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1. 发明授权

US5625436A Scanning type exposure apparatus and exposure method 失效
标题翻译：扫描式曝光装置和曝光方法
公开(公告)号：US5625436A
公开(公告)日：1997-04-29
申请号：US689691
申请日：1996-08-13
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
摘要翻译：在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面，提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

2. 再颁专利

USRE37361E1 Scanning type exposure apparatus and exposure method 有权
公开(公告)号：USRE37361E1
公开(公告)日：2001-09-11
申请号：US09300376
申请日：1999-04-27
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyohsi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyohsi Narabe , Hiroshi Chiba
IPC分类号： H01L21027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.

3. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

4. 发明授权

US5579147A Scanning light exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US5579147A
公开(公告)日：1996-11-26
申请号：US354715
申请日：1994-12-06
申请人： Susumu Mori , Tsuyoshi Naraki
发明人： Susumu Mori , Tsuyoshi Naraki
IPC分类号： G03B27/50 , G03F7/20 , H01L21/027 , G02B26/08
CPC分类号： G03F7/7005 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
摘要翻译：扫描曝光装置包括用于将光束照射到掩模的图案区域中的多个子区域的照明光学系统，沿着预定方向布置的多个投影光学系统，用于投影子像素的单位放大率的竖立图像，通过掩模将光束透射到感光基板上的区域，在每个照明光学系统中布置在与感光基板基本共轭的位置处的光阑部件，用于将子区域的投影面积限制在光敏基片上，敏感基板，用于相对于所述投影光学系统和隔膜控制装置基本横向于预定方向同步扫描所述掩模和所述感光基板的扫描装置，用于沿横向于预定的方向改变每个隔膜部件的孔的宽度方向。

5. 发明授权

US06479832B1 Surface height detecting apparatus and exposure apparatus using the same 有权
标题翻译：表面高度检测装置及使用其的曝光装置
公开(公告)号：US06479832B1
公开(公告)日：2002-11-12
申请号：US09267682
申请日：1999-03-15
申请人： Tsuyoshi Naraki , Kazuhiko Hori
发明人： Tsuyoshi Naraki , Kazuhiko Hori
IPC分类号： G01N2186
CPC分类号： G03F9/7026
摘要： An illumination device emits detection light toward the surface of a substrate from an oblique direction with respect to the substrate. The detection light is shaped into a slit beam by an optical shaper. An alteration device changes the width of the slit beam by controlling the optical shaper. The slit beam strikes the surface of the substrate through an optical element. The slit beam reflected from the surface of the substrate is oscillated along the width direction of the slit by a controlled oscillation mirror. A detector detects the surface height of the substrate based on the oscillating slit beam.
摘要翻译：照明装置相对于基板从倾斜方向朝向基板的表面发射检测光。检测光通过光学整形器成形为狭缝光束。变更装置通过控制光学整形器改变狭缝光束的宽度。狭缝光束通过光学元件撞击基板的表面。从基板的表面反射的狭缝光束通过受控的振荡镜沿狭缝的宽度方向振荡。检测器基于振荡狭缝光束来检测基板的表面高度。

6. 发明授权

US06239861B1 Exposure method and scanning type exposure apparatus 有权
标题翻译：曝光方法和扫描型曝光装置
公开(公告)号：US06239861B1
公开(公告)日：2001-05-29
申请号：US09479671
申请日：2000-01-10
申请人： Kei Nara , Tsuyoshi Naraki
发明人： Kei Nara , Tsuyoshi Naraki
IPC分类号： G03B2442
CPC分类号： G03F7/70466 , G03F7/70275 , G03F7/70358 , G03F7/70808
摘要： A substrate coated with a photosensitive agent is exposed to light beams passing through a mask by projecting the light beams upon the substrate through a projection optical system, on which occasion areas having a large layer thickness of the photosensitive agent on the substrate are subjected to double exposures, i.e., the exposure through the projection optical system and an exposure through an optical system different therefrom.
摘要翻译：用感光剂涂布的基材通过投影光学系统将光束投射到基板上而暴露于通过掩模的光束，在该情况下，基板上的感光剂层厚度大的区域经受双重曝光，即通过投影光学系统的曝光和通过与其不同的光学系统的曝光。

7. 发明授权

US6134007A Method for measuring orthogonality having a third interferometer which is not orthogonal 有权
标题翻译：正交性测量方法，舞台装置和曝光装置
公开(公告)号：US6134007A
公开(公告)日：2000-10-17
申请号：US310959
申请日：1999-05-13
申请人： Tsuyoshi Naraki , Shuji Kawamura
发明人： Tsuyoshi Naraki , Shuji Kawamura
IPC分类号： G01B11/26 , G03F7/20 , G03F9/00 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70716 , G01B11/26 , G03F7/70775 , G03F9/70
摘要： A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.
摘要翻译：投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。衬底台沿着包括在XY平面中的第三轴的方向移动距离L，并相对于Y轴以α角倾斜，同时操作用于第三个方向的移动镜和干涉仪轴。对应于在第三轴方向上的距离L的Y方向的分量被定义为d。基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定，该方向被定义为S.正交性可以根据θ= tan-1 [（dS）/ d]来确定误差θ。通过移动衬底台，同时给出偏移以校正误差，可以正确地控制衬底台的位置。此功能也可应用于遮罩舞台。

