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    • 1. 发明公开
    • POSITIVE RESIST COMPOSITION
    • POSITIV ARBEITENDE PHOTOLACKZUSAMMENSETZUNG
    • EP0831370A4
    • 1999-08-18
    • EP96900700
    • 1996-01-17
    • NIPPON ZEON COKAWATA SHOJIHAYASHI HIROSHIHIGASHI HIROKAZUKATO TAKEYOSHINAKAMURA MASAHIRO
    • KAWATA SHOJIHAYASHI HIROSHIHIGASHI HIRIKAZUKATO TAKEYOSHINAKAMURA MASAHIRO
    • G03F7/022G03F7/023
    • G03F7/0236G03F7/0226G03F7/0233
    • A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R and R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R to R represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R to R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R to R represents hydroxy and m is a positive integer.
    • 正性抗蚀剂组合物的灵敏度,显影后的薄膜损耗,分辨率,耐热流动性,保存稳定性,曝光余量和聚焦余量优异,并且包括(A)碱溶性酚醛树脂,(B)醌二叠氮化物类 光敏剂和(C)酚类化合物,其中所述酚类化合物(C)为选自具有由下式(I)表示的结构单元的酚类化合物(CX)和酚类化合物(C)的至少一种酚类化合物 CD)具有由下式(II)表示的结构单元:其中R 1至R 3彼此独立地为氢原子,羟基,卤素原子,烷基 可以被取代的,可被取代的环烷基,可被取代的烯基,可被取代的烷氧基或可被取代的芳基,R 4至R 11独立地是 彼此啊 可以被取代的烷基,可被取代的环烷基,可被取代的烯基,可被取代的芳基或可被取代的烷氧基,n是正整数 ; 和,其中R 12至R 15彼此独立地为氢原子,羟基,卤素原子,可被取代的烷基,可被取代的环烷基, 可被取代的烯基,可被取代的烷氧基或可被取代的芳基,条件是R 12至R 15中的至少一个为羟基,m为 正整数。
    • 2. 发明公开
    • POSITIVE RESIST COMPOSITION
    • 正工作PHOTO涂料组合物
    • EP0831370A1
    • 1998-03-25
    • EP96900700.4
    • 1996-01-17
    • NIPPON ZEON CO., LTD.Kawata, ShojiHayashi, HiroshiHigashi, HirokazuKato, TakeyoshiNakamura, Masahiro
    • KAWATA, ShojiHAYASHI, HiroshiHIGASHI, HirikazuKATO, TakeyoshiNAKAMURA, Masahiro
    • G03F7/022G03F7/023
    • G03F7/0236G03F7/0226G03F7/0233
    • A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II):
      wherein R 1 to R 3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R 4 to R 11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and
      wherein R 12 to R 15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R 12 to R 15 is a hydroxyl group, and m is a positive integer.
    • 10. 发明申请
    • ANCHOR
    • WO1997002979A1
    • 1997-01-30
    • PCT/JP1996000108
    • 1996-01-19
    • HAYASHI, Hiroshi
    • B63B21/36
    • B63B21/22
    • An anchor comprises a rod body provided with a fastening portion for a rope body for anchoring, and arms connected to the rod body by connection means for engagement with the bottom of the sea. When a force for pulling the fastening portion acts in parallel to the lengthwise direction of the rod body, the connection means keeps a state such that the arms are connected to the rod body. When a force for pulling the fastening portion is directed obliquely relative to the lengthwise direction of the rod body, forces exerted on the connection means become great to release connection of the arms to the rod body. In a state that connection by the connection means is released, separation preventing means prevents the arms from separating from the rod body.
    • 锚固件包括杆体,该杆体设置有用于锚固的绳索主体的紧固部分,以及通过用于与海底接合的连接装置连接到杆体的臂。 当用于拉动紧固部分的力平行于杆体的长度方向作用时,连接装置保持使得臂连接到杆体的状态。 当用于拉动紧固部分的力相对于杆体的长度方向倾斜地定向时,作用在连接装置上的力变大,以释放臂与杆体的连接。 在通过连接装置的连接被释放的状态下,分离防止装置防止臂从杆体分离。