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1. 发明专利

JP2009228022A Oxide film deposition method and oxide film member 有权
标题翻译：氧化膜沉积方法和氧化膜成员
公开(公告)号：JP2009228022A
公开(公告)日：2009-10-08
申请号：JP2008072038
申请日：2008-03-19
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , SAITO HIDETOSHI , KAWAGUCHI SHINNOSUKE
IPC分类号： C23C16/40 , C01F17/00 , C04B41/87
摘要： PROBLEM TO BE SOLVED: To provide an oxide film deposition method and an oxide film member for depositing a metal oxide thin film on the projection and recessed face, in the crack or the like of a surface of a substrate. SOLUTION: A Y 2 O 3 film is deposited on an aluminum oxide (Al 2 O 3 ) sintered body substrate 10 by using an air-open type CVD method using an air-open type CVD apparatus. An yttrium oxide film can be synthesized along a base material by using Y(DPM) 3 as a starting material of the Y 2 O 3 film. Any unevenness of the surface of the substrate can be uniformized, and the deepest part of grain boundary cracking or the like can be filled by the vapor deposition of the yttrium oxide film. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供氧化膜沉积方法和用于在基板的表面的裂纹等中在突起和凹面上沉积金属氧化物薄膜的氧化物膜部件。解决方案：将AY 2 3 膜沉积在氧化铝（Al 2 SB 3 O 3 / SB 3）上，通过使用空气开放式CVD装置的空气开放式CVD方法来烧结体基板10。可以通过使用Y（DPM） 3 作为Y SB“2 O”SB“膜的原料，沿着基材合成氧化钇膜。基板表面的任何不均匀性均匀化，可以通过氧化钇膜的气相沉积来填充最深部分的晶界裂纹等。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2010235975A Oxide film 审中-公开
标题翻译：氧化膜
公开(公告)号：JP2010235975A
公开(公告)日：2010-10-21
申请号：JP2009082616
申请日：2009-03-30
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , KAWAGUCHI SHINNOSUKE , SAITO HIDETOSHI
IPC分类号： C23C16/40 , C01B13/20 , C01F17/00 , C04B41/87 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a consistent oxide film having excellent plasma resistance.
SOLUTION: An oxide film is deposited by blowing a raw material 5 of metal oxides on a surface of a heated base material 10 by the open-air type CVD method. The film deposition condition is set so that the film density measured by the XRR method is in a range between 75.0 and
摘要翻译：要解决的问题：提供具有优异的等离子体电阻的一致的氧化物膜。解决方案：通过露天式CVD方法在加热的基材10的表面上吹入金属氧化物的原料5来沉积氧化物膜。设定膜沉积条件使得通过XRR方法测量的膜密度在理论密度（TD）的75.0至<98.0％之间的范围内。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2009299107A Atmosphere open type cvd apparatus 有权
标题翻译：大气开放式CVD装置
公开(公告)号：JP2009299107A
公开(公告)日：2009-12-24
申请号：JP2008152665
申请日：2008-06-11
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , KAWAGUCHI SHINNOSUKE , SAITO HIDETOSHI
IPC分类号： C23C16/455 , C23C16/40
摘要： PROBLEM TO BE SOLVED: To provide an atmosphere open type CVD apparatus capable of forming a dense and thick metal oxide film even on the surface of a base material having a large size.
SOLUTION: In the atmosphere open type CVD apparatus, a multi hole plate 20 having many holes bored at irregular positions is arranged in a gas ejection part of a nozzle 7 and configured so as to be rotated together with the nozzle 7 by a rotating mechanism 17 at a position opposing to a substrate and having a predetermined height above the substrate. Thereby, a mixed gas of raw materials is uniformly blown to the surface of the substrate and a metal oxide film is uniformly deposited on the surface of the substrate.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供即使在具有大尺寸的基材的表面上也能够形成致密且厚的金属氧化物膜的气氛开放式CVD装置。解决方案：在大气开放型CVD装置中，在喷嘴7的气体喷射部分中布置有在不规则位置钻出许多孔的多孔板20，并被构造成与喷嘴7一起旋转旋转机构17位于与衬底相对的位置上并且具有在衬底上方的预定高度。由此，原料的混合气体均匀地吹向基板的表面，金属氧化物膜均匀地沉积在基板的表面上。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2014011251A Manufacturing method of electrostatic chuck 有权
标题翻译：静电切割的制造方法
公开(公告)号：JP2014011251A
公开(公告)日：2014-01-20
申请号：JP2012145527
申请日：2012-06-28
申请人： Taiheiyo Cement Corp , 太平洋セメント株式会社 , Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： ISHIDA HIRONORI , SATO KEISUKE , KITABAYASHI TETSUO , TSUCHIDA ATSUSHI
IPC分类号： H01L21/683 , B23Q3/15 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrostatic chuck by which particles can be reduced, which are generated when making an adsorbed body adsorbed in a semiconductor manufacturing process.SOLUTION: A manufacturing method of an electrostatic chuck formed with alumina and holding an adsorbed body in a semiconductor manufacturing process includes the steps of: holding an electrode 5 and a joining material 7 between two alumina plates 6 and 8, and performing heating treatment at 1400°C or more; and reducing the temperature at a rate of 100°C/h or less after the heating treatment. Since the temperature is reduced at the rate of 100°C/h or less, stress remaining in a grain boundary can be reduced, and particles can be reduced, which are generated when making an adsorbed body adsorbed in a semiconductor manufacturing process.
摘要翻译：要解决的问题：提供一种静电卡盘的制造方法，通过该方法可以减少在半导体制造工艺中吸附吸附体时产生的颗粒。溶液：由氧化铝形成的静电卡盘的制造方法，在半导体制造方法中的吸附体包括以下步骤：将电极5和接合材料7保持在两个氧化铝板6和8之间，并在1400℃以上进行加热处理; 并在加热处理后以100℃/ h以下的速度降温。由于温度以100℃/ h以下的速度降低，因此能够降低残留于晶界的应力，并且能够降低在半导体制造工序中使吸附体吸附时产生的粒子。

