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1. 发明申请

WO2006071535A3 SILICON ELECTRODE ASSEMBLY SURFACE DECONTAMINATION BY ACIDIC SOLUTION 审中-公开
标题翻译：硅电极组件表面去酸化酸性溶液
公开(公告)号：WO2006071535A3
公开(公告)日：2007-05-10
申请号：PCT/US2005045273
申请日：2005-12-14
申请人： LAM RES CORP , SHIH HONG , HUANG TUOCHUAN , ZHOU CHUNHONG
发明人： SHIH HONG , HUANG TUOCHUAN , ZHOU CHUNHONG
IPC分类号： H01L21/302 , C11D7/32 , H01L21/461
CPC分类号： C11D11/0047 , C11D7/08 , Y10T137/0329
摘要： Methods for cleaning silicon surfaces of electrode assemblies by efficiently removing contaminants from the silicon surfaces without discoloring the silicon surfaces using an acidic solution comprising hydrofluoric acid, nitric acid, acetic acid, and balance deionized water.
摘要翻译：通过使用包含氢氟酸，硝酸，乙酸和平衡去离子水的酸性溶液有效地从硅表面去除污染物而不使硅表面变色来清洁电极组件的硅表面的方法。

2. 发明申请

WO2006071544A3 METHODS FOR SILICON ELECTRODE ASSEMBLY ETCH RATE AND ETCH UNIFORMITY RECOVERY 审中-公开
标题翻译：用于硅电极组装蚀刻速率和蚀刻均匀性恢复的方法
公开(公告)号：WO2006071544A3
公开(公告)日：2007-08-16
申请号：PCT/US2005045361
申请日：2005-12-15
申请人： LAM RES CORP , HUANG TUOCHUAN , REN DAXING , SHIH HONG , ZHOU CATHERINE , YAN CHUN , MAGNI ENRICO , YEN BI MING , HUBACEK JEROME , LIM DAE J , SUNG DOUGYONG
发明人： HUANG TUOCHUAN , REN DAXING , SHIH HONG , ZHOU CATHERINE , YAN CHUN , MAGNI ENRICO , YEN BI MING , HUBACEK JEROME , LIM DAE J , SUNG DOUGYONG
IPC分类号： B24B1/00
CPC分类号： H01L21/67069 , B08B3/10 , B08B3/12 , B24C1/003 , H01J37/32605
摘要： Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
摘要翻译：用于清洁电极组件的方法，其可用于在清洁之后蚀刻等离子体蚀刻室中的电介质材料，包括抛光电极组件的硅表面，优选从其中去除黑色硅污染物。

3. 发明申请

WO2010042908A2 SYSTEM AND METHOD FOR TESTING AN ELECTROSTATIC CHUCK 审中-公开
标题翻译：用于测试静电卡盘的系统和方法
公开(公告)号：WO2010042908A2
公开(公告)日：2010-04-15
申请号：PCT/US2009060290
申请日：2009-10-10
申请人： LAM RES CORP , SHIH HONG , ULLAL SAURABH , HUANG TUOCHUAN , FANG YAN , MCCHESNEY JON
发明人： SHIH HONG , ULLAL SAURABH , HUANG TUOCHUAN , FANG YAN , MCCHESNEY JON
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6833
摘要： The present invention provides a reliable, non-invasive, electrical test method for predicting satisfactory performance of electrostatic chucks (ESCs). In accordance with an aspect of the present invention, a parameter, e.g., impedance, of an ESC is measured over a frequency band to generate a parameter functions. This parameter function may be used to establish predetermined acceptable limits of the parameter within the frequency band.
摘要翻译：本发明提供了用于预测静电卡盘（ESC）的令人满意的性能的可靠的非侵入式电测试方法。根据本发明的一个方面，在频带上测量ESC的参数，例如阻抗，以产生参数功能。该参数功能可用于建立频带内参数的预定可接受极限。

4. 发明申请

WO2006060234A3 WET CLEANING OF ELECTROSTATIC CHUCKS 审中-公开
标题翻译：静电清洁剂的清洁
公开(公告)号：WO2006060234A3
公开(公告)日：2006-07-20
申请号：PCT/US2005042294
申请日：2005-11-21
申请人： LAM RES CORP , SHIH HONG , HUANG TUOCHUAN , ZHOU CATHERINE , MOREL BRUNO , MCMILLIN BRIAN , MULGREW PAUL , AVOYAN ARMEN
发明人： SHIH HONG , HUANG TUOCHUAN , ZHOU CATHERINE , MOREL BRUNO , MCMILLIN BRIAN , MULGREW PAUL , AVOYAN ARMEN
IPC分类号： B08B3/12 , B08B3/00 , B08B3/10 , B08B3/14 , B08B5/00 , B08B6/00 , B08B7/00 , B08B7/02 , C23G1/02
CPC分类号： H01L21/6831 , B08B3/12 , H01L21/6704
摘要： A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
摘要翻译：用于清洁新的或使用过的静电卡盘的非破坏性和简单的方法包括湿式清洁工艺，其去除沉积在静电卡盘的表面上的污染物。

