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1. 发明授权

US06671034B1 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US06671034B1
公开(公告)日：2003-12-30
申请号：US09301311
申请日：1999-04-29
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03B2754
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.
摘要翻译：本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。采用实现（邻近）场效应实现装置和方法。一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

2. 发明授权

US07115354B2 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US07115354B2
公开(公告)日：2006-10-03
申请号：US10699873
申请日：2003-11-04
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G01F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.
摘要翻译：光学压印装置和二维图案的制造方法的线宽小于曝光光的波长。采用ev逝（邻近）场效应实现装置和方法。一种光学压印装置包括一个封闭光的容器，曝光掩模具有牢固地固定在容器的一部分上的接近场曝光图案，用于通过光封闭的曝光场曝光在感光材料上的消光场其中以及用于将光提供到容器中的光源。

3. 发明授权

US5998097A Fabrication method employing energy beam source 失效
标题翻译：采用能量束源的制造方法
公开(公告)号：US5998097A
公开(公告)日：1999-12-07
申请号：US300844
申请日：1999-04-28
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务都可以在三维空间中的工件的任何表面和任何位置上进行。

4. 发明授权

US5852298A Micro-processing apparatus and method therefor 失效
标题翻译：微处理装置及其方法
公开(公告)号：US5852298A
公开(公告)日：1998-12-22
申请号：US621990
申请日：1996-03-26
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/20 , H01J37/30 , H01J37/00
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.
摘要翻译：微加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时通过至少一对光学或电子显微镜实时观察操作的进展，从而提供来自至少两个方向的同时视图。这提供了关于微型工作特别关键的工作空间的空间视觉信息。通过使用特别设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。微型托盘提供的旋转和平行平移运动与该装置的微加工能力相结合，可用于生产用于光学和电子设备的先进应用的微米级部件。

5. 发明授权

US5770123A Method and apparatus for energy beam machining 失效
标题翻译：能量束加工方法和装置
公开(公告)号：US5770123A
公开(公告)日：1998-06-23
申请号：US531698
申请日：1995-09-21
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
IPC分类号： H01J37/305 , B29C59/16
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.
摘要翻译：能量束通过限定在掩模中的光束传播孔照射到工件。此时，能量束源与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，其对应于能量的照射量光束。通过这种方法，可以非常容易地形成具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以高精度地将产品加工成期望的深度。

6. 发明授权

US5989779A Fabrication method employing and energy beam source 失效
标题翻译：采用制造方法和能量束源
公开(公告)号：US5989779A
公开(公告)日：1999-11-23
申请号：US544108
申请日：1995-10-17
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , B23K15/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务可以在三维空间中的工件的任何表面和任何位置上进行。

7. 发明授权

US6015976A Fabrication apparatus employing energy beam 失效
标题翻译：采用能量束的制造装置
公开(公告)号：US6015976A
公开(公告)日：2000-01-18
申请号：US195254
申请日：1998-11-18
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , H01J37/302
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. Basic components are an energy beam source, a mask member and a specimen stage. The mask member is an independent component, and various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of flexibility of fabrication and material, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction devices for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused bean is used, a technique of reduced projection imaging can be utilized to produce fine-structures of the order of nm.
摘要翻译：产生了数量级小于等于30的数量级的三维超细微结构，用于先进的光通信系统和量子效应器件。基本组件是能量束源，掩模构件和样品台。掩模构件是独立的部件，并且可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，由此产生多个线或阵列的凸或微型微透镜。精细结构的其他实例包括以多线图案或阵列图案沉积薄膜。由于制造和材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。可以使nm的数量级的细槽尺寸。能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。通常使用平行光束，但是当使用聚焦光束时，可以利用减少投影成像的技术来产生nm级数的精细结构。

8. 发明授权

US5868952A Fabrication method with energy beam 失效
标题翻译：能量束的制作方法
公开(公告)号：US5868952A
公开(公告)日：1999-02-09
申请号：US617376
申请日：1996-03-18
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , B44C1/22
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.
摘要翻译：产生了数量级小于等于30的数量级的三维超细微结构，用于先进的光通信系统和量子效应器件。基本部件是能量束源，掩模构件和样品台。由于掩模构件是独立的部件，所以可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，从而产生多条线或阵列的凸或微型微透镜。精细结构的其他实例包括以多线图案或阵列图案沉积薄膜。由于制造方法和制造材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。可以使nm的数量级的细槽尺寸。能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。通常使用平行光束，但是当使用聚焦光束时，可以利用降低投影成像的技术来产生大约数量级的精细结构。

9. 发明授权

US6010831A Ultra-fine microfabrication method using an energy beam 失效
标题翻译：使用能量束的超细微细加工方法
公开(公告)号：US6010831A
公开(公告)日：2000-01-04
申请号：US274341
申请日：1999-03-23
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/00 , H01L21/302
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
摘要翻译：使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构以产生二维结构。当能量束和屏蔽的辐射的基础技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不存在由反应性气体粒子束或解决方案提供的附加化学效应时，具有非常高的精细结构纵横比可以精确地生产。通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。

10. 发明授权

US6048671A Ultra-fine microfabrication method using an energy beam 失效
公开(公告)号：US6048671A
公开(公告)日：2000-04-11
申请号：US195255
申请日：1998-11-18
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/58 , B44C1/22
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

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