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    • 1. 发明专利
    • Management server and paper apron circulation support system
    • 管理服务器和纸张APRON循环支持系统
    • JP2011123753A
    • 2011-06-23
    • JP2009282012
    • 2009-12-11
    • Takayuki HasegawaTakahiro Nakamura貴宏 中村孝幸 長谷川
    • NAKAMURA TAKAHIROHASEGAWA TAKAYUKI
    • G06Q30/02G06Q30/06G06Q50/00G06Q50/12G09F19/00G09F23/06G09F23/10
    • PROBLEM TO BE SOLVED: To provide a management server which supports circulation of paper aprons as consumables prepared in a restaurant. SOLUTION: The management server transmits a paper apron format to a distribution requested person terminal and acquires distribution request information based on the paper apron format from the distribution requested person terminal. The management server creates a print image of the paper apron based on the distribution request information and directs distribution of the paper aprons based on the created print image to a distribution destination store. The management server accumulates store visiting person information acquired from the customer terminal of a customer to whom the paper apron was provided at the distribution destination store, and notifies information based on the store visiting information to a distribution requested person terminal, the customer terminal and the restaurant terminal of the distribution destination store. When the distribution destination store needs to be changed, the management server changes the distribution destination store and directs the changed destination store to distribute the paper aprons based on the distribution request information. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种管理服务器,其支持纸围裙作为餐馆中准备的消费品的循环。 解决方案:管理服务器向发行请求人终端发送纸围裙格式,并从分发请求人终端基于纸围裙格式获取分发请求信息。 管理服务器基于分发请求信息创建纸皮圈的打印图像,并且基于所创建的打印图像指示纸皮圈的分布到分发目的地商店。 管理服务器累积从在分发目的地商店提供纸皮圈的客户的客户终端获取的店面访问人员信息,并且将基于店铺访问信息的信息通知给分发请求人终端,客户终端和 分销目的地商店的餐厅终端。 当分发目的地存储需要改变时,管理服务器改变分发目的地存储并引导改变的目的地存储器,以便基于分发请求信息分发纸皮圈。 版权所有(C)2011,JPO&INPIT
    • 5. 发明授权
    • Measuring method and apparatus, exposure method and apparatus, and device manufacturing method
    • 测量方法和装置,曝光方法和装置以及装置制造方法
    • US07098467B2
    • 2006-08-29
    • US10994326
    • 2004-11-23
    • Takayuki Hasegawa
    • Takayuki Hasegawa
    • A61N5/00G21G5/00G01B9/00G01N21/00
    • G03F7/706
    • A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being rotatable around an optical axis of the target optical system, and an illumination optical system for introducing the measuring light into the barrel, the illumination optical system being movable along a direction perpendicular to the optical axis of the target optical system, wherein the measuring apparatus controls an illumination area of the measuring light in the target optical system using a polar coordinate determined by a rotational angle of the barrel and a moving amount of the illumination optical system.
    • 用于照射测量光并用于测量目标光学系统的光学性能的测量装置包括:用于容纳目标光学系统的镜筒,镜筒可围绕目标光学系统的光轴旋转;以及照明光学系统,用于将测量 照明光学系统可以沿着与目标光学系统的光轴垂直的方向移动,其中测量装置使用由旋转方向确定的极坐标来控制目标光学系统中的测量光的照明区域 镜筒的角度和照明光学系统的移动量。
    • 6. 发明申请
    • Optical unit and measuring apparatus having the same
    • 光学单元及其测量装置
    • US20050128478A1
    • 2005-06-16
    • US11002889
    • 2004-12-03
    • Takayuki HasegawaAkira Miyake
    • Takayuki HasegawaAkira Miyake
    • G01N23/22G01B11/30G01J3/28G01M11/00G01T1/36G01B11/24
    • G01B11/30G01J3/28
    • An optical unit includes a spectrometer that includes a diffraction grating for separating light, and a beam intensity sensor for detecting a light intensity of light emitted from the spectrometer, wherein the beam intensity sensor includes, in order from a light incident side to a light exit side, an aperture having a first opening that restricts a width of incident light, and a light receiving sensor that has a second opening for detecting part of light from the aperture, wherein the second opening in the light receiving sensor is wider than the first opening in the aperture in a spectral direction of the light from the spectrometer, and wherein the second opening in the light receiving sensor is narrower than the first opening in the aperture in a direction orthogonal to the spectral direction of the light from the spectrometer.
