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1. 发明授权

US07351966B1 High-resolution optical channel for non-destructive navigation and processing of integrated circuits 有权
标题翻译：用于集成电路非破坏性导航和处理的高分辨率光通道
公开(公告)号：US07351966B1
公开(公告)日：2008-04-01
申请号：US11419811
申请日：2006-05-23
申请人： Herschel M. Marchman , Steven B. Herschbein , Chad Rue , Michael Renner , Narender Rana
发明人： Herschel M. Marchman , Steven B. Herschbein , Chad Rue , Michael Renner , Narender Rana
IPC分类号： H01J37/244
CPC分类号： H01J37/28 , H01J37/226 , H01J37/3056 , H01J2237/2446 , H01J2237/24578 , H01J2237/31749
摘要： An optical-fiber based light channel system is included in an ion/electron beam tool for imaging and/or processing integrated circuits. The optical channel system includes an image collection portion, an optical fiber image transmission portion and a detector portion. The image collection portion includes micro-optical components and has submillimeter dimensions, so that it is easily accommodated within the working distance of the ion/electron beam tool. The entire system is sufficiently compact and lightweight so that it may easily be mounted on a translation stage inside the sample chamber, which permits the optical channel to be mechanically extended and retracted to avoid blocking the primary ion or electron beam. The system may be mounted to a translation stage or to a gas injector assembly, which may itself be mounted to a flange plate on the chamber wall with feed-through ports for electrical and optical signals.
摘要翻译：用于成像和/或处理集成电路的离子/电子束工具中包括基于光纤的光通道系统。光通道系统包括图像采集部分，光纤图像传输部分和检测器部分。图像采集部分包括微光学部件并且具有亚毫米尺寸，使得其容易地容纳在离子/电子束工具的工作距离内。整个系统足够紧凑和重量轻，使得其可以容易地安装在样品室内的平移台上，这允许光学通道机械地延伸和缩回以避免阻挡主离子或电子束。该系统可以安装到平移台或气体喷射器组件，气体喷射器组件本身可以通过用于电和光信号的馈通端口安装在腔壁上的凸缘板上。

2. 发明申请

US20080067369A1 HIGH-RESOLUTION OPTICAL CHANNEL FOR NON-DESTRUCTIVE NAVIGATION AND PROCESSING OF INTEGRATED CIRCUITS 有权
标题翻译：用于非破坏性导航的高分辨率光通道和集成电路的处理
公开(公告)号：US20080067369A1
公开(公告)日：2008-03-20
申请号：US11419811
申请日：2006-05-23
申请人： Herschel M. Marchman , Steven B. Herschbein , Chad Rue , Michael Renner , Narender Rana
发明人： Herschel M. Marchman , Steven B. Herschbein , Chad Rue , Michael Renner , Narender Rana
IPC分类号： H01J37/22
CPC分类号： H01J37/28 , H01J37/226 , H01J37/3056 , H01J2237/2446 , H01J2237/24578 , H01J2237/31749
摘要： An optical-fiber based light channel system is included in an ion/electron beam tool for imaging and/or processing integrated circuits. The optical channel system includes an image collection portion, an optical fiber image transmission portion and a detector portion. The image collection portion includes micro-optical components and has submillimeter dimensions, so that it is easily accommodated within the working distance of the ion/electron beam tool. The entire system is sufficiently compact and lightweight so that it may easily be mounted on a translation stage inside the sample chamber, which permits the optical channel to be mechanically extended and retracted to avoid blocking the primary ion or electron beam. The system may be mounted to a translation stage or to a gas injector assembly, which may itself be mounted to a flange plate on the chamber wall with feed-through ports for electrical and optical signals.
摘要翻译：用于成像和/或处理集成电路的离子/电子束工具中包括基于光纤的光通道系统。光通道系统包括图像采集部分，光纤图像传输部分和检测器部分。图像采集部分包括微光学部件并且具有亚毫米尺寸，使得其容易地容纳在离子/电子束工具的工作距离内。整个系统足够紧凑和重量轻，使得其可以容易地安装在样品室内的平移台上，这允许光学通道机械地延伸和缩回以避免阻挡主离子或电子束。该系统可以安装到平移台或气体喷射器组件，气体喷射器组件本身可以通过用于电和光信号的馈通端口安装在腔壁上的凸缘板上。

