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1. 发明申请

WO2009085163A1 A COMPOSITE SHOWERHEAD ELECTRODE ASSEMBLY FOR A PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：用于等离子体加工设备的复合淋浴电极组件
公开(公告)号：WO2009085163A1
公开(公告)日：2009-07-09
申请号：PCT/US2008/013782
申请日：2008-12-17
申请人： LAM RESEARCH CORPORATION , LARSON, Dean, Jay , STEVENSON, Tom , WANG, Victor
发明人： LARSON, Dean, Jay , STEVENSON, Tom , WANG, Victor
IPC分类号： H01L21/205
CPC分类号： H01L21/3065 , B29C65/483 , B29C65/4835 , B29C65/4855 , B29C65/4865 , B29C65/4875 , B29C65/4885 , B29C65/5028 , B29C65/5057 , B29C65/5071 , B29C66/73111 , B29C66/73112 , B29C66/742 , B29K2305/00 , B32B37/025 , B32B37/1292 , B32B38/145 , B32B38/164 , B32B2307/202 , B32B2309/02 , B32B2309/10 , B32B2309/105 , B32B2457/00 , C23C16/45565 , H01J37/32009 , H01J37/3244 , H01J37/32541 , H01J37/3255 , H05K13/0023 , Y10T29/49 , Y10T29/49002 , Y10T29/5313 , Y10T29/532 , Y10T29/53204 , Y10T156/10 , Y10T156/1062
摘要： A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of ≥300% in a temperature range of room temperature to 3000C such as heat curable high molecular weight dimethyl silicone with fillers. The sheet form adhesive has bond thickness control for parallelism of bonded surfaces over large areas. The sheet adhesive may be cast or die cut into pre-form shapes that can conform to irregularly shaped features, maximize surface contact area with mating electrode surfaces, and installed into cavities of the mating assembly. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.
摘要翻译：用于等离子体处理装置的喷头电极包括在电极的配合表面和背衬构件之间的弹性片粘合剂粘合，以适应由于热膨胀系数的失配而在温度循环期间产生的应力。弹性体片材包括能够在室温至300℃的温度范围内承受= 300％的高剪切应变的导热硅酮粘合剂，例如具有填料的热固化高分子量二甲基硅氧烷。片状粘合剂具有用于在大面积上的接合表面的平行度的结合厚度控制。片状粘合剂可以被铸造或模切成预成形的形状，其可以符合不规则形状的特征，使与配合的电极表面的表面接触面积最大化并且安装到配合组件的空腔中。安装可以手动，手动安装工具或自动化机械。具有不同物理性质的片状粘合剂的复合层可以层压或共面。

2. 发明申请

WO2011014328A2 LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS 审中-公开
标题翻译：静电卡匣中的防眩光
公开(公告)号：WO2011014328A2
公开(公告)日：2011-02-03
申请号：PCT/US2010/040284
申请日：2010-06-29
申请人： LAM RESEARCH CORPORATION , STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
发明人： STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
IPC分类号： H01L21/687 , B23Q3/15 , H02N13/00
CPC分类号： H01L21/68757 , H01J37/32541 , H01J37/3255 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L21/6875
摘要： An electrostatic chuck assembly is provided comprising a ceramic contact layer, a patterned bonding layer, an electrically conductive base plate, and a subterranean arc mitigation layer. The ceramic contact layer and the electrically conductive base plate cooperate to define a plurality of hybrid gas distribution channels formed in a subterranean portion of the electrostatic chuck assembly. Individual ones of the hybrid gas distribution channels comprise surfaces of relatively high electrical conductivity presented by the electrically conductive base plate and relatively low electrical conductivity presented by the ceramic contact layer. The subterranean arc mitigation layer comprises a layer of relatively low electrical conductivity and is formed over the relatively high conductivity surfaces of the hybrid gas distribution channels in the subterranean portion of the electrostatic chuck assembly. Semiconductor wafer processing chambers are also provided.
摘要翻译：提供了一种静电吸盘组件，其包括陶瓷接触层，图案化的接合层，导电基板和地下电弧缓和层。陶瓷接触层和导电基板共同限定形成在静电吸盘组件的地下部分中的多个混合气体分配通道。混合气体分配通道中的各个混合气体分配通道包括由导电基板呈现的相对高电导率的表面以及由陶瓷接触层呈现的相对低的电导率。地下电弧缓和层包括具有相对低电导率的层并形成在静电吸盘组件的地下部分中的混合气体分配通道的相对高导电性表面上。还提供了半导体晶圆处理室。

