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1. 发明授权

US06225637B1 Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US06225637B1
公开(公告)日：2001-05-01
申请号：US08954520
申请日：1997-10-20
申请人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
发明人： Shigeru Terashima , Masato Muraki , Masahiko Okunuki , Akira Miyake , Shin Matsui
IPC分类号： H01J37302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/045 , H01J2237/31767
摘要： An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.
摘要翻译：一种用于通过还原电子光学系统将由电子束形成的图像投影到晶片上的电子束曝光装置，将准直的电子束照射到具有弧形孔的孔板，该弧形孔夹在两个弧之间，该弧之间以中心为中心电子光学系统，并且使具有已经透过该孔的弧形截面形状的电子束曝光晶片。

2. 发明授权

US6054713A Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US6054713A
公开(公告)日：2000-04-25
申请号：US13304
申请日：1998-01-26
申请人： Akira Miyake , Masato Muraki , Masahiko Okunuki , Shigeru Terashima , Shin Matsui
发明人： Akira Miyake , Masato Muraki , Masahiko Okunuki , Shigeru Terashima , Shin Matsui
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70375 , H01J37/3175 , H01J2237/31779
摘要： An electron beam exposure apparatus, which illuminates a mask with light emitted by a light source, photoelectrically converts the light patterned by the mask using a photoelectric converter, and exposes an object to be exposed with a patterned electron beam emitted by the photoelectric converter. The apparatus includes an electron optical system for imaging the electron beam emitted by the photoelectric converter onto the object, an axial shifter for shifting an optical center of the electron optical system in a direction perpendicular to an optical axis, an axial deflector for deflecting the electron beam that propagates in the electron optical system, a region limiter for limiting a region of the mask to be projected onto the object via the photoelectric converter and the electron optical system to a partial region of the mask, and a scan controller for scanning the object with the region-limited electron beam by changing the partial region to be limited while controlling the axial shifter and axial deflector.
摘要翻译：用光源发出的光照射掩模的电子束曝光装置使用光电转换器对由掩模图案化的光进行光电转换，并用由光电转换器发射的图案化电子束曝光待曝光的物体。该装置包括用于将由光电转换器发射的电子束成像到物体上的电子光学系统，用于沿垂直于光轴移动电子光学系统的光学中心的轴向移动器，用于偏转电子的轴向偏转器在电子光学系统中传播的光束，用于将要经由光电转换器和电子光学系统投射到物体上的掩模的区域限制到掩模的部分区域的区域限制器，以及用于扫描物体的扫描控制器通过在控制轴向移位器和轴向偏转器的同时改变局部区域来限制电子束区域。

3. 发明授权

US09063277B2 Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method 有权
标题翻译：镜子，制造方法，曝光装置和装置制造方法
公开(公告)号：US09063277B2
公开(公告)日：2015-06-23
申请号：US13332582
申请日：2011-12-21
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： B05D5/06 , F21V9/04 , G03B27/32 , G03B27/54 , G02B5/08 , G03F7/20 , G21K1/06 , B82Y10/00
CPC分类号： G02B5/0816 , B82Y10/00 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
摘要翻译：一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤，第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

4. 发明授权

US08921807B2 In situ cleaning device for lithographic apparatus 有权
标题翻译：光刻设备原位清洁装置
公开(公告)号：US08921807B2
公开(公告)日：2014-12-30
申请号：US13462013
申请日：2012-05-02
申请人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
发明人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
IPC分类号： H01J37/30 , B08B5/00 , H01J37/317
CPC分类号： H01J37/3177 , B08B5/00 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/03 , H01J2237/0435 , H01J2237/0453 , H01J2237/1205
摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
摘要翻译：在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为移动案件。

5. 发明授权

US08106584B2 Light emitting device and illumination apparatus 有权
标题翻译：发光装置和照明装置
公开(公告)号：US08106584B2
公开(公告)日：2012-01-31
申请号：US11721807
申请日：2005-07-27
申请人： Tomoya Tabuchi , Akira Miyake , Daisuke Sakumoto
发明人： Tomoya Tabuchi , Akira Miyake , Daisuke Sakumoto
IPC分类号： H01J1/62 , H01L21/00
CPC分类号： H01L33/56 , H01L33/507 , H01L2224/13
摘要： A light emitting device includes a base on which a wiring conductor is formed from the top surface to the bottom surface or the side face; a light emitting chip mounted on the top surface of the base and electrically connected with the wiring conductor; a first light transmitting member which covers the light emitting chip; a second light transmitting member provided above the first light transmitting member to cover the first light transmitting member, the second light transmitting member being formed of a light transmitting material containing fluorescent materials for converting in wavelength the light emitted from the light emitting chip; and a third light transmitting member provided between the first and second light transmitting members, wherein the refractive index n1 of the first light transmitting member, the refractive index n2 of the second light transmitting member and the refractive index n3 of the third light transmitting member satisfy the relation: n3
摘要翻译：发光器件包括从顶表面到底表面或侧面形成布线导体的基底; 发光芯片安装在基座的顶表面上并与布线导体电连接; 覆盖发光芯片的第一透光构件; 第二透光构件，设置在第一透光构件上方以覆盖第一透光构件，第二透光构件由包含荧光材料的透光材料形成，用于使波长从发光芯片发射的光转换; 以及第三透光构件，设置在第一透光构件和第二透光构件之间，其中第一透光构件的折射率n1，第二透光构件的折射率n2和第三透光构件的折射率n3满足关系：n3

