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1. 发明专利

JP2011189318A Operation method for ion exchange device 有权
标题翻译：离子交换装置的操作方法
公开(公告)号：JP2011189318A
公开(公告)日：2011-09-29
申请号：JP2010059391
申请日：2010-03-16
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： FUKUI NAGAO , MORITA HIROSHI
IPC分类号： C02F1/42
摘要： PROBLEM TO BE SOLVED: To provide an operation method for an ion exchange device which can prevent deterioration of water quality due to elution of organic substances and the like from a new ion exchange resin.
SOLUTION: In the operation method for an ion exchange device having a first to n-th (n is an integer of 4 or larger) ion exchangers where, after water is passed through the first to n-th ion exchangers in this order, the first ion exchanger is subjected to maintenance and then water supply order is changed to restart water supply, the water supply order after the restart of the water supply is set so that the n-1-th ion exchanger, which has been the second from the tail end, is the tail end, the first ion exchanger subjected to the maintenance is the second from the tail end, and other ion exchangers are in the ascending order of their orders till then.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以防止由于新离子交换树脂有机物等的洗脱而导致的水质恶化的离子交换装置的操作方法。解决方案：在具有第一至第n（n为4以上的整数）的离子交换装置的操作方法中，在这种离子交换器中，在水通过第一至第n离子交换器之后，对第一离子交换器进行维护，然后改变供水顺序重新开始供水，设定供水重启后的供水顺序，使得第一离子交换器已经被从尾端开始，是尾端，经过维护的第一个离子交换器是尾端的第二个离子交换器，其他离子交换器按照它们的顺序升序。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010095737A Oxidation device for surface of solid organic matter 有权
标题翻译：固体有机物表面氧化装置
公开(公告)号：JP2010095737A
公开(公告)日：2010-04-30
申请号：JP2008265559
申请日：2008-10-14
申请人： Kurita Water Ind Ltd , Toyota Motor Corp , トヨタ自動車株式会社 , 栗田工業株式会社
发明人： IWASAKI MAMORU , MORITA HIROSHI , YANAGIMOTO HIROSHI , BESSHO TAKESHI , SHINOHARA NOBUKI
IPC分类号： C23C18/20
摘要： PROBLEM TO BE SOLVED: To provide an oxidation device for the surfaces of solid organic matters using ozone water, which attains the acceleration of ozone oxidation and the suppression of ozone decomposition in combination. SOLUTION: The device is provided with: a pretreatment tank 1 packed with an ozone oxidation accelerator; and an ozone treatment apparatus 2 having an ozone water treatment tank 3. The pretreatment tank 1 is filled with an ozone oxidation accelerator Q, and workpieces P are held by a plurality of fixing holders 4 capable of reciprocating between the pretreatment tank 1 and the ozone water treatment tank 3 by a driving apparatus not shown in the figure. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供使用臭氧水的固体有机物表面的氧化装置，其结合了臭氧氧化的加速和臭氧分解的抑制。解决方案：装置设有：装有臭氧氧化促进剂的预处理槽1; 以及具有臭氧水处理槽3的臭氧处理装置2.预处理槽1填充有臭氧氧化促进剂Q，工件P由能够在预处理槽1和臭氧之间往复运动的多个固定保持件4保持水处理槽3由未图示的驱动装置。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2009027023A Manufacturing method and apparatus for wafer cleaning liquid 审中-公开
标题翻译：用于清洗液体的制造方法和装置
公开(公告)号：JP2009027023A
公开(公告)日：2009-02-05
申请号：JP2007189757
申请日：2007-07-20
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： CHUMA TAKAAKI , NAGAI TATSUO , MORITA HIROSHI
IPC分类号： H01L21/304 , B01D61/44 , B01D61/46 , B01D61/48 , C11D3/39 , C11D7/18
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method and apparatus for wafer cleaning liquid, capable of manufacturing a sulfuric peroxide aqueous solution by an inexpensive apparatus.
