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1. 发明授权

US06479832B1 Surface height detecting apparatus and exposure apparatus using the same 有权
标题翻译：表面高度检测装置及使用其的曝光装置
公开(公告)号：US06479832B1
公开(公告)日：2002-11-12
申请号：US09267682
申请日：1999-03-15
申请人： Tsuyoshi Naraki , Kazuhiko Hori
发明人： Tsuyoshi Naraki , Kazuhiko Hori
IPC分类号： G01N2186
CPC分类号： G03F9/7026
摘要： An illumination device emits detection light toward the surface of a substrate from an oblique direction with respect to the substrate. The detection light is shaped into a slit beam by an optical shaper. An alteration device changes the width of the slit beam by controlling the optical shaper. The slit beam strikes the surface of the substrate through an optical element. The slit beam reflected from the surface of the substrate is oscillated along the width direction of the slit by a controlled oscillation mirror. A detector detects the surface height of the substrate based on the oscillating slit beam.
摘要翻译：照明装置相对于基板从倾斜方向朝向基板的表面发射检测光。检测光通过光学整形器成形为狭缝光束。变更装置通过控制光学整形器改变狭缝光束的宽度。狭缝光束通过光学元件撞击基板的表面。从基板的表面反射的狭缝光束通过受控的振荡镜沿狭缝的宽度方向振荡。检测器基于振荡狭缝光束来检测基板的表面高度。

2. 发明授权

US06506544B1 Exposure method and exposure apparatus and mask 失效
标题翻译：曝光方法和曝光装置和面罩
公开(公告)号：US06506544B1
公开(公告)日：2003-01-14
申请号：US09430179
申请日：1999-10-29
申请人： Kazuhiko Hori , Katsuya Machino , Manabu Toguchi , Masahiro Iguchi
发明人： Kazuhiko Hori , Katsuya Machino , Manabu Toguchi , Masahiro Iguchi
IPC分类号： G03C500
CPC分类号： G03F7/70466 , G03F7/70433 , G03F7/70791
摘要： In the exposure method of the invention, a first pattern and a second pattern are joined and exposed on a substrate using a mask having a pattern. The pattern on the mask has a common pattern for the first pattern and the second pattern, and a non-common pattern different from the common pattern and formed continuously with the common pattern. The common pattern and at least a part of the non-common pattern are selected to effect the joining and exposing. According to this method, the number of masks required for exposure processing accompanying screen synthesis can be reduced.
摘要翻译：在本发明的曝光方法中，使用具有图案的掩模将第一图案和第二图案接合并暴露在基板上。掩模上的图案具有用于第一图案和第二图案的共同图案，以及与公共图案不同且与公共图案连续形成的非共同图案。选择共同图案和至少一部分非共同图案以实现接合和曝光。根据该方法，可以减少伴随画面合成的曝光处理所需的掩模的数量。

3. 外观设计

USD345450S Element of a shoe 失效
公开(公告)号：USD345450S
公开(公告)日：1994-03-29
申请号：US1220
申请日：1992-11-06
申请人： Hirokazu Kusuki , Masahiro Kumakiri , Kazuhiko Hori , Tuan Le
设计人： Hirokazu Kusuki , Masahiro Kumakiri , Kazuhiko Hori , Tuan Le

4. 发明授权

US5793472A Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures 失效
标题翻译：曝光方法使用掩模和基板上的参考标记，并且即使在多次曝光之后也能够提供高对准精度
公开(公告)号：US5793472A
公开(公告)日：1998-08-11
申请号：US940287
申请日：1997-09-30
申请人： Kazuhiko Hori , Kei Nara , Seiji Miyazaki
发明人： Kazuhiko Hori , Kei Nara , Seiji Miyazaki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/20 , G03F7/70466 , G03F9/70 , G03F9/7076
摘要： Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light-shielding pattern and the light-transmitting pattern.
摘要翻译：使用形成在掩模上的第一参考标记和形成在感光基板上的第二参考标记来执行掩模和感光基板之间的对准。之后，掩模和感光基片相对移动，使得形成在与掩模上的第一基准标记不同的位置上的遮光图案和透光图案之一的图像形成在第二基准在感光基板上标记。然后，将形成在掩模上的电路图案转印到感光基板上，并且利用遮光图案和透光图案之一的图像露出包括第二参考标记的部分区域。

5. 发明授权

US06366341B1 Exposure method and exposure apparatus 有权
标题翻译：曝光方法和曝光装置
公开(公告)号：US06366341B1
公开(公告)日：2002-04-02
申请号：US09636813
申请日：2000-08-10
申请人： Akinori Shirato , Kazuhiko Hori , Toshio Matsuura
发明人： Akinori Shirato , Kazuhiko Hori , Toshio Matsuura
IPC分类号： G03B2772
CPC分类号： G03F7/70066 , G03F7/70558
摘要： At the time of transferring the pattern image of a mask onto a substrate, an exposure apparatus overlays peripheral portions of exposure areas with respect to a pattern image, which has previously been transferred onto the substrate, with each other, and transfers a predetermined pattern onto the substrate. This exposure apparatus comprises a dose adjusting device capable of adjusting the dose of exposure light at the overlying portion, a shape measuring unit for measuring the shape of the pattern image of the overlying portion formed on the substrate, and a control section for controlling the dose adjusting device based on the result of measurement by the shape measuring unit in such a way that the shape of the pattern image of the overlying portion formed on the substrate becomes an intended shape.
摘要翻译：在将掩模的图案图像转印到基板上时，曝光装置相对于先前已经转印到基板上的图案图像将曝光区域的周边部分重叠，并将预定图案转印到底物。该曝光装置包括能够调整上覆部分的曝光光的剂量的剂量调整装置，用于测量形成在基板上的上覆部分的图案图像的形状的形状测量单元和用于控制剂量的控制部分调整装置基于由形状测量单元测量的结果，使得形成在基板上的上覆部分的图案图像的形状成为预期的形状。

6. 外观设计

USD343506S Shoe sole 失效
公开(公告)号：USD343506S
公开(公告)日：1994-01-25
申请号：US1199
申请日：1992-11-06
申请人： Hirokazu Kusuki , Masahiro Kumakiri , Kazuhiko Hori , Tuan Le
设计人： Hirokazu Kusuki , Masahiro Kumakiri , Kazuhiko Hori , Tuan Le

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