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1. 发明授权

US06534851B1 Modular semiconductor substrates 有权
标题翻译：模块化半导体衬底
公开(公告)号：US06534851B1
公开(公告)日：2003-03-18
申请号：US09642376
申请日：2000-08-21
申请人： Michael Antonell , Erik Cho Houge , Nitin Patel , Larry E. Plew , Catherine Vartuli
发明人： Michael Antonell , Erik Cho Houge , Nitin Patel , Larry E. Plew , Catherine Vartuli
IPC分类号： H01L2306
CPC分类号： H01L21/67346 , H01L22/20 , H01L22/34
摘要： A modular substrate-based processing scheme for producing semiconductor devices provides multiple modular processing units which may be arranged together to form any of various cohesive processing units or they may be individually or sequentially processed through standard semiconductor processing equipment. The cohesive processing units are processed unitarily providing for multiple modular processing units to be processed simultaneously. The modular processing units may be formed of a thick semiconductor substrate or a semiconductor substrate mounted on a further substrate such as a ceramic material. The modular processing units may each contain ribs, grooves, posts or other features to aid in handling and placement of the individual units.
摘要翻译：用于制造半导体器件的基于模块化基板的处理方案提供多个模块化处理单元，其可以被布置在一起以形成各种内聚处理单元中的任何一个，或者可以通过标准半导体处理设备单独或顺序地处理。整体处理单元被一体处理，提供要同时处理的多个模块化处理单元。模块化处理单元可以由安装在诸如陶瓷材料的另外的基板上的厚半导体衬底或半导体衬底形成。模块化处理单元可以各自包含肋，槽，柱或其他特征以帮助处理和放置各个单元。

2. 发明授权

US06713409B2 Semiconductor manufacturing using modular substrates 有权
标题翻译：使用模块化基板的半导体制造
公开(公告)号：US06713409B2
公开(公告)日：2004-03-30
申请号：US10303280
申请日：2002-11-25
申请人： Michael Antonell , Erik Cho Houge , Nitin Patel , Larry E. Plew , Catherine Vartuli
发明人： Michael Antonell , Erik Cho Houge , Nitin Patel , Larry E. Plew , Catherine Vartuli
IPC分类号： H01L2100
CPC分类号： H01L21/67346 , H01L22/20 , H01L22/34
摘要： A manufacturing method using a modular substrate-based processing scheme for producing semiconductor devices, provides multiple modular processing units which may be arranged together to form any of various cohesive processing units or individually or sequentially processed through standard semiconductor processing equipment. The cohesive processing units are processed unitarily providing for multiple modular processing units to be processed simultaneously. The modular processing units may be formed of a thick semiconductor substrate or a semiconductor substrate mounted on a further substrate such as a ceramic material. The modular processing units may each contain ribs, grooves, posts or other features to aid in handling and placement of the individual units.
摘要翻译：使用基于模块化的基于基板的处理方法来制造半导体器件的制造方法提供了多个模块化处理单元，其可以被布置在一起以形成任何各种内聚处理单元，或者通过标准半导体处理设备单独地或顺序地处理。整体处理单元被一体处理，提供要同时处理的多个模块化处理单元。模块化处理单元可以由安装在诸如陶瓷材料的另外的基板上的厚半导体衬底或半导体衬底形成。模块化处理单元可以各自包含肋，槽，柱或其他特征以帮助处理和放置各个单元。