5. 发明申请

WO2005123282A2 METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA PROCESSING CHAMBERS 审中-公开
标题翻译：用于等离子体处理室的组件的清洁清洗表面的方法
公开(公告)号：WO2005123282A2
公开(公告)日：2005-12-29
申请号：PCT/US2005019466
申请日：2005-06-03
申请人： LAM RES CORP , SHIH HONG , HUANG TUOCHUAN , OUTKA DUANE , KUO JACK , LIU SHENJIAN , MOREL BRUNO , CHEN ANTHONY
发明人： SHIH HONG , HUANG TUOCHUAN , OUTKA DUANE , KUO JACK , LIU SHENJIAN , MOREL BRUNO , CHEN ANTHONY
IPC分类号： B08B3/12 , C23C16/00 , C23C16/44
CPC分类号： C23C16/4407 , H01J37/32862
摘要： Methods for wet cleaning quartz surfaces of components for plasma processing chambers in which semiconductor substrates are processed, such as etch chambers and resist stripping chambers, include contacting the quartz surface with at least one organic solvent, a basic solution and different acid solutions, so as to remove organic and metallic contaminants from the quartz surface. The quartz surface is preferably contacted with one of the acid solutions at least two times.
摘要翻译：用于湿处理其中处理半导体衬底的等离子体处理室的部件的石英表面的方法，例如蚀刻室和抗蚀剂剥离室，包括使石英表面与至少一种有机溶剂，碱性溶液和不同的酸溶液接触，以便以从石英表面去除有机和金属污染物。石英表面优选与一种酸溶液接触至少两次。

6. 发明申请

WO2012061362A3 ELECTRODE SECURING PLATENS AND ELECTRODE POLISHING ASSEMBLIES INCORPORATING THE SAME 审中-公开
标题翻译：电极固定平板和电极抛光组件并入其中
公开(公告)号：WO2012061362A3
公开(公告)日：2012-09-07
申请号：PCT/US2011058745
申请日：2011-11-01
申请人： LAM RES CORP , LA CROIX CLIFF , AVOYAN ARMEN , OUTKA DUANE , ZHOU CATHERINE , SHIH HONG
发明人： LA CROIX CLIFF , AVOYAN ARMEN , OUTKA DUANE , ZHOU CATHERINE , SHIH HONG
IPC分类号： H01L21/304
CPC分类号： B24B37/30 , B24B41/061
摘要： In one embodiment, an electrode polishing assembly may include an electrode securing platen, a plurality of electrode locating fasteners, and an electrode. Each of the electrode locating fasteners may include an electrode spacing shoulder, a variance cancelling shoulder extending from the electrode spacing shoulder, a threaded platen clamping portion extending from the variance cancelling shoulder, and a threaded nut that engages the threaded platen clamping portion. The electrode locating fasteners clamp the electrode securing platen between the threaded nut and the electrode spacing shoulder. The variance cancelling shoulder is at least partially within one of a plurality of variance cancelling passages of the electrode securing platen. A minimum position stack-up is equal to a minimum passage size minus a maximum shoulder size. A maximum position stack-up is equal to a maximum passage size minus a minimum shoulder size. The maximum position stack-up is greater than the minimum position stack-up.
摘要翻译：在一个实施例中，电极抛光组件可以包括电极固定台板，多个电极定位紧固件和电极。每个电极定位紧固件可以包括电极间隔肩部，从电极间隔肩部延伸的变化抵消肩部，从变化抵消肩部延伸的螺纹压板夹紧部分以及与螺纹压板夹紧部分接合的螺纹螺母。电极定位紧固件将电极固定板夹紧在螺母和电极间隔肩之间。方差消除肩部至少部分在电极固定台板的多个方差消除通道中的一个之内。最小位置叠加等于最小通道尺寸减去最大肩部尺寸。最大位置叠加等于最大通道尺寸减去最小肩部尺寸。最大位置叠加大于最小位置叠加。

7. 发明申请

WO2011084127A3 METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM AN UPPER ELECTRODE USED IN A PLASMA CHAMBER 审中-公开
标题翻译：用于在等离子室中使用上电极清洁表面金属污染的方法
公开(公告)号：WO2011084127A3
公开(公告)日：2011-10-13
申请号：PCT/US2010003092
申请日：2010-12-06
申请人： LAM RES CORP , SHIH HONG , AVOYAN ARMEN , DESHMUKH SHASHANK C , CARMAN DAVID
发明人： SHIH HONG , AVOYAN ARMEN , DESHMUKH SHASHANK C , CARMAN DAVID
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： B08B3/08
摘要： A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.
摘要翻译：一种用于从等离子体室中使用的上电极清除金属污染物的方法。该方法包括将上电极浸泡在浓氢氧化铵，过氧化氢和水的清洁溶液中的步骤。清洁液不含氢氟酸和盐酸。该方法还包括将上电极浸泡在稀硝酸中并冲洗清洁后的上电极的可选步骤。