3. 发明授权

US07781733B2 In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques 失效
标题翻译：用于光学观察和表面处理的原位高分辨率光通道并行带电粒子（FIB和SEM）技术
公开(公告)号：US07781733B2
公开(公告)日：2010-08-24
申请号：US11749350
申请日：2007-05-16
申请人： Steven B. Herschbein , Herschel M. Marchman , Narender Rana , Chad Rue
发明人： Steven B. Herschbein , Herschel M. Marchman , Narender Rana , Chad Rue
IPC分类号： H01J40/14 , G01N23/00 , G21K7/00
CPC分类号： H01J37/304 , H01J37/228 , H01J37/3056 , H01J2237/28 , H01J2237/31742 , H01J2237/31749
摘要： An apparatus for simultaneous parallel processing of a sample using light energy for optical viewing or surface processing in parallel with a charged particle beam. A charged particle beam transmits a focused ion beam or an electron beam along a path to a sample. An optical microscope transmits light along a first path to the sample, and a prism aligned along the first light path reflects light into a second light path toward the sample. A portion of the prism and reflective surface is removed for passage of the charged particle beam. A lens is aligned along the second light path and has a portion removed for passage of the charged particle beam. The removed portions of the prism and lens are aligned along the charged particle beam path to permit parallel delivery of the charged particle beam and the light to substantially the same portion of the sample.
摘要翻译：一种用于使用光能同时并行处理用于光学观察或与带电粒子束平行的表面处理的装置。带电粒子束沿着路径将聚焦离子束或电子束透射到样品。光学显微镜沿着第一路径将光透射到样品，并且沿着第一光路排列的棱镜将光反射到朝向样品的第二光路中。去除棱镜和反射表面的一部分以通过带电粒子束。透镜沿着第二光路对准，并且具有去除带电粒子束通过的部分。棱镜和透镜的去除部分沿着带电粒子束路径排列，以允许将带电粒子束和光平行地传送到样品的基本上相同的部分。

4. 发明申请

US20080283777A1 IN-SITU HIGH-RESOLUTION LIGHT-OPTICAL CHANNEL FOR OPTICAL VIEWING AND SURFACE PROCESSING IN PARALLEL WITH CHARGED PARTICLE (FIB AND SEM) TECHNIQUES 失效
标题翻译：用于光学观察和表面处理的现场高分辨率光通道与并联粒子（FIB和SEM）技术
公开(公告)号：US20080283777A1
公开(公告)日：2008-11-20
申请号：US11749350
申请日：2007-05-16
申请人： Steven B. Herschbein , Herschel M. Marchman , Narender Rana , Chad Rue
发明人： Steven B. Herschbein , Herschel M. Marchman , Narender Rana , Chad Rue
IPC分类号： G21K5/00
CPC分类号： H01J37/304 , H01J37/228 , H01J37/3056 , H01J2237/28 , H01J2237/31742 , H01J2237/31749
摘要： An apparatus for simultaneous parallel processing of a sample using light energy for optical viewing or surface processing in parallel with a charged particle beam. A charged particle beam transmits a focused ion beam or an electron beam along a path to a sample. An optical microscope transmits light along a first path to the sample, and a prism aligned along the first light path reflects light into a second light path toward the sample. A portion of the prism and reflective surface is removed for passage of the charged particle beam. A lens is aligned along the second light path and has a portion removed for passage of the charged particle beam. The removed portions of the prism and lens are aligned along the charged particle beam path to permit parallel delivery of the charged particle beam and the light to substantially the same portion of the sample.
摘要翻译：一种用于使用光能同时并行处理用于光学观察或与带电粒子束平行的表面处理的装置。带电粒子束沿着路径将聚焦离子束或电子束透射到样品。光学显微镜沿着第一路径将光透射到样品，并且沿着第一光路排列的棱镜将光反射到朝向样品的第二光路中。去除棱镜和反射表面的一部分以通过带电粒子束。透镜沿着第二光路对准，并且具有去除带电粒子束通过的部分。棱镜和透镜的去除部分沿着带电粒子束路径排列，以允许将带电粒子束和光平行地传送到样品的基本上相同的部分。