3. 发明授权

US06695572B2 Method and apparatus for minimizing semiconductor wafer contamination 有权
标题翻译：用于最小化半导体晶片污染的方法和设备
公开(公告)号：US06695572B2
公开(公告)日：2004-02-24
申请号：US09966156
申请日：2001-09-28
申请人： Michael Antonell , Erik Cho Houge , Larry E. Plew , Catherine Vartuli , Jennifer Juszczak
发明人： Michael Antonell , Erik Cho Houge , Larry E. Plew , Catherine Vartuli , Jennifer Juszczak
IPC分类号： B65G4907
CPC分类号： H01L21/6732
摘要： A method and apparatus for minimizing the surface contamination of semiconductor wafers (11) during the semiconductor device manufacturing process. Semiconductor wafers (11) are stored in a storage cassette (12) with their face sides (17) facing downward and their back sides (16) facing upward. Particulate contamination present on the back sides of the wafers is thereby secured to the wafers by the force of gravity, and the faces of the wafers are shielded from falling debris. An automated wafer handling device (19) is provided with a rotary joint (22) to accomplish the wafer flipping motion before inserting a wafer into a cassette and after removing the wafer from the cassette.
摘要翻译：一种在半导体器件制造过程中最小化半导体晶片（11）的表面污染的方法和装置。半导体晶片（11）被储存在存储盒（12）中，其表面（17）面向下并且它们的背面（16）面向上。因此，通过重力将晶片的背面存在的颗粒污染物固定在晶片上，并且晶片的表面被遮蔽而不会掉落。自动晶片处理装置（19）设置有旋转接头（22），以在将晶片插入盒内并在从盒中取出晶片之后实现晶片翻转运动。

4. 发明授权

US06606371B2 X-ray system 有权
标题翻译： X光系统
公开(公告)号：US06606371B2
公开(公告)日：2003-08-12
申请号：US09745236
申请日：2000-12-19
申请人： Michael Antonell , Erik Cho Houge , John Martin McIntosh , Larry E. Plew , Catherine Vartuli
发明人： Michael Antonell , Erik Cho Houge , John Martin McIntosh , Larry E. Plew , Catherine Vartuli
IPC分类号： G21K106
CPC分类号： G21K1/06 , G21K2201/062 , G21K2201/064 , G21K2201/067
摘要： A reflective lens with at least one curved surface formed of polycrystalline material. In one embodiment, a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source. A system is also provided for performing an operation with x-rays. In one embodiment, a system includes a source for generating the x-rays, a polycrystalline surface region having crystal spacing suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, and transmitting the reflected x-rays to a reference position. An associated method includes providing x-rays to polycrystalline surface region having crystal spacings suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, transmitting the reflected x-rays to a reference position and positioning a sample between the surface region and the reference position so that the x-rays are transmitted through the sample.
摘要翻译：具有由多晶材料形成的至少一个曲面的反射透镜。在一个实施例中，透镜结构包括具有预定曲率的表面的基底和沿着基底的表面形成的膜，多个单独的构件各自具有相对于邻近构件的基底表面的部分的至少一个相似的取向，使得共同地，这些构件为从公共源产生的x射线的衍射提供可预测的角度。还提供了一种用于使用X射线进行操作的系统。在一个实施例中，系统包括用于产生x射线的源，具有适合于沿着该区域以相同的布拉格角反射多个x射线的晶体间距的多晶表面区域，以及将反射的x射线透射到参考位置。相关联的方法包括向具有晶体间距的多晶表面区域提供x射线，该晶体间距适于沿着该区域以相同的布拉格角反射多个x射线，将反射的x射线透射到参考位置，并将样品定位在表面区域和参考位置，使得x射线透射通过样品。

