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    • 1. 发明申请
    • POSITIVE RESIST COMPOSITION
    • 积极抵抗组成
    • WO1996022563A1
    • 1996-07-25
    • PCT/JP1996000061
    • 1996-01-17
    • NIPPON ZEON CO., LTD.KAWATA, ShojiHAYASHI, HiroshiHIGASHI, HirokazuKATO, TakeyoshiNAKAMURA, Masahiro
    • NIPPON ZEON CO., LTD.KAWATA, ShojiHAYASHI, HiroshiHIGASHI, HirokazuKATO, TakeyoshiNAKAMURA, Masahiro
    • G03F07/022
    • G03F7/0236G03F7/0226G03F7/0233
    • A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R and R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R to R represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R to R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R to R represents hydroxy and m is a positive integer.
    • 具有优异的灵敏度,残留膜残留率,分辨率,耐热性,保存稳定性,曝光余量,聚焦余量等特性的正型抗蚀剂组合物,其包含(A)碱溶性酚醛树脂,(B)醌二叠氮磺酸酯光敏剂和( C)酚类化合物,其特征在于作为(C)成分的酚类化合物是选自由式(I)表示的结构单元的酚类化合物(CX)和酚类化合物(CD)组成的组中的至少一种酚类化合物, 由式(II)表示。 在式(I)中,R 1和R 3各自独立地表示氢,羟基,卤素,任选取代的烷基,任选取代的环烷基,任选取代的烯基,任选取代的烷氧基或任选取代的芳基, R 11各自独立地表示氢,任选取代的烷基,任选取代的环烷基,任选取代的烯基,任选取代的芳基或任选取代的烷氧基,n是正整数。 在式(II)中,R 12至R 15各自独立地表示氢,羟基,卤素,任选取代的烷基,任选取代的环烷基,任选取代的烯基,任选取代的烷氧基或任选取代的芳基,提供至少一个 R 12至R 15表示羟基,m为正整数。
    • 2. 发明公开
    • POSITIVE RESIST COMPOSITION
    • 正工作PHOTO涂料组合物
    • EP0831370A1
    • 1998-03-25
    • EP96900700.4
    • 1996-01-17
    • NIPPON ZEON CO., LTD.Kawata, ShojiHayashi, HiroshiHigashi, HirokazuKato, TakeyoshiNakamura, Masahiro
    • KAWATA, ShojiHAYASHI, HiroshiHIGASHI, HirikazuKATO, TakeyoshiNAKAMURA, Masahiro
    • G03F7/022G03F7/023
    • G03F7/0236G03F7/0226G03F7/0233
    • A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II):
      wherein R 1 to R 3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R 4 to R 11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and
      wherein R 12 to R 15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R 12 to R 15 is a hydroxyl group, and m is a positive integer.