5. 发明授权

US06843893B2 Metal dry etch using electronic field 失效
标题翻译：金属干蚀刻使用电子领域
公开(公告)号：US06843893B2
公开(公告)日：2005-01-18
申请号：US10317679
申请日：2002-12-12
申请人： Steven B. Herschbein , Herschel M. Marchman , Chad Rue , Michael R. Sievers
发明人： Steven B. Herschbein , Herschel M. Marchman , Chad Rue , Michael R. Sievers
IPC分类号： C10B1/00 , C23F4/00 , H01B13/00 , H01L21/302 , H01L21/3213
CPC分类号： H01L21/32134 , C23F4/00
摘要： A method and structure for an apparatus for removing metal from an integrated circuit structure is disclosed. A container holds an integrated circuit structure that has a metal portion. An electronic device connected to the container produces an electronic field proximate to a limited region of the metal portion. A first supply connected to the container supplies an oxidizing agent within the container. A solvent supply connected to the container supplies solvent to the limited region of the metal portion.
摘要翻译：公开了一种用于从集成电路结构中去除金属的装置的方法和结构。容器保持具有金属部分的集成电路结构。连接到容器的电子设备产生靠近金属部分的有限区域的电子场。连接到容器的第一供应源在容器内提供氧化剂。连接到容器的溶剂供应源将溶剂供应到金属部分的有限区域。

6. 发明授权

US07119333B2 Ion detector for ion beam applications 有权
标题翻译：用于离子束应用的离子检测器
公开(公告)号：US07119333B2
公开(公告)日：2006-10-10
申请号：US10904438
申请日：2004-11-10
申请人： Steven B. Herschbein , Narender Rana , Chad Rue , Michael R. Sievers
发明人： Steven B. Herschbein , Narender Rana , Chad Rue , Michael R. Sievers
IPC分类号： G01N23/225 , H01J37/00
CPC分类号： H01J37/244 , H01J2237/2448 , H01J2237/3174
摘要： Detection of weak ion currents scattered from a sample by an ion beam is improved by the use of a multiplier system in which a conversion electrode converts incident ions to a number of secondary electrons multiplied by a multiplication factor, the secondary electrons being attracted to an electron detector by an appropriate bias. In one version, the detector is a two stage system, in which the secondary electrons strike a scintillator that emits photons that are detected in a photon detector such as a photomultiplier or a CCD.
摘要翻译：通过使用其中转换电极将入射离子转换成多个次级电子乘以乘法因子的乘法系统来提高通过离子束从样品散射的弱离子电流的检测，二次电子被吸引到电子检测器通过适当的偏差。在一个版本中，检测器是两级系统，其中二次电子撞击发射在诸如光电倍增管或CCD的光子检测器中检测到的光子的闪烁体。

7. 发明申请

US20130200501A1 IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING 审中-公开
标题翻译：通过合理接地的现场有源波形充电屏蔽
公开(公告)号：US20130200501A1
公开(公告)日：2013-08-08
申请号：US13368630
申请日：2012-02-08
申请人： Cheng Cen , Steven B. Herschbein , Narender Rana , Nedal R. Saleh , Alok Vaid
发明人： Cheng Cen , Steven B. Herschbein , Narender Rana , Nedal R. Saleh , Alok Vaid
IPC分类号： H01L21/326 , H01L29/02
CPC分类号： H01L21/326 , H01J2237/0044 , H01J2237/2817 , H01L29/0607
摘要： Embodiments of the invention relate generally to semiconductor wafer technology and, more particularly, to the use of conformal grounding for active charge screening on wafers during wafer processing and metrology. A first aspect of the invention provides a method of reducing an accumulated surface charge on a semiconductor wafer, the method comprising: grounding a layer of conductive material adjacent a substrate of the wafer; and allowing a mirrored charge substantially equal in magnitude and opposite in sign to the accumulated surface charge to be induced along the conductive material.
摘要翻译：本发明的实施例大体上涉及半导体晶片技术，更具体地，涉及在晶片处理和测量期间使用用于在晶片上进行有源电荷屏蔽的保形接地。本发明的第一方面提供了一种减少半导体晶片上累积的表面电荷的方法，所述方法包括：使邻近晶片衬底的导电材料层接地; 并且允许在幅度上基本相等并且符号相反的镜像电荷与沿导电材料诱导的累积表面电荷。