5. 发明授权

US06750447B2 Calibration standard for high resolution electron microscopy 失效
标题翻译：高分辨率电子显微镜的校准标准
公开(公告)号：US06750447B2
公开(公告)日：2004-06-15
申请号：US10122645
申请日：2002-04-12
申请人： Erik Cho Houge , Catherine Vartuli , John Martin McIntosh , Fred Anthony Stevie
发明人： Erik Cho Houge , Catherine Vartuli , John Martin McIntosh , Fred Anthony Stevie
IPC分类号： G12B1300
CPC分类号： G01N23/04 , G01N2001/2893 , H01J37/265 , H01J2237/2826
摘要： A method and apparatus used to calibrate high-resolution electron microscopes where a single standard provides multiple samples, each having a different atomic structure, permits rapid accurate calibration of the entire range of magnifications. The different atomic structure dimensions possess known reference measurement data. The S/TEM is adjusted to focus onto the crystal lattice structure of each sample in a selected sequence. Measurements of these lattice spacings are compared to known dimensions. If S/TEM measurements do not agree with the lattice spacing dimensions, the S/TEM magnification is adjusted to reflect known dimensions. Typical standard exchange and associated processing steps are eliminated by the use of the single standard comprising of a plurality of samples.
摘要翻译：用于校准高分辨率电子显微镜的方法和装置，其中单个标准提供多个样品，每个样品具有不同的原子结构，允许快速精确校准整个放大倍数。不同的原子结构尺寸具有已知的参考测量数据。调整S / TEM以选择的顺序聚焦到每个样品的晶格结构上。将这些晶格间距的测量与已知尺寸进行比较。如果S / TEM测量与晶格间距尺寸不一致，则调整S / TEM放大倍率以反映已知尺寸。通过使用包含多个样品的单一标准来消除典型的标准交换和相关处理步骤。

6. 发明授权

US06569690B1 Monitoring system for determining progress in a fabrication activity 有权
标题翻译：用于确定制造活动进展的监测系统
公开(公告)号：US06569690B1
公开(公告)日：2003-05-27
申请号：US09653364
申请日：2000-08-31
申请人： Erik Cho Houge , Isik C. Kizilyalli , John Martin McIntosh , Fred Anthony Stevie , Catherine Vartuli
发明人： Erik Cho Houge , Isik C. Kizilyalli , John Martin McIntosh , Fred Anthony Stevie , Catherine Vartuli
IPC分类号： H01L2100
CPC分类号： B24B37/013 , B24B37/042 , B24B49/04
摘要： Method for fabricating a structure. According to an exemplary embodiment, a structure is made by forming a layer of removable material with a first surface spaced a part from a second surface. The first surface is formed along a first region from which the material is removable. The first surface is altered by removal of material from the layer. Removed material from the first surface is monitored to detect fluctuations in a variable of composition in the layer, and removal of material from the first surface is terminated when the composition of monitored material meets a predetermined criterion. In an alternate embodiment a variable characteristic is imparted to a layer of material as a function of layer thickness and an operation is performed on the layer resulting in removal of material. Samples of removed material are monitored for variation in the characteristic and the operation is modified when a variation conforms with a criterion.
摘要翻译：制造结构的方法。根据示例性实施例，通过形成具有与第二表面间隔一部分的第一表面的可移除材料层来制造结构。第一表面沿着第一区域形成，材料可从该第一区域移除。通过从层中去除材料来改变第一表面。监测来自第一表面的去除材料以检测该层中组成变量的波动，并且当所监测材料的组成符合预定标准时，从第一表面去除材料终止。在替代实施例中，可变特性被赋予作为层厚度的函数的材料层，并且在层上进行操作，导致材料的去除。监测去除材料的样品的特性变化，并且当变化符合标准时修改操作。

7. 发明授权

US06633032B2 Mass spectrometer particle counter 有权
标题翻译：质谱仪粒子计数器
公开(公告)号：US06633032B2
公开(公告)日：2003-10-14
申请号：US09727014
申请日：2000-11-30
申请人： Erik Cho Houge , John Martin McIntosh , Fred Anthony Stevie , Steven Barry Valle , Catherine Vartuli
发明人： Erik Cho Houge , John Martin McIntosh , Fred Anthony Stevie , Steven Barry Valle , Catherine Vartuli
IPC分类号： B01D5944
CPC分类号： H01J49/04
摘要： The present invention relates to a device for testing particles for composition and concentration. The device includes a particle counter, a collector screen, and a mass spectrometer. In one embodiment, the collector screen is positioned to receive particles received by the particle counter, and the mass spectrometer is positioned to receive counted particles retained on the collector screen.
摘要翻译：本发明涉及用于测试用于组成和浓缩的颗粒的装置。该装置包括颗粒计数器，收集器屏幕和质谱仪。在一个实施例中，收集器屏幕定位成接收由颗粒计数器接收的颗粒，并且质谱仪被定位成接收保留在收集器屏幕上的计数颗粒。

