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1. 发明专利

JP2009228022A Oxide film deposition method and oxide film member 有权
标题翻译：氧化膜沉积方法和氧化膜成员
公开(公告)号：JP2009228022A
公开(公告)日：2009-10-08
申请号：JP2008072038
申请日：2008-03-19
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , SAITO HIDETOSHI , KAWAGUCHI SHINNOSUKE
IPC分类号： C23C16/40 , C01F17/00 , C04B41/87
摘要： PROBLEM TO BE SOLVED: To provide an oxide film deposition method and an oxide film member for depositing a metal oxide thin film on the projection and recessed face, in the crack or the like of a surface of a substrate. SOLUTION: A Y 2 O 3 film is deposited on an aluminum oxide (Al 2 O 3 ) sintered body substrate 10 by using an air-open type CVD method using an air-open type CVD apparatus. An yttrium oxide film can be synthesized along a base material by using Y(DPM) 3 as a starting material of the Y 2 O 3 film. Any unevenness of the surface of the substrate can be uniformized, and the deepest part of grain boundary cracking or the like can be filled by the vapor deposition of the yttrium oxide film. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供氧化膜沉积方法和用于在基板的表面的裂纹等中在突起和凹面上沉积金属氧化物薄膜的氧化物膜部件。解决方案：将AY 2 3 膜沉积在氧化铝（Al 2 SB 3 O 3 / SB 3）上，通过使用空气开放式CVD装置的空气开放式CVD方法来烧结体基板10。可以通过使用Y（DPM） 3 作为Y SB“2 O”SB“膜的原料，沿着基材合成氧化钇膜。基板表面的任何不均匀性均匀化，可以通过氧化钇膜的气相沉积来填充最深部分的晶界裂纹等。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2010235975A Oxide film 审中-公开
标题翻译：氧化膜
公开(公告)号：JP2010235975A
公开(公告)日：2010-10-21
申请号：JP2009082616
申请日：2009-03-30
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , KAWAGUCHI SHINNOSUKE , SAITO HIDETOSHI
IPC分类号： C23C16/40 , C01B13/20 , C01F17/00 , C04B41/87 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a consistent oxide film having excellent plasma resistance.
SOLUTION: An oxide film is deposited by blowing a raw material 5 of metal oxides on a surface of a heated base material 10 by the open-air type CVD method. The film deposition condition is set so that the film density measured by the XRR method is in a range between 75.0 and
摘要翻译：要解决的问题：提供具有优异的等离子体电阻的一致的氧化物膜。解决方案：通过露天式CVD方法在加热的基材10的表面上吹入金属氧化物的原料5来沉积氧化物膜。设定膜沉积条件使得通过XRR方法测量的膜密度在理论密度（TD）的75.0至<98.0％之间的范围内。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2009299107A Atmosphere open type cvd apparatus 有权
标题翻译：大气开放式CVD装置
公开(公告)号：JP2009299107A
公开(公告)日：2009-12-24
申请号：JP2008152665
申请日：2008-06-11
申请人： Nagaoka Univ Of Technology , Nihon Ceratec Co Ltd , 国立大学法人長岡技術科学大学 , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , KAWAGUCHI SHINNOSUKE , SAITO HIDETOSHI
IPC分类号： C23C16/455 , C23C16/40
摘要： PROBLEM TO BE SOLVED: To provide an atmosphere open type CVD apparatus capable of forming a dense and thick metal oxide film even on the surface of a base material having a large size.
