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1. 发明申请

WO1996022563A1 POSITIVE RESIST COMPOSITION 审中-公开
标题翻译：积极抵抗组成
公开(公告)号：WO1996022563A1
公开(公告)日：1996-07-25
申请号：PCT/JP1996000061
申请日：1996-01-17
申请人： NIPPON ZEON CO., LTD. , KAWATA, Shoji , HAYASHI, Hiroshi , HIGASHI, Hirokazu , KATO, Takeyoshi , NAKAMURA, Masahiro
发明人： NIPPON ZEON CO., LTD. , KAWATA, Shoji , HAYASHI, Hiroshi , HIGASHI, Hirokazu , KATO, Takeyoshi , NAKAMURA, Masahiro
IPC分类号： G03F07/022
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/0233
摘要： A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R and R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R to R represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R to R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R to R represents hydroxy and m is a positive integer.
摘要翻译：具有优异的灵敏度，残留膜残留率，分辨率，耐热性，保存稳定性，曝光余量，聚焦余量等特性的正型抗蚀剂组合物，其包含（A）碱溶性酚醛树脂，（B）醌二叠氮磺酸酯光敏剂和（ C）酚类化合物，其特征在于作为（C）成分的酚类化合物是选自由式（I）表示的结构单元的酚类化合物（CX）和酚类化合物（CD）组成的组中的至少一种酚类化合物，由式（II）表示。在式（I）中，R 1和R 3各自独立地表示氢，羟基，卤素，任选取代的烷基，任选取代的环烷基，任选取代的烯基，任选取代的烷氧基或任选取代的芳基， R 11各自独立地表示氢，任选取代的烷基，任选取代的环烷基，任选取代的烯基，任选取代的芳基或任选取代的烷氧基，n是正整数。在式（II）中，R 12至R 15各自独立地表示氢，羟基，卤素，任选取代的烷基，任选取代的环烷基，任选取代的烯基，任选取代的烷氧基或任选取代的芳基，提供至少一个 R 12至R 15表示羟基，m为正整数。

2. 发明申请

WO1996020430A1 POSITIVE RESIST COMPOSITION 审中-公开
标题翻译：积极抵抗组成
公开(公告)号：WO1996020430A1
公开(公告)日：1996-07-04
申请号：PCT/JP1994002301
申请日：1994-12-28
申请人： NIPPON ZEON CO., LTD. , KAWATA, Shoji , KASHIWAGI, Motofumi , KUSUNOKI, Teturyo , NAKAMURA, Masahiro
发明人： NIPPON ZEON CO., LTD.
IPC分类号： G03F07/022
CPC分类号： G03F7/0226 , G03F7/022
摘要： A positive resist composition comprising an alkali-soluble phenol resin, a sensitizer comprising a guinone diazide sulfonic ester of a specified polyhydroxy compound, and an aromatic phenolic compound.
摘要翻译：一种正型抗蚀剂组合物，其包含碱溶性酚醛树脂，包含特定多羟基化合物的吉尼酮重氮磺酸酯的敏化剂和芳族酚类化合物。

3. 发明申请

WO1998001791A1 POSITIVE PHOTORESIST COMPOSITION 审中-公开
标题翻译：积极的光电组成
公开(公告)号：WO1998001791A1
公开(公告)日：1998-01-15
申请号：PCT/JP1997002373
申请日：1997-07-09
申请人： NIPPON ZEON CO., LTD. , KAWATA, Shoji , HIGASHI, Hirokazu , NAKAMURA, Masahiro
发明人： NIPPON ZEON CO., LTD.
IPC分类号： G03F07/022
CPC分类号： G03F7/022
摘要： A positive resist composition comprising: (A) an alkali-soluble phenolic resin and (B) a photosensitive agent consisting of an ester of quinonediazidesulfonic acid with a phenol, characterized in that the component (B) contains an ester (B1) of 1,2-naphthoquinonediazide-6-sulfonic acid with a phenol wherein 10 to 70 % of the phenolic hydroxyl groups of the phenol are esterified with a photosensitive group of formula (1) resulting from 1,2-naphthoquinonediazide-6-sulfonic acid.
摘要翻译：一种正型抗蚀剂组合物，其包含：（A）碱溶性酚醛树脂和（B）由醌二叠氮磺酸与苯酚的酯组成的感光剂，其特征在于组分（B）含有1， 2-萘醌二叠氮化物-6-磺酸与酚，其中苯酚的10〜70％的酚羟基被由1,2-萘醌二叠氮化物-6-磺酸得到的式（1）的感光基团酯化。

4. 发明公开

EP0831370A4 POSITIVE RESIST COMPOSITION 失效
标题翻译： POSITIV ARBEITENDE PHOTOLACKZUSAMMENSETZUNG
公开(公告)号：EP0831370A4
公开(公告)日：1999-08-18
申请号：EP96900700
申请日：1996-01-17
申请人： NIPPON ZEON CO , KAWATA SHOJI , HAYASHI HIROSHI , HIGASHI HIROKAZU , KATO TAKEYOSHI , NAKAMURA MASAHIRO
发明人： KAWATA SHOJI , HAYASHI HIROSHI , HIGASHI HIRIKAZU , KATO TAKEYOSHI , NAKAMURA MASAHIRO
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/0233
摘要： A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R and R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R to R represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R to R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R to R represents hydroxy and m is a positive integer.
摘要翻译：正性抗蚀剂组合物的灵敏度，显影后的薄膜损耗，分辨率，耐热流动性，保存稳定性，曝光余量和聚焦余量优异，并且包括（A）碱溶性酚醛树脂，（B）醌二叠氮化物类光敏剂和（C）酚类化合物，其中所述酚类化合物（C）为选自具有由下式（I）表示的结构单元的酚类化合物（CX）和酚类化合物（C）的至少一种酚类化合物 CD）具有由下式（II）表示的结构单元：其中R 1至R 3彼此独立地为氢原子，羟基，卤素原子，烷基可以被取代的，可被取代的环烷基，可被取代的烯基，可被取代的烷氧基或可被取代的芳基，R 4至R 11独立地是彼此啊可以被取代的烷基，可被取代的环烷基，可被取代的烯基，可被取代的芳基或可被取代的烷氧基，n是正整数 ; 和，其中R 12至R 15彼此独立地为氢原子，羟基，卤素原子，可被取代的烷基，可被取代的环烷基，可被取代的烯基，可被取代的烷氧基或可被取代的芳基，条件是R 12至R 15中的至少一个为羟基，m为正整数。

5. 发明公开

EP0831370A1 POSITIVE RESIST COMPOSITION 失效
标题翻译：正工作PHOTO涂料组合物
公开(公告)号：EP0831370A1
公开(公告)日：1998-03-25
申请号：EP96900700.4
申请日：1996-01-17
申请人： NIPPON ZEON CO., LTD. , Kawata, Shoji , Hayashi, Hiroshi , Higashi, Hirokazu , Kato, Takeyoshi , Nakamura, Masahiro
发明人： KAWATA, Shoji , HAYASHI, Hiroshi , HIGASHI, Hirikazu , KATO, Takeyoshi , NAKAMURA, Masahiro
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/0233
摘要： A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II):
wherein R 1 to R 3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R 4 to R 11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and
wherein R 12 to R 15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R 12 to R 15 is a hydroxyl group, and m is a positive integer.

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