SOLUTION: A bipolar film 5 is arranged most closely to a cathode 2, and a cathode chamber 6 is formed between the cathode 2 and the bipolar film 5. From the bipolar film 5 to an anode, a cation exchange film 4 and the bipolar film 5 are arrayed alternately in the order. The bipolar film 5 is arranged most closely to the anode 5. A cation moving chamber 7 is arranged on the side of the cathode 2 of the cation exchange film 4 arranged between a pair of bipolar films 5, and a treating chamber 8 is formed on the side of the anode 3 of the cation exchange film 4. A persulfate aqueous solution inside a tank 15 for circulation is supplied through a pump 16 and piping 11 to each treating chamber 8.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够通过廉价的装置制造硫酸过氧化物水溶液的晶片清洗液的制造方法和装置。解决方案：双极性膜5最靠近阴极2布置，阴极室6形成在阴极2和双极性膜5之间。从双极膜5到阳极，阳离子交换膜4和双极性膜5按顺序交替排列。双极性膜5最靠近阳极5.阳离子移动室7设置在布置在一对双极性膜5之间的阳离子交换膜4的阴极2侧，处理室8形成在阳离子交换膜4的阳极3的侧面。用于循环的罐15内的过硫酸盐水溶液通过泵16和管道11供给到每个处理室8.版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2009021419A Method and device for cleaning substrate 有权
标题翻译：清洗基板的方法和装置
公开(公告)号：JP2009021419A
公开(公告)日：2009-01-29
申请号：JP2007183234
申请日：2007-07-12
申请人： Kurita Water Ind Ltd , Renesas Technology Corp , 栗田工業株式会社 , 株式会社ルネサステクノロジ
发明人： HIROTA YUSAKU , SUGANO ITARU , MORITA HIROSHI , IDA JUNICHI
IPC分类号： H01L21/304 , B08B3/02 , B08B3/10 , B08B3/12 , G02F1/13 , G02F1/1333 , H01L21/306
CPC分类号： H01L21/67086 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide a high efficiency cleaning method for a substrate which does not damage a fine pattern on the substrate.
SOLUTION: This cleaning method for the substrate according to a batch-type dip-treatment method makes a single substrate or a plurality of substrates one batch, and includes the processes of immersing one batch of the substrates in a wet-etching liquid, carrying out ultrasonic cleaning, and drying. In the ultrasonic cleaning process, the cleaning water whose saturation degree of a dissolved gas under atmospheric pressure being 60%-100% is used, the frequency of the ultrasonic wave is 500 kHz or more, and the output of the ultrasonic wave is 0.02 W/cm
2 -0.5 W/cm
2 .
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供不损害基板上的精细图案的基板的高效清洁方法。解决方案：根据间歇式浸渍处理方法的该基板的清洗方法使一个基板或多个基板成为一批，并且包括将一批基板浸入湿蚀刻液中的工序，进行超声波清洗和干燥。在超声波清洗工序中，使用大气压下的溶解气体的饱和度为60％-100％的清洗水，超声波的频率为500kHz以上，超声波的输出为0.02W /cm2-0.5 W / cm 2 。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2008166404A Wash water for hydrophobic silicon wafer, and cleaning method using the same 审中-公开
标题翻译：用于疏水硅膜的洗涤水和使用其的清洁方法
公开(公告)号：JP2008166404A
公开(公告)日：2008-07-17
申请号：JP2006352646
申请日：2006-12-27
申请人： Kurita Water Ind Ltd , Siltronic Ag , ジルトロニックアクチエンゲゼルシャフトSiltronic AG , 栗田工業株式会社
发明人： MORI TAKASHI , SHINBARA TERUO , MORI YOSHIHIRO , MORITA HIROSHI , IDA JUNICHI
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide rinsing water for hydrophobic silicon wafers capable of providing a high-quality silicon wafer by reducing the surface roughness generated in a cleaning process, and to provide a cleaning method that uses the rinsing water.
