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1. 发明专利

JP2005055986A Event-photograph providing system and method 审中-公开
标题翻译：事件照片提供系统和方法
公开(公告)号：JP2005055986A
公开(公告)日：2005-03-03
申请号：JP2003206360
申请日：2003-08-06
申请人： Masato Muraki , 政人村城
发明人： MURAKI MASATO
IPC分类号： B41J29/38 , G06F3/12 , G06Q50/00 , G06Q50/10 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To provide an event-photograph providing system which rapidly provides a photograph regarding various kinds of events such as a bridal, a funeral, a party and so on in a low cost, and also provide a method therefor. SOLUTION: The event-photograph providing system 1 is provided with an image acquiring means 2 which acquires image data regarding the events, an image data processing means 3 which processes the image data acquired, a selection information acquiring means 4 which acquires selection information for selecting processed image data to be transmitted by means of an image transmission means or processed image data to be printed by means of an image printing means, a message information acquiring means 5 which acquires message information attached to a photograph to be provided, the image data printing means 6 which prints the photograph to be provided from the processed image data by using a printer, and the image transmission means 7 which configures the processed image data transmittable via a network. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种事件照片提供系统，其以低成本快速提供关于各种事件的照片，例如新娘，葬礼，聚会等，并且还提供其方法。事件照片提供系统1具备获取与事件有关的图像数据的图像获取单元2，处理所取得的图像数据的图像数据处理单元3，选择信息取得单元4，取得选择单元用于通过图像发送装置选择要发送的处理后的图像数据的信息或通过图像打印装置打印的处理后的图像数据的信息;消息信息获取装置5，其获取附加到要提供的照片的消息信息，图像数据打印装置6，其通过使用打印机打印从处理的图像数据提供的照片;以及图像发送装置7，其配置经由网络可传送的经处理的图像数据。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2004189294A Envelope with picture frame function 审中-公开
公开(公告)号：JP2004189294A
公开(公告)日：2004-07-08
申请号：JP2002360687
申请日：2002-12-12
申请人： Masato Muraki , 政人村城
发明人： MURAKI MASATO
IPC分类号： B42D15/02 , B65D27/00 , B65D27/04 , B65D27/34
摘要： PROBLEM TO BE SOLVED: To provide an envelope with a picture frame function which is used for a picture frame after the envelope is served for mail or the like.
SOLUTION: The rectangular envelope 1 having a face sheet 2 and a back sheet 3 overlapping each other comprises (a) size-reducing perforations 10 and 18 which are formed continuous to the face sheet 2 and the back sheet 3 and capable of cutting and removing one short side 6, (b) an opening perforation 9 which is formed in the face sheet 2 and capable of opening a center portion, (c) a transparent film 4 affixed to an area other than the center portion to be opened in the back side of the face sheet 2 by the opening perforation 9, and (d) a stand perforation 19 which is formed in the back sheet 3 and capable of forming a stand piece 26.
COPYRIGHT: (C)2004,JPO&NCIPI

3. 发明专利

JP2005058251A Envelope type photograph frame 审中-公开
标题翻译： ENVELOPE TYPE PHOTOGRAPH FRAME
公开(公告)号：JP2005058251A
公开(公告)日：2005-03-10
申请号：JP2003207046
申请日：2003-08-11
申请人： Masato Muraki , 政人村城
发明人： MURAKI MASATO
IPC分类号： A47G1/14 , B65D27/00
摘要： PROBLEM TO BE SOLVED: To provide a low cost envelope type photograph frame having superior handling properties, photograph protective properties, and design performance and easily decorating a photograph at an arbitrary position.
SOLUTION: This envelope type photograph frame is provided with a square outer frame 1, having a front sheet 5 and a rear sheet 6 superimposedly connected together into an envelope type, a mount 2 having a shape fitted in the outer frame 1, and a transparent film 3; the outer frame 1 is formed of translucent tracing paper; the front sheet 5 is provided with an opening window 7 in its central part; and a slit with a stop for the photograph frame is provided at a position in matching with the opening window 7 in the mount 2. It is preferable that the rear sheet 6 be provided with a slit 8 with a stop for a stand formed into a stand piece 17. This envelope type photograph frame may be further provided with a self-adhesive sheet 4 or the like, to constitute the side of the rear sheet 6 stickable.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有优异的操作性能，照片保护性能和设计性能的低成本信封型照相框，并且可以在任意位置容易地装饰照片。解决方案：这种信封型照相框架设有正方形的外框架1，其具有叠置在外壳中的前片5和后片6，安装在外框架1上的形状的安装件2，和透明膜3; 外框架1由半透明跟踪纸形成; 前片5的中央部设有开口窗7，并且在与安装件2中的开口窗7相匹配的位置处设置有用于照相框的停止的狭缝。优选的是，后片6设置有狭缝8，狭缝8具有形成为这种信封型照相框架还可以设置有自粘合片材4等，以构成后片材6可粘贴的一面。版权所有（C）2005，JPO＆NCIPI

