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    • 2. 发明授权
    • Optical image processor
    • 光学图像处理器
    • US5220445A
    • 1993-06-15
    • US943374
    • 1992-09-10
    • Hiromitsu TakenakaNozomu OhkouchiMasanobu ShigetaShigeo ShimizuToshio Konno
    • Hiromitsu TakenakaNozomu OhkouchiMasanobu ShigetaShigeo ShimizuToshio Konno
    • G02F1/135
    • G02F1/1354G02F2202/103
    • There is provided an optical image processor for forming a charge image according to a first optical image by photoelectric effect when illuminated with an electro-magnetic radiation beam for writing carrying the first optical image and forming, in accordance with the charge image, a second optical image correlating with the first optical image by light-modulation when illuminated with an electro-magnetic radiation beam for reading, in the presence of an electric field. The processor comprises a plurality of photoconductive segments two-dimensionally arranged with a space among the photoconductive segments for forming the charge image when illuminated with the electro-magnetic radiation beam for writing and a high resistive member provided in the space for preventing transfer of electric charges of the formed charge image among the photoconductive segments.
    • 提供了一种光学图像处理器,用于当用用于书写的携带第一光学图像的电磁辐射束照射时,通过光电效应根据第一光学图像形成电荷图像,并根据电荷图像形成第二光学 在存在电场的情况下用用于读取的电磁辐射束照射时,通过光调制与第一光学图像相关联的图像。 该处理器包括多个光电导体段,其在用用于书写的电磁辐射束照射时用于形成电荷图像的光电导段之间具有空间,并且设置在该空间中用于防止电荷转移的高电阻部件 的光电导段中形成的电荷图像。
    • 3. 发明授权
    • Spatial light modulator
    • 空间光调制器
    • US5148298A
    • 1992-09-15
    • US672954
    • 1991-03-21
    • Masanobu ShigetaShigeo ShimizuNozomu OhkouchiHiromitsu TakenakaToshio Konno
    • Masanobu ShigetaShigeo ShimizuNozomu OhkouchiHiromitsu TakenakaToshio Konno
    • G02F1/1335G02F1/1343G02F1/135
    • G02F1/13439G02F1/135G02F1/133502
    • A spatial light modulator providing an improved contrast, has a laminated structure of multiple layers including typically a photoconductive layer, an optical modulation layer, and a pair of electrode layers interposing the photoconductive and optical modulation layers. The thickness of at least one of the electrode layers having a predetermined relationship with a wavelength of light incident to the one of the electrode layers for writing or reading-out information into or from the spatial light modulator. The electrode layer may further comprise an electrode member and an intermediate layer disposed between the electrode member and an adjacent layer laminated adjacent to the one of the electrode layers, the electrode member having a first refractive index, the adjacent layer having a second refractive index, and the intermediate layer having a third refractive index determined to be in between the first and second indices, the thickness of the intermediate layer having an another predetermined relationship with the wavelength of the light incident to the one of the electrode layers for writing or reading-out information into or from the spatial light modulator. The intermediate layer may be a single layer-member or multiple layer-members having different refractive indices each other.
    • 提供改善的对比度的空间光调制器具有通常包括光电导层,光调制层和插入光电导和光调制层的一对电极层的多层的叠层结构。 至少一个电极层的厚度与入射到一个电极层的光的波长具有预定的关系,用于向或从空间光调制器写入或读出信息。 电极层还可以包括电极构件和设置在电极构件和邻近电极层之间层叠的相邻层之间的中间层,电极构件具有第一折射率,相邻层具有第二折射率, 并且所述中间层具有确定为在所述第一和第二折射率之间的第三折射率,所述中间层的厚度与入射到用于书写或读取的所述一个电极层的光的波长具有另外的预定关系, 将信息输出到或来自空间光调制器。 中间层可以是具有彼此不同折射率的单层构件或多层构件。
    • 7. 发明授权
    • Apparatus and method of producing alignment layer for liquid crystal display
    • 制作液晶显示器取向层的装置及方法
    • US06771341B2
    • 2004-08-03
    • US10391612
    • 2003-03-20
    • Nozomu OhkouchiMasanobu ShigetaTatsushi NakanishiTakashi MoroboshiTakeshi HosoyaMasami SondaNobuyasu Katayama
    • Nozomu OhkouchiMasanobu ShigetaTatsushi NakanishiTakashi MoroboshiTakeshi HosoyaMasami SondaNobuyasu Katayama
    • G02F11337
    • C23C14/225C23C14/24G02F1/133734Y10T428/1014
    • An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows. The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0≦×≦2.0) by vacuum deposition at an angle in the range from 45° to 60° from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0≦&Dgr;&thgr;≦3° in &Dgr;&thgr;=tan−1)dcos &thgr;/(D+d sin &thgr;)), “d” a distance from the substrate center to the center of a substrate edge, “D” a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3° to 10°.
