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1. 发明授权

US08192059B2 Illuminant device and lamp clip 失效
标题翻译：照明装置和灯夹
公开(公告)号：US08192059B2
公开(公告)日：2012-06-05
申请号：US12307685
申请日：2007-07-06
申请人： Masashi Yokota , Tsutomu Tsuji , Takaharu Kikuchi , Masaki Okazaki , Hirotomo Onozaki , Kouichi Fujiwara
发明人： Masashi Yokota , Tsutomu Tsuji , Takaharu Kikuchi , Masaki Okazaki , Hirotomo Onozaki , Kouichi Fujiwara
IPC分类号： F21V21/00
CPC分类号： F21V19/02 , F21S9/04 , F21V19/008 , F21Y2103/00 , G02F1/133604 , G02F1/133608
摘要： Indexes indicative of the locations of lamp clips are formed on a chassis where lamps are juxtaposed with different juxtaposition pitches. The lamp clips comprise: plate-like bases; holding portions, which are provided at one face of the bases, for holding the lamps; and markers corresponding to the indexes.
摘要翻译：指示灯夹的位置的索引形成在底座上，其中灯与不同的并置间距并置。灯夹包括：板状基座; 保持部，设置在基座的一个面上，用于保持灯; 和与索引相对应的标记。

2. 发明申请

US20090323307A1 ILLUMINANT DEVICE AND LAMP CLIP 失效
标题翻译：照明装置和灯夹
公开(公告)号：US20090323307A1
公开(公告)日：2009-12-31
申请号：US12307685
申请日：2007-07-06
申请人： Masashi Yokota , Tsutomu Tsuji , Takaharu Kikuchi , Masaki Okazaki , Hirotomo Onozaki , Kouichi Fujiwara
发明人： Masashi Yokota , Tsutomu Tsuji , Takaharu Kikuchi , Masaki Okazaki , Hirotomo Onozaki , Kouichi Fujiwara
IPC分类号： G02F1/13357 , F21V21/00 , F21V21/08
CPC分类号： F21V19/02 , F21S9/04 , F21V19/008 , F21Y2103/00 , G02F1/133604 , G02F1/133608
摘要： Indexes indicative of the locations of lamp clips are formed on a chassis where lamps are juxtaposed with different juxtaposition pitches. The lamp clips comprise: plate-like bases; holding portions, which are provided at one face of the bases, for holding the lamps; and markers corresponding to the indexes.
摘要翻译：指示灯夹的位置的索引形成在底座上，其中灯与不同的并置间距并置。灯夹包括：板状基座; 保持部，设置在基座的一个面上，用于保持灯; 和与索引相对应的标记。

3. 发明授权

US07452655B2 Acrylic copolymer and radiation-sensitive resin composition 有权
标题翻译：丙烯酸共聚物和辐射敏感树脂组合物
公开(公告)号：US07452655B2
公开(公告)日：2008-11-18
申请号：US10533254
申请日：2003-11-04
申请人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
发明人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译：具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异，优秀的形成接触孔和线和空格。

4. 发明申请

US20070269754A1 Acrylic Polymer and Radiation-Sensitive Resin Composition 有权
标题翻译：丙烯酸聚合物和辐射敏感性树脂组合物
公开(公告)号：US20070269754A1
公开(公告)日：2007-11-22
申请号：US10567117
申请日：2004-08-04
申请人： Kouichi Fujiwara , Hiroshi Yamaguchi , Atsushi Nakamura
发明人： Kouichi Fujiwara , Hiroshi Yamaguchi , Atsushi Nakamura
IPC分类号： C08G61/02 , G03C5/00
CPC分类号： C08F220/30 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R′, R″ and R′″ are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.
摘要翻译：提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂，并且可以形成线边缘粗糙度减小的显影图案。一种丙烯酸类聚合物，其特征在于包含通式（1）的单元，通式（2）的单元和通式（3）的单元和/或通式（4）的单元，其中R，R'，R' '和R“'分别是氢，甲基或三氟甲基; R 1是氢，C 1-4 - 直链或支链烷基，烷氧基或C 1-4 - 直链或支链氟代烷基; X是由碳原子和氢原子组成的C 7-20多环脂族烃基; R 2和R 3各自独立地为C 1-4 - 直链或支链烷基; R 4是C 4-20脂肪族烃基; R 5是C 1-4烷基直链或支链烷基; 和R 6和R 7各自为氢或C 1-4 - 直链或支链烷基。

5. 发明申请

US20060074139A1 Acrylic copolymer and radiation-sensitive resin composition 有权
标题翻译：丙烯酸共聚物和辐射敏感树脂组合物
公开(公告)号：US20060074139A1
公开(公告)日：2006-04-06
申请号：US10533254
申请日：2003-11-04
申请人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
发明人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
IPC分类号： C08J3/28
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译：具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异，优秀的形成接触孔和线和空格。

6. 发明申请

US20110111349A1 RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME 有权
标题翻译：用于制造耐腐蚀图案的树脂组合物，以及使用它们形成耐力图案的方法
公开(公告)号：US20110111349A1
公开(公告)日：2011-05-12
申请号：US13004898
申请日：2011-01-12
申请人： Gouji WAKAMATSU , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
发明人： Gouji WAKAMATSU , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
IPC分类号： G03F7/20 , C08L37/00
CPC分类号： G03F7/40 , G03F7/0035 , G03F7/0046 , G03F7/0397 , G03F7/2024 , H01L21/0273
摘要： A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要翻译：抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种：下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