3. 发明申请

WO2012017378A2 METHODS FOR STABILIZING CONTACT SURFACES OF ELECTROSTATIC CHUCKS 审中-公开
标题翻译：稳定静电卡接触表面的方法
公开(公告)号：WO2012017378A2
公开(公告)日：2012-02-09
申请号：PCT/IB2011/053417
申请日：2011-08-01
申请人： LAM RESEARCH CORPORATION , LAM RESEARCH AG , KIMBALL, Chris , STEVENSON, Tom , MURAOKA, Peter
发明人： KIMBALL, Chris , STEVENSON, Tom , MURAOKA, Peter
IPC分类号： H01L21/683 , H01L21/687 , B23Q3/15 , H02N13/00
CPC分类号： B08B7/0064 , B08B1/00 , H01L21/6831
摘要： Methods for stabilizing a ceramic contact surface of an electrostatic chuck, wherein the electrostatic chuck can be disposed within a reaction chamber of a semiconductor wafer processing assembly including a radio frequency source and a coolant gas supply are described herein. The method may include: clamping electrostatically a conditioning wafer to the ceramic contact surface of the electrostatic chuck; and cycling an output power of the radio frequency source and an output pressure of the coolant gas supply for multiple hot/cold cycles. Each of the hot/cold cycles includes a hot abrasion state and a cold abrasion state. At the hot abrasion state, the output power of the radio frequency source is relatively high and the output pressure of the coolant gas supply is relatively low to yield a relatively hot conditioning wafer. At the cold abrasion state, the output power of the radio frequency source is relatively low and the output pressure of the coolant gas supply is relatively high to yield a relatively cool conditioning wafer.
摘要翻译：本文描述了用于稳定静电吸盘的陶瓷接触表面的方法，其中静电吸盘可以设置在包括射频源和冷却剂气体供应源的半导体晶片处理组件的反应室内。该方法可以包括：将调节晶片静电夹持到静电吸盘的陶瓷接触表面; 以及循环所述射频源的输出功率和所述冷却剂气体供应的输出压力以用于多个热/冷循环。每个热/冷循环包括热磨损状态和冷磨损状态。在热磨损状态下，射频源的输出功率相对较高并且冷却剂气体供应的输出压力相对较低以产生相对热的调节晶片。在冷磨损状态下，射频源的输出功率相对较低，并且冷却剂气体供应的输出压力相对较高，以产生相对较冷的调节晶片。

4. 发明申请

WO2009151538A1 SHOWERHEAD ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES 审中-公开
标题翻译：用于等离子体加工设备的淋浴电极组件
公开(公告)号：WO2009151538A1
公开(公告)日：2009-12-17
申请号：PCT/US2009/003186
申请日：2009-05-22
申请人： LAM RESEARCH CORPORATION , STEVENSON, Tom , DHINDSA, Rajinder
发明人： STEVENSON, Tom , DHINDSA, Rajinder
IPC分类号： H01L21/3065 , H01L21/205 , H05H1/34
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/52 , H01J37/32091 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , H01L21/67069
摘要： Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact regions across the backing plate; and at least one interface member separating the backing plate and the thermal control plate, or the thermal control plate and showerhead electrode, at the contact regions, the interface member having a thermally and electrically conductive gasket portion and a particle mitigating seal portion. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.
摘要翻译：公开了一种喷头电极组件，其包括适于安装在真空室内部的喷头电极; 连接到喷头电极的可选背板; 热控制板，其在跨过所述背板的多个接触区域附接到所述背板或所述喷头电极; 以及至少一个界面构件，其在所述接触区域处分离所述背板和所述热控制板或所述热控制板和喷头电极，所述界面构件具有导热和导电的垫圈部分和颗粒减轻密封部分。还公开了使用喷头电极组件处理半导体衬底的方法。