    • 如下形成用于液晶显示器的取向层,每个液晶显示器具有至少两个液晶密封的基板。 放置在几个基板托盘中的每一个上的基板在第一加载锁定室中被加热。 通过真空沉积,从蒸镀的氧化硅颗粒(SiOx:1.0 <= x <= 2.0)照射两个基板中的至少一个,其角度与从该线上的法线方向成45°至60° 衬底表面以在衬底托盘间歇地或顺序地在层淀积室中移动的同时在其上形成取向层。 衬底托盘在第二加载锁定室中冷却,从而产生各自在其上形成取向层的基板。 沉积室可以被设置在需要0 <= Deltatheta <= 3°in Deltatheta = tan -1]dcosθ/(D + dsinθ)),“d”是从基板中心到中心的距离 基板边缘的距离“D”是从包含氧化物硅的蒸发源的中心到基板中心的距离,以及θ是在法线在基板中心延伸的方向和另一方向之间形成的角度,在该方向上蒸发 氧化硅颗粒从蒸发源沉积在衬底中心。 取向层可以以3°至10°的层沉积的角度形成。
    • 8. 发明授权
    • Apparatus and method of producing alignment layer for liquid crystal display
    • 制作液晶显示器取向层的装置及方法
    • US06563560B2
    • 2003-05-13
    • US10116033
    • 2002-04-05
    • Nozomu OhkouchiMasanobu ShigetaTatsushi NakanishiTakashi MoroboshiTakeshi HosoyaMasami SondaNobuyasu Katayama
    • Nozomu OhkouchiMasanobu ShigetaTatsushi NakanishiTakashi MoroboshiTakeshi HosoyaMasami SondaNobuyasu Katayama
    • G02F113
    • C23C14/225C23C14/24G02F1/133734Y10T428/1014
    • An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows: The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0≦×≦2.0) by vacuum deposition at an angle in the range from 45° to 60° from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0≦&Dgr;&thgr;≦3° in &Dgr;&thgr;=tan−1(d cos &thgr;/(D+d sin &thgr;)), “d” a distance from the substrate center to the center of a substrate edge, “D” a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3° to 10°.
    • 用于液晶显示器的取向层每个具有至少两个密封在其间的液晶的基板形成如下:放置在几个基板托盘中的每一个上的基板在第一加载锁定室中被加热。 通过真空沉积,从蒸镀的氧化硅颗粒(SiOx:1.0 <= x <= 2.0)照射两个基板中的至少一个,其角度与从该线上的法线方向成45°到60° 衬底表面以在衬底托盘间歇地或顺序地在层淀积室中移动的同时在其上形成取向层。 衬底托盘在第二加载锁定室中冷却,从而产生各自在其上形成取向层的基板。 沉积室可以设置在DELTAta = tan-1(dcosθ/(D + dsinθ))中的要求0 <=DELTAθ= 3°,“d”是从基板中心到中心的距离 衬底边缘,从衬底中心到包含氧化硅的蒸发源的中心的距离“D”,以及θ是在法线在衬底中心延伸的方向与另一方向之间形成的角度,其中蒸发的颗粒 氧化硅从蒸发源沉积在衬底中心。 取向层可以以3°至10°的层沉积的角度形成。
    • 10. 发明授权
    • Dielectric mirror of spatial light modulator having silicon layers
containing oxygen and production method
    • 具有含氧硅层的空间光调制器的电介质镜和制造方法
    • US5434689A
    • 1995-07-18
    • US77568
    • 1993-06-15
    • Masanobu ShigetaShigeo Shimizu
    • Masanobu ShigetaShigeo Shimizu
    • G02B5/26G02B5/08G02F1/135G02F1/1335G02B1/10
    • G02B5/0833G02F1/135G02F2001/1352
    • A dielectric mirror of a spatial light modulator having a photoconductive layer on which an image is written by a writing light carrying an image information and a photomodulator layer through which the written image is read out by irradiating a reading light and by reflecting the reading light with the dielectric mirror. The dielectric mirror is constructed by laminating plural kinds of layers respectively having different values of refractive indexes, for instance, Si layers and SiO.sub.2 layers. The resolution of the spatial light modulator degrades when an oxygen content rate in the Si layers becomes below a certain amount, on the contrary, the contrast ratio of the spatial light modulator degrades when the oxygen content rate in the Si layers becomes above a certain amount. The Si layers of the present invention have an oxygen content rate ranging from 10 to 40 atom %, preferably ranging from 15 to 35 atom %.
    • 空间光调制器的电介质镜,其具有光导层,在其上通过携带图像信息的写入光写入图像,光调制器层通过照射读取光并通过反射读取光与读取光来读出写入图像 电介质镜。 电介质镜通过层压分别具有不同折射率值的多种层,例如Si层和SiO 2层来构成。 当Si层中的氧含量率变得低于一定量时,空间光调制器的分辨率降低,相反,当Si层中的氧含量率高于一定量时,空间光调制器的对比度降低 。 本发明的Si层的氧含量范围为10〜40原子%,优选为15〜35原子%。