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1. 发明授权

US5751426A Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object 失效
$Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object$
标题翻译：位置偏差测量装置和测量形成在同一物体上的多个衍射光栅之间的位置偏差的方法
公开(公告)号：US5751426A
公开(公告)日：1998-05-12
申请号：US460708
申请日：1995-06-02
申请人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.
摘要翻译：用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

2. 发明授权

US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
$Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes$
标题翻译：用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸
公开(公告)号：US5610718A
公开(公告)日：1997-03-11
申请号：US297511
申请日：1994-08-29
申请人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
发明人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.
摘要翻译：用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

3. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

4. 发明授权

US5333050A Measuring method and apparatus for meausring the positional relationship of first and second gratings 失效
标题翻译：测量第一和第二光栅的位置关系的方法和装置
公开(公告)号：US5333050A
公开(公告)日：1994-07-26
申请号：US675277
申请日：1991-03-26
申请人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
发明人： Noriyuki Nose , Kenji Saitoh , Koichi Sentoku , Minoru Yoshii
IPC分类号： G03F7/20 , G03F9/00 , G01B11/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.
摘要翻译：公开了一种用于测量在不同时刻印刷在诸如半导体晶片的物品上的第一图案和第二图案之间的相对位置偏差的方法和装置，该测量是基于检测衍射光从至少一个第一和第二印刷图案。

5. 发明授权

US5432603A Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
标题翻译：光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译：在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

6. 发明授权

US5585923A Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means 失效
标题翻译：在通过误差检测装置的误差检测的基础上校正误差的同时测量位置偏差的方法和装置
公开(公告)号：US5585923A
公开(公告)日：1996-12-17
申请号：US314444
申请日：1994-09-28
申请人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
发明人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/70
摘要： A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.
摘要翻译：用于测量形成在物体上的第一和第二衍射光栅之间的相对位置偏差的方法和装置包括确定第一和第二衍射光栅的相对位置偏差，同时检测和校正相对于检测到的位置偏差的检测产生的误差第一和第二衍射光栅。

7. 发明授权

US5465148A Apparatus and method for detecting the relative positional deviation between two diffraction gratings 失效
$Apparatus and method for detecting the relative positional deviation between two diffraction gratings$
标题翻译：用于检测两个衍射光栅之间的相对位置偏差的装置和方法
公开(公告)号：US5465148A
公开(公告)日：1995-11-07
申请号：US139143
申请日：1993-10-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
IPC分类号： G01B9/02 , G01B11/24 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G03F9/70
摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.
摘要翻译：第一萨瓦特板和待测对象被布置在塞曼光源的光路上。要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。这里，萨瓦特板将光分成两束。衍射由衍射光栅引起之后，光束由Savart板重新合成。两个光束在相同的光路上行进，从而提高测量精度。

8. 发明授权

US5343291A Method and apparatus for measuring an interval between two objects 失效
标题翻译：用于测量两个物体间隔的方法和装置
公开(公告)号：US5343291A
公开(公告)日：1994-08-30
申请号：US851109
申请日：1992-03-16
申请人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
发明人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.
摘要翻译：用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

9. 发明授权

US5319444A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5319444A
公开(公告)日：1994-06-07
申请号：US20464
申请日：1993-02-22
申请人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
发明人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
IPC分类号： G03F9/00 , G01B11/14 , G01N21/86
CPC分类号： G03F9/7049
摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.
摘要翻译：一种检测第一和第二物体之间的相对位置偏差的方法。该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

10. 发明授权

US5327221A Device for detecting positional relationship between two objects 失效
标题翻译：用于检测两个物体之间的位置关系的装置
公开(公告)号：US5327221A
公开(公告)日：1994-07-05
申请号：US919380
申请日：1992-07-29
申请人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
发明人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
摘要翻译：一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态在预定方向上的物体与第一光不同。基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

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