SOLUTION: The rinsing water is solution, containing not less than 1.0 ppm hydrogen gas, ammonium or TMAH, and hydrogen peroxide. When the rinsing water contains ammonia, the concentration of the ammonia ranges from 300 to 2,000 ppm, and the concentration of hydrogen peroxide ranges from 400 to 1,500 ppm, preferably not lower than (0.8 × ammonium concentration) ppm. When the rinsing water contains TMAH, preferably, the concentration is within a range of 50-2,000 ppm, and the concentration of hydrogen peroxide is not lower than (0.2 × TMAH concentration) ppm.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够通过降低在清洁过程中产生的表面粗糙度来提供高质量硅晶片的疏水性硅晶片的冲洗水，并提供使用冲洗水的清洁方法。解决方案：冲洗水是含有不少于1.0ppm氢气，铵或TMAH和过氧化氢的溶液。当漂洗水含有氨时，氨的浓度范围为300〜2000ppm，过氧化氢浓度为400〜1500ppm，优选为（0.8×铵浓度）ppm。当漂洗水含有TMAH时，优选浓度在50-2000ppm的范围内，并且过氧化氢浓度不低于（0.2×TMAH浓度）ppm。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2008119611A Apparatus and method for manufacture of gas-dissolved cleaning water 有权
标题翻译：气体清洗水的制造装置及其制造方法
公开(公告)号：JP2008119611A
公开(公告)日：2008-05-29
申请号：JP2006306843
申请日：2006-11-13
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： B01F1/00 , B01D19/00 , B01D53/22 , B01D61/00 , B01F5/06 , C02F1/20
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for manufacture of gas-dissolved cleaning water which enable efficient, stable and safe provision of gas-dissolved cleaning water for cleaning of e.g. electronic parts dissolved with a required concentration of a specific gas with the amount of the used gas saved.
SOLUTION: The apparatus for manufacture of gas-dissolved cleaning water has a pressurization dissolution section which dissolves a specific gas in water in a supersaturation under pressurized conditions with respect to an atmospheric pressure and a supersaturation removal section which removes the supersaturated portion of the gas, and a reserve dissolution section having a gas-permeable membrane module is arranged on the primary side in the pressurization dissolution section so as to supply a specific gas to the gas-phase chamber. The method of manufacturing gas-dissolved cleaning water employs the apparatus having a reservoir tank, a hydraulic pump, a cleaning mechanism removing foreign matter, the pressurization dissolution section and the supersaturation removal section and comprises measuring the concentration of the gas dissolved on the primary side of the pressurization dissolution section of the secondary side of the supersaturation removal section and adjusting the flow rate or the pressure of a specific gas to be supplied to the pressurization dissolution section according to the measured value so as to generate water dissolved with a specific gas in a required concentration.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于制造气体溶解的清洁水的装置和方法，其能够有效，稳定和安全地提供用于清洁例如水的溶解的清洁水。以特定气体的所需浓度溶解电子部件，节省了用过的气体量。解决方案：用于制造气体溶解的清洁水的装置具有加压溶解部分，该加压溶解部分在加压条件下相对于大气压和过饱和除去部分在过饱和中溶解特定气体，该部分除去过饱和部分气体和具有透气膜组件的储备溶解部分设置在加压溶解部分的初级侧，以便向气相室供应特定气体。制造气体溶解的清洗水的方法采用具有储存箱，液压泵，清除异物的清洁机构，加压溶解部分和过饱和除去部分的装置，包括测量溶解在初级侧的气体的浓度的过饱和除去部分的次级侧的加压溶解部分，并根据测量值调节供应到加压溶解部分的特定气体的流量或压力，以产生用特定气体溶解的水所需浓度版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2008066464A Substrate treatment equipment and substrate treatment method 有权
标题翻译：基板处理设备和基板处理方法
公开(公告)号：JP2008066464A
公开(公告)日：2008-03-21
申请号：JP2006241798
申请日：2006-09-06
申请人： Dainippon Screen Mfg Co Ltd , Kurita Water Ind Ltd , 大日本スクリーン製造株式会社 , 栗田工業株式会社
发明人： NAGAI TATSUO , MORITA HIROSHI , TAKAHASHI HIROAKI , UCHIDA HIROAKI , HAYASHI TOYOHIDE
IPC分类号： H01L21/027 , B08B3/02 , B08B3/08 , G02F1/13 , G11B7/26 , H01L21/304
CPC分类号： G03F7/423 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide substrate treatment equipment and a substrate treatment method which can remove a resist from a substrate well and can reuse a treatment liquid used for removing the resist.
