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    • 4. 发明授权
    • Device for applying high voltage using pulse voltage, and method of applying high voltage
    • 使用脉冲电压施加高压的装置以及施加高电压的方法
    • US09130480B2
    • 2015-09-08
    • US13395905
    • 2010-11-24
    • Tomonori Miura
    • Tomonori Miura
    • H03K3/017H02M7/5387
    • H02M7/53871H03K2217/0045
    • A device for applying a high voltage using a pulse voltage is provided which applies a high voltage having a pulse width τ0 to a capacitive load (1) through a pulse transformer (4), the high voltage having pulse-like peaks with a steep leading edge, wherein a capacitance C1 of the capacitive load (1) and a secondary side leakage inductance L1 of the pulse transformer (4) satisfy the equation: L1=(τ0/π)2×(1/C1). This enables enlargement of the pulse-like peaks and application of any pulse repetition frequency when the high voltage having the pulse-like peaks is applied to the capacitive load through the pulse transformer.
    • 提供了一种使用脉冲电压施加高电压的装置,其通过脉冲变压器(4)将具有脉冲宽度τ0的高电压施加到电容性负载(1),该高电压具有陡峭的引线 边缘,其中电容性负载(1)的电容C1和脉冲变压器(4)的次级侧漏电感L1满足等式:L1 =(τ0/&pgr;)2×(1 / C1)。 当具有脉冲峰值的高电压通过脉冲变压器施加到电容性负载时,能够扩大脉冲峰值和施加任何脉冲重复频率。
    • 10. 发明申请
    • POLISHING METHOD AND POLISHING APPARATUS
    • 抛光方法和抛光装置
    • US20120220200A1
    • 2012-08-30
    • US13496685
    • 2010-08-20
    • Hiroto FukushimaAkira HoriguchiKen IsobeTomonori MiuraShoji Nakao
    • Hiroto FukushimaAkira HoriguchiKen IsobeTomonori MiuraShoji Nakao
    • B24B47/10B24B57/00B24B1/00
    • B24B37/042B24B37/08B24B37/345H01L21/68H01L21/6838H01L21/68707
    • To propose a method for realizing appropriate delivering of works to carriers in the conventional transfer process. Specifically, in a polishing method for polishing a work retained in a carrier, at least one carrier for retaining a work to be polished is placed between an upper plate and a lower plate; the work is fit in a hole of the carrier; the carrier and the work are inserted between the upper plate and the lower plate; and at least one of the upper plate and the lower plate is rotated while supplying a polishing agent to a space between the upper plate and the lower plate. In fitting the work in the hole of the carrier, an end portion of the work is held and the work is carried to a position above the lower plate; the work is positioned with respect to the hole of the carrier on the lower plate; and the work is released from the hold and guided by a guide to be slowly carried down toward the hole.
    • 提出一种在常规传输过程中实现对载体的适当传递的方法。 具体而言,在用于研磨保留在载体中的工件的研磨方法中,将至少一个用于保持待抛光的工件的载体放置在上板和下板之间; 工作适合承运人的一个洞; 载体和工件插入在上板和下板之间; 并且在将抛光剂供给到上板和下板之间的空间的同时旋转上板和下板中的至少一个。 在将工件装配在承载件的孔中时,工件的端部被保持并将工件运送到下板上方的位置; 工件相对于下板上的托架的孔定位; 工作由保持架释放出来,由导向器引导,慢慢地朝向洞穴移动。