    • 光学单元包括:光谱仪,其包括用于分离光的衍射光栅;以及光束强度传感器,用于检测从光谱仪发射的光的光强度,其中光束强度传感器包括从光入射侧到光出射 具有限制入射光的宽度的第一开口的孔,以及具有用于检测来自所述孔的部分光的第二开口的光接收传感器,其中所述光接收传感器中的所述第二开口比所述第一开口宽 在来自光谱仪的光的光谱方向上的孔中,并且其中光接收传感器中的第二开口在与光谱仪的光的光谱方向正交的方向上比孔中的第一开口窄。
    • 7. 发明授权
    • Oscillation mechanism in exposure apparatus
    • 曝光装置的振荡机制
    • US06618146B1
    • 2003-09-09
    • US09670541
    • 2000-09-27
    • Takayuki Hasegawa
    • Takayuki Hasegawa
    • G01B1100
    • G03F7/70075G03F7/70691G03F7/708G03F7/70833
    • An oscillation mechanism includes a measuring device for measuring a position of an object, a movable stage being arranged so as to be positioned with respect to the object, a driving mechanism for moving the stage, a control unit for controlling the driving mechanism on the basis of an output of the measuring device, an oscillation element mounted on the stage, which is arranged to be oscillated with respect to the stage, and an intermediate element having a predetermined mass, which is disposed between the stage and the oscillation element. The intermediate element is (i) connected to the oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to the stage through a second spring element having a predetermined spring constant. The oscillation mechanism also includes an oscillation unit for oscillating the oscillation element by oscillating the intermediate element at a predetermined frequency.
    • 振动机构包括:用于测量物体位置的测量装置,相对于物体定位的可移动台,用于移动平台的驱动机构,用于控制驱动机构的控制单元 所述测量装置的输出,安装在所述载物台上的相对于所述载物台摆动的振动元件以及设置在所述载物台与所述振动元件之间的具有预定质量的中间元件。 中间元件是(i)通过具有预定弹簧常数的第一弹簧元件连接到振动元件,和(ii)通过具有预定弹簧常数的第二弹簧元件连接到舞台。 振荡机构还包括用于通过以预定频率振荡中间元件来振荡振荡元件的振荡单元。
    • 8. 发明授权
    • X-ray illumination device, x-ray illumination method, and an x-ray exposing device and device manufacturing method using the same
    • X射线照射装置,X射线照射方法和X射线曝光装置及使用该X射线照射装置的装置制造方法
    • US06256371B1
    • 2001-07-03
    • US09207023
    • 1998-12-08
    • Takayuki HasegawaYutaka Watanabe
    • Takayuki HasegawaYutaka Watanabe
    • H01L2130
    • G03F7/70075G03F7/702G03F7/709
    • An x-ray illumination device which illuminates an object by reflecting an x-ray irradiated from a SR emission point with at least one x-ray mirror comprises: first measuring means for measuring the position of the emission point; first control means for controlling the position of the emission point based on the measurements of the first measuring means; second measuring means for measuring the position of the x-ray near the x-ray mirror; and second control means for controlling the position or the attitude of the x-ray mirror based on the measurements of the second measuring means. The control frequency of the first control means of the x-ray illumination device here is of a frequency range higher than the control frequency of the second control means, and the ranges of the two control frequencies thereof partially overlap.