5. 发明专利

JP2010277980A Electrode for cold-cathode fluorescent lamp and method of manufacturing the same 审中-公开
标题翻译：冷阴极荧光灯电极及其制造方法
公开(公告)号：JP2010277980A
公开(公告)日：2010-12-09
申请号：JP2009145818
申请日：2009-05-29
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , SATO YUTAKA
IPC分类号： H01J61/067 , H01J9/02 , H01J61/06
摘要： PROBLEM TO BE SOLVED: To provide an electrode for cold-cathode fluorescent lamp, which has a great film thickness and capable of achieving long lifetime. SOLUTION: In order to form an oxide ceramic film on an inner surface of an electrode in a shape of a cup, a plasma thermal spraying method is used and an angle of a thermal spraying gun during a period of formation is set arbitrarily, and it is made possible to form the film on an inside surface part of the electrode in the shape of the cup. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有大的膜厚度并能够实现长寿命的冷阴极荧光灯用电极。解决方案：为了在杯形状的电极的内表面上形成氧化物陶瓷膜，使用等离子体热喷涂方法，并且在成形期间热喷枪的角度被任意设定，并且可以在杯形状的电极的内表面部分上形成膜。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2010106327A Corrosion-resistant member 有权
标题翻译：耐腐蚀成员
公开(公告)号：JP2010106327A
公开(公告)日：2010-05-13
申请号：JP2008280723
申请日：2008-10-31
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： SAKAMAKI MAKOTO , TSUTAI YOSHIFUMI , SATO KEISUKE , INOUE YUKIO
IPC分类号： C23C28/04 , B32B9/00 , C04B41/87 , C04B41/89 , C23C4/10 , C23C18/12 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a corrosion-resistant member capable of reducing particles produced by the use in a halogen-based corrosive gas and halogen-based gas plasma.
SOLUTION: In the corrosion-resistant member, the surface to be exposed to the halogen-based corrosive gas, the halogen type gas plasma or the like, such as the inside of semiconductor manufacturing equipment, the inside of a flat panel display manufacturing apparatus or the inside of a solar cell manufacturing apparatus, is formed of a gadolinium oxide sol-gel film formed according to a sol-gel method and a thermally sprayed film formed according to a thermal spraying method on the gadolinium oxide sol-gel film.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够减少通过在卤素类腐蚀性气体和卤素系气体等离子体中使用而产生的微粒的耐腐蚀性构件。解决方案：在耐腐蚀构件中，暴露于卤素类腐蚀性气体的表面，卤素型气体等离子体等，例如半导体制造装置的内部，平板显示器的内部制造装置或太阳能电池制造装置的内部由根据溶胶 - 凝胶法形成的氧化钆溶胶凝胶膜和根据热喷涂法形成的热氧化钆溶胶凝胶膜形成的热喷涂膜。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008120654A Ceramic-coated member and method of manufacturing the same 审中-公开
标题翻译：陶瓷涂层成员及其制造方法
公开(公告)号：JP2008120654A
公开(公告)日：2008-05-29
申请号：JP2006309089
申请日：2006-11-15
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： TSUTAI YOSHIFUMI , SATO KEISUKE , SAITO CHIKASHI , OTAKI HIROMICHI , IGUCHI MASAHITO
IPC分类号： C04B41/87 , B32B18/00 , C03C17/25 , C23C18/12 , H01L21/3065 , H01L21/31 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a ceramic-coated member which is inhibited from occurrence of particles and has excellent corrosion resistance and durability and to provide a method of manufacturing the ceramic-coated member by which a ceramic film hardly causing occurrence of particles and having excellent corrosion resistance and durability is easily formed on a complicate shaped base material or a large-sized base material. SOLUTION: The ceramic-coated member has structure in which the ceramic film having ≥98% purity, ≥0.05 μm and ≤10 μm film thickness and ≤50 nm average particle diameter is formed on the surface of the base material. The ceramic film is formed by wet-forming a coating film using a solution containing at least one kind of a metal alkoxide, an organic metal complex, an oxide nanoparticle or a non-oxide nanoparticle on the surface of the base material and after drying the coating film, applying heat treatment to the dried coating film at ≥300°C and ≤1,000°C. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种抑制颗粒发生并具有优异的耐腐蚀性和耐久性的陶瓷涂覆部件，并且提供一种陶瓷涂覆部件的制造方法，通过该方法陶瓷膜难以发生在复杂形状的基材或大尺寸基材上容易形成具有优异的耐腐蚀性和耐久性的颗粒。＆lt; P＆gt;解决方案：陶瓷涂覆部件具有在基材的表面上形成具有≥98％纯度≥0.05μm和≤10μm膜厚以及≤50nm平均粒径的陶瓷膜的结构。通过使用包含至少一种金属醇盐，有机金属络合物，氧化物纳米颗粒或非氧化物纳米颗粒的溶液在基材表面上湿法成膜涂层而形成陶瓷膜，涂膜，在≥300℃和≤1,000℃下对干燥的涂膜进行热处理。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2014067834A Electrostatic chuck and manufacturing method of the same 有权
标题翻译：静电切割机及其制造方法
公开(公告)号：JP2014067834A
公开(公告)日：2014-04-17
申请号：JP2012211464
申请日：2012-09-25
申请人： Taiheiyo Cement Corp , 太平洋セメント株式会社 , Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： ISHIDA HIRONORI , SUZUKI HIROAKI , SATO KEISUKE
IPC分类号： H01L21/683 , B23Q3/15 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic chuck which improves temperature control accuracy of a wafer while improving corrosion resistance, and to provide a manufacturing method of the electrostatic chuck.SOLUTION: An electrostatic chuck of the invention includes: a ceramic sintered body 1 having a support surface 10 for supporting a wafer; and an electrostatic chuck electrode 21 buried in the ceramic sintered body 1. In the ceramic sintered body 1, a second layer 12 (a second region), in which an average particle size of ceramic particles is larger than that of the first layer 11 (a first region) existing at the support surface 10 side with respect to the electrostatic chuck electrode 21, exists at the opposite side of the support surface 10 with respect to the electrostatic chuck electrode 21.
摘要翻译：要解决的问题：提供一种提高耐腐蚀性的晶片温度控制精度的静电卡盘，提供静电卡盘的制造方法。本发明的静电卡盘包括：陶瓷烧结体1，其具有用于支撑晶片的支撑表面10; 以及埋设在陶瓷烧结体1中的静电卡盘电极21.在陶瓷烧结体1中，陶瓷粒子的平均粒径大于第一层11的平均粒径的第二层12（第二区域）相对于静电卡盘电极21，在支撑面10侧存在的第一区域）相对于静电吸盘电极21位于支撑面10的相对侧。