4. 发明授权

US08083562B2 Method of manufacturing image display apparatus using sputtering 失效
标题翻译：使用溅射制造图像显示装置的方法
公开(公告)号：US08083562B2
公开(公告)日：2011-12-27
申请号：US12355376
申请日：2009-01-16
申请人： Hiromasa Mitani , Masato Muraki
发明人： Hiromasa Mitani , Masato Muraki
IPC分类号： H01J9/26 , H01J9/32
CPC分类号： H01J9/261 , H01J29/90 , H01J31/127
摘要： A manufacturing method of an image display apparatus having a substrate and a conductive supporting frame formed at a periphery of the substrate includes steps of forming a wiring on the substrate, and forming an insulating layer on the wiring. The insulating layer includes a silicon nitride or a silicon oxide deposited by a sputtering technique. The insulating layer is seal-bonded with the conductive supporting frame.
摘要翻译：具有形成在基板的周边的基板和导电支撑框架的图像显示装置的制造方法包括在基板上形成布线的步骤，以及在布线上形成绝缘层。绝缘层包括通过溅射技术沉积的氮化硅或氧化硅。绝缘层与导电支撑框架密封接合。

5. 发明申请

US20100078555A1 Electron Beam Apparatus And Method Of Generating An Electron Beam Irradiation Pattern 有权
标题翻译：电子束装置及其产生电子束照射模式的方法
公开(公告)号：US20100078555A1
公开(公告)日：2010-04-01
申请号：US12630346
申请日：2009-12-03
申请人： Ryo FUJITA , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
发明人： Ryo FUJITA , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
IPC分类号： G01N23/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31769
摘要： High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.
摘要翻译：通过使用小剂量的电子束进行高对比度曝光，以高精度在晶片上形成图案，进行高精度检查。在图案形成中，执行邻近效应校正处理。此外，基于使用电子束的曝光特性的逆特性的滤波结果来执行电子束的曝光。此外，在图案检查中，基于滤波结果照射电子束，以获得形成的图案的边缘的周边区域。

6. 发明申请

US20080067403A1 CHARGED PARTICLE BEAM EXPOSURE APPARATUS 有权
标题翻译：充电颗粒光束曝光装置
公开(公告)号：US20080067403A1
公开(公告)日：2008-03-20
申请号：US11762182
申请日：2007-06-13
申请人： Masato Muraki , Haruo Yoda
发明人： Masato Muraki , Haruo Yoda
IPC分类号： H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/043 , H01J2237/24507 , H01J2237/3045 , H01J2237/30455 , H01J2237/30477 , H01J2237/30483
摘要： An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the detector with the charged particle beam, and a controller which controls the deflector to scan each of a plurality of scanning ranges on the detector with the charged particle beam, and calculates, on the basis of the charged particle beam amount detected by the detector upon scanning the plurality of scanning ranges, the intensity distribution of the charged particle beam which strikes the detector.
摘要翻译：公开了一种在具有带电粒子束的基板上绘制图案的曝光装置。曝光装置包括检测带电粒子束的检测器，使带电粒子束偏转以利用带电粒子束扫描基板或检测器的偏转器，以及控制偏转器扫描多个扫描范围中的每一个的控制器在具有带电粒子束的检测器上，并且基于扫描多个扫描范围时由检测器检测到的带电粒子束量计算撞击检测器的带电粒子束的强度分布。

7. 发明授权

US07126141B2 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method 有权
标题翻译：电光系统阵列，带电粒子束曝光装置及其制造方法
公开(公告)号：US07126141B2
公开(公告)日：2006-10-24
申请号：US11168425
申请日：2005-06-29
申请人： Haruhito Ono , Masato Muraki
发明人： Haruhito Ono , Masato Muraki
IPC分类号： G21K5/00
CPC分类号： H01J37/12 , G01N23/00 , H01J9/14 , H01J9/18 , H01J37/3007 , H01J2237/1205 , H01J2237/151 , H01J2237/1534 , H01J2237/3175 , H01J2237/31774
摘要： A charged-particle beam exposure apparatus includes a charged-particle beam source for emitting a charged-particle beam, an electrooptic system array which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle beam source by the plurality of electron lenses, and a projection electrooptic system for projecting on a substrate the plurality of intermediate images formed by the electrooptic system array. The electrooptic system array includes at least two electrodes arranged along paths of a plurality of charged-particle beams, each of the at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode which is interposed between the at least two electrodes and has a plurality of shields corresponding to the respective paths of the plurality of charged-particle beams.
摘要翻译：带电粒子束曝光装置包括用于发射带电粒子束的带电粒子束源，具有多个电子透镜并由多个电子透镜形成带电粒子束源的多个中间图像的电光系统阵列的电子透镜，以及用于在基板上投影由电光系统阵列形成的多个中间图像的投射电光系统。电光系统阵列包括沿着多个带电粒子束的路径布置的至少两个电极，所述至少两个电极中的每一个在所述多个带电粒子束的路径上具有多个孔，以及屏蔽电极，设置在所述至少两个电极之间并且具有对应于所述多个带电粒子束的相应路径的多个屏蔽。