8. 发明申请

WO2010042907A3 METHOD OF REFURBISHING BIPOLAR ELECTROSTATIC CHUCK 审中-公开
标题翻译：改造双极性静电卡车的方法
公开(公告)号：WO2010042907A3
公开(公告)日：2010-07-15
申请号：PCT/US2009060289
申请日：2009-10-10
申请人： LAM RES CORP , SHIH HONG
发明人： SHIH HONG
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6833 , H02N13/00 , Y10T29/49004 , Y10T29/49155 , Y10T29/49718 , Y10T29/49719 , Y10T29/49746
摘要： A bipolar electrostatic chuck refurbishing process in accordance with an aspect of the present invention does not require physical separation of the two electrodes of the electrostatic chuck. One aspect of the present invention is drawn to method of treating a bipolar electrostatic chuck having a front surface and a back surface and comprising a first electrode disposed at the front surface, a second electrode at the front surface and an anodized layer disposed on the front surface, the first electrode and the second electrode. The method comprises measuring a first parameter of the electrostatic chuck, discarding the electrostatic chuck if the first measured parameter is not within a first predetermined range, cleaning the electrostatic chuck if the first measured parameter is within the first predetermined range, sealing gaps between the first electrode and the second electrode at the front surface with a sealant, without displacing the first electrode relative to the second electrode, eliminating the anodized layer; and disposing a new anodized layer onto the front surface, the first electrode and the second electrode.
摘要翻译：根据本发明的一个方面的双极静电卡盘翻新工艺不需要静电卡盘的两个电极的物理分离。本发明的一个方面涉及一种处理具有前表面和后表面的双极静电卡盘的方法，所述双极性静电卡盘包括位于前表面处的第一电极，在前表面处的第二电极和设置在前表面上的阳极氧化层表面，第一电极和第二电极。该方法包括测量静电卡盘的第一参数，如果第一测量参数不在第一预定范围内，则将静电卡盘丢弃;如果第一测量参数在第一预定范围内，则清洁静电卡盘;密封第一测量参数之间的间隙电极和第二电极在前表面具有密封剂，而不相对于第二电极移动第一电极，消除阳极氧化层; 以及在所述前表面，所述第一电极和所述第二电极上设置新的阳极氧化层。

9. 发明申请

WO2010002724A2 PERIPHERALLY ENGAGING ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 审中-公开
标题翻译：外围接触电极载体和组装体
公开(公告)号：WO2010002724A2
公开(公告)日：2010-01-07
申请号：PCT/US2009048797
申请日：2009-06-26
申请人： LAM RES CORP , AUGUSTINO JASON , AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
发明人： AUGUSTINO JASON , AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
IPC分类号： H05H1/34
CPC分类号： H01J37/32541 , H01J37/32009 , H01J37/32605 , H01L21/67069
摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.
摘要翻译：根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。外围接合电极载体包括载体框架和多个往复电极支撑件。多组分电极位于载体框架的电极容纳孔中。电极的背板包括围绕其周边形成的多个安装凹部。往复式电极支撑件可以往复运动进入和离开安装凹槽。考虑到更广泛和更窄范围的另外的实施例。

10. 发明申请

WO2007037955A3 ACTIVELY HEATED ALUMINUM BAFFLE COMPONENT HAVING IMPROVED PARTICLE PERFORMANCE AND METHODS OF USE AND MANUFACTURE THEREOF 审中-公开
标题翻译：具有改进颗粒性能的活性加热铝粉组分及其使用和制备方法
公开(公告)号：WO2007037955A3
公开(公告)日：2007-12-06
申请号：PCT/US2006035238
申请日：2006-09-11
申请人： LAM RES CORP , SHIH HONG , PENG G GRANT , REN DAXING
发明人： SHIH HONG , PENG G GRANT , REN DAXING
IPC分类号： H01L21/306 , C23C16/00 , C23C16/455 , C23C16/50 , C25D5/00 , C25D5/44
CPC分类号： H01L21/3065 , C23C16/4401 , C25D11/04 , H01J37/32623 , H01J37/32633 , H01L21/02041 , H01L21/67069
摘要： An actively heated aluminum baffle component such as a thermal control plate (101) or baffle ring (120) of a showerhead electrode assembly (100) of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer dupng plasma processing compared to an identically shaped component having a Type III anodized surface.
摘要翻译：诸如等离子体处理室的喷头电极组件（100）的热控制板（101）或挡板环（120）的主动加热的铝挡板部件具有通过电抛光工艺形成的露出的外部氧化铝层。暴露的外部氧化铝层与由具有III型阳极氧化表面的相同形状的部件相比，由于铝部件和外部氧化铝层复制等离子体处理所经受的差异热应力而产生的缺陷和颗粒最小化。

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