6. 发明申请

US20110096526A1 Light Emitting Device and Illumination Device 有权
标题翻译：发光装置和照明装置
公开(公告)号：US20110096526A1
公开(公告)日：2011-04-28
申请号：US12810769
申请日：2008-12-26
申请人： Kousuke Katabe , Yuki Mori , Akira Miyake , Shingo Matsuura
发明人： Kousuke Katabe , Yuki Mori , Akira Miyake , Shingo Matsuura
IPC分类号： F21V9/16
CPC分类号： H01L33/60 , F21K9/64 , F21Y2115/10 , H01L33/507 , H01L33/64 , H01L2924/0002 , H01L2924/00
摘要： A light emitting device includes a base, a sub-mount substrate, and a frame member. The light emitting device further includes a light emitting element and a wavelength converting member. The sub-mount substrate is disposed on the base, and has an upper surface made of a ceramic sintered body. The frame member has a light reflecting portion made of porous ceramics, is disposed on the base, and surrounds the sub-mount substrate. The light emitting element is mounted on the sub-mount substrate. The wavelength converting member covers the light emitting element and the light reflecting portion of the frame member.
摘要翻译：发光装置包括基座，副安装基板和框架构件。发光装置还包括发光元件和波长转换构件。副安装基板设置在基座上，具有由陶瓷烧结体构成的上表面。框架构件具有由多孔陶瓷制成的光反射部分，设置在基座上并且包围副安装基板。发光元件安装在副安装基板上。波长转换部件覆盖框架部件的发光元件和光反射部。

7. 发明授权

US07785407B2 Evaporated fuel gas adsorbent, evaporated fuel gas trapping apparatus, active carbon and process for producing the same 有权
标题翻译：蒸发燃料气体吸附剂，蒸发燃料气体捕集装置，活性炭及其生产方法
公开(公告)号：US07785407B2
公开(公告)日：2010-08-31
申请号：US11573989
申请日：2005-08-25
申请人： Susumu Abe , Shizuo Ishimura , Takanori Kitamura , Yoshifumi Egawa , Akira Miyake , Takayuki Yamada , Tetsuya Hanamoto
发明人： Susumu Abe , Shizuo Ishimura , Takanori Kitamura , Yoshifumi Egawa , Akira Miyake , Takayuki Yamada , Tetsuya Hanamoto
IPC分类号： F02M25/08 , B01J20/20 , B01D53/04
CPC分类号： F02M25/0854 , B01D53/0407 , B01D53/0415 , B01D2253/102 , B01D2253/306 , B01D2253/308 , B01D2253/311 , B01D2257/704 , B01D2259/40086 , B01D2259/4516 , B01J20/20 , C01B32/336
摘要： The present invention provides an evaporated fuel gas adsorbent, an evaporated fuel gas trapping apparatus that uses the adsorbent, an activated carbon, and a process for producing the activated carbon. The evaporated fuel gas adsorbent is capable of improving adsorptivity and desorptivity by reliably preventing a temperature rise and a temperature fall caused by heat generated in response to the adsorption and desorption of evaporated fuel gas, is capable of achieving a size reduction of the device, and is capable of being easily produced. The activated carbon has high mechanical strength and high abrasive resistance, has many pores suitable to adsorb an organic solvent, especially, evaporated fuel gas, and has a high packing density. The activated-carbon producing process is industrially advantageous.
摘要翻译：本发明提供蒸发的燃料气体吸附剂，使用吸附剂的蒸发的燃料气体捕获装置，活性炭和生产活性炭的方法。蒸发的燃料气体吸附剂能够通过可靠地防止由于蒸发的燃料气体的吸附和解吸而产生的热而导致的温度升高和温度下降，能够提高吸附性和解吸性，能够实现装置的尺寸减小，能够容易地生产。活性炭具有高的机械强度和高的耐磨性，具有适用于吸附有机溶剂，特别是蒸发的燃料气体的许多孔，并且具有高的堆积密度。活性炭生产方法在工业上是有利的。

8. 发明授权

US07349524B2 X-ray generator and exposure apparatus 有权
标题翻译： X射线发生器和曝光装置
公开(公告)号：US07349524B2
公开(公告)日：2008-03-25
申请号：US11246485
申请日：2005-10-07
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： G21G4/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70175
摘要： An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.
摘要翻译：用于产生等离子体的X射线发生器和从等离子体发射的X射线包括用于产生等离子体的单元和用于通过不同光路引入X射线的多个反射光学系统。

9. 发明授权

US07276710B2 Light source unit and exposure apparatus having the same 失效
标题翻译：光源单元和具有该光源单元的曝光设备
公开(公告)号：US07276710B2
公开(公告)日：2007-10-02
申请号：US11181192
申请日：2005-07-13
申请人： Takeshi Yamamoto , Akira Miyake
发明人： Takeshi Yamamoto , Akira Miyake
IPC分类号： A61N5/00 , G03B27/72
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A light source unit supplies the light radiated from the plasma, and includes a stabilizer for reducing a fluctuation of a position of the light radiated from the plasma.
摘要翻译：光源单元提供从等离子体辐射的光，并且包括用于减少从等离子体辐射的光的位置的波动的稳定器。

10. 发明申请

US20070002474A1 Apparatus for evalulating EUV light source, and evaluation method using the same 失效
标题翻译：用于评价EUV光源的装置及使用其的评价方法
公开(公告)号：US20070002474A1
公开(公告)日：2007-01-04
申请号：US11082404
申请日：2005-03-17
申请人： Mitsuaki Amemiya , Akira Miyake
发明人： Mitsuaki Amemiya , Akira Miyake
IPC分类号： G02B5/08
CPC分类号： G02B17/0631 , B82Y10/00 , G02B5/22 , G02B17/0642 , G02B17/0663 , G21K2201/061
摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.
摘要翻译：公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统，基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

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