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1. 发明授权

US06468598B1 Magnetic disk and method of making thereof 失效
标题翻译：磁盘及其制造方法
公开(公告)号：US06468598B1
公开(公告)日：2002-10-22
申请号：US09598454
申请日：2000-06-22
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
IPC分类号： B05D500
CPC分类号： C23C14/048 , C23C16/047 , G11B5/82 , G11B5/84 , G11B5/8404 , G11B5/8408
摘要： It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk, having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam surface at an inclined angle to the substrate surface. The surface is irradiated through a shielding mask having a specific pattern, so as to produce a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.
摘要翻译：本发明的目的是提供一种制造具有均匀纹理结构的磁盘的方法，其制造深度小于20nm，优选小于10nm，局部深度偏差小于5 ％，其中纹理图案的特征在于结构的侧表面是倾斜的或弯曲的。该目的已经在制造磁盘的方法中实现，其通过用来自梁表面的高能量光束旋转和照射制造表面而在基板的制造表面上具有微波纹以减少动态摩擦和控制磁头浮动与基板表面成倾斜的角度。通过具有特定图案的屏蔽掩模照射该表面，以在基板表面上产生转印图案，以产生具有倾斜或弯曲侧表面的微波纹的纹理结构。

2. 发明授权

US6099698A Magnetic disc and method of manufacturing same 失效
标题翻译：磁盘及其制造方法
公开(公告)号：US6099698A
公开(公告)日：2000-08-08
申请号：US165371
申请日：1998-10-02
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Tohru Satake , Yasushi Tohma , Juichi Ishiguro
IPC分类号： C03C19/00 , C03C23/00 , C23C14/04 , C23C16/04 , G11B5/64 , G11B5/82 , G11B5/84 , C23C14/46 , B01J19/08
CPC分类号： G11B5/8408 , C23C14/048 , C23C16/047 , G11B5/84 , G11B5/8404 , G11B5/82
摘要： It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam source at an inclined angle to the substrate surface, through a shielding mask having a specific pattern, so as to process a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.
摘要翻译：本发明的目的是提供一种制造具有均匀纹理结构的磁盘的方法，其制造深度小于20nm，优选小于10nm，局部深度偏差小于5 ％，其中纹理图案的特征在于结构的侧表面是倾斜的或弯曲的。该目的已经在用于制造具有微波纹的磁盘的方法中实现，该磁盘在基板的制造表面上用于减少动态摩擦并且通过旋转和照射来自光源的高能量束的制造表面来旋转和照射制造表面通过具有特定图案的屏蔽掩模，与基板表面倾斜的角度，以便处理基板表面上的转印图案，以产生具有倾斜或弯曲侧表面的微波纹的纹理结构。

3. 发明授权

US06627095B2 Magnetic recording disk and method of manufacturing same 失效
标题翻译：磁记录盘及其制造方法
公开(公告)号：US06627095B2
公开(公告)日：2003-09-30
申请号：US09739381
申请日：2000-12-19
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Yasushi Tohma , Tohru Satake
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Yasushi Tohma , Tohru Satake
IPC分类号： G11B5127
CPC分类号： G11B5/7315 , G11B5/7325 , G11B5/82 , Y10S428/90 , Y10T428/12389 , Y10T428/12465 , Y10T428/12736 , Y10T428/12944 , Y10T428/12993 , Y10T428/266
摘要： A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided. A magnetic recording disk has a substrate 11, 12 (16) coated on a surface thereof with a magnetic layer 13, a carbon layer 14, and a lubricating film 15. The substrate has on a surface thereof a texture structure of fine surface irregularities for reducing friction when the substrate is brought into contact with a head and controlling an amount of lift of the head. The fine surface irregularities have a height of 20 nm or less and are formed from a pattern shape or profile of a shield with a high-speed atomic beam emitted from a high-speed atomic beam source.
摘要翻译：一种磁记录盘，其表面具有适合于高密度磁记录的具有减小的变化的细小表面凹凸的纹理结构，以及制造这种磁记录盘的方法。磁记录盘具有在其表面上涂覆有磁性层13，碳层14和润滑膜15的基板11,12（16）。该基板在其表面上具有细小的表面凹凸的纹理结构，用于当衬底与头部接触并控制头部的提升量时，减小摩擦。微细表面凹凸具有20nm以下的高度，并且由具有从高速原子束源发射的高速原子束的屏蔽的图案形状或轮廓形成。