    • 通过用至少一个X射线镜反射从SR发射点照射的x射线照射物体的X射线照明装置包括:用于测量发射点的位置的第一测量装置; 第一控制装置,用于基于第一测量装置的测量值控制发射点的位置; 用于测量x射线反射镜附近的X射线位置的第二测量装置; 以及第二控制装置,用于基于第二测量装置的测量值来控制X射线镜的位置或姿态。 这里的X射线照明装置的第一控制装置的控制频率为比第二控制装置的控制频率高的频率范围,其两个控制频率的范围部分重叠。
    • 9. 发明授权
    • Slide fastener
    • 滑动紧固件
    • US06253425B1
    • 2001-07-03
    • US09375192
    • 1999-08-16
    • Hideyuki MatsushimaTakayuki Hasegawa
    • Hideyuki MatsushimaTakayuki Hasegawa
    • A44B1934
    • A44B19/24Y10T24/25Y10T24/2514Y10T24/2532Y10T24/2534
    • The present invention provides a slide fastener having a three-dimensional reflecting function on faces of fastener tapes by simple structure and means. Each of reflective tapes is provided separately from a fastener tape and has a band-shaped attaching portion, a bulging edge portion integrally formed on a longitudinal edge portion of the attaching portion, and a reflective portion formed by providing a retroreflective film or the like on the bulging edge portion. Each the reflective tape is attached to the fastener tape beside fastener elements such that at least a distance corresponding to a thickness of a flange of a slider is maintained between the bulging edge portion and the fastener elements, the reflective portion of the bulging edge portion appears and protrudes from a surface of the fastener tape, and that the bulging edge portion can swing. Each the reflective portion is not damaged by a sliding movement of the slider and can exhibit a three-dimensional reflecting function.
    • 本发明通过简单的结构和手段提供了一种在拉链带的表面上具有三维反射功能的拉链。 每个反射带与拉链带分开设置,并且具有带状安装部分,一体地形成在安装部分的纵向边缘部分上的凸出边缘部分,以及通过将反射膜等设置在其上而形成的反射部分 凸出边缘部分。 每个反射带在紧固件元件附近附接到拉链带,使得至少一个对应于滑块的​​凸缘的厚度的距离保持在凸出边缘部分和紧固件元件之间,凸出边缘部分的反射部分出现 并且从拉链带的表面突出,并且凸出边缘部分可以摆动。 每个反射部分不会被滑块的滑动运动所损坏,并且可以呈现三维反射功能。
    • 10. 发明授权
    • X-ray exposure apparatus
    • X射线曝光装置
    • US06078640A
    • 2000-06-20
    • US106893
    • 1998-06-30
    • Takayuki HasegawaTakeshi Miyachi
    • Takayuki HasegawaTakeshi Miyachi
    • G21K5/02G03F7/20G03F9/00H01L21/027G21K5/00
    • G03F7/70216G03F7/70425G03F9/703
    • An exposure method and apparatus for lithographically transferring a pattern of a mask onto a substrate to be exposed, wherein a detecting system detects a relative positional relation between the mask and the substrate with respect to at least a predetermined direction, a stage member changes the relative positional relation between the mask and the substrate, on the basis of the detection by the detecting system, a magnification correcting mechanism corrects a transfer magnification of the mask pattern to the substrate, a control system for the stage member corrects one of a drive amount of the stage member and a detection result of the detecting system in accordance with a positional deviation of the mask pattern attributable to the correction operation of the magnification correcting mechanism.
    • 一种用于将掩模图案光刻转印到待曝光的基板上的曝光方法和装置,其中检测系统相对于至少预定方向检测掩模和基板之间的相对位置关系,台架构件改变相对 掩模和基板之间的位置关系,基于检测系统的检测,放大校正机构将掩模图案的传送倍率校正到基板,台架构件的控制系统校正驱动量 舞台构件和检测系统的检测结果,根据由倍率校正机构的校正操作引起的掩模图案的位置偏差。