8. 发明授权

US06946064B2 Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool 失效
标题翻译：用于在聚焦离子束（FIB）工具中进行溅射沉积的样品座
公开(公告)号：US06946064B2
公开(公告)日：2005-09-20
申请号：US10604272
申请日：2003-07-08
申请人： Lawrence S. Fischer , Steven B. Herschbein , Chad Rue
发明人： Lawrence S. Fischer , Steven B. Herschbein , Chad Rue
IPC分类号： C23C14/46 , C23C14/50 , H01J37/20 , H01J37/305 , C23C14/34 , B23Q3/18
CPC分类号： H01J37/20 , C23C14/46 , C23C14/50 , H01J37/3056
摘要： A method and structure for a sample processing apparatus that uses a vacuum enclosure is disclosed. A focused ion beam tool, sputter target, movable stage, and hinged mount are all included within the vacuum enclosure. The hinged mount includes a sample mounting portion, for holding a sample being processed in the vacuum enclosure, and a counterweight portion. The counterweight portion is connected to the sample mounting portion at an approximate right angle to the sample mounting portion. More specifically, one end of the sample mounting portion is connected to one end of the counterweight portion, such that the sample mounting portion and the counterweight portion form an approximate right angle. There is also an axis around which the mount rotates. The axis passes through the sample mounting portion and the counterweight portion at a location where the sample mounting portion and the counterweight portion connect to one another.
摘要翻译：公开了一种使用真空外壳的样品处理设备的方法和结构。聚焦离子束工具，溅射靶，活动台和铰接安装座都包括在真空外壳内。铰链安装件包括用于保持在真空外壳中处理的样品的样品安装部分和配重部分。配重部分以与样品安装部分成直角的角度连接到样品安装部分。更具体地，样品安装部分的一端连接到配重部分的一端，使得样品安装部分和配重部分形成近似的直角。另外还有一个安装座旋转的轴。轴在样品安装部分和对重部分彼此连接的位置处通过样品安装部分和配重部分。

9. 发明授权

US06900137B2 Dry etch process to edit copper lines 失效
标题翻译：干蚀刻工艺来编辑铜线
公开(公告)号：US06900137B2
公开(公告)日：2005-05-31
申请号：US10249289
申请日：2003-03-28
申请人： Steven B. Herschbein , Ville S. Kiiskinen , Chad Rue , Carmelo F. Scrudato , Michael R. Sievers
发明人： Steven B. Herschbein , Ville S. Kiiskinen , Chad Rue , Carmelo F. Scrudato , Michael R. Sievers
IPC分类号： C23F4/00 , H01L21/3213 , H01I21/302
CPC分类号： C23F4/00 , H01L21/32131 , H01L21/32135
摘要： The present invention is directed to methods for editing copper features embedded within an organic body by exposing at least a portion of a top surface of the copper feature, forming a mill box there-over and then simultaneously milling both the copper feature and any organic material exposed through the mill box in a single step using an ion beam in combination with a XeF2 gas for a dwell time of at least 10 milliseconds. The invention dramatically increases the efficiency of Focused Ion Beam milling of copper features embedded in organic layers by milling these features in a gas-depleted environment at significantly increased dwell time while avoiding the problems of graphitization, destruction of the organic layer and metal redeposition.
摘要翻译：本发明涉及用于通过暴露铜特征的顶表面的至少一部分，在其上形成铣刀盒，然后同时铣削铜特征和任何有机材料来编辑嵌入有机体内的铜特征的方法在一个步骤中使用离子束与XeF 2气体一起暴露在磨机箱中，停留时间至少为10毫秒。本发明通过在气体耗尽的环境中研磨这些特征，显着增加停留时间，同时避免了石墨化，有机层破坏和金属沉积问题，从而显着提高了嵌入有机层中的铜特征的聚焦离子束研磨的效率。

10. 发明授权

US08111903B2 Inline low-damage automated failure analysis 有权
标题翻译：内联低损伤自动化故障分析
公开(公告)号：US08111903B2
公开(公告)日：2012-02-07
申请号：US12238602
申请日：2008-09-26
申请人： Steven B. Herschbein , Ronald C. Geiger, Jr. , George Y. Gu , Oleg Gluschenkov , Xu Ouyang
发明人： Steven B. Herschbein , Ronald C. Geiger, Jr. , George Y. Gu , Oleg Gluschenkov , Xu Ouyang
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148
摘要： A system and method for failure analysis of devices on a semiconductor wafer is disclosed. The present invention comprises the use of an inline focused ion beam milling tool to perform milling and image capturing of cross sections of a desired inspection point. The inspection points are located by identifying at least one fiducial that corresponds to an X-Y offset from the desired inspection point. The fiducials are recognized by a computer vision system. By automating the inspection process, the time required to perform the inspections is greatly reduced.
摘要翻译：公开了一种用于半导体晶片上的器件的故障分析的系统和方法。本发明包括使用在线聚焦离子束铣削工具来执行所需检查点的横截面的铣削和图像捕获。通过识别与期望的检查点的X-Y偏移对应的至少一个基准来定位检查点。基准由计算机视觉系统认可。通过自动化检查过程，进行检查所需的时间大大减少。

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