4. 发明授权

US06194048B1 Magnetic recording disk 失效
标题翻译：磁记录盘
公开(公告)号：US06194048B1
公开(公告)日：2001-02-27
申请号：US09165637
申请日：1998-10-02
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Yasushi Tohma , Tohru Satake
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Kazuo Yamauchi , Shinta Kunitomo , Yasushi Tohma , Tohru Satake
IPC分类号： B32B302
CPC分类号： G11B5/7315 , G11B5/7325 , G11B5/82 , Y10S428/90 , Y10T428/12389 , Y10T428/12465 , Y10T428/12736 , Y10T428/12944 , Y10T428/12993 , Y10T428/266
摘要： A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided. The magnetic recording disk has a substrate 11, 12 (16) coated on a surface thereof with a magnetic layer 13, a carbon layer 14, and a lubricating film 15. The substrate has on a surface thereof a texture structure of fine surface irregularities for reducing friction when the substrate is brought into contact with a head and controlling an amount of lift of the head. The fine surface irregularities have a height of 20 nm or less and are formed from a pattern shape or profile of a shield with a high-speed atomic beam emitted from a high-speed atomic beam source.
摘要翻译：一种磁记录盘，其表面具有适合于高密度磁记录的具有减小的变化的细小表面凹凸的纹理结构和制造这种磁记录盘的方法。磁记录盘具有在其表面上涂覆有磁性层13，碳层14和润滑膜15的基板11,12（16）。该基板在其表面上具有细小的表面凹凸的纹理结构，用于当衬底与头部接触并控制头部的提升量时，减小摩擦。微细表面凹凸具有20nm以下的高度，并且由具有从高速原子束源发射的高速原子束的屏蔽的图案形状或轮廓形成。

5. 发明授权

US06949735B1 Beam source 失效
标题翻译：光源
公开(公告)号：US06949735B1
公开(公告)日：2005-09-27
申请号：US10030087
申请日：2000-07-14
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Tohru Satake
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Kenji Watanabe , Tohru Satake
IPC分类号： G21G4/02 , H01J27/16 , H01J37/08 , H01J37/32 , H05H3/00
CPC分类号： H01J37/32192 , H01J27/16 , H01J37/08 , H01J37/321 , H05H3/00
摘要： An object of the present invention is to provide a beam source capable of efficiently generating a high-density energy beam having good directivity and a relatively large beam diameter. The beam source of the present invention comprises a discharge tube; a gas inlet for introducing gas into the discharge tube; three electrodes mounted in the discharge tube downstream from the gas inlet, wherein the electrode on the upstream end has a plurality of openings through which the gas can pass, the middle electrode is a mesh-shaped electrode, and the electrode on the downstream end is a beam-emitting electrode having a plurality of beam-emitting holes and is disposed in a plane parallel to the middle electrode; plasma-generating means disposed between the two upstream electrodes on the outside of the discharge tube for transforming gas introduced into the discharge tube into plasma; and voltage-applying means for accelerating the beam between the two downstream electrodes and emitting the accelerated beam from the downstream beam-emitting electrode.
摘要翻译：本发明的目的是提供一种能够有效地产生具有良好方向性和较大光束直径的高密度能量束的束源。本发明的光束源包括放电管; 用于将气体引入放电管的气体入口; 三个电极安装在放气管的气体入口下游，其中上游端的电极具有多个开口，气体可以通过该开口，中间电极是网状电极，下游端的电极是具有多个光束发射孔并且布置在与中间电极平行的平面中的光束发射电极; 等离子体产生装置，设置在放电管外侧的两个上游电极之间，用于将引入放电管的气体转化为等离子体; 以及用于加速两个下游电极之间的光束并从下游光束发射电极发射加速光束的电压施加装置。

6. 发明授权

US06671034B1 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US06671034B1
公开(公告)日：2003-12-30
申请号：US09301311
申请日：1999-04-29
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03B2754
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.
摘要翻译：本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。采用实现（邻近）场效应实现装置和方法。一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

7. 发明授权

US07115354B2 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US07115354B2
公开(公告)日：2006-10-03
申请号：US10699873
申请日：2003-11-04
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G01F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.
摘要翻译：光学压印装置和二维图案的制造方法的线宽小于曝光光的波长。采用ev逝（邻近）场效应实现装置和方法。一种光学压印装置包括一个封闭光的容器，曝光掩模具有牢固地固定在容器的一部分上的接近场曝光图案，用于通过光封闭的曝光场曝光在感光材料上的消光场其中以及用于将光提供到容器中的光源。

8. 发明授权

US07888642B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 有权
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07888642B2
公开(公告)日：2011-02-15
申请号：US12188567
申请日：2008-08-08
申请人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： H01J49/48 , G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

9. 发明申请

US20090101816A1 Testing apparatus using charged particles and device manufacturing method using the testing apparatus 有权
标题翻译：使用带电粒子的测试装置和使用该测试装置的装置制造方法
公开(公告)号：US20090101816A1
公开(公告)日：2009-04-23
申请号：US12073892
申请日：2008-03-11
申请人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
发明人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
IPC分类号： G01N23/00 , A61N5/00
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/202 , H01J2237/2441 , H01J2237/2446 , H01J2237/2801 , H01J2237/2817 , H01L21/6833 , H01L2223/54466
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
摘要翻译：提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。产生电子束，使照度不均匀为10％以下。由检测器25.11检测从样品W发射的电子。

10. 发明授权

US07521692B2 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 有权
标题翻译： TDI检测装置，馈通装置，使用这些装置和设备的电子束装置，以及使用该电子束装置的半导体装置的制造方法
公开(公告)号：US07521692B2
公开(公告)日：2009-04-21
申请号：US11896519
申请日：2007-09-04
申请人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： G01K1/08 , H01J3/14 , H01J3/26
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
摘要翻译：电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块，连接力可以保持在如此低的水平，以防止传感器中的破损。引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。优选地，行计数的数量可以几乎等于积分级数。

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