SOLUTION: A persulfuric acid generated by an electrolysis of a low-concentration sulfuric acid having a concentration of 4 mol/l in a persulfuric acid generation bath 12 and a high-temperature and high-concentration sulfuric acid having a temperature of 120°C and a concentration of 96 wt.% are supplied to a mixing valve 8. Then, the persulfuric acid and the high-temperature and high-concentration sulfuric acid are mixed in the mixing valve 8 and dilution heat is generated for the dilution of the high-temperature and high-concentration sulfuric acid by the persulfuric acid. The temperature of the mixed solution of the persulfuric acid and the high-temperature and high-concentration sulfuric acid sharply rises to a high temperature of the liquid temperature of the high-temperature and high-concentration sulfuric acid or higher by the dilution heat and heat that the high-temperature and high-concentration sulfuric acid has. The mixed solution whose temperature has risen to a high temperature is immediately fed to a nozzle 3 from the mixing valve 8 and discharged toward the surface of a wafer W from the nozzle 3.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可以从基材中去除抗蚀剂的基板处理设备和基板处理方法，并且可以重新利用用于除去抗蚀剂的处理液。解决方案：通过在过硫酸发生浴12中的浓度为4mol / l的低浓度硫酸和温度为120℃的高温高浓度硫酸电解生成的过硫酸 ℃和96重量％的浓度供给到混合阀8.然后，将过硫酸和高温高浓度硫酸混合在混合阀8中，产生稀释热，以稀释高温高浓硫酸经过硫酸。过硫酸和高温高浓度硫酸的混合溶液的温度通过稀释热和热量急剧上升到高温高浓度硫酸的液温的高温高温高浓硫酸具有。温度上升到高温的混合溶液立即从混合阀8供给到喷嘴3，并从喷嘴3向晶片W的表面排出。（C）2008，JPO＆INPIT

8. 发明专利

JP2005270793A Apparatus for production of nitrogen-dissolved water 有权
标题翻译：硝酸溶解水生产设备
公开(公告)号：JP2005270793A
公开(公告)日：2005-10-06
申请号：JP2004087489
申请日：2004-03-24
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： KUROBE HIROSHI , MORITA HIROSHI
IPC分类号： B01D61/00 , B01F1/00 , C02F1/68
CPC分类号： C02F1/68 , B01F1/0022 , B01F1/0038 , C02F2209/03
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for production of nitrogen-dissolved water permitting production of water with the concentration of dissolved nitrogen managed conveniently and precisely.