SOLUTION: In the atmosphere open type CVD apparatus, a multi hole plate 20 having many holes bored at irregular positions is arranged in a gas ejection part of a nozzle 7 and configured so as to be rotated together with the nozzle 7 by a rotating mechanism 17 at a position opposing to a substrate and having a predetermined height above the substrate. Thereby, a mixed gas of raw materials is uniformly blown to the surface of the substrate and a metal oxide film is uniformly deposited on the surface of the substrate.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供即使在具有大尺寸的基材的表面上也能够形成致密且厚的金属氧化物膜的气氛开放式CVD装置。解决方案：在大气开放型CVD装置中，在喷嘴7的气体喷射部分中布置有在不规则位置钻出许多孔的多孔板20，并被构造成与喷嘴7一起旋转旋转机构17位于与衬底相对的位置上并且具有在衬底上方的预定高度。由此，原料的混合气体均匀地吹向基板的表面，金属氧化物膜均匀地沉积在基板的表面上。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2010277980A Electrode for cold-cathode fluorescent lamp and method of manufacturing the same 审中-公开
标题翻译：冷阴极荧光灯电极及其制造方法
公开(公告)号：JP2010277980A
公开(公告)日：2010-12-09
申请号：JP2009145818
申请日：2009-05-29
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： SATO KEISUKE , TSUTAI YOSHIFUMI , IGUCHI MASAHITO , SATO YUTAKA
IPC分类号： H01J61/067 , H01J9/02 , H01J61/06
摘要： PROBLEM TO BE SOLVED: To provide an electrode for cold-cathode fluorescent lamp, which has a great film thickness and capable of achieving long lifetime. SOLUTION: In order to form an oxide ceramic film on an inner surface of an electrode in a shape of a cup, a plasma thermal spraying method is used and an angle of a thermal spraying gun during a period of formation is set arbitrarily, and it is made possible to form the film on an inside surface part of the electrode in the shape of the cup. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有大的膜厚度并能够实现长寿命的冷阴极荧光灯用电极。解决方案：为了在杯形状的电极的内表面上形成氧化物陶瓷膜，使用等离子体热喷涂方法，并且在成形期间热喷枪的角度被任意设定，并且可以在杯形状的电极的内表面部分上形成膜。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2008239358A Fitted body and its manufacturing method 审中-公开
标题翻译：适用身体及其制造方法
公开(公告)号：JP2008239358A
公开(公告)日：2008-10-09
申请号：JP2007078065
申请日：2007-03-26
申请人： Nihon Ceratec Co Ltd , Taiheiyo Cement Corp , 太平洋セメント株式会社 , 株式会社日本セラテック
发明人： ISHII MAMORU , UMETSU MOTOHIRO , OGURA TOMOYUKI , SHIOGAI TATSUYA , IGUCHI MASAHITO , KATAOKA MASAKO , KIKUCHI SHINYA
IPC分类号： C04B37/02
摘要： PROBLEM TO BE SOLVED: To provide a fitted body wherein a ceramic member is fitted into a concave part of a metal-ceramic composite member without any gap and the ceramic member is crackless, and its manufacturing method.
SOLUTION: The method for manufacturing the fitted body contains a concave part-forming process wherein the concave part is formed on a preform made of a ceramic reinforced material, a fitting process wherein a ceramic member is fitted into the concave part, a process for filling a ceramic reinforced material powder into the gap between the preform and the ceramic member, and an infiltration process wherein pores of the preform and gaps of the filled ceramic reinforced material powder are infiltrated with a molten metal under pressure.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种嵌合体，其中将陶瓷构件嵌入金属 - 陶瓷复合构件的凹部而没有任何间隙，并且陶瓷构件是无裂纹的及其制造方法。解决方案：制造装配体的方法包括凹部形成工艺，其中凹部形成在由陶瓷增强材料制成的预成型件上，其中陶瓷构件装配到凹部中的配合工艺，用于将陶瓷增强材料粉末填充到预成型件和陶瓷构件之间的间隙中的过程，以及渗透方法，其中预制件的孔和填充的陶瓷增强材料粉末的间隙在压力下被熔融金属渗透。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008120654A Ceramic-coated member and method of manufacturing the same 审中-公开
标题翻译：陶瓷涂层成员及其制造方法
公开(公告)号：JP2008120654A
公开(公告)日：2008-05-29
申请号：JP2006309089
申请日：2006-11-15
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： TSUTAI YOSHIFUMI , SATO KEISUKE , SAITO CHIKASHI , OTAKI HIROMICHI , IGUCHI MASAHITO
