interlayer insulating layer in between, between the first electrode, and the second and third electrodes; and a sub stack body including an insulating layer and a semiconductor layer, disposed so as to be opposed to the first wiring with the interlayer insulating layer in between, between the first and second wirings in a position where the first and second wirings overlap and/or between the first and third wirings in a position where the first and third wirings overlap.
    • 提供了容易制造的高性能薄膜晶体管结构。 薄膜晶体管结构包括:第一电极; 第二和第三电极以与第一电极的层级不同的层级彼此分开; 分别连接到第一,第二和第三电极的第一,第二和第三布线; 主堆叠体,设置成与第一电极相对,在第一电极和第二和第三电极之间具有层间绝缘层; 以及包括绝缘层和半导体层的子堆叠体,在第一和第二布线重叠的位置和/或第二布线之间,在第一布线和第二布线之间设置有与第一布线相对的第一布线和层间绝缘层, 或者在第一和第三布线重叠的位置之间的第一和第三布线之间。