SOLUTION: The apparatus has (A) a membrane type gas dissolving device equipped with a water chamber and a gas chamber divided with a gas-permeable membrane, (B) a deoxidized water supply pipe supplying deoxidized water to the water chamber, (C) a gas-dissolved water discharging pipe discharging gas-dissolved water from the water chamber, (D) a nitrogen supply pipe supplying nitrogen to the gas chamber, (E) a nitrogen supply adjusting means adjusting the amount of nitrogen supplied to the gas chamber and (F) a manometer measuring the pressure of the gas chamber. The apparatus adjusts the amount of supplied nitrogen with the nitrogen supply adjusting means according to measurements of the manometer in order to keep the pressure of the gas chamber at a predetermined value.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：为了提供容易生产具有溶解氮浓度的水的氮溶解水的设备，方便和精确地进行管理。解决方案：该装置具有：（A）具有分隔有透气膜的水室和气室的膜式气体溶解装置，（B）向水室供给脱氧水的脱氧供水管，（C）从水室排出溶解有溶解水的气体溶解水排出管，（D）向气室供给氮的氮供给管，（E）氮供给调整单元，调整供给到所述气室的氮量气室和（F）测量气室压力的压力计。该装置根据压力计的测量结果，利用氮气供给调节装置调节供应的氮气量，以将气室的压力保持在预定值。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2004285374A Unit for generating ozone gas and apparatus for manufacturing liquid containing dissolved ozone 有权
公开(公告)号：JP2004285374A
公开(公告)日：2004-10-14
申请号：JP2003076310
申请日：2003-03-19
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI , KUROBE HIROSHI
IPC分类号： C02F1/78 , B01F1/00 , C01B13/10 , C25B1/13 , C25B1/28
摘要： PROBLEM TO BE SOLVED: To provide a unit for generating ozone gas and an apparatus for manufacturing a liquid containing dissolved ozone, which precisely grasp the state of degradation of a diaphragm on the unit for electrolytically generating ozone gas to enable the change of the diaphragm at an appropriate time, and to prevent an accident caused by hydrogen gas in an ozone gas system and a water system containing dissolved ozone. SOLUTION: The unit for generating ozone gas by supplying pure water to an electrolysis device having a cathode chamber and an anode chamber partitioned from each other by a diaphragm, and exhausting a generated ozone-containing gas from the anode chamber, comprises an ozonolysis unit for decomposing ozone in the exhausted ozone-containing gas, and a hydrogen measurement device for measuring the concentration of hydrogen gas in the gas by contacting itself with the gas having passed through the ozonolysis unit. The apparatus for manufacturing the liquid containing dissolved ozone comprises the unit for generating ozone gas, and the gas-dissolving unit for dissolving the ozone-containing gas exhausted from the unit for generating ozone gas into water. COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2003344343A Dissolved gas measuring meter and method for measuring dissolved gas 有权
标题翻译：溶解气体测量仪和测量溶解气体的方法
公开(公告)号：JP2003344343A
公开(公告)日：2003-12-03
申请号：JP2002154056
申请日：2002-05-28
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI
IPC分类号： G01N27/26 , G01N27/404 , G01N27/416
摘要： PROBLEM TO BE SOLVED: To provide a dissolved gas measuring meter which can always correctly measure and can safely and surely calibrate the dissolved gas concentration of a functional water with a gas dissolved therein used in a cleaning step, and to provide a method of measuring the dissolved gas. SOLUTION: The dissolved gas measuring meter has a flow cell provided with a diaphragm type electrode for measuring the dissolved gas concentration. In the meter, a sample water supply duct and a sample water drain duct are provided in the flow cell. When the dissolved gas concentration of the sample water is measured, the sample water is distributed to the flow cell. When the diaphragm type electrode for measuring the dissolved gas concentration is calibrated, the sample water in the cell is drained, and the same gas as or different gas from the dissolved gas is supplied from the gas supply duct to the cell by the operation of a valve. The method of measuring the dissolved gas comprises the steps of correcting the designated value of the diaphragm type electrode for measuring the dissolved gas concentration by fully filling the same gas as the dissolved gas in the cell, and correcting the designated value of the electrode for measuring the concentration to the '0' of the dissolved gas concentration by fully filling different gas from the dissolved gas in the cell. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种溶解气体测量计，其可以总是正确地测量，并且可以安全和可靠地校准在清洁步骤中用于其中溶解的气体的功能水的溶解气体浓度，并提供方法测量溶解气体。解决方案：溶解气体测量计具有设置有用于测量溶解气体浓度的隔膜式电极的流动池。在流量计中，在流动池中设置有供水管道和样品排水管。当测量样品水的溶解气体浓度时，将样品水分配到流动池。当校准用于测量溶解气体浓度的隔膜式电极时，排出电池中的样品水，并将与溶解气体相同的气体或不同气体从气体供应管道通过操作阀。测量溶解气体的方法包括以下步骤：通过完全填充与电池中的溶解气体相同的气体来校正用于测量溶解气体浓度的膜片式电极的指定值，并校正用于测量的电极的指定值通过从细胞中溶解的气体中充分填充不同的气体，使浓度达到溶解气体浓度的'0'。版权所有（C）2004，JPO

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