5. 发明申请

WO2009078923A2 FILM ADHESIVE FOR SEMICONDUCTOR VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：半导体真空处理装置的薄膜粘合剂
公开(公告)号：WO2009078923A2
公开(公告)日：2009-06-25
申请号：PCT/US2008/013466
申请日：2008-12-18
申请人： LAM RESEARCH CORPORATION , LARSON, Dean Jay , STEVENSON, Tom , WANG, Victor
发明人： LARSON, Dean Jay , STEVENSON, Tom , WANG, Victor
CPC分类号： H01L21/67069 , B32B37/12 , H01L21/67103 , H01L21/68757 , Y10T156/10 , Y10T156/1062 , Y10T428/31504
摘要： A bonded assembly to reduce particle contamination in a semiconductor vacuum chamber such as a plasma processing apparatus is provided, including an elastomeric sheet adhesive bond between mating surfaces of a component and a support member to accommodate thermal stresses. The elastomeric sheet comprises a silicone adhesive to withstand a high shear strain of =800% at a temperature range between room temperature and 300°C such as heat curable high molecular weight dimethyl silicone with optional fillers. The sheet form has bond thickness control for parallelism of bonded surfaces. The sheet adhesive may be cut into pre-form shapes to conform to regularly or irregularly shaped features, maximize surface contact area with mating parts, and can be installed into cavities. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.
摘要翻译：提供了一种减少诸如等离子体处理设备的半导体真空室中的粒子污染的结合组件，其包括在部件和支撑构件的配合表面之间的弹性体片粘合剂结合以适应热应力。该弹性体片材包含有机硅粘合剂以在室温和300℃之间的温度范围内承受800％的高剪切应变，例如具有任选填料的可热固化高分子量二甲基硅氧烷。片材形式具有粘合厚度控制，用于粘合表面的平行度。可以将片状粘合剂切割成预成型形状以符合规则或不规则形状的特征，使与配合部件的表面接触面积最大化，并且可以将其安装到腔体中。可以手动安装，也可以使用安装工具手动安装，也可以使用自动化机械。具有不同物理特性的片状粘合剂复合层可以层压或共面。

6. 发明授权

EP2301067B1 SHOWERHEAD ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES 有权
公开(公告)号：EP2301067B1
公开(公告)日：2018-07-11
申请号：EP09762834.1
申请日：2009-05-22
申请人： Lam Research Corporation
发明人： STEVENSON, Tom , DHINDSA, Rajinder
IPC分类号： H01L21/3065 , H01L21/205 , C23C16/509 , H01J37/32 , C23C16/455 , C23C16/52
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/52 , H01J37/32091 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , H01L21/67069
摘要： Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact regions across the backing plate; and at least one interface member separating the backing plate and the thermal control plate, or the thermal control plate and showerhead electrode, at the contact regions, the interface member having a thermally and electrically conductive gasket portion and a particle mitigating seal portion. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.

7. 发明公开

EP2460179A2 LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS 审中-公开
标题翻译：点火保护在静电吸盘
公开(公告)号：EP2460179A2
公开(公告)日：2012-06-06
申请号：EP10804865.3
申请日：2010-06-29
申请人： LAM Research Corporation
发明人： STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
IPC分类号： H01L21/687 , B23Q3/15 , H02N13/00 , H01L21/683 , C23C16/458
CPC分类号： H01L21/68757 , H01J37/32541 , H01J37/3255 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L21/6875
摘要： An electrostatic chuck assembly is provided comprising a ceramic contact layer, a patterned bonding layer, an electrically conductive base plate, and a subterranean arc mitigation layer. The ceramic contact layer and the electrically conductive base plate cooperate to define a plurality of hybrid gas distribution channels formed in a subterranean portion of the electrostatic chuck assembly. Individual ones of the hybrid gas distribution channels comprise surfaces of relatively high electrical conductivity presented by the electrically conductive base plate and relatively low electrical conductivity presented by the ceramic contact layer. The subterranean arc mitigation layer comprises a layer of relatively low electrical conductivity and is formed over the relatively high conductivity surfaces of the hybrid gas distribution channels in the subterranean portion of the electrostatic chuck assembly. Semiconductor wafer processing chambers are also provided.

8. 发明公开

EP2301067A1 SHOWERHEAD ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES 有权
标题翻译：花洒电极组件等离子处理设备
公开(公告)号：EP2301067A1
公开(公告)日：2011-03-30
申请号：EP09762834.1
申请日：2009-05-22
申请人： Lam Research Corporation
发明人： STEVENSON, Tom , DHINDSA, Rajinder
IPC分类号： H01L21/3065 , H01L21/205 , H05H1/34
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/52 , H01J37/32091 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , H01L21/67069
摘要： Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact regions across the backing plate; and at least one interface member separating the backing plate and the thermal control plate, or the thermal control plate and showerhead electrode, at the contact regions, the interface member having a thermally and electrically conductive gasket portion and a particle mitigating seal portion. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.

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