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1. 发明授权

US06930756B2 Electron beam exposure apparatus and semiconductor device manufacturing method 失效
标题翻译：电子束曝光装置及半导体装置的制造方法
公开(公告)号：US06930756B2
公开(公告)日：2005-08-16
申请号：US10617682
申请日：2003-07-14
申请人： Kotaro Akutsu , Shin Matsui
发明人： Kotaro Akutsu , Shin Matsui
IPC分类号： G03F7/20 , H01J37/20 , H01J37/317 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/20214 , H01J2237/20228 , H01J2237/20235 , H01J2237/31774
摘要： An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or a plurality of electron beams. The apparatus includes a substrate stage on which a substrate is mounted, a transfer stage which drives the substrate stage on an X-Y plane, an electromagnetic actuator which drives the substrate stage in a rotation direction about a Z-axis with respect to the transfer stage, and a measuring system which measures a position of the substrate stage in the rotation direction about the Z-axis using a measuring beam along a direction perpendicular to the plurality of electron beams.
摘要翻译：一种电子束曝光装置，其使用一个或多个电子束以预定图案曝光基板。该装置包括其上安装有基板的基板台，在XY平面上驱动基板台的转印台，相对于转印台围绕Z轴的旋转方向驱动基板台的电磁致动器，以及测量系统，其使用测量光束沿着垂直于多个电子束的方向测量围绕Z轴的旋转方向的基板台的位置。

2. 发明授权

US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus 失效
标题翻译：带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
公开(公告)号：US07566422B2
公开(公告)日：2009-07-28
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D16/00 , C23C14/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

3. 发明授权

US07218383B2 Holding system, exposure apparatus, and device manufacturing method 有权
标题翻译：保持系统，曝光装置和装置制造方法
公开(公告)号：US07218383B2
公开(公告)日：2007-05-15
申请号：US11555711
申请日：2006-11-02
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03B27/58 , G03F7/70708
摘要： A holding system, provided on a movable stage, for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.
摘要翻译：一种保持系统，设置在可移动的台上，用于从上方保持物体以防止重力。保持系统包括适于与物体接触的至少一个保持部分，用于将物体从上方夹持，以及至少一个吸引部分，用于向上吸引物体的有限部分而不与其接触。

4. 发明授权

US07187432B2 Holding system, exposure apparatus, and device manufacturing method 有权
标题翻译：保持系统，曝光装置和装置制造方法
公开(公告)号：US07187432B2
公开(公告)日：2007-03-06
申请号：US10987148
申请日：2004-11-15
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03B27/58 , G03F7/70708
摘要： A holding system for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto, and a gap measuring unit for measuring a gap between the object and the at least one attracting portion. The attraction force of the attracting portion is controlled on the basis of the measurement made by the gap measuring unit.
摘要翻译：用于从上方保持物体的反作用力的保持系统。保持系统包括适于与物体接触的至少一个保持部分，用于从上方保持物体，至少一个吸引部分用于向上吸引物体的有限部分而不与其接触;以及间隙测量单元，用于测量所述物体与所述至少一个吸引部分之间的间隙。基于由间隙测量单元进行的测量来控制吸引部分的吸引力。

5. 发明授权

US06225637B1 Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US06225637B1
公开(公告)日：2001-05-01
申请号：US08954520
申请日：1997-10-20
申请人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
发明人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
IPC分类号： H01J37302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/045 , H01J2237/31767
摘要： An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.
摘要翻译：一种用于通过还原电子光学系统将由电子束形成的图像投影到晶片上的电子束曝光装置，将准直的电子束照射到具有弧形孔的孔板，该弧形孔夹在两个弧之间，该弧之间以中心为中心电子光学系统，并且使具有已经透过该孔的弧形截面形状的电子束曝光晶片。

6. 发明申请

US20100081355A1 SUBSTRATE HOLDING APPARATUS, CARRIER, SUBSTRATE PROCESSING APPARATUS, AND IMAGE DISPLAY DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板保持装置，载体，基板处理装置和图像显示装置的制造方法
公开(公告)号：US20100081355A1
公开(公告)日：2010-04-01
申请号：US12568396
申请日：2009-09-28
申请人： Masato INOUE , Shin Matsui , Yasuo Kato
发明人： Masato INOUE , Shin Matsui , Yasuo Kato
IPC分类号： H01J9/00
CPC分类号： H01J9/241
摘要： An apparatus comprises a carrier configured to hold a mask containing a magnetic material and a substrate by magnetically attracting the mask via the substrate, and a controller configured to control the carrier, the carrier including a permanent electromagnet and a first contact, the permanent electromagnet including a variable-polarity magnet, a coil electrically connected to the first contact and generates a magnetic field for changing the polarity of the variable-polarity magnet by an electric current supplied via the first contact, and a fixed-polarity magnet. The controller includes a second contact which is in contact with the first contact and supplies an electric current to the coil via the first contact, a sensor unit which senses a contact state between the first contact and the second contact, and a current supply unit which supplies an electric current to the coil via the first contact and the second contact.
摘要翻译：一种装置，包括：载体，被配置为通过经由衬底磁吸引掩模来保持包含磁性材料和基底的掩模;以及控制器，被配置为控制载体，所述载体包括永久电磁体和第一接触，所述永磁电动机包括一个可变极性磁体，一个电连接到该第一触点的线圈，并产生用于通过经由该第一触点提供的电流来改变该可变极性磁体的极性的磁场和一个固定极性的磁体。所述控制器包括与所述第一接触件接触并且经由所述第一接触件向所述线圈提供电流的第二接触件，感测所述第一接触件和所述第二接触件之间的接触状态的传感器单元和电流供应单元，经由第一触点和第二触点向线圈供给电流。