9. 发明专利

JP2011228232A Electrode for cold cathode fluorescent lamp and manufacturing method thereof 审中-公开
标题翻译：冷阴极荧光灯电极及其制造方法
公开(公告)号：JP2011228232A
公开(公告)日：2011-11-10
申请号：JP2010106740
申请日：2010-04-15
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , SATO YUTAKA
IPC分类号： H01J61/067 , H01J9/02 , H01J61/06
摘要： PROBLEM TO BE SOLVED: To provide an electrode for a cold cathode fluorescent lamp having a long life and stable electron emission characteristics.SOLUTION: In an electrode 7 for a cold cathode fluorescent lamp 1, a discharge medium 4 is sealed in a glass tube having a phosphor coating layer 3 on the inner surface of the glass tube, the cold cathode fluorescent lamp includes a pair of cup-shaped electrodes sealed in the glass tube, an oxide ceramic film 8 is deposited on the inner surface of the cup-shaped electrode, and a DLC film 9 is formed on the uppermost layer thereof.

10. 发明专利

JP2010280877A Phosphor material and light-emitting device 审中-公开
标题翻译：磷光材料和发光器件
公开(公告)号：JP2010280877A
公开(公告)日：2010-12-16
申请号：JP2009137727
申请日：2009-06-08
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： TSUTAI YOSHIFUMI , SATO KEISUKE , SATO YUTAKA , IGUCHI MASAHITO
IPC分类号： C09K11/08 , H01L33/50
CPC分类号： C09K11/025 , C09K11/08 , H01L33/502 , H01L2224/48091 , H01L2924/00014
摘要： PROBLEM TO BE SOLVED: To provide a phosphor material achieving a longer lifetime by improving water resistance, resistance against UV rays and the like, and to provide a light-emitting device.
SOLUTION: The phosphor material has a phosphor particle 11 and a coating layer 12 coating the whole surface of the phosphor particle 11, wherein the coating layer 12 contains at least one kind of metal oxide in a group consisting of rare earth oxides, aluminum oxide, compound oxides of yttrium and aluminum, magnesium oxide and compound oxides of aluminum and magnesium. Thus, water resistance, resistance against UV rays and the like are improved and a longer lifetime is achieved.
COPYRIGHT: (C)2011,JPO&INPIT

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