7. 发明授权

US08877429B2 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same 有权
标题翻译：用于制造抗蚀剂图案的树脂组合物不溶性，以及通过使用它们形成抗蚀剂图案的方法
公开(公告)号：US08877429B2
公开(公告)日：2014-11-04
申请号：US13004898
申请日：2011-01-12
申请人： Gouji Wakamatsu , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
发明人： Gouji Wakamatsu , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
IPC分类号： G03F7/095 , G03F7/26 , G03F7/004 , G03F7/00 , H01L21/027 , G03F7/039
CPC分类号： G03F7/40 , G03F7/0035 , G03F7/0046 , G03F7/0397 , G03F7/2024 , H01L21/0273
摘要： A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要翻译：抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种：下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

8. 发明申请

US20130068945A1 METHOD FOR DETERMINING STAGE OF CHRONIC KIDNEY DISEASE, DEVICE THEREFOR AND METHOD FOR OPERATING THE SAME 有权
标题翻译：用于确定慢性假性疾病病症的方法，其装置及其操作方法
公开(公告)号：US20130068945A1
公开(公告)日：2013-03-21
申请号：US13700795
申请日：2011-05-30
申请人： Noriaki Tanaka , Masahiro Kohno , Emiko Sato , Kouichi Fujiwara
发明人： Noriaki Tanaka , Masahiro Kohno , Emiko Sato , Kouichi Fujiwara
IPC分类号： A61B5/00
CPC分类号： H01J49/0431 , A61B5/0059 , G01N30/34 , G01N30/7233 , G01N33/6893 , G01N2030/045 , G01N2030/8813 , G01N2800/347
摘要： This invention provides a method or device for determining the stage of chronic kidney disease.The present invention relates to a method for determining a stage of chronic kidney disease in a subject suffering from kidney disease, the method comprising the steps of: (A-1) measuring the content of at least one marker selected from the group consisting of markers (1) to (16) in a specimen from the subject, (B-1) determining the stage indicated by each marker by comparing the content of the at least one marker in the specimen from the subject, which has been measured in step (A-1), with a reference content range determined in each stage, and (C-1) determining that when each marker indicates the same stage, which has been determined in step (A-1), the chronic kidney disease in the subject is in that stage.
摘要翻译：本发明提供了一种用于确定慢性肾脏疾病阶段的方法或装置。本发明涉及一种用于确定患有肾脏疾病的受试者的慢性肾脏疾病阶段的方法，所述方法包括以下步骤：（A-1）测量选自标记物中的至少一种标志物的含量（B-1）通过比较在步骤（1）中测量的来自受试者的标本中的至少一个标记物的含量来确定每个标记物指示的阶段（B-1） A-1），每个阶段确定参考含量范围，和（C-1）确定当每个标记指示在步骤（A-1）中确定的相同阶段时，受试者中的慢性肾脏疾病在那个阶段

9. 发明授权

US08240863B2 Illuminant device 有权
标题翻译：照明装置
公开(公告)号：US08240863B2
公开(公告)日：2012-08-14
申请号：US12664152
申请日：2008-05-29
申请人： Hideto Takeuchi , Kouichi Fujiwara , Akira Toyama
发明人： Hideto Takeuchi , Kouichi Fujiwara , Akira Toyama
IPC分类号： G09F13/04 , G09F13/08
CPC分类号： G02F1/133608 , G02F1/133308 , G02F2001/133311 , G02F2001/133314 , G02F2001/133328 , G02F2201/503
摘要： In a chassis which has a lid plate closing an opening portion of a frame part and in which a plurality of lamps are juxtaposed, the lid plate includes a plurality of plate bodies juxtaposed with their end parts superposed on each other and a connecting unit connects the superposed end parts of the plate bodies and the superposed end parts of the plate bodies, respectively.
摘要翻译：在具有闭合框架部分的开口部分并且多个灯并置的盖板的底盘中，盖板包括与它们的彼此重叠的端部并置的多个板体，并且连接单元将板体的叠置端部和板体的叠置端部分别。

10. 发明授权

US07704669B2 Acrylic polymer and radiation-sensitive resin composition 有权
标题翻译：丙烯酸聚合物和辐射敏感树脂组合物
公开(公告)号：US07704669B2
公开(公告)日：2010-04-27
申请号：US10567117
申请日：2004-08-04
申请人： Kouichi Fujiwara , Hiroshi Yamaguchi , Atsushi Nakamura
发明人： Kouichi Fujiwara , Hiroshi Yamaguchi , Atsushi Nakamura
IPC分类号： G03F7/004 , C08F220/18 , C08F224/00
CPC分类号： C08F220/30 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R′, R″ and R′″ are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.
摘要翻译：提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂，并且可以形成线边缘粗糙度减小的显影图案。一种丙烯酸类聚合物，其特征在于包含通式（1）的单元，通式（2）的单元和通式（3）的单元和/或通式（4）的单元，其中R，R'，R“ 和R'“各自为氢，甲基或三氟甲基; R1是氢，C1-4直链或支链烷基，烷氧基或C1-4直链或支链氟代烷基; X是由碳原子和氢原子组成的C7-20多环脂族烃基; R2和R3各自独立地为C1-4直链或支链烷基; R4是C4-20脂环族烃基; R5是C1-4直链或支链烷基; 并且R 6和R 7各自为氢或C 1-4直链或支链烷基。

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