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    • 5. 发明授权
    • X-ray mask and fabrication process using it
    • X射线掩模和使用它的制作工艺
    • US5870448A
    • 1999-02-09
    • US855473
    • 1997-05-13
    • Hiroshi MaeharaKeiko Chiba
    • Hiroshi MaeharaKeiko Chiba
    • G03F1/22G21K1/10H01L21/027G21K5/00
    • G03F1/22G21K1/10
    • The present X-ray mask comprises an X-ray transmitting film, and a mask pattern formed on the X-ray transmitting film, wherein the mask pattern includes a mixture of a high-contrast pattern and a low-contrast pattern against X-rays and wherein the high-contrast pattern is comprised of stacked films the number of which is larger than that of the low-contrast pattern and which are made of different kinds of materials. A fabrication process of this X-ray mask comprises a step of forming a first metal film; a step of forming a second metal film of a different kind of material from the first metal film, thereon; and a step of successively performing a resist application process and an etching process to form a portion where the both first and second metal films are removed, a portion where only the first metal layer is left, and a portion where the both first and second metal layers are left, thereby forming a mask pattern.
    • 本X射线掩模包括X射线透射膜和形成在X射线透射膜上的掩模图案,其中掩模图案包括针对X射线的高对比度图案和低对比度图案的混合物 并且其中所述高对比度图案包括数量大于所述低对比度图案并且由不同种类的材料制成的堆叠薄膜。 该X射线掩模的制造工艺包括形成第一金属膜的步骤; 在其上形成与第一金属膜不同种类的材料的第二金属膜的步骤; 以及连续进行抗蚀剂涂布处理和蚀刻工序以形成去除了第一和第二金属膜两者的部分,仅剩下第一金属层的部分,以及第一和第二金属 留下层,从而形成掩模图案。