8. 发明授权

US5995225A Method for measuring orthogonality in a stage of an exposure apparatus 失效
标题翻译：用于在曝光装置的阶段中测量正交性的方法
公开(公告)号：US5995225A
公开(公告)日：1999-11-30
申请号：US754012
申请日：1996-11-20
申请人： Tsuyoshi Naraki , Shuji Kawamura
发明人： Tsuyoshi Naraki , Shuji Kawamura
IPC分类号： G01B11/26 , G03F7/20 , G03F9/00 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70716 , G01B11/26 , G03F7/70775 , G03F9/70
摘要： A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.
摘要翻译：投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。衬底台沿着包括在XY平面中的第三轴的方向移动距离L，并相对于Y轴以α角倾斜，同时操作用于第三个方向的移动镜和干涉仪轴。对应于在第三轴方向上的距离L的Y方向的分量被定义为d。基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定，该方向被定义为S.正交性可以根据θ= tan-1 [（dS）/ d]来确定误差θ。通过移动衬底台，同时给出偏移以校正误差，可以正确地控制衬底台的位置。此功能也可应用于遮罩舞台。

9. 发明授权

US4655584A Substrate positioning apparatus 失效
标题翻译：基板定位装置
公开(公告)号：US4655584A
公开(公告)日：1987-04-07
申请号：US729968
申请日：1985-05-03
申请人： Hiroshi Tanaka , Yukio Kakizaki , Hiromitsu Iwata , Tsuyoshi Naraki
发明人： Hiroshi Tanaka , Yukio Kakizaki , Hiromitsu Iwata , Tsuyoshi Naraki
IPC分类号： G03F7/20 , G03B27/42 , A23G9/00
CPC分类号： G03F7/7075 , Y10S414/136
摘要： An apparatus for positioning a planar substrate on a plane relative to a stage comprises means for supporting the substrate on the plane, the supporting means being provided on the stage for rotation about an axis perpendicular to the plane, first drive means for moving the substrate relative to the supporting means in a predetermined direction along the plane, a reference member disposed on the stage and having a reference surface intersecting the plane, the reference member having a position in which the reference surface is opposed to the substrate moved in the predetermined position so that the reference surface is brought into contact with the circumferential end of the substrate moved by the first drive means to thereby position the substrate, and a biased position in which the reference surface is biased away from the circumferential end of the substrate from the opposed position, and second drive means for displacing the reference member between the opposed position and the biased position.
摘要翻译：用于将平面基板定位在相对于平台的平面上的装置包括用于在平面上支撑基板的装置，支撑装置设置在平台上用于围绕垂直于平面的轴线旋转;第一驱动装置，用于移动基板相对在沿着平面的预定方向上到支撑装置的参考构件，设置在平台上并具有与平面交叉的参考表面的基准构件，基准构件具有基准表面与在预定位置移动的基板相对的位置，从而参考表面与由第一驱动装置移动的基板的周向端部接触，从而定位基板;以及偏置位置，在该偏置位置，参考表面偏离基板的周向端部，从相对位置以及第二驱动装置，用于使参考构件在相对位置和双侧之间移位 sed位置。

10. 发明授权

US06617097B2 Exposure method 有权
标题翻译：曝光方法
公开(公告)号：US06617097B2
公开(公告)日：2003-09-09
申请号：US09747910
申请日：2000-12-22
申请人： Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
发明人： Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
IPC分类号： G03C556
CPC分类号： G03F9/7084 , G03F7/70275 , G03F7/70358 , G03F7/70433
摘要： The present invention aims at reducing the number of scanning exposure and at enhancing throughput. the above-mentioned objective is achieved by allowing a substrate 14 to be placed in sideways with respect to a substrate holder 15a (placing the longer sides of the substrate in parallel to the shorter sides of the substrate holder) depending on the size of the apparatus and the size of the substrate 14. It is acceptable even when areas other than an effective exposure area of the substrate 14 should project out from the substrate holder.
摘要翻译：本发明的目的在于减少扫描曝光次数和提高生产量。上述目的是通过使基板14相对于基板保持器15a侧向放置（将基板的长边平行放置到基板保持器的短边），这取决于装置的尺寸和基板14的尺寸。即使基板14的有效曝光区域以外的区域从基板支架突出出来也是可以接受的。

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