8. 发明授权

US07049610B2 Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method 有权
标题翻译：带电粒子束曝光方法，带电粒子束曝光装置和装置制造方法
公开(公告)号：US07049610B2
公开(公告)日：2006-05-23
申请号：US10885665
申请日：2004-07-08
申请人： Masato Muraki , Haruo Yoda
发明人： Masato Muraki , Haruo Yoda
IPC分类号： H01J37/305
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/0435 , H01J2237/083 , H01J2237/30477
摘要： In a charged particle beam exposure method of applying/not applying charged particle beams to expose a substrate by deflecting the charged particle beams to move the charged particle beams on a blanking aperture stop, the size of the charged particle beams on the blanking aperture stop is made larger than the size of the blanking aperture stop.
摘要翻译：在通过使带电粒子束偏转以使带电粒子束移动到消隐孔径光阑上而施加/不施加带电粒子束以暴露衬底的带电粒子束曝光方法中，消隐孔径光阑上的带电粒子束的尺寸为制成大于冲孔孔径的尺寸。

9. 发明授权

US07038226B2 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method 失效
标题翻译：电光系统阵列，带电粒子束曝光装置及其制造方法
公开(公告)号：US07038226B2
公开(公告)日：2006-05-02
申请号：US10454576
申请日：2003-06-05
申请人： Haruhito Ono , Masato Muraki
发明人： Haruhito Ono , Masato Muraki
IPC分类号： H01J3/14 , H01J37/00 , A61N5/00 , G21G5/00
CPC分类号： H01J37/12 , G01N23/00 , H01J9/14 , H01J9/18 , H01J37/3007 , H01J2237/1205 , H01J2237/151 , H01J2237/1534 , H01J2237/3175 , H01J2237/31774
摘要： A semiconductor manufacturing factory includes a plurality of semiconductor manufacturing apparatuses including an exposure apparatus for exposing a substrate by using a plurality of charged particle beams, a local area network for connecting the plurality of semiconductor manufacturing apparatuses, and a gateway for connecting the local area network to an external network of the semiconductor manufacturing factory. The exposure apparatus includes a lens array, which has a plurality of lenses and directs a plurality of charged particle beams onto a substrate. The lens array includes at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode interposed between the at least two electrodes.
摘要翻译：一种半导体制造工厂包括多个半导体制造装置，其包括通过使用多个带电粒子束使基板曝光的曝光装置，用于连接多个半导体制造装置的局域网，以及用于连接局域网到半导体制造工厂的外部网络。曝光装置包括具有多个透镜并将多个带电粒子束引导到基板上的透镜阵列。透镜阵列包括在多个带电粒子束的路径上具有多个孔的至少两个电极以及插在该至少两个电极之间的屏蔽电极。

10. 发明授权

US06784442B2 Exposure apparatus, control method thereof, and device manufacturing method 有权
标题翻译：曝光装置及其控制方法及装置的制造方法
公开(公告)号：US06784442B2
公开(公告)日：2004-08-31
申请号：US10329388
申请日：2002-12-27
申请人： Masato Muraki , Hiroya Ohta , Shin-ichi Hashimoto
发明人： Masato Muraki , Hiroya Ohta , Shin-ichi Hashimoto
IPC分类号： G21G500
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/30472
摘要： This invention provides a multi-charged-particle beam exposure apparatus capable of easily correcting at a high precision the electron-optic characteristics of each column which constitutes an electron-optic system. The exposure apparatus has magnetic lens arrays (ML1, ML2, ML3, and ML4) which commonly adjust the electron-optic characteristics of a plurality of columns which constitute the electron-optic system, and dynamic focus lenses or deflector arrays which individually correct the electron-optic characteristics of the columns.
摘要翻译：本发明提供一种能够以高精度容易地校正构成电子光学系统的各列的电子光学特性的多电荷粒子束曝光装置。曝光装置具有通常调整构成电子光学系统的多个列的电子光学特性的磁透镜阵列（ML1，ML2，ML3和ML4），以及单独校正电子的动态聚焦透镜或偏转器阵列 - 列的光学特性。

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