IPC分类号： C04B41/87 , B32B18/00 , C03C17/25 , C23C18/12 , H01L21/3065 , H01L21/31 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a ceramic-coated member which is inhibited from occurrence of particles and has excellent corrosion resistance and durability and to provide a method of manufacturing the ceramic-coated member by which a ceramic film hardly causing occurrence of particles and having excellent corrosion resistance and durability is easily formed on a complicate shaped base material or a large-sized base material. SOLUTION: The ceramic-coated member has structure in which the ceramic film having ≥98% purity, ≥0.05 μm and ≤10 μm film thickness and ≤50 nm average particle diameter is formed on the surface of the base material. The ceramic film is formed by wet-forming a coating film using a solution containing at least one kind of a metal alkoxide, an organic metal complex, an oxide nanoparticle or a non-oxide nanoparticle on the surface of the base material and after drying the coating film, applying heat treatment to the dried coating film at ≥300°C and ≤1,000°C. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种抑制颗粒发生并具有优异的耐腐蚀性和耐久性的陶瓷涂覆部件，并且提供一种陶瓷涂覆部件的制造方法，通过该方法陶瓷膜难以发生在复杂形状的基材或大尺寸基材上容易形成具有优异的耐腐蚀性和耐久性的颗粒。＆lt; P＆gt;解决方案：陶瓷涂覆部件具有在基材的表面上形成具有≥98％纯度≥0.05μm和≤10μm膜厚以及≤50nm平均粒径的陶瓷膜的结构。通过使用包含至少一种金属醇盐，有机金属络合物，氧化物纳米颗粒或非氧化物纳米颗粒的溶液在基材表面上湿法成膜涂层而形成陶瓷膜，涂膜，在≥300℃和≤1,000℃下对干燥的涂膜进行热处理。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2012031377A Phosphor material and light-emitting device 有权
标题翻译：磷光材料和发光器件
公开(公告)号：JP2012031377A
公开(公告)日：2012-02-16
申请号：JP2011038210
申请日：2011-02-24
申请人： Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： TSUTAI YOSHIFUMI , SATO YUTAKA , ABE TAKASHI , IGUCHI MASAHITO
IPC分类号： C09K11/08 , H01L33/50
CPC分类号： C09K11/02 , H01L33/501 , H01L2224/48091 , H01L2924/00014
摘要： PROBLEM TO BE SOLVED: To provide a phosphor material which can improve properties including water resistance and ultraviolet light resistance and can prevent the deterioration in properties caused by coating, and to provide a light-emitting device.SOLUTION: The phosphor material comprises phosphor particles 11 and a coating layer 12 which coats a surface of each of the phosphor particles 11, wherein the coating layer 12 has such a structure that microparticles 12A having an average particle diameter of 10 to 40 nm inclusive are laminated. Preferably, the largest particle diameter of the microparticles is 50 nm or less and the microparticles 12A are laminated in three particle layers or more in the thickness direction.
摘要翻译：要解决的问题：提供一种能够改善包括耐水性和耐紫外光性的性能的荧光体材料，并且可以防止由涂覆引起的性能的劣化，并提供发光装置。解决方案：荧光体材料包括荧光体颗粒11和涂覆每个荧光体颗粒11的表面的涂层12，其中涂层12具有这样的结构，即平均粒径为10至40的微粒12A （nm）。优选地，微粒的最大粒径为50nm以下，微粒12A在厚度方向上层叠成三层以上。版权所有（C）2012，JPO＆INPIT

8. 发明专利

JP2011259316A High frequency vibration piezoelectric device, ultrasonic sensor, and manufacturing method for high frequency vibration piezoelectric device 有权
标题翻译：高频振动压电器件，超声波传感器和高频振动压电器件的制造方法
公开(公告)号：JP2011259316A
公开(公告)日：2011-12-22
申请号：JP2010133320
申请日：2010-06-10
申请人： Honda Electronic Co Ltd , K Technology Corp , Nihon Ceratec Co Ltd , Tohoku Univ , ケイテック株式会社 , 国立大学法人東北大学 , 本多電子株式会社 , 株式会社日本セラテック
发明人： SAIJO YOSHIFUMI , TAMURA KIYOSHI , KIKUCHI KIYOSHI , KOBAYASHI KAZUTO , OMORI KENJI , IGUCHI MASAHITO , ENDO TOSHIYUKI
IPC分类号： H04R17/00 , A61B8/00 , H04R31/00
摘要： PROBLEM TO BE SOLVED: To provide a high frequency vibration piezoelectric device which can be manufactured easily and which can accurately detect ultrasonic waves having a frequency of about 25-50 MHz, a ultrasonic sensor, and a manufacturing method for the high frequency vibration piezoelectric device.SOLUTION: A high frequency vibration piezoelectric device 105 of an array type which allows for detection of vibration of ultrasonic waves and echo waves from observation objects has a vibrator array formed by a plate-shaped piezoelectric body structure integrally formed as a lattice window. Thus the high frequency vibration piezoelectric device 105 can keep the parallelism of the vibrator array, heighten the flatness of the vibrator array, and make a piezoelectric body 107 thin, because the vibrator array is integrally formed as the lattice window. As a result, the ultrasonic waves having a frequency of about 25-50 MHz can be accurately detected. Also, the trouble to arrange a vibrator 110 can be spared, so the piezoelectric device 105 can be easily manufactured in terms of the process.