8. 发明授权

US06708574B2 Abnormal photoresist line/space profile detection through signal processing of metrology waveform 有权
标题翻译：通过信号处理计量波形的异常光刻胶线/空间轮廓检测
公开(公告)号：US06708574B2
公开(公告)日：2004-03-23
申请号：US10156242
申请日：2002-05-24
申请人： Erik Cho Houge , Scott Jessen , John Martin McIntosh , Catherine Vartuli , Fred Anthony Stevie
发明人： Erik Cho Houge , Scott Jessen , John Martin McIntosh , Catherine Vartuli , Fred Anthony Stevie
IPC分类号： G01M1900
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor manufacturing automation method for analyzing a patterned feature formed on a semiconductor layer is disclosed. At least one patterned feature is scanned to generate an amplitude modulated waveform signal of the line and neighboring space characteristics. Signal processing is automatically performed on this waveform by an in-line computational source to extract known patterned features based on the profile of the amplitude modulated waveform signal. The extracted waveform segments are subjected to known geometric shapes to determine if the waveform indicates a normal or abnormal patterned feature on a semiconductor layer.
摘要翻译：公开了一种用于分析形成在半导体层上的图案特征的半导体制造自动化方法。扫描至少一个图案化特征以产生线和相邻空间特征的幅度调制波形信号。通过在线计算源自动对该波形执行信号处理，以基于幅度调制波形信号的轮廓来提取已知的图案特征。提取的波形段经历已知的几何形状以确定波形是否指示半导体层上的正常或异常图案化特征。

9. 发明授权

US06577970B2 Method of determining a crystallographic quality of a material located on a substrate 有权
公开(公告)号：US06577970B2
公开(公告)日：2003-06-10
申请号：US09801455
申请日：2001-03-08
申请人： Erik C. Houge , John M. McIntosh , Larry E. Plew , Fred A. Stevie , Catherine Vartuli
发明人： Erik C. Houge , John M. McIntosh , Larry E. Plew , Fred A. Stevie , Catherine Vartuli
IPC分类号： G01N3700
CPC分类号： G01N23/225
摘要： The present invention provides a method of determining a crystallographic quality of a material located on a substrate. The method includes determining a set of crystallographic solutions for an unknown crystallographic orientation, and subsequently comparing the set of crystallographic solutions to adjacent known crystallographic orientations to determine the unknown crystallographic orientation. In a preferred embodiment, the set of crystallographic solutions may be a rank of crystallographic solutions which may represent the most probable crystallographic orientations. The rank of crystallographic solutions, in an alternative embodiment, may be represented by a vote, a fit and a confidence index.

10. 发明授权

US06603119B1 Calibration method for quantitative elemental analysis 有权
标题翻译：定量元素分析校正方法
公开(公告)号：US06603119B1
公开(公告)日：2003-08-05
申请号：US09567675
申请日：2000-05-09
申请人： Lucille A. Giannuzzi , Frederick A. Stevie , Catherine Vartuli
发明人： Lucille A. Giannuzzi , Frederick A. Stevie , Catherine Vartuli
IPC分类号： H01J4926
CPC分类号： G01N23/2255
摘要： The present invention provides a method of calibrating an analytical tool. The method, in a illustrative embodiment, includes preparing a calibration standard having a known concentration of an element and obtaining a portion of the calibration standard with a focused beam, wherein the calibration standard is representative of the concentration. The portion of the calibration standard is then used to calibrate an analytical tool.
摘要翻译：本发明提供一种校准分析工具的方法。在说明性实施例中，该方法包括制备具有已知浓度的元件并且用聚焦光束获得校准标准的一部分的校准标准，其中校准标准代表浓度。然后将校准标准品的一部分用于校准分析工具。

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