7. 发明申请

US20100079054A1 PROCESSING APPARATUS AND IMAGE DISPLAY DEVICE 审中-公开
标题翻译：处理装置和图像显示装置
公开(公告)号：US20100079054A1
公开(公告)日：2010-04-01
申请号：US12568056
申请日：2009-09-28
申请人： Masato INOUE , Shin Matsui , Akira Kodama
发明人： Masato INOUE , Shin Matsui , Akira Kodama
IPC分类号： H01J1/62 , B05C11/00
CPC分类号： H05B33/10 , C23C14/042 , C23C14/56
摘要： The present invention provides a processing apparatus including a processing unit configured to process a processing object in a processing chamber by bringing a mask into contact with the processing object at a predetermined position, a base configured to hold the processing object on a holding surface, a structure configured to connect the base in a portion opposite to the holding surface of the base, and a driving unit configured to change a processing position of the processing object by pivoting the structure about a rotation shaft parallel to the holding surface of the base, the processing unit including an operation unit configured to perform, at an identical position, a fixing process and a release process, and a deposition processing unit configured to perform a deposition process on the processing object while the mask is in contact with the processing object.
摘要翻译：本发明提供一种处理装置，包括：处理单元，被配置为通过使掩模与预定位置处理对象接触来处理处理室中的处理对象;基部，被配置为将处理对象保持在保持面上; 结构构造成在与基座的保持表面相对的部分中连接基部;以及驱动单元，其构造成通过围绕平行于基部的保持表面的旋转轴枢转结构来改变处理对象的处理位置，处理单元，其包括被配置为在相同位置执行定影处理和释放处理的操作单元，以及沉积处理单元，被配置为在所述掩模与所述处理对象接触的同时对所述处理对象执行沉积处理。

8. 发明授权

US06982784B2 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method 失效
公开(公告)号：US06982784B2
公开(公告)日：2006-01-03
申请号：US10931984
申请日：2004-09-02
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： H01L21/6875 , G03F7/707 , G03F7/70708 , G03F7/7075 , G03F7/70925 , H01L21/67265 , H01L21/67294 , H01L21/6831 , H01L21/6838 , H01L21/68714 , H01L21/68785 , H01L2223/54493
摘要： A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

9. 发明申请

US20100080891A1 HOLDING MECHANISM, PROCESSING APPARATUS INCLUDING HOLDING MECHANISM, DEPOSITION METHOD USING PROCESSING APPARATUS, AND METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE 审中-公开
标题翻译：保持机构，包括保持机构的处理装置，使用处理装置的沉积方法和制造图像显示装置的方法
公开(公告)号：US20100080891A1
公开(公告)日：2010-04-01
申请号：US12568031
申请日：2009-09-28
申请人： Masanao YOSHIMURA , Shoji Hashimoto , Masato Inoue , Shin Matsui
发明人： Masanao YOSHIMURA , Shoji Hashimoto , Masato Inoue , Shin Matsui
IPC分类号： B05D5/06 , B05D3/00 , B05C13/00
CPC分类号： H01L21/67092 , C23C14/042 , G03F1/20 , H01L21/67132
摘要： The present invention provides a holding mechanism which holds a processing object and a mask including a mask pattern located on the processing object, and a mask frame which supports the mask pattern in a periphery thereof, the mechanism including a base configured to hold, on a holding surface thereof, the processing object and the mask frame, a permanent magnet, arranged along the holding surface of the base, configured to fix the processing object and the mask on the base by magnetically attracting the mask, and a pressing unit which is located on a peripheral portion of the mask pattern, includes a to-be-attracted portion magnetically attracted by the permanent magnet, and is configured to press the peripheral portion of the mask pattern toward the base as the permanent magnet magnetically attracts the to-be-attracted portion.
摘要翻译：本发明提供了一种保持处理对象的保持机构和包括位于处理对象上的掩模图案的掩模和在其周边支撑掩模图案的掩模框，该机构包括：基座，处理对象和掩模框架，沿着基座的保持表面布置的永磁体，其被配置为通过磁吸引掩模将处理对象和掩模固定在基座上;以及按压单元，其位于在掩模图案的周边部分包括由永久磁铁磁吸引的被吸引部分，并且被配置为当永久磁铁磁吸引待被吸收的部分时，将掩模图案的周边部分朝向基部按压，吸引了部分。

10. 发明授权

US06984362B2 Processing apparatus, measuring apparatus, and device manufacturing method 失效
标题翻译：处理装置，测量装置和装置制造方法
公开(公告)号：US06984362B2
公开(公告)日：2006-01-10
申请号：US10619506
申请日：2003-07-16
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05B1/00 , G05B23/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

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