摘要翻译：要解决的问题：为了提供容易制造并能够精确地检测频率约为25-50MHz的超声波的高频振动压电装置，超声波传感器和用于高频率的制造方法振动压电器件。解决方案：允许检测来自观察对象的超声波和回波的振动的阵列型的高频振动压电装置105具有由一体形成为格子窗的板状压电体结构形成的振子阵列。因此，高频振动压电元件105可以保持振子阵列的平行度，提高振子阵列的平面度，并使压电体107变薄，因为振子阵列整体形成为格子窗。结果，可以精确地检测到具有约25-50MHz的频率的超声波。此外，可以避免设置振动器110的麻烦，因此可以根据工艺容易地制造压电装置105。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2010202896A Sputtering target and production method of the same 有权
标题翻译：溅射目标及其生产方法
公开(公告)号：JP2010202896A
公开(公告)日：2010-09-16
申请号：JP2009047035
申请日：2009-02-27
申请人： Nihon Ceratec Co Ltd , Taiheiyo Cement Corp , 太平洋セメント株式会社 , 株式会社日本セラテック
发明人： SAITO NORIKO , OGURA TOMOYUKI , MIYATA NOBORU , IGUCHI MASAHITO , ICHIKAWA YOSHITAKA
IPC分类号： C23C14/34 , C04B35/00 , C04B35/453 , C22C29/12 , H01L21/285
摘要： PROBLEM TO BE SOLVED: To provide a sputtering target allowing uniform formation of a film and hardly causing abnormal discharge. SOLUTION: The sputtering target comprises a zinc oxide sintered compact, containing Ga by 0.03 to 0.75 atom% and no compound oxide detected by X-ray diffraction. The target contains one or more of Zr, Si and Al by 100 atom ppm or lower in total. The surface of the zinc oxide sintered compact shows a color difference ΔE*ab of 0.7 or less. The sputtering target is sintered under the condition that no compound oxide is detected by X-ray diffraction. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2013063907A METHOD FOR PRODUCING ZnO SINTERED COMPACT 有权
标题翻译：生产ZnO烧结复合材料的方法
公开(公告)号：JP2013063907A
公开(公告)日：2013-04-11
申请号：JP2012256664
申请日：2012-11-22
申请人： Taiheiyo Cement Corp , 太平洋セメント株式会社 , Nihon Ceratec Co Ltd , 株式会社日本セラテック
发明人： MIYATA NOBORU , OGURA TOMOYUKI , SAITO NORIKO , IGUCHI MASAHITO , ICHIKAWA YOSHITAKA
IPC分类号： C04B35/453 , C23C14/08 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a ZnO sintered compact for forming a transparent conductive film which is excellent in the uniformity of film characteristics.SOLUTION: The ZnO sintered compact is produced by the method including: a step for obtaining ZnBOpowders by mixing ZnO powders with BOpowders, firing and pulverizing; and a step for obtaining the ZnO sintered compact by mixing the ZnO powders having an average particle diameter of 0.5-1 μm with the ZnBOpowders having an average particle diameter of 0.2-0.5 μm, molding and firing.
摘要翻译：解决的问题：提供一种制造薄膜特性均匀性优异的透明导电膜形成用ZnO烧结体的方法。解决方案：ZnO烧结体通过以下方法制造：包括以下步骤：获得Zn 4 通过将ZnO粉末与B 3 O 3 / SB SB粉末进行混合，焙烧和粉碎以及通过将平均粒径为0.5-1μm的ZnO粉末与Zn 4 6混合得到ZnO烧结体的步骤具有平均粒径为0.2-0.5μm的粉末，成型和烧制。 O 13 版权所有（C）2013，JPO＆INPIT

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