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    • 4. 发明授权
    • Sensor shape of a CPP magnetic head for improving the MR ratio
    • 用于改善MR比的CPP磁头的传感器形状
    • US08355224B2
    • 2013-01-15
    • US12011904
    • 2008-01-29
    • Satoru OkamotoKoji OkazakiShuuichi KojimaNobuo YoshidaKatsuro WatanabeHiroyuki Katada
    • Satoru OkamotoKoji OkazakiShuuichi KojimaNobuo YoshidaKatsuro WatanabeHiroyuki Katada
    • G11B5/33
    • G11B5/398B82Y25/00G01R33/093G11B5/3163H01L43/08
    • Embodiments of the present invention help to prevent a head characteristic from being deteriorated by re-deposition or damage which occurs when a sensor film is etched, a track width is narrowed, and the head characteristic is stabilized. According to one embodiment, when it is assumed that the thickness of the sensor film on an air bearing surface is T, and a distance between an end of a medium layer that is interposed between a free layer and a pinned layer which comprise the sensor film and an end of the sensor film lowest portion, a relationship of 1.2×T≦X≦2.5×T is satisfied, and the ends of a pair of magnetic films which are in contact with both sides in the track-width direction through an insulator do not exist in the track central portion from the free layer end. The sensor film is etched while an incident angle of an etching beam is changed over, and when it is assumed that a direction normal to the sensor film surface is the incident angle of 0, etching is conducted under the condition where the incident angle of the etching beam becomes smaller with time.
    • 本发明的实施例有助于通过在传感器膜被蚀刻,轨道宽度变窄并且头部特性稳定时发生的再沉积或损伤来防止头部特性劣化。 根据一个实施例,当假设空气轴承表面上的传感器膜的厚度为T时,介于介于包含传感器膜的自由层和被钉扎层之间的介质层的端部之间的距离 和传感器膜最低部分的一端,满足1.2×T≦̸ X≦̸ 2.5×T的关系,并且通过绝缘体在轨道宽度方向上与两侧接触的一对磁性膜的端部 不存在于自由层末端的轨道中心部分。 在蚀刻光束的入射角变化的同时蚀刻传感器膜,并且当假定与传感器膜表面垂直的方向为入射角为0时,在其入射角 刻蚀光束随时间变小。
    • 6. 发明申请
    • Sensor shape and etching process of CPP magnetic head for reduce property degradation
    • CPP磁头的传感器形状和蚀刻工艺,用于降低性能下降
    • US20090046394A1
    • 2009-02-19
    • US12011904
    • 2008-01-29
    • Satoru OkamotoKoji OkazakiShuuichi KojimaNobuo YoshidaKatsuro WatanabeHiroyuki Katada
    • Satoru OkamotoKoji OkazakiShuuichi KojimaNobuo YoshidaKatsuro WatanabeHiroyuki Katada
    • G11B5/33B44C1/22
    • G11B5/398B82Y25/00G01R33/093G11B5/3163H01L43/08
    • Embodiments of the present invention help to prevent a head characteristic from being deteriorated by re-deposition or damage which occurs when a sensor film is etched, a track width is narrowed, and the head characteristic is stabilized. According to one embodiment, when it is assumed that the thickness of the sensor film on an air bearing surface is T, and a distance between an end of a medium layer that is interposed between a free layer and a pinned layer which comprise the sensor film and an end of the sensor film lowest portion, a relationship of 1.2×T≦x≦2.5×T is satisfied, and the ends of a pair of magnetic films which are in contact with both sides in the track-width direction through an insulator do not exist in the track central portion from the free layer end. The sensor film is etched while an incident angle of an etching beam is changed over, and when it is assumed that a direction normal to the sensor film surface is the incident angle of 0, etching is conducted under the condition where the incident angle of the etching beam becomes smaller with time.
    • 本发明的实施例有助于通过在传感器膜被蚀刻,轨道宽度变窄并且头部特性稳定时发生的再沉积或损伤来防止头部特性劣化。 根据一个实施例,当假设空气轴承表面上的传感器膜的厚度为T时,介于介于包含传感器膜的自由层和被钉扎层之间的介质层的端部之间的距离 和传感器膜最低部分的端部,满足1.2×T <= x <= 2.5×T的关系,并且通过绝缘体在轨道宽度方向上与两侧接触的一对磁性膜的端部 不存在于自由层末端的轨道中心部分。 在蚀刻光束的入射角变化的同时蚀刻传感器膜,并且当假定与传感器膜表面垂直的方向为入射角为0时,在其入射角 刻蚀光束随时间变小。