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1. 发明授权

US06475767B1 Process for producing L-methionine &ggr;-lyase crystals 有权
标题翻译：生产L-甲硫氨酸γ-裂解酶晶体的方法
公开(公告)号：US06475767B1
公开(公告)日：2002-11-05
申请号：US09367974
申请日：1999-08-24
申请人： Kensaku Akita , Tomoaki Takakura , Akio Takimoto , Takaomi Ito
发明人： Kensaku Akita , Tomoaki Takakura , Akio Takimoto , Takaomi Ito
IPC分类号： C12N988
CPC分类号： C12N9/88
摘要： A process for production of L-methionine &ggr;-lyase crystals by using polyethylene glycol, characterized by comprising the first step of warming a solution containing L-methionine &ggr;-lyase before or after addition of polyethylene glycol thereto and the second step of adding an inorganic salt.
摘要翻译：一种使用聚乙二醇生产L-甲硫氨酸γ-裂解酶晶体的方法，其特征在于包括在加入聚乙二醇之前或之后加热含有L-甲硫氨酸γ-裂解酶的溶液的第一步骤，第二步是加入无机盐。

2. 发明申请

US20100016547A1 Glycosilated Peptide and Medicine Comprising It as an Effective Ingredient 审中-公开
标题翻译：糖化肽和医药包含它作为有效成分
公开(公告)号：US20100016547A1
公开(公告)日：2010-01-21
申请号：US12085770
申请日：2006-11-29
申请人： Takaomi Ito , Akio Takimoto , Hirofumi Nagatome , Masataka Fumoto , Taichi Ueda , Shin-Ichiro Nishimura
发明人： Takaomi Ito , Akio Takimoto , Hirofumi Nagatome , Masataka Fumoto , Taichi Ueda , Shin-Ichiro Nishimura
IPC分类号： C07K14/605
CPC分类号： C07K14/605 , A61K38/00 , C08B37/006
摘要： The present invention related to providing a novel medicine for treating diabetes. It is possible to provide a GLP-1 derivative which is resistant to enzyme degradation by glycosylation of the peptide side chain.
摘要翻译：本发明涉及提供一种治疗糖尿病的新型药物。可以提供通过肽侧链的糖基化对酶降解具有抗性的GLP-1衍生物。

3. 发明授权

US06605811B2 Electron beam lithography system and method 有权
标题翻译：电子束光刻系统及方法
公开(公告)号：US06605811B2
公开(公告)日：2003-08-12
申请号：US09986485
申请日：2001-11-09
申请人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
发明人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
IPC分类号： G01N2300
CPC分类号： H01J37/1472 , H01J2237/3175
摘要： In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.
摘要翻译：在电子束光刻系统中，输出的主信号直接施加到偏转板，而输出的辅助信号通过电容耦合施加到偏转板，用于以高速准确地写入宽的带状图案。在电子束光刻系统中，偏转信号被分成具有低频和大振幅的主信号以及具有高频和小振幅的辅助信号。主信号直接施加到偏转板，辅助信号通过电容器施加到偏转板上。在写入具有一定宽度的直线和固体图形的情况下，因为电子束通过使用辅助信号以给定方向偏转并且给定的宽度与基于主要的一个扫描周期同步地信号，可以写入其宽度与电子束直径的宽度一样宽的线，并且可以高速写入具有一定宽度的图形。

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