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1. 发明授权

US5641264A Substrate conveying device and method of controlling the same 失效
标题翻译：基板输送装置及其控制方法
公开(公告)号：US5641264A
公开(公告)日：1997-06-24
申请号：US996870
申请日：1992-12-21
申请人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
发明人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
IPC分类号： G03F7/20 , H01L21/687 , B65G65/00
CPC分类号： G03F7/70741 , H01L21/68707 , Y10S294/907
摘要： A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.
摘要翻译：一种控制输送装置的方法，所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构，其中检测到通过被输送物品施加到抓握手的按压力，并且输送操作当按压力超过预定力时，输送机构停止。

2. 发明授权

US5226523A Conveying apparatus and method of controlling the same 失效
标题翻译：输送装置及其控制方法
公开(公告)号：US5226523A
公开(公告)日：1993-07-13
申请号：US963517
申请日：1992-10-20
申请人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
发明人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
IPC分类号： G03F7/20 , G05B19/23
CPC分类号： G03F7/70741 , G03F7/7075 , G05B19/231
摘要： A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.
摘要翻译：传送装置包括沿着传送方向设置的多个位置限制装置，以及选择装置，可操作以在开始传送之前选择在目标位置有效的多个位置限制装置中的一个或那些位置限制装置。选择装置还可操作以在开始运送之后再次选择多个位置限制装置中的一个或那些位置限制装置中的一个或那些位置限制装置，其在待传送物品的当前位置有效。

3. 发明授权

US5356686A X-ray mask structure 失效
标题翻译： X光掩模结构
公开(公告)号：US5356686A
公开(公告)日：1994-10-18
申请号：US182513
申请日：1994-01-14
申请人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
发明人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
IPC分类号： G03F1/22 , G03F1/60 , G03F7/20 , H01L21/027 , H01L21/30 , G03F9/00 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70866 , Y10T428/21 , Y10T428/24612 , Y10T428/24851
摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.
摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。

4. 发明授权

US5157700A Exposure apparatus for controlling intensity of exposure radiation 失效
标题翻译：用于控制接触辐射强度的曝光装置
公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

5. 发明授权

US5577552A Temperature controlling device for mask and wafer holders 失效
标题翻译：面罩和晶圆座的温度控制装置
公开(公告)号：US5577552A
公开(公告)日：1996-11-26
申请号：US412101
申请日：1995-03-28
申请人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
IPC分类号： G03F7/20 , G05D23/19 , H05K7/20 , F28D15/00
CPC分类号： H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译：可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如，掩模台，晶片台等。该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。因此，能够以简单的结构有效地控制多个控制对象的温度。

6. 发明授权

US5182615A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5182615A
公开(公告)日：1993-01-26
申请号：US563420
申请日：1990-08-07
申请人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
发明人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F9/7049
摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

7. 发明授权

US5172402A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5172402A
公开(公告)日：1992-12-15
申请号：US666649
申请日：1991-03-08
申请人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
发明人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70008 , G03F7/702
摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

8. 发明授权

US5524131A Alignment apparatus and SOR x-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR x射线曝光装置
公开(公告)号：US5524131A
公开(公告)日：1996-06-04
申请号：US441641
申请日：1995-05-15
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.
摘要翻译：一种制造SOR X射线曝光装置的半导体器件，其中在掩模和半导体晶片对准之后，使用SOR X射线将掩模上的半导体器件图案转印到半导体晶片上的抗蚀剂上。该装置包括反射镜单元和曝光单元，用于将晶片通过掩模曝光到来自反射镜单元的X射线。镜单元包括用于沿所需方向分散X射线的X射线镜，用于在X射线反射镜周围提供期望的真空环境的第一腔室和用于供给X射线镜的第一支撑装置。曝光单元包括用于控制曝光的快门，用于保持掩模的掩模台，用于保持晶片的晶片台，用于在掩模台和晶片台周围提供期望的He环境的第二室，用于安装的框架结构掩模台和晶片台以及用于支撑框架结构的第二支撑装置。由此，可以制造更高度集成的半导体器件。

9. 发明授权

US5160961A Substrate holding device 失效
标题翻译：基板保持装置
公开(公告)号：US5160961A
公开(公告)日：1992-11-03
申请号：US672636
申请日：1991-03-20
申请人： Mitsuji Marumo , Kazunori Iwamoto , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
发明人： Mitsuji Marumo , Kazunori Iwamoto , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
IPC分类号： H01L21/673 , G03F7/20 , H01L21/027 , H01L21/677 , H01L21/683 , H01L21/687
CPC分类号： G03F7/7075 , H01L21/67766 , H01L21/67778 , H01L21/6838 , H01L21/68707
摘要： A device for holding a substrate includes a holding system for holding a substrate by attraction and a guard system for preventing dropping of the substrate held by the holding system, the guard system being out of contact with the substrate as the same is held by the holding system.

10. 发明授权

US5498501A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5498501A
公开(公告)日：1996-03-12
申请号：US416503
申请日：1995-04-04
申请人： Isamu Shimoda , Takao Kariya , Nobutoshi Mizusawa , Kunitaka Ozawa , Shunichi Uzawa
发明人： Isamu Shimoda , Takao Kariya , Nobutoshi Mizusawa , Kunitaka Ozawa , Shunichi Uzawa
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/2022 , G03F7/7045 , Y10S438/949
摘要： A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.
摘要翻译：一种半导体器件的制造方法，包括用具有第一曝光范围的第一曝光装置曝光半导体衬底的不同部分; 将半导体衬底相对于第二曝光装置的第二曝光范围放置和对准，该范围大于第一曝光装置的第一曝光范围; 检测由第二曝光装置的第二曝光范围所覆盖的半导体衬底的每个部分的对准误差; 基于检测到的对准误差，计算半导体衬底的这些部分相对于第二曝光装置的整个第二曝光范围的总体对准误差; 并根据计算的整体对准误差来控制第二曝光装置的曝光操作。

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