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    • 2. 发明申请
    • METHOD OF ETCHING MATERIALS WITH ELECTRON BEAM AND LASER ENERGY
    • 用电子束和激光能量蚀刻材料的方法
    • US20100200546A1
    • 2010-08-12
    • US12704167
    • 2010-02-11
    • Lyudmila Zaykova-FeldmanHerschel M. MarchmanThomas M. Moore
    • Lyudmila Zaykova-FeldmanHerschel M. MarchmanThomas M. Moore
    • B44C1/22
    • H01L21/67069G03F1/72G03F1/74H01L21/32135
    • We disclose a method of electron-beam induced of etching the surface of a specimen in a charged-particle beam instrument, where the charged-particle beam instrument has first and second laser beams, an electron beam, and a gas-injection system for applying etchant gas to the surface. Etching is accomplished by applying a photolytic pulse from the first laser to the surface; applying a pyrolytic pulse from the second laser to the surface; and, applying an etchant gas to the surface at least during the pyrolytic pulse. Two or more alternating pyrolytic laser pulses and photolytic laser pulses may be applied to the surface. The stage supporting the specimen may be tilted relative to the axis of the electron beam before applying the electron beam to the surface of the specimen. The electron beam is applied to the surface of the specimen during the time the etchant gas is present at the surface.
    • 我们公开了一种在带电粒子束仪器中蚀刻样品表面的电子束的方法,其中带电粒子束仪器具有第一和第二激光束,电子束和用于施加的气体注入系统 蚀刻气体到表面。 通过将第一激光器的光解脉冲施加到表面来实现蚀刻; 将来自第二激光器的热解脉冲施加到表面; 以及至少在热解脉冲期间将蚀刻剂气体施加到表面。 可以将两个或更多个交替的热解激光脉冲和光解激光脉冲施加到表面。 在将电子束施加到试样的表面之前,支撑试样的载物台可相对于电子束的轴线倾斜。 在蚀刻剂气体存在于表面的时间内,电子束被施加到样品的表面。
    • 3. 发明授权
    • Single-channel optical processing system for energetic-beam microscopes
    • 用于能量束显微镜的单通道光学处理系统
    • US07961397B2
    • 2011-06-14
    • US12201447
    • 2008-08-29
    • Herschel M. MarchmanThomas M. MooreRocky Kruger
    • Herschel M. MarchmanThomas M. MooreRocky Kruger
    • G02B27/10
    • H01J37/226H01J37/3045H01J2237/2482H01J2237/317H01J2237/31749
    • A single-channel optical processing system for an energetic-beam instrument has separate sources for processing radiation and illumination radiation. The processing radiation and the illumination radiation are combined in a single optical path and directed to a sample surface inside the energetic-beam instrument through a self-focusing rod lens. The self-focusing rod lens thus has a working distance from the sample surface that will not interfere with typical arrangements of ion beams and electron beams in such instruments. A combination of polarizers and beam splitters allows separation of the combined incident radiation and the combined radiation reflected from the sample surface and returned through the same optical channel, so that the reflected radiation may be directed to an optical detector, such as a camera or spectrometer. In other embodiments, additional illumination of the sample surface is provided at an angle to the central axis of the self-focusing rod lens.
    • 用于能量束仪器的单通道光学处理系统具有用于处理辐射和照射辐射的单独源。 处理辐射和照射辐射在单个光学路径中组合并通过自聚焦棒透镜指向能量束仪器内部的样品表面。 因此,自聚焦棒透镜具有与样品表面的工作距离,其不会干扰这些仪器中的离子束和电子束的典型布置。 偏振器和分束器的组合允许组合的入射辐射和从样品表面反射的组合辐射分离并通过相同的光学通道返回,使得反射的辐射可以被引导到诸如相机或光谱仪的光学检测器 。 在其他实施例中,样品表面的附加照明以与自聚焦棒透镜的中心轴成一定角度设置。
    • 4. 发明申请
    • SINGLE-CHANNEL OPTICAL PROCESSING SYSTEM FOR ENERGETIC-BEAM MICROSCOPES
    • 用于能量束显微镜的单通道光学处理系统
    • US20100051802A1
    • 2010-03-04
    • US12201447
    • 2008-08-29
    • Herschel M. MarchmanThomas M. MooreRocky Kruger
    • Herschel M. MarchmanThomas M. MooreRocky Kruger
    • G01N23/00
    • H01J37/226H01J37/3045H01J2237/2482H01J2237/317H01J2237/31749
    • A single-channel optical processing system for an energetic-beam instrument has separate sources for processing radiation and illumination radiation. The processing radiation and the illumination radiation are combined in a single optical path and directed to a sample surface inside the energetic-beam instrument through a self-focusing rod lens. The self-focusing rod lens thus has a working distance from the sample surface that will not interfere with typical arrangements of ion beams and electron beams in such instruments. A combination of polarizers and beam splitters allows separation of the combined incident radiation and the combined radiation reflected from the sample surface and returned through the same optical channel, so that the reflected radiation may be directed to an optical detector, such as a camera or spectrometer. In other embodiments, additional illumination of the sample surface is provided at an angle to the central axis of the self-focusing rod lens.
    • 用于能量束仪器的单通道光学处理系统具有用于处理辐射和照射辐射的单独源。 处理辐射和照射辐射在单个光学路径中组合并通过自聚焦棒透镜指向能量束仪器内部的样品表面。 因此,自聚焦棒透镜具有与样品表面的工作距离,其不会干扰这些仪器中的离子束和电子束的典型布置。 偏振器和分束器的组合允许组合的入射辐射和从样品表面反射的组合辐射分离并通过相同的光学通道返回,使得反射的辐射可以被引导到诸如相机或光谱仪的光学检测器 。 在其他实施例中,样品表面的附加照明以与自聚焦棒透镜的中心轴成一定角度设置。
    • 5. 发明授权
    • Multiple magnification optical system with single objective lens
    • 具有单个物镜的多重放大光学系统
    • US08054558B2
    • 2011-11-08
    • US12701071
    • 2010-02-05
    • Herschel M. MarchmanGonzalo Amador
    • Herschel M. MarchmanGonzalo Amador
    • G02B21/02G02B3/00G02B9/00
    • H01L21/67069G03F1/72G03F1/74H01L21/32135
    • A multiple magnification optical system has a single objective focused upon a specimen at a given working distance. A graded-index lens receives light passing through the objective from the specimen. A beam splitter splits the light exiting the gradient-index lens into a first optical axis and a second optical axis. A first lens is aligned in the first optical axis between the beam splitter and a first camera to focus a magnified image at the first camera. A second camera is situated along the second optical axis from the rear principal plane of the objective so as to obtain unity magnification when the working distance of the objective is set at twice its focal length. Multiple magnifications can be obtained with a single objective by moving the optical system axially to set different working distances from a specimen, and by using multiple beam splitters, or combinations thereof.
    • 多重放大光学系统具有在给定工作距离下聚焦在样本上的单个目标。 渐变折射率透镜从样本接收通过物镜的光。 分束器将离开渐变折射率透镜的光分成第一光轴和第二光轴。 第一透镜在分束器和第一相机之间的第一光轴上对准,以将第一相机上的放大图像聚焦。 第二摄像机沿着第二光轴从物镜的后主平面定位,以便当物镜的工作距离设定为焦距的两倍时获得单位倍率。 通过使光学系统轴向移动以设置与样本的不同工作距离,并且通过使用多个分束器或其组合,可